Comprehensive stoichiometric studies on the reaction of silicon in HF/HNO3 and HF/HNO3/H2SiF6 mixtures
Author: | Anja RietigORCiD, Thomas LangnerORCiD, Jörg AckerORCiDGND |
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URL: | https://pubs.rsc.org/en/content/articlelanding/2022/cp/d1cp05418j |
DOI: | https://doi.org/10.1039/d1cp05418j |
ISSN: | 1463-9076 |
Title of the source (English): | Physical chemistry, chemical physics |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2022 |
Tag: | etching; hydrogen; mechanism; nitrogen oxides; silicon; stoichiometry |
Volume/Year: | 24 |
Issue number: | 5 |
First Page: | 3094 |
Last Page: | 3108 |
Faculty/Chair: | Fakultät 2 Umwelt und Naturwissenschaften / FG Physikalische Chemie |