High temperature x-ray diffraction measurements on Ge/Si(001) heterostructures: a study on the residual tensile strain
Author: | Giovanni CapelliniORCiD, Monica De Seta, Peter Zaumseil, Grzegorz Kozłowski, Thomas Schroeder |
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DOI: | https://doi.org/10.1063/1.3702443 |
ISSN: | 0021-8979 |
Title of the source (English): | Journal of Applied Physics |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2012 |
Volume/Year: | 111 |
Issue number: | 7 |
Faculty/Chair: | Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Halbleitermaterialien |
Institution name at the time of publication: | Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Halbleitermaterialien |