Mihaela Popovici, Annelies Delabie, Christoph Adelmann, Johan Meersschaut, Alexis Franquet, Massimo Tallarida, Jaap van den Berg, Olivier Richard, Johan Swerts, Kazuyuki Tomida, Min-Soo Kim, Hilde Tielens, Hugo Bender, Thierry Conard, Malgorzata Jurczak, Sven van Elshocht, Dieter Schmeißer
- The atomic layer deposition of titanium oxide TiO2 on ruthenium and oxidized ruthenium with titanium methoxide as metal precursor
and H2O and O3 as oxidant was investigated by Rutherford backscattering (RBS) and time of flight secondary ion mass spectrometry (TOFSIMS). An ultra-thin layer of TiO2 deposited a priori with H2O plays the role of protection of Ru(Ox) substrates against etching by O3. Information about thin films (∼3 nm) interfacial reactions, thickness and structure was brought by Medium Energy Ion
Scattering Spectroscopy (MEIS) and X-ray absorption spectroscopy (XAS) measurements. The growth enhancements observed in
the first stages of the deposition depends on the pre-treatment (pre-oxidation, H2O based interlayer thickness) of the Ru substrate.
Thick films (∼14 nm) were analyzed by transmission electron microscopy (TEM) and X-ray diffraction (XRD). The as deposited TiO2 films are crystalline with rutile structure, as resulted from structural analyzes. However, the presence of small amounts of anatase was detected byThe atomic layer deposition of titanium oxide TiO2 on ruthenium and oxidized ruthenium with titanium methoxide as metal precursor
and H2O and O3 as oxidant was investigated by Rutherford backscattering (RBS) and time of flight secondary ion mass spectrometry (TOFSIMS). An ultra-thin layer of TiO2 deposited a priori with H2O plays the role of protection of Ru(Ox) substrates against etching by O3. Information about thin films (∼3 nm) interfacial reactions, thickness and structure was brought by Medium Energy Ion
Scattering Spectroscopy (MEIS) and X-ray absorption spectroscopy (XAS) measurements. The growth enhancements observed in
the first stages of the deposition depends on the pre-treatment (pre-oxidation, H2O based interlayer thickness) of the Ru substrate.
Thick films (∼14 nm) were analyzed by transmission electron microscopy (TEM) and X-ray diffraction (XRD). The as deposited TiO2 films are crystalline with rutile structure, as resulted from structural analyzes. However, the presence of small amounts of anatase was detected by soft X-ray absorption spectroscopy (XAS) and is strongly influenced by the surface pre-treatment of the Ru substrate. The electrical properties (equivalent oxide thickness and leakage current density) correlate with a different rutile/anatase
ratio present in the films.…
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MetadatenAuthor: | Mihaela Popovici, Annelies Delabie, Christoph AdelmannORCiD, Johan Meersschaut, Alexis Franquet, Massimo TallaridaORCiD, Jaap van den Berg, Olivier Richard, Johan Swerts, Kazuyuki Tomida, Min-Soo Kim, Hilde Tielens, Hugo Bender, Thierry Conard, Malgorzata Jurczak, Sven van Elshocht, Dieter SchmeißerORCiD |
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DOI: | https://doi.org/10.1149/2.035301jss |
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ISSN: | 2162-8769 |
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Title of the source (English): | ECS Journal of Solid State Science and Technology |
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Document Type: | Scientific journal article peer-reviewed |
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Language: | English |
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Year of publication: | 2013 |
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Tag: | Medium Energy Ion Scattering Spectroscopy (MEIS); RuOx; Rutherford backscattering (RBS); TiO2; X-Ray absorption spectroscopy; X-ray diffraction (XRD); atomic layer deposition; rutile; time of flight secondary ion mass spectrometry (TOFSIMS); transmission electron microscopy (TEM) |
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Volume/Year: | 2 |
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Issue number: | 1 |
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First Page: | N23 |
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Last Page: | N27 |
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Faculty/Chair: | Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie |
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Institution name at the time of publication: | Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik |
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