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Two-Photon Lithography Parameter Study for Manufacturing of Acoustic Metamaterials on MEMS

  • Acoustic impedance matching structures can be used on capacitive micromachined ultrasonic transducers (CMUT) to increase acoustic energy transmission into the load medium. Our contribution contains a systematic study of the viability of the two-photon-polymerization lithography process for the fabrication of acoustic impedance matching metamaterials. For this purpose, acoustic simulations were conducted to find optimized dimensions of the matching structure. Based on the proposed dimensions, parameter sweeps were manufactured on substitute substrates, resulting in a viable parameter space for the direct fabrication on CMUT devices.

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Metadaten
Author: Severin Schweiger, Anton MelnikovORCiD, Sandro G. Koch, Harald SchenkORCiD
URL:https://www.vde-verlag.de/proceedings-de/455656092.html
ISBN:978-3-8007-5656-8
Title of the source (English):MikroSystemTechnik Kongress 2021 : Mikroelektronik/Mikrosystemtechnik und ihre Anwendungen Innovative Produkte für zukunftsfähige Märkte 08. – 10. November 2021, Stuttgart-Ludwigsburg
Publisher:VDE-Verlag
Place of publication:Berlin ; Offenbach
Document Type:Conference publication not peer-reviewed
Language:English
Year of publication:2021
First Page:365
Last Page:368
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Mikro- und Nanosysteme
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