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Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

  • The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using etrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation.

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Metadaten
Author: Małgorzata KotORCiD, Justyna Łobaza, Franziska NaumannORCiD, Hassan Gargouri, Karsten HenkelORCiDGND, Dieter SchmeißerORCiD
DOI:https://doi.org/10.1116/1.5003356
ISSN:0734-2101
ISSN:1520-8559
Title of the source (English):Journal of Vacuum Science and Technology A
Document Type:Scientific journal article peer-reviewed
Language:English
Year of publication:2018
Tag:X-Ray photoelectron spectroscopy (XPS); atomic layer deposition (ALD); surface oxidation; titanium oxynitride
Volume/Year:36
Issue number:1
Article number:01A114
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
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