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Graphene Research in 200 mm CMOS Pilot Line

  • Due to the unique electronic structures, graphene and other 2D Materials are considered as materials which can enable and extend the functionalities and performance in a large variety of applications, among them in microelectronics. At this point, the investigation and preparation of graphene devices in conditions resembling as close as possible the Si technology environment is of highest importance.Towards these goals, this paper focuses on the full spectra of graphene research aspects in 200mm pilot line. We investigated different process module developments such as CMOS compatible growth of high quality graphene on germanium and its growth mechanisms, transfer related challenges on target substrates, patterning, passivation and various concepts of contacting of graphene on a full 200 mm wafers. Finally, we fabricated proof-of-concept test structures e.g. TLM, Hall bars and capacitor structures to prove the feasibility of graphene processing in the pilot line of IHP.

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Author: Mindaugas Lukosius, Rasuolė Lukose, Marco Lisker, G. Luongo, M. Elviretti, Andreas Mai, Christian WengerORCiD
DOI:https://doi.org/10.23919/MIPRO55190.2022.9803362
ISBN:978-953-233-103-5
ISBN:978-953-233-102-8
ISBN:978-1-6654-8434-3
ISSN:2623-8764
ISSN:1847-3938
Title of the source (English):45th Jubilee International Convention on Information, Communication and Electronic Technology (MIPRO), 2022
Document Type:Conference publication peer-reviewed
Language:English
Year of publication:2022
Tag:CMOS; Graphene
First Page:113
Last Page:117
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Halbleitermaterialien
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