About determining reliable etching rates and the role of temperature in kinetic experiments on acidic wet chemical etching of silicon
Author: | Anja RietigORCiD, Thomas LangnerORCiD, Jörg AckerORCiDGND |
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URL: | https://pubs.rsc.org/en/content/articlelanding/2023/cp/d2cp05837e |
DOI: | https://doi.org/10.1039/D2CP05837E |
ISSN: | 1463-9084 |
Title of the source (English): | Physical Chemistry Chemical Physics |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2023 |
Volume/Year: | 25 |
Issue number: | 16 |
First Page: | 11387 |
Last Page: | 11397 |
Faculty/Chair: | Fakultät 2 Umwelt und Naturwissenschaften / FG Physikalische Chemie |