In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems
Author: | Krzysztof Kolanek, Massimo TallaridaORCiD, Konstantin Karavaev, Dieter SchmeißerORCiD |
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ISBN: | 978-1-4244-4303-1 |
Title of the source (English): | International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany |
Publisher: | IEEE |
Place of publication: | Piscataway, NJ |
Document Type: | Conference Proceeding |
Language: | English |
Year of publication: | 2009 |
Tag: | atomic layer deposition; high-k dielectrics; microsystems |
First Page: | 47 |
Last Page: | 51 |
Faculty/Chair: | Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie |
Institution name at the time of publication: | Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik |