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Advances in MOEMS technologies for high quality imaging systems

  • An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering.

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Metadaten
Author: Harald SchenkORCiD, Michael Wagner, Jan Grahmann, André Merten
DOI:https://doi.org/10.1117/12.2297399
ISBN:978-1-5106-1666-0
ISBN:978-1-5106-1667-7
Title of the source (English):Optical Microlithography XXXI, 27 February-1 March 2018, San Jose, California, Unites States
Publisher:SPIE
Place of publication:Bellingham, Washington
Editor: Jongwook Kye, Soichi Owa
Document Type:Conference Proceeding
Language:English
Year of publication:2018
Series ; volume number:Proceedings of SPIE ; volume 10587
Article number:1058703
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Mikro- und Nanosysteme
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