Study of InP Surfaces after Wet Chemical Treatments
- In this work synchrotron radiation photoemission spectroscopy (SRPES) is used to study InP surfaces after different wet chemical treatments. All results are compared to a typical fingerprint of surface components present on an as received InP sample. It is shown that acidified (HCl and H₂SO₄) treatments efficiently remove the native phosphate, although components like Pᴼ, Inᴼ and P(2±∆)+ remain present. In alkaline solution (NH₄OH) oxide remains present at the surface. As an alternative treatment, the immersion into (NH₄)₂S was studied. This passivation treatment results in fewer surface components which suggests that a higher quality surface is obtained.
Author: | Daniel Cuypers, Dennis H. von DorpORCiD, Massimo TallaridaORCiD, Simone Brizzi, Leonard Rodriguez, Thierry Conard, Sophia Arnauts, Dieter SchmeißerORCiD, Christoph AdelmannORCiD, Stefan De Gendt |
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DOI: | https://doi.org/10.1149/05806.0297ecst |
ISSN: | 1938-6737 |
ISSN: | 1938-5862 |
Title of the source (English): | ECS Transactions |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2013 |
Tag: | InP; Synchrotron Radiation Photoelectron Spectroscopy; Wet chemical treatment |
Volume/Year: | 58 |
Issue number: | 6 |
First Page: | 297 |
Last Page: | 303 |
Faculty/Chair: | Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie |
Institution name at the time of publication: | Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik |