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Study of InP Surfaces after Wet Chemical Treatments

  • In this work synchrotron radiation photoemission spectroscopy (SRPES) is used to study InP surfaces after different wet chemical treatments. All results are compared to a typical fingerprint of surface components present on an as received InP sample. It is shown that acidified (HCl and H₂SO₄) treatments efficiently remove the native phosphate, although components like Pᴼ, Inᴼ and P(2±∆)+ remain present. In alkaline solution (NH₄OH) oxide remains present at the surface. As an alternative treatment, the immersion into (NH₄)₂S was studied. This passivation treatment results in fewer surface components which suggests that a higher quality surface is obtained.

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Author: Daniel Cuypers, Dennis H. von DorpORCiD, Massimo TallaridaORCiD, Simone Brizzi, Leonard Rodriguez, Thierry Conard, Sophia Arnauts, Dieter SchmeißerORCiD, Christoph AdelmannORCiD, Stefan De Gendt
DOI:https://doi.org/10.1149/05806.0297ecst
ISSN:1938-6737
ISSN:1938-5862
Title of the source (English):ECS Transactions
Document Type:Scientific journal article peer-reviewed
Language:English
Year of publication:2013
Tag:InP; Synchrotron Radiation Photoelectron Spectroscopy; Wet chemical treatment
Volume/Year:58
Issue number:6
First Page:297
Last Page:303
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
Institution name at the time of publication:Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik
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