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Study of InP Surfaces after Wet Chemical Treatments

  • The influence of different wet chemical treatments (HCl, H₂SO₄, NH₄OH) on the composition of InP surfaces is studied by using synchrotron radiation photoemission spectroscopy (SRPES). It is shown that a significant amount of oxide remains present after immersion in a NH₄OH solution which is ascribed to the insolubility of In³⁺ at higher pH values. Acidic treatments efficiently remove the native oxide, although components like Pᴼ, Inᴼ and P(2±Δ)+ suboxides are observed. Alternatively, the influence of a passivation step in (NH₄)₂S solution on the surface composition was investigated. The InP surface after immersion into (NH₄)₂S results in fewer surface components, without detection of Pᴼ and P(2±Δ)+ suboxides. Finally, slight etching of InP surfaces in HCl/H₂O₂ solution followed by a native oxide removal step, showed no significant effect on the surface composition.

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Author: Daniel Cuypers, Dennis H. von DorpORCiD, Massimo TallaridaORCiD, Simone Brizzi, Thierry Conard, Leonard Rodriguez, M. Mees, Sophia Arnauts, Dieter SchmeißerORCiD, Christoph AdelmannORCiD, Stefan De Gendt
DOI:https://doi.org/10.1149/2.005401jss
ISSN:2162-8777
ISSN:2162-8769
Title of the source (English):ECS Journal of Solid State Science and Technology
Document Type:Scientific journal article peer-reviewed
Language:English
Year of publication:2014
Tag:InP; Scanning Tunneling Microscopy; Synchrotron Radiation Photoelectron Spectroscopy; Wet chemical treatment
Volume/Year:3
Issue number:1
First Page:N3016
Last Page:N3022
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
Institution name at the time of publication:Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik
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