Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO3 and H2SiF6
Author: | Anja RietigORCiD, Jörg AckerORCiDGND |
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DOI: | https://doi.org/10.1039/d3cp03188h |
ISSN: | 1463-9084 |
ISSN: | 1463-9076 |
Title of the source (English): | Physical Chemistry Chemical Physics |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2023 |
Volume/Year: | 25 |
Issue number: | 38 |
First Page: | 26245 |
Last Page: | 26257 |
Faculty/Chair: | Fakultät 2 Umwelt und Naturwissenschaften / FG Physikalische Chemie |