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Orientation studies of Si-Phthalocyanines sulfonic acids cast on SiOx substrates

  • Layers of dihydroxy silicon phthalocyanine tetrasulfonic acid and oligo-7-oxo silicon phthalocyanine tetrasulfonic acid were prepared by solution-casting methods. The purity of the material was checked by X-ray photoemission spectroscopy. The orientation of the molecules in respect to the substrate plane was investigated by angle-dependent near-edge X-ray absorption fine-structure spectroscopy. The morphology was characterized by atomic force microscopy. Most samples exhibited a significant orientation that was accompanied by crystalline structures; others had no orientation at all with a dominant amorphous morphology. This behavior indicates that several preparation parameters affect the crystallinity and the orientation of the phthalocyanines.

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Metadaten
Author: Günter Appel, H. Ade, A. G. Gürek, S. Stadler, Ricardo Pablo Mikalo, Dieter SchmeißerORCiD
DOI:https://doi.org/10.1007/s003390201320
ISSN:1432-0630
Title of the source (English):Applied Physics / A
Document Type:Scientific journal article peer-reviewed
Language:English
Year of publication:2003
Volume/Year:76
Issue number:2
First Page:177
Last Page:182
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
Institution name at the time of publication:Fakultät für Mathematik, Naturwissenschaften und Informatik (eBTU) / LS Angewandte Physik / Sensorik
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