TY - CHAP A1 - Schmeißer, Dieter A1 - Hoffmann, Patrick A1 - Müssig, Hans-Joachim T1 - The Pr2O3/Si(001) interface: a mixed Si-Proxide T2 - BESSY annual report 2001 Y1 - 2002 SP - 171 EP - 173 PB - Bessy CY - Berlin ER - TY - JOUR A1 - Schmeißer, Dieter A1 - Hoffmann, Patrick T1 - Characterisation of the PrOx/Si(001) Interface by Photoelectron Spectroscopy Y1 - 2002 ER - TY - JOUR A1 - Seyller, Th. A1 - Sieber, N. A1 - Graupner, R. A1 - James, D. A1 - Riley, J. A1 - Leckey, R. A1 - Polcik, M. A1 - Schmeißer, Dieter T1 - High Resolution Photoelectron Spectroscopy on SiC Surfaces Y1 - 2002 ER - TY - JOUR A1 - Pop, D. A1 - Winter, B. A1 - Batchelor, David R. A1 - Freyer, W. A1 - Weber, R. A1 - Bröcker, D. A1 - Hertel, I. V. A1 - Schmeißer, Dieter A1 - Widdra, Wolf T1 - Copper Satellite Structure in Porphyrazine Compounds Y1 - 2002 ER - TY - JOUR A1 - Gracia, F. A1 - Martin-Concepcion, A. I. A1 - Barranco, A. A1 - Holgado, J. P. A1 - Espinos, J. P. A1 - Yubero, F. A1 - Batchelor, David R. A1 - Schmeißer, Dieter A1 - Gonzalez-Elipe, A. R. T1 - XAS investigation of texture in TiO2 thin films prepared by IBICVD Y1 - 2002 ER - TY - GEN A1 - Lopez, Alberto A1 - Heller, Thomas A1 - Bitzer, Thomas A1 - Richardson, Neville V. T1 - A vibrational study of the adsorption of glycine on clean and Na modified Si (100)-2x1 surfaces T2 - Chemical physics N2 - The chemisorption of glycine and its fully deuterated analogue, d(5)-glycine, deposited on the clean and Na modified Si(100)-2 x 1 surfaces, has been studied byhigh-resolution electron energy loss spectroscopy (HREELS) and ab initio methods. HREELS indicates that chemisorption of glycine and d(5)-glycine on Na/Si(100)-2 x1 occurs through cleavage of the OH and OD bonds in the carboxylic groups. The adsorbed species are bonded through the formation of an ionic bond between thedeprotonated carboxylate group and the adsorbed Na atom, leading to species in a bidentate coordination. In contrast, we observe monodentate glycinate andd(5)-glycinate species following the exposure of Si(100)-2 x 1 to glycine and deuterated glycine. The thermal stability of glycine on clean Si(100)-2 x 1 and on the Namodified surface has been studied by heating the substrate to various temperatures. KW - Silicon KW - Glycine KW - Sodium KW - Ab initio KW - HREELS Y1 - 2002 SN - 0301-0104 VL - 277 IS - 1 SP - 1 EP - 8 ER - TY - GEN A1 - Beerbom, Martin A1 - Mayer, Thomas A1 - Jaegermann, Wolfram A1 - Batchelor, David R. A1 - Schmeißer, Dieter T1 - Synchrotron-induced photoemission of GaAs electrodes after electrochemical treatment in aqueous electrolytes N2 - Electrochemically-induced oxidation and reduction reactions of UHV-cleaved GaAs(110) surfaces have been studied after emersion under potential control using highresolution synchrotron-induced photoelectron spectroscopy. High quality spectra of the As and Ga core 3d lines and the valence band region have been obtained. Thespectra of the anodic oxide show strong emission of bulk-like Ga2O3 and some As2O3 with the admixture of suboxides and hydroxides. Ga2O3 and As2O3 arecathodically reduced leaving the GaAs surface covered mostly with elemental As, some As-H and remnants of Ga-suboxides and -hydroxides. KW - GAAS(110) KW - GaAs KW - Electrochemistry KW - Aqueous electrolytes KW - Surface engineering Y1 - 2002 ER - TY - JOUR A1 - Sieber, N. A1 - Seyller, Th. A1 - Graupner, R. A1 - Ley, L. A1 - Mikalo, Ricardo Pablo A1 - Hoffmann, Patrick A1 - Batchelor, David R. A1 - Schmeißer, Dieter T1 - Wet-chemical preparation of silicate adlayer reconstructed SiC(0001) surfaces as studied by PIES and LEED N2 - We have studied the surface chemistry of 6H-SiC(0001) and 6H-SiC (000 (1) over bar) after wet-chemical treatment using photoelectron spectroscopy (PES) andlow-energy electron diffraction (LEED). The origin of chemically shifted components in the Si2p and C1s spectra is discussed in the light of previous studies onwet-chemically prepared surfaces and on silicate adlayer reconstructed surfaces. On 6H-SiC(0001) an ordered silicate adlayer was prepared by etching the surface withsulfuric acid based agents. KW - Core level KW - Photoelectron spectroscopy KW - Synchrotron radiation KW - Wet-chemical preparation OXIDE Y1 - 2002 ER - TY - GEN A1 - Lewerenz, Hans-Joachim A1 - Aggour, Mohammed A1 - Murrell, Chris A1 - Kanis, M. A1 - Hoffmann, Patrick A1 - Jungblut, H. A1 - Schmeißer, Dieter T1 - Interface engineering of photoelectrochemically prepared Si surfaces N2 - The oxide of Si(111) formed by electropolishing in dilute ammonium fluoride solution is analysed by photoelectron spectroscopy using synchrotron radiation. The oxidiclayer is about 3.1 nm thick and contains Si-F-x species as well as oxyfluorides. The oxyfluorides are found preferentially at the electropolishing layer surface. SiOHspecies are concentrated at the oxidic film/substrate interface. The full width half maximum of the Si 2p line indicates that the Si/electropolishing oxide interface issmoother than the Si/natural oxide interface. KW - Mean Free Paths KW - Silicon KW - Range Y1 - 2002 ER - TY - THES A1 - Goryachko, Andriy T1 - Investigations of perspective materials for aggressively scaled gate stacks and contact structures of MOS devices KW - silicon KW - praseodymium oxide KW - tungsten nitride KW - tungsten silicide KW - cobalt silicide KW - scanning tunneling microscopy KW - Angerelection spectroscopy Y1 - 2002 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:co1-000000342 UR - http://opus4.kobv.de/opus4-btu/frontdoor/index/index/docId/59 ER - TY - JOUR A1 - Batchelor, David R. A1 - Follath, Rolf A1 - Schmeißer, Dieter T1 - Commissioning Results of the BTUC-PGM beamline Y1 - 2001 ER - TY - GEN A1 - Böhme, O. A1 - Lloyd Spetz, Anita A1 - Lundström, Ingemar A1 - Schmeißer, Dieter T1 - Nanoparticles as the Active Element of High-Temperature Metal-Insulator-Silicon Carbide Gas Sensors T2 - Advanced Materials Y1 - 2001 SN - 1521-4095 SN - 0935-9648 VL - 13 IS - 8 SP - 597 EP - 601 ER - TY - GEN A1 - Gürek, A. G. A1 - Appel, Günter A1 - Mikalo, Ricardo Pablo A1 - Schmeißer, Dieter T1 - Synthesis of dihydroxy silicon phthalocyanine tetrasulfonic acid and poly-µ-oxo silicon phthalocyanine tetrasulfonic acid T2 - Journal of Porphyrins and Phthalocyanines Y1 - 2001 SN - 1099-1409 SN - 1088-4246 VL - 5 IS - 10 SP - 751 EP - 757 ER - TY - GEN A1 - Henkel, Karsten A1 - Oprea, A. A1 - Paloumpa, Ioanna A1 - Appel, Günter A1 - Schmeißer, Dieter A1 - Kamieth, P. T1 - Selective polypyrrole electrodes for quartz microbalances : NO2 and gas flux sensitivities T2 - Sensors and Actuators : B, Chemical 76(2001)1-3 Y1 - 2001 SN - 0925-4005 VL - 76 IS - 1-3 SP - 124 EP - 129 ER -