TY - GEN A1 - Tarnawska, Lidia Lupina A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Okur, S. A1 - Morkoc, H. A1 - Paszkiewicz, R. A1 - Storck, Peter A1 - Schroeder, Thomas T1 - Structural and optical quality of GaN on Sc2O3 / Y2O3 / Si(111) T2 - Journal of Applied Physics Y1 - 2012 U6 - https://doi.org/10.1063/1.3699201 SN - 0021-8979 VL - 111 IS - 7 SP - 073509 EP - 073509-4 ER - TY - GEN A1 - Kozłowski, Grzegorz A1 - Fursenko, Oksana A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Vorderwestner, M. A1 - Storck, Peter T1 - The epitaxial growth of low defect SiGe buffer layers for integration of new materials on 300 mm silicon wafers T2 - ECS transactions Y1 - 2012 SN - 1938-6737 VL - 50 IS - 9 SP - 613 EP - 621 ER - TY - CHAP A1 - Seifarth, Olaf A1 - Walczyk, Christian A1 - Lupina, Grzegorz A1 - Dabrowski, Jaroslaw A1 - Weidner, Günter A1 - Zaumseil, Peter A1 - Schmeißer, Dieter A1 - Storck, Peter A1 - Müssig, Hans-Joachim A1 - Schroeder, Thomas T1 - On the electronic and dielectric characterisation of thin cubic PrO2 layers on Silicon T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 43 N2 - For the integration of 100 % Ge onto the Si platform, a buffer oxide approach has been developed recently, using rare earth oxides to tune the lattice constant between the Si and the Ge. Among these buffer oxides, PrO2 is a prospective candidate with high quality crystalline growth on Si, moderated by an interfacial Pr-silicate between. In order to specify electronic properties of thin PrO2 and its interface on Si(111), especially the width of the band gap, we performed synchrotron radiation based XPS, UPS and XAS measurements at the U49/2 PGM 2 beamline at BESSY II and correlate the results with our structural characterisation performed by TEM and XRD. In order to evaluate the dielectric properties of thin PrO2 layers on Si(111), we performed temperature-, time-, voltage-, and layer thickness-dependent leakage current measurements (J-V). Here, we identified relaxation behaviour in the leakage current, successfully addressed to defect like states inside the Pr-silicate interface layer, corroborated by frequency dependent capacitance versus voltage (C-V) measurements. Y1 - 2008 UR - http://www.dpg-verhandlungen.de/year/2008/conference/berlin/part/df/session/12/contribution/6 SN - 0420-0195 SP - S. 196 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Lupina, Grzegorz A1 - Dabrowski, Jarek Marek A1 - Formanek, Peter A1 - Schmeißer, Dieter A1 - Sorge, Roland A1 - Wenger, Christian A1 - Zaumseil, Peter A1 - Müssig, Hans-Joachim T1 - Solid-state reaction between Pr and SiO2 studied by photoelectron spectroscopy and ab initio calculations T2 - Materials Science in Semiconductor Processing N2 - We report on the structural and electrical properties of Pr-based high-k dielectric films fabricated by solid-state reaction between metallic Pr and SiO2 underlayers. A non-destructive depth profiling using synchrotron radiation excited photoelectron spectroscopy (SR-PES), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) were employed to examine the chemical composition and microstructure. Ab initio calculations were done to gain insight into the physical processes involved. SR-PES results indicate that Pr deposition at room temperature (RT) leads to the formation of a Pr silicide and a Pr oxide, what is in good agreement with the scenario expected from ab initio calculations. As revealed by TEM and electrical measurements, oxidation of the reacted structures, followed by annealing, results in a stacked dielectric composed of a SiO2-based buffer with an enhanced permittivity and a Pr silicate film with a high dielectric constant. The leakage current density of 10-4 A/cm2 was measured for stacks with capacitance equivalent thickness (CET) of 1.5 nm prepared by evaporation of the Pr layer on a 1.8 nm SiO2 film, followed by oxidation in air ambient and annealing in N2 atmosphere. The capacitance-voltage (C-V) curves exhibit a large flatband voltage (VFB) shift indicating the presence of a positive charge in the stack. Switching away from the Al contacts to Au gate electrodes introduces a significant reduction of the VFB by 1.3 eV, what is much more than the change expected from the work function difference between Al and Au (not, vert, similar0.9 eV). This in turn implies that VFB is strongly affected by the gate interface electrode. KW - High-k dielectrics KW - Photoelectron spectroscopy KW - Interface reaction Y1 - 2004 SN - 1369-8001 VL - 7 IS - 4-6 SP - 215 EP - 220 ER - TY - GEN A1 - Müssig, Hans-Joachim A1 - Dabrowski, Jarek Marek A1 - Wenger, Christian A1 - Lupina, Grzegorz A1 - Sorge, Roland A1 - Formanek, Peter A1 - Zaumseil, Peter A1 - Schmeißer, Dieter T1 - Ultrathin Dielectric Films Grown by Solid Phase Reaction of Pr with SiO2 T2 - MRS Proceedings Y1 - 2004 SN - 1946-4274 VL - 811 ER - TY - GEN A1 - Richard, Marie-Ingrid A1 - Zöllner, Marvin Hartwig A1 - Chahine, Gilbert A. A1 - Zaumseil, Peter A1 - Capellini, Giovanni A1 - Häberlen, Maik A1 - Storck, Peter A1 - Schülli, Tobias U. A1 - Schröder, Thomas T1 - Structural Mapping of Functional Ge Layers Grown on Graded SiGe Buffers for sub-10 nm CMOS Applications Using Advanced X-ray Nano-Diffraction T2 - ACS Applied Materials and Interfaces Y1 - 2015 U6 - https://doi.org/10.1021/acsami.5b08645 SN - 1944-8244 SN - 1944-8252 VL - 7 IS - 48 SP - 26696 EP - 26700 ER - TY - GEN A1 - Zöllner, Marvin Hartwig A1 - Richard, Marie-Ingrid A1 - Chahine, Gilbert A. A1 - Zaumseil, Peter A1 - Reich, Christian A1 - Capellini, Giovanni A1 - Montalenti, Francesco A1 - Marzegalli, Anna A1 - Xie, Ya-Hong A1 - Schülli, Tobias U. A1 - Häberlen, Maik A1 - Storck, Peter A1 - Schroeder, Thomas T1 - Imaging structure and composition homogeneity of 300 mm SiGe virtual substrates for advanced CMOS applications by scanning X-ray diffraction microscopy T2 - ACS Applied Materials and Interfaces Y1 - 2015 U6 - https://doi.org/10.1021/am508968b SN - 1944-8252 VL - 7 IS - 17 SP - 9031 EP - 9037 ER - TY - CHAP A1 - Lippert, Gunther A1 - Dabrowski, Jarek Marek A1 - Costina, Ioan A1 - Lupina, Grzegorz A1 - Ratzke, Markus A1 - Zaumseil, Peter A1 - Müssig, Hans-Joachim T1 - Morphology and Composition of Praseodymium Based High-k Materials and Their Relevance to Dielectric Properties of Thin-Films Y1 - 2007 ER - TY - GEN A1 - Capellini, Giovanni A1 - De Seta, Monica A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Schroeder, Thomas T1 - High temperature x-ray diffraction measurements on Ge/Si(001) heterostructures: a study on the residual tensile strain T2 - Journal of Applied Physics Y1 - 2012 U6 - https://doi.org/10.1063/1.3702443 SN - 0021-8979 VL - 111 IS - 7 ER - TY - GEN A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Yamamoto, Yuji A1 - Schubert, Markus Andreas A1 - Schroeder, Thomas T1 - X-ray Characterization of Ge Dots Epitaxially Grown on Nano-structured Si Islands on SOI Substrates T2 - Journal of Applied Crystallography Y1 - 2013 SN - 0021-8898 VL - 46 IS - 4 SP - 868 EP - 873 ER - TY - GEN A1 - Oehme, Michael A1 - Widmann, Daniel A1 - Kostecki, Konrad A1 - Zaumseil, Peter A1 - Schwartz, Bernhard A1 - Gollhofer, Martin A1 - Körner, Roman A1 - Bechler, Stefan A1 - Kittler, Martin A1 - Kasper, Erich A1 - Schulze, Jörg T1 - GeSn/Ge Multi Quantum Well Photodetectors on Si Substrates T2 - Optics Letters Y1 - 2014 U6 - https://doi.org/10.1364/OL.39.004711 SN - 1539-4794 VL - 39 IS - 16 SP - 4711 EP - 4714 ER - TY - GEN A1 - Di Gaspare, L. A1 - Sabbagh, D. A1 - De Seta, Monica A1 - Sodo, A. A1 - Wirths, S. A1 - Buca, Dan A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Capellini, Giovanni T1 - A very low temperature epi-cleaning process for Ge / GeSn heterostructures T2 - Journal of Applied Physics Y1 - 2015 U6 - https://doi.org/10.1063/1.4906616 SN - 1089-7550 VL - 117 SP - 045306 ER - TY - GEN A1 - Taoka, Noriyuki A1 - Asano, Takanori A1 - Yamaha, Takashi A1 - Terashima, Tatsuya A1 - Nakatsuka, Osamu A1 - Costina, Ioan A1 - Zaumseil, Peter A1 - Capellini, Giovanni A1 - Zaima, Shigeaki A1 - Schroeder, Thomas T1 - Non-uniform depth distributions of Sn concentration induced by Sn migration and desorption during GeSnSi layer formation T2 - Applied Physics Letters Y1 - 2015 U6 - https://doi.org/10.1063/1.4908121 SN - 1077-3118 VL - 106 SP - 061107-1 EP - 061107-5 ER - TY - GEN A1 - Wirths, S. A1 - Troitsch, R. A1 - Mussler, G. A1 - Stoica, T. A1 - Hartmann, J.-M. A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Mantl, Siegfried A1 - Buca, Dan T1 - Ternary and Quaternary Ni(Si)GeSn Contact Formation for highly strained Ge p- and n-MOSFETs T2 - Semiconductor Science and Technology Y1 - 2015 U6 - https://doi.org/10.1088/0268-1242/30/5/055003 SN - 0268-1242 VL - 30 IS - 5 SP - 055003 ER - TY - GEN A1 - Niu, Gang A1 - Capellini, Giovanni A1 - Lupina, Grzegorz A1 - Niermann, Tore A1 - Salvalaglio, Marco A1 - Marzegalli, Anna A1 - Schubert, Markus Andreas A1 - Zaumseil, Peter A1 - Krause, Hans-Michael A1 - Skibitzki, Oliver A1 - Lehmann, Michael A1 - Montalenti, Francesco A1 - Xie, Ya-Hong A1 - Schröder, Thomas T1 - Photodetection in hybrid single layer graphene/fully coherent Ge island nanostructures selectively grown on Si nano-tip patterns T2 - ACS Applied Materials and Interfaces Y1 - 2016 SN - 1944-8252 VL - 8 IS - 3 SP - 2017 EP - 2026 ER - TY - GEN A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Yamamoto, Yuji A1 - Skibitzki, Oliver A1 - Capellini, Giovanni A1 - Schröder, Thomas T1 - Misfit dislocation-free epitaxial growth of SiGe on compliant nanostructured Silicon T2 - Solid State Phenomena Y1 - 2016 U6 - https://doi.org/10.4028/www.scientific.net/SSP.242.402 SN - 1662-9779 SN - 0377-6883 VL - 242 SP - 402 EP - 407 ER - TY - GEN A1 - Taoka, Noriyuki A1 - Capellini, Giovanni A1 - Driesch, Nils von den A1 - Buca, Dan A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Klesse, Wolfgang Matthias A1 - Montanari, Michele A1 - Schröder, Thomas T1 - Sn Migration Control at High Temperature Due to High Deposition Speed for Forming High Quality GeSn Layer T2 - Applied Physics Express Y1 - 2016 U6 - https://doi.org/10.7567/APEX.9.031201 SN - 1882-0786 SN - 1882-0778 VL - 9 IS - 3 SP - 031201 ER - TY - GEN A1 - Niu, Gang A1 - Capellini, Giovanni A1 - Schubert, Markus Andreas A1 - Niermann, Tore A1 - Zaumseil, Peter A1 - Katzer, Jens A1 - Krause, Hans-Michael A1 - Skibitzki, Oliver A1 - Lehmann, Michael A1 - Xie, Ya-Hong A1 - Känel, Hans von A1 - Schröder, Thomas T1 - Dislocation-free Ge nano-crystals via pattern dependent selective Ge heteroepitaxy on Si nano-tip wafers T2 - Scientific Reports Y1 - 2016 U6 - https://doi.org/10.1038/srep22709 SN - 2045-2322 VL - 6 SP - 22709 ER - TY - GEN A1 - Engelhard, M. A1 - Klemp, C. A1 - Behringer, M. A1 - Rudolph, A. A1 - Skibitzki, Oliver A1 - Zaumseil, Peter A1 - Schröder, Thomas T1 - Characterization of reclaimed GaAs substrates and investigation of reuse for thin film InGaAlP LED epitaxial growth T2 - Journal of Applied Physics Y1 - 2016 U6 - https://doi.org/10.1063/1.4955333 SN - 1089-7550 SN - 0021-8979 VL - 120 IS - 4 SP - 045301 ER - TY - GEN A1 - Niu, Gang A1 - Capellini, Giovanni A1 - Hatami, Fariba A1 - Bartolomeo, Antonio di A1 - Niermann, Tore A1 - Hameed, Hussein Emad A1 - Schubert, Markus Andreas A1 - Krause, Hans-Michael A1 - Zaumseil, Peter A1 - Skibitzki, Oliver A1 - Masselink, William T. A1 - Lehmann, Michael A1 - Xie, Ya-Hong A1 - Schröder, Thomas T1 - Selective Epitaxy of InP on Si and Rectification in Graphene/InP/Si Hybrid Structure T2 - ACS Applied Materials and Interfaces Y1 - 2016 U6 - https://doi.org/10.1021/acsami.6b09592 SN - 1944-8244 SN - 1944-8252 VL - 8 IS - 40 SP - 26948 EP - 26955 ER -