TY - GEN A1 - Mazur, Michał A1 - Kapuścik, Paulina A1 - Weichbrodt, Wiktoria A1 - Domaradzki, Jarosław A1 - Mazur, Piotr A1 - Kot, Małgorzata A1 - Flege, Jan Ingo T1 - WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations T2 - Materials N2 - Hydrogen gas sensors have recently attracted increased interest due to the explosive nature of H2 and its strategic importance in the sustainable global energy system. In this paper, the tungsten oxide thin films deposited by innovative gas impulse magnetron sputtering have been investigated in terms of their response to H2. It was found that the most favourable annealing temperature in terms of sensor response value, as well as response and recovery times, was achieved at 673 K. This annealing process caused a change in the WO3 cross-section morphology from a featureless and homogenous form to a rather columnar one, but still maintaining the same surface homogeneity. In addition to that, the full-phase transition from an amorphous to nanocrystalline form occurred with a crystallite size of 23 nm. It was found that the sensor response to only 25 ppm of H2 was equal to 6.3, which is one of the best results presented in the literature so far of WO3 optical gas sensors based on a gasochromic effect. Moreover, the results of the gasochromic effect were correlated with the changes in the extinction coefficient and the concentration of the free charge carriers, which is also a novel approach to the understanding of the gasochromic phenomenon. KW - Tungsten oxide (WO3) KW - gas impulse magnetron sputtering KW - thin film KW - gasochromic properties KW - optical properties KW - annealing KW - optical hydrogen gas sensor Y1 - 2023 U6 - https://doi.org/10.3390/ma16103831 SN - 1996-1944 VL - 16 IS - 10 ER - TY - GEN A1 - Weichbrodt, Wiktoria A1 - Domaradzki, Jaroslaw A1 - Obstarczyk, Agata A1 - Kot, Malgorzata A1 - Flege, Jan Ingo A1 - Mazur, Michal T1 - Influence of thermal modification on the gasochromic properties of WO₃ thin films fabricated by electron beam evaporation T2 - Applied optics N2 - This paper describes the effect of post-deposition annealing on the structural and gasochromic properties of WO3 thin films deposited by electron beam evaporation and additionally decorated with a Pd catalyst layer of varying thickness. The WO3 layers were annealed at 800°C, which led to a phase transition from an amorphous to a monoclinic crystal structure, accompanied by an increase in surface roughness from 1.3 to 66 nm and the formation of a discontinuous island-like morphology with grain sizes up to 3 µm. The structural changes had a significant effect on the optical response of the layers to hydrogen. For the annealed samples, the absolute change in light transmission reached 20.2–20.9% for the 1.5 nm thick Pd catalyst and 7.7–9.2% for the 5 nm thick Pd catalyst at a wavelength of 850 nm. The corresponding optical response was 184–186% for the thin Pd layer and 353–396% for the thick Pd layer, depending on the hydrogen concentration (25–1000 ppm). The response time was reduced from 10 min at 25 ppm to < 4 min at 1000 ppm, while the recovery time to the original state in air remained below 66 s under all conditions. XPS studies confirmed the reduction of W6+ to W5+ under the influence of hydrogen and reversible transition PdO - Pd, which correlates with the observed optical changes. The results show that annealing increases crystallinity and modifies porosity, which, in combination with the Pd catalyst directly affects the kinetics and magnitude of the gasochromic response. Y1 - 2025 U6 - https://doi.org/10.1364/AO.574918 SN - 1559-128X VL - 65 IS - 5 SP - A58 EP - A67 PB - Optica Publishing Group CY - Washington, DC ER -