TY - GEN A1 - Zeipert-Böckle, Silke A1 - Wilker, Viola A1 - Opfermann, Johannes A1 - Linke, Dietmar T1 - Thermokinetische Analyse des Sintern unterschiedlich präparierter Si-Al-Y-O-N-Keramik N2 - Kurzreferat zum Poster auf der 11. Vortragstagung der Gesellschaft Deutscher Chemiker, Fachgruppe Festkörperchemie und Materialforschung, "Nichtstöchiometrische Festkörper - Grundlagen und Anwendungen", Dresden 24.-26.09.2002 KW - Keramik KW - Sintermechanismus KW - Kinetik Y1 - 2002 N1 - Poster ER - TY - GEN A1 - Wilker, Viola A1 - Zeipert-Böckle, Silke A1 - Linke, Dietmar T1 - Sialon-Glas-Komposite N2 - Poster auf dem Antragskolloquium zum DFG-Schwerpunktprogramm "Substitutionseffekte in ionischen Festkörpern", Bonn-Röttgen, 08.-09.04.2002 Materialforschung, "Nichtstöchiometrische Festkörper - Grundlagen und Anwendungen", Dresden 24.-26.09.2002 KW - Keramik-Glas-Komposite KW - Sintermechanismus KW - Kinetik Y1 - 2002 N1 - Poster ER - TY - GEN A1 - Wilker, Viola A1 - Vieth, Siegfried A1 - Linke, Dietmar T1 - Materialforschung zu Hochleistungskeramik auf der Basis von Siliciumnitrid Si3N4 N2 - Posterbeitrag, 2. Innovationskongreß "Chemie und Biotechnologie", 13./14.05.2003, Martin-Luther-Universität Halle-Wittenberg KW - Forschungsschwerpunkte Lehrstuhl KW - Pulvermodifizierung KW - Sinterkinetik Y1 - 2003 ER - TY - CHAP A1 - Zeipert-Böckle, Silke A1 - Wilker, Viola A1 - Finke, B. A1 - Linke, Dietmar T1 - Das Sintern einer Si-Al-Y-O-N-Keramik über unterschiedliche Reaktionswege Y1 - 2001 ER - TY - CHAP A1 - Zeipert-Böckle, Silke A1 - Wilker, Viola A1 - Linke, Dietmar T1 - Vom chemisch-reaktiven zum physikalischen Sintern - Schwindungsverhalten unterschiedlich präparierter Si-Al-Y-O-N-Proben identischer Bruttozusammensetzung Y1 - 2001 ER - TY - GEN A1 - Gaydardzhiev, Stoyan A1 - Gusovius, Hans-Jörg A1 - Wilker, Viola A1 - Ay, Peter T1 - Gel-casted porous Al2O3 ceramics by use of natural fibres as pore developers T2 - Journal of Porous Materials KW - Gel-casting Y1 - 2008 SN - 1573-4854 SN - 1380-2224 VL - 15 IS - 4 SP - 475 EP - 480 ER - TY - GEN A1 - Gaydardzhiev, Stoyan A1 - Wilker, Viola A1 - Scheffler, Michael T1 - Dip-coating of fibrous natural materials for alumina tube manufacturing T2 - Advanced Engineering Materials KW - natural fibres Y1 - 2008 SN - 1527-2648 SN - 1438-1656 VL - 10 IS - 3 SP - 223 EP - 226 ER - TY - GEN A1 - Kot, Małgorzata A1 - Henkel, Karsten A1 - Naumann, Franziska A1 - Gargouri, Hassan A1 - Tarnawska, Lidia Lupina A1 - Wilker, Viola A1 - Kus, Peter A1 - Pożarowska, Emilia A1 - Garain, Samiran A1 - Rouissi, Zied A1 - Schmeißer, Dieter T1 - Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources T2 - Journal of Vacuum Science and Technology A N2 - A comparative study of thin aluminum nitride (AlN) films deposited by plasma-enhanced atomic layer deposition in the SENTECH SI ALD LL system applying either a direct inductively coupled plasma (ICP) or an indirect capacitively coupled plasma (CCP) source is presented. The films prepared with the ICP source (based on a planar triple spiral antenna) exhibit improved properties concerning the growth rate per cycle, total cycle duration, homogeneity, refractive index, fixed and mobile electrical charges, and residual oxygen content compared to the CCP source, where the comparison is based on the applied plasma power of 200 W. The increase of the plasma power to 600 W in the ICP process significantly reduces the residual oxygen content and enhances the electrical breakdown field. The AlN layers grown under these conditions, with a growth rate per cycle of 1.54 Å/cycle, contain residual oxygen and carbon concentrations of about 10% and 4%, respectively, and possess a refractive index of 2.07 (at 632.8 nm). KW - Plamsa-enhanced atomic layer deposition (PEALD) KW - inductively coupled KW - capacitively coupled KW - plamsa source KW - ellipsometry KW - X-ray photoelectron spectroscopy (XPS) KW - X-ray diffraction (XRD) KW - Field emission scanning electron microscopy (FESEM) KW - capacitance-voltage (CV) KW - atomic force microscopy Y1 - 2019 U6 - https://doi.org/10.1116/1.5079628 SN - 0734-2101 SN - 1520-8559 VL - 37 IS - 2 ER -