TY - CHAP A1 - Kot, Małgorzata A1 - Kegelmann, Lukas A1 - Kus, Peter A1 - Tsud, Nataliya A1 - Matolínová, Iva A1 - Albrecht, Steve A1 - Matolin, Vladimir A1 - Schmeißer, Dieter T1 - Room temperature atomic layer deposition for perovskite solar cells T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3 N2 - After few years of efficiency driven research on perovskite solar cells, the focus now is shifting to understand the underlying processes governing the high efficiency and also to obtain long-term stable devices. Among various deposition methods, atomic layer deposition (ALD) may represent one of the best options, being possible to coat substrates in a very efficient way and at very low temperatures. In our previous work [1] we reported that the efficiency of the solar cell containing aged perovskite film can be enhanced twice while covering the perovskite with a thin ALD alumina film at room temperature. In this work, the chemical, electronic and morphological properties of the fresh perovskite film treated by ALD pulses of the trimethylaluminium and water at room temperature investigated using X-ray Photoelectron Spectroscopy and Field Emission Scanning Electron Microscopy will be discused and correlated with the solar cells performance and stability. [1] M. Kot et al., ChemSusChem 2016, 9, 3401. KW - Perovskite solar cells KW - atomic layer deposition KW - X-Ray photoelectron spectroscopy (XPS) KW - atomic force microscopy KW - field emission scanning electron microscopy KW - photo-conversion efficiency Y1 - 2018 SN - 0420-0195 SP - S. 174 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -