TY - GEN A1 - Zhang, Wei A1 - Sun, Ke A1 - Li, Biyun A1 - Lee, Jae Young A1 - Xie, Ya-Hong A1 - Katzer, Jens A1 - Schroeder, Thomas A1 - Wei, Xinyu A1 - Russell, Thomas P. T1 - Field Emission Tip Array Fabrication Utilizing Geometrical Hindrance in the Oxidation of Si T2 - IEEE Transactions on Nanotechnology Y1 - 2012 U6 - https://doi.org/10.1109/TNANO.2012.2208472 SN - 1536-125X VL - 11 IS - 5 SP - 999 EP - 1003 ER - TY - GEN A1 - Bertaud, Thomas A1 - Sowinska, Małgorzata A1 - Walczyk, Damian A1 - Thiess, Sebastian A1 - Walczyk, Christian A1 - Gloskovski, A. A1 - Drube, W. A1 - Schroeder, Thomas T1 - In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by Hard X-ray Photoelectron Spectroscopy T2 - Applied Physics Letters Y1 - 2012 VL - 112 IS - 4 SP - 043506 EP - 043511 ER - TY - GEN A1 - Bertaud, Thomas A1 - Walczyk, Damian A1 - Sowinska, Małgorzata A1 - Wolansky, Dirk A1 - Tillack, Bernd A1 - Schoof, Gunther A1 - Korolevych, R. A1 - Wenger, Christian A1 - Thiess, Sebastian A1 - Schroeder, Thomas A1 - Walczyk, Christian T1 - HfO2-based RRAM for Embedded Nonvolatile Memory: From Materials Science to Integrated 1T1R RRAM Arrays T2 - ECS transactions Y1 - 2012 SN - 1938-6737 VL - 50 IS - 4 SP - 21 EP - 26 ER - TY - GEN A1 - Froehlich, K. A1 - Jančovič, P. A1 - Hudek, B. A1 - Dérer, J. A1 - Paskaleva, A. A1 - Bertaud, Thomas A1 - Schroeder, Thomas T1 - Atomic layer deposition of thin oxide films for resistive switching T2 - Electrochemical Society (ECS) Transactions Y1 - 2013 U6 - https://doi.org/10.1149/05810.0163ecst SN - 1938-6737 VL - 58 IS - 10 SP - 163 EP - 170 ER - TY - GEN A1 - Lange, Felix A1 - Ernst, Owen C. A1 - Teubner, Thomas A1 - Richter, Carsten A1 - Schmidbauer, Martin A1 - Skibitzki, Oliver A1 - Schroeder, Thomas A1 - Schmidt, Peer A1 - Boeck, Torsten T1 - In-plane growth of germanium nanowires on nanostructured Si(001)/SiO2 substrates T2 - Nano Futures N2 - Germanium (Ge) nanowires (NWs) were grown in-plane on nano-structured Si(001)/SiO2 substrates by molecular beam epitaxy using gold (Au) as the solvent. The site-selective NW growth was enabled by a rectangular array of gold droplets on silicon (Si) tips with an Au nuclei density below 0.25 μm−2 on the surrounding silicon oxide (SiO2). The initial growth of Ge NWs starting from Si–Au droplets with SixGe1−x nucleation from ternary alloy is discussed from a thermodynamic point of view. The in-plane NW elongation occurred within ⟨110⟩ directions on the substrate and NWs were mainly bounded by two 55◦ inclined 111 facets and a less pronounced planar (001) top facet. Fully relaxed crystal lattices of Ge NWs were observed from two-dimensional reciprocal space maps of x-ray diffraction measurements. KW - Crystal growth KW - Silicon KW - Germanium KW - Phase diagram Y1 - 2020 UR - https://iopscience.iop.org/article/10.1088/2399-1984/ab82a0 U6 - https://doi.org/10.1088/2399-1984/ab82a0 SN - 2399-1984 VL - 4 IS - 3 SP - 1 EP - 8 ER - TY - GEN A1 - Lupina, Grzegorz A1 - Schroeder, Thomas A1 - Dabrowski, Jarek Marek A1 - Schmeißer, Dieter A1 - Hoffmann, Patrick T1 - Praseodymium silicate layers with atomically abrupt interface on Si(100) T2 - Applied Physics Letters Y1 - 2005 SN - 0003-6951 VL - 87 IS - 5 ER - TY - JOUR A1 - Lupina, Grzegorz A1 - Schroeder, Thomas A1 - Schmeißer, Dieter A1 - Dabrowski, Jarek Marek T1 - Praseodymium Silicate Films on Si(100) for Gate Dielectric Applications: Physical and Electrical Characterization Y1 - 2006 ER - TY - GEN A1 - Schroeder, Thomas A1 - Lupina, Grzegorz A1 - Seifarth, Olaf A1 - Tallarida, Massimo A1 - Schmeißer, Dieter T1 - Synchrotron radiation x-ray photoelectron spectroscopy study on the interface chemistry of high-k PrxAl2-xO3 (x=0-2) dielectrics on TiN for dynamic random access memory applications T2 - Journal of Applied Physics Y1 - 2007 SN - 0021-8979 VL - 102 IS - 1 SP - 014103 ER - TY - GEN A1 - Schmeißer, Dieter A1 - Müller, S. A1 - Seifarth, Olaf A1 - Dabrowski, Jarek Marek A1 - Müssig, Hans-Joachim A1 - Schroeder, Thomas T1 - On the band gaps and electronic structure of thin single crystalline praseodymium oxide layers on Si(111) T2 - Journal of vacuum science & technology / B KW - band gabs KW - electronic structure KW - oxide layers Y1 - 2009 VL - 27 IS - 1 SP - 271 EP - 276 ER - TY - GEN A1 - Seifarth, Olaf A1 - Schubert, Markus Andreas A1 - Giussani, A. A1 - Klenov, D. O. A1 - Schmeißer, Dieter A1 - Schroeder, Thomas T1 - Single crystalline Pr2-xYxO3 (x=0-2)dielectrics on Si with tailored electronic and crystallographic structure KW - crystalline KW - dielectric KW - structure Y1 - 2010 SN - 1089-7550 VL - 108 IS - 10 SP - 103709 ER - TY - CHAP A1 - Seifarth, Olaf A1 - Wilke, A. A1 - Walczyk, Christian A1 - Dabrowski, Jarek Marek A1 - Zaumseil, Peter A1 - Schmeißer, Dieter A1 - Müssig, Hans-Joachim A1 - Schroeder, Thomas T1 - Band gap and electronic structure determination with XAS and UPS of thin Pr-oxide films on Si(111) T2 - Proceedings of 15th Workshop on Dielectrics in Microelectronics, Bad Saarow, 23 - 25 June 2008, Bad Saarow (Berlin) KW - band gab KW - XAS KW - UPS KW - Si(111) Y1 - 2008 SP - 285 EP - 286 ER - TY - GEN A1 - Capellini, Giovanni A1 - De Seta, Monica A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Schroeder, Thomas T1 - High temperature x-ray diffraction measurements on Ge/Si(001) heterostructures: a study on the residual tensile strain T2 - Journal of Applied Physics Y1 - 2012 U6 - https://doi.org/10.1063/1.3702443 SN - 0021-8979 VL - 111 IS - 7 ER - TY - GEN A1 - Kozłowski, Grzegorz A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Yamamoto, Yuji A1 - Schülli, Tobias U. A1 - Tillack, Bernd A1 - Schroeder, Thomas T1 - Growth and relaxation processes in Ge nanocrystals on free-standing Si(001) nanopillars T2 - Nanotechnology Y1 - 2012 U6 - https://doi.org/10.1088/0957-4484/23/11/115704 SN - 0957-4484 VL - 23 IS - 11 SP - 115704 EP - 115711 ER - TY - GEN A1 - Skibitzki, Oliver A1 - Hatami, Fariba A1 - Yamamoto, Yuji A1 - Zaumseil, Peter A1 - Trampert, A. A1 - Schubert, Markus Andreas A1 - Tillack, Bernd A1 - Schroeder, Thomas T1 - GaP collector development for SiGe HBT performance increase: A heterostructure growth study T2 - Journal of Applied Physics Y1 - 2012 U6 - https://doi.org/10.1063/1.3701583 SN - 0021-8979 VL - 111 IS - 7 SP - 073515 EP - 073515-9 ER - TY - GEN A1 - Tarnawska, Lidia Lupina A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Okur, S. A1 - Morkoc, H. A1 - Paszkiewicz, R. A1 - Storck, Peter A1 - Schroeder, Thomas T1 - Structural and optical quality of GaN on Sc2O3 / Y2O3 / Si(111) T2 - Journal of Applied Physics Y1 - 2012 U6 - https://doi.org/10.1063/1.3699201 SN - 0021-8979 VL - 111 IS - 7 SP - 073509 EP - 073509-4 ER - TY - GEN A1 - Wang, Pu A1 - Zhang, Wei A1 - Liang, Owen A1 - Pantoja, Marcos A1 - Katzer, Jens A1 - Schroeder, Thomas A1 - Xie, Ya-Hong T1 - Giant enhancement and anomalous behavior of Graphene Raman spectra on plasmonic nanostructures T2 - ACS Nano Y1 - 2012 SN - 1936-086X VL - 6 IS - 7 SP - 6244 EP - 6249 ER - TY - GEN A1 - Pieper, H. H. A1 - Derks, C. A1 - Zöllner, Marvin Hartwig A1 - Olbrich, R. A1 - Troeger, L. A1 - Schroeder, Thomas A1 - Neumann, M. A1 - Reichling, M. T1 - Morphology and nanostructure of CeO2(111) surfaces of single crystals and of Si(111) supported ceria films, T2 - Physical Chemistry Chemical Physics Y1 - 2012 U6 - https://doi.org/10.1039/C2CP42733H SN - 1463-9084 VL - 14 IS - 44 SP - 15361 EP - 15368 ER - TY - GEN A1 - Zöllner, Marvin Hartwig A1 - Zaumseil, Peter A1 - Wilkens, Henrik A1 - Gevers, Sebastian A1 - Wollschläger, Joachim A1 - Bäumer, Marcus A1 - Xie, Ya-Hong A1 - Niu, Gang A1 - Schroeder, Thomas T1 - Stoichiometry-structure correlation of epitaxial Ce1-xPrxO2-δ (x = 0-1) thin films on Si(111) T2 - Journal of Crystal Growth Y1 - 2012 SN - 0022-0248 VL - 355 IS - 1 SP - 159 EP - 165 ER - TY - GEN A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Yamamoto, Yuji A1 - Bauer, J. A1 - Schubert, Markus Andreas A1 - Schülli, Tobias U. A1 - Tillack, Bernd A1 - Schroeder, Thomas T1 - Compliant Si nanostructures on SOI for Ge nanoheteroepitaxy – a case study for lattice mismatched semiconductor integration on Si(001) T2 - Journal of Applied Physics Y1 - 2012 SN - 0021-8979 VL - 112 IS - 4 SP - 043506 EP - 043511 ER - TY - GEN A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Schubert, Markus Andreas A1 - Yamamoto, Yuji A1 - Bauer, J. A1 - Schülli, Tobias U. A1 - Tillack, Bernd A1 - Schroeder, Thomas T1 - The role of SiGe buffer in growth and relaxation of Ge on free-standing Si(001) nanopillars T2 - Nanotechnology Y1 - 2012 SN - 1361-6528 VL - 23 IS - 35 SP - 355706 ER - TY - GEN A1 - Kozłowski, Grzegorz A1 - Fursenko, Oksana A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Vorderwestner, M. A1 - Storck, Peter T1 - The epitaxial growth of low defect SiGe buffer layers for integration of new materials on 300 mm silicon wafers T2 - ECS transactions Y1 - 2012 SN - 1938-6737 VL - 50 IS - 9 SP - 613 EP - 621 ER - TY - GEN A1 - Bauer, J. A1 - Yamamoto, Yuji A1 - Zaumseil, Peter A1 - Fursenko, Oksana A1 - Schulz, K. A1 - Kozłowski, Grzegorz A1 - Schubert, Markus Andreas A1 - Schroeder, Thomas A1 - Tillack, Bernd T1 - Nanostructured Silicon for Ge Nanoheteroepitaxy T2 - Microelectronics Engineering Y1 - 2012 SN - 0167-9317 VL - 97 SP - 169 EP - 172 ER - TY - GEN A1 - Capellini, Giovanni A1 - Kozłowski, Grzegorz A1 - Yamamoto, Yuji A1 - Lisker, Marco A1 - Tillack, Bernd A1 - Ghrib, A. A1 - Kersauson, M. de A1 - El Kurdi, M. A1 - Boucaud, P. A1 - Schroeder, Thomas T1 - Tensile strained Ge layers obtained via Si-CMOS compatible approach T2 - Journal of Applied Physics Y1 - 2013 VL - 113 IS - 1 SP - 013513-1 EP - 013513-6 ER - TY - GEN A1 - Virgilio, Michele A1 - Manganelli, Constanza Lucia A1 - Grosso, G. A1 - Schroeder, Thomas A1 - Capellini, Giovanni T1 - Photoluminescence, recombination rate, and gain spectra in optically excited n-type and tensile strained germanium layers T2 - Journal of Applied Physics Y1 - 2013 SN - 0021-8979 VL - 114 IS - 24 SP - 243102 EP - 243102-11 ER - TY - GEN A1 - Wilkens, Henrik A1 - Rodewald, Jari A1 - Gevers, Sebastian A1 - Zöllner, Marvin Hartwig A1 - Schroeder, Thomas A1 - Wollschläger, Joachim T1 - Surface morphology of ultra-thin hex-Pr2O3 films on Si(111) T2 - Journal of Physics : D, Applied Physics Y1 - 2013 SN - 0022-3727 VL - 46 IS - 28 SP - 285306 EP - 285313 ER - TY - GEN A1 - Wang, P. A1 - Liang, O. A1 - Zhang, Wei A1 - Schroeder, Thomas A1 - Xie, Y. H. T1 - Ultra-Sensitive Graphene-Plasmonic Hybrid Platform for Label-Free Detection T2 - Advanced Materials Y1 - 2013 SN - 1521-4095 VL - 25 IS - 35 SP - 4918 EP - 4924 ER - TY - GEN A1 - Zaumseil, Peter A1 - Kozłowski, Grzegorz A1 - Yamamoto, Yuji A1 - Schubert, Markus Andreas A1 - Schroeder, Thomas T1 - X-ray Characterization of Ge Dots Epitaxially Grown on Nano-structured Si Islands on SOI Substrates T2 - Journal of Applied Crystallography Y1 - 2013 SN - 0021-8898 VL - 46 IS - 4 SP - 868 EP - 873 ER - TY - GEN A1 - Niu, Gang A1 - Zaumseil, Peter A1 - Schubert, Markus Andreas A1 - Zöllner, Marvin Hartwig A1 - Dabrowski, Jarek Marek A1 - Schroeder, Thomas T1 - Lattice-matched single crystalline ternary PrxY2-xO3 films on SrO-passivated Si (001): interface engineering and crystallography tailoring T2 - Applied Physics Letters Y1 - 2013 VL - 102 SP - 011906-1 EP - 011906-5 ER - TY - GEN A1 - Niermann, T. A1 - Zengler, D. A1 - Tarnawska, Lidia Lupina A1 - Storck, Peter A1 - Schroeder, Thomas T1 - Virtual GaN substrates via Sc2O3/Y2O3 buffers on Si(111): TEM Characterization of growth defects T2 - Journal of Applied Physics Y1 - 2013 SN - 0021-8979 VL - 113 IS - 22 SP - 223501 EP - 223501-8 ER - TY - GEN A1 - Wilkens, Henrik A1 - Schuckmann, O. A1 - Oelke, R. A1 - Gevers, Sebastian A1 - Schaefer, A. A1 - Bäumer, Marcus A1 - Zöllner, Marvin Hartwig A1 - Schroeder, Thomas A1 - Wollschläger, Joachim T1 - Stabilization of the ceria Jota-phase Ce7O12 surface on Si(111) T2 - Applied Physics Letters Y1 - 2013 SN - 0003-6951 VL - 102 IS - 11 SP - 111602-1 EP - 111602-3 ER - TY - GEN A1 - Wilkens, Henrik A1 - Schuckmann, O. A1 - Oelke, R. A1 - Gevers, Sebastian A1 - Reichling, M. A1 - Schaefer, A. A1 - Bäumer, Marcus A1 - Zöllner, Marvin Hartwig A1 - Niu, Gang A1 - Schroeder, Thomas A1 - Wollschläger, Joachim T1 - Structural transitions of epitaxial ceria films on Si(111) T2 - Physical Chemistry Chemical Physics Y1 - 2013 SN - 1463-9084 VL - 15 IS - 42 SP - 18589 EP - 18599 ER - TY - CHAP A1 - Seifarth, Olaf A1 - Walczyk, Christian A1 - Lupina, Grzegorz A1 - Dabrowski, Jaroslaw A1 - Weidner, Günter A1 - Zaumseil, Peter A1 - Schmeißer, Dieter A1 - Storck, Peter A1 - Müssig, Hans-Joachim A1 - Schroeder, Thomas T1 - On the electronic and dielectric characterisation of thin cubic PrO2 layers on Silicon T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 43 N2 - For the integration of 100 % Ge onto the Si platform, a buffer oxide approach has been developed recently, using rare earth oxides to tune the lattice constant between the Si and the Ge. Among these buffer oxides, PrO2 is a prospective candidate with high quality crystalline growth on Si, moderated by an interfacial Pr-silicate between. In order to specify electronic properties of thin PrO2 and its interface on Si(111), especially the width of the band gap, we performed synchrotron radiation based XPS, UPS and XAS measurements at the U49/2 PGM 2 beamline at BESSY II and correlate the results with our structural characterisation performed by TEM and XRD. In order to evaluate the dielectric properties of thin PrO2 layers on Si(111), we performed temperature-, time-, voltage-, and layer thickness-dependent leakage current measurements (J-V). Here, we identified relaxation behaviour in the leakage current, successfully addressed to defect like states inside the Pr-silicate interface layer, corroborated by frequency dependent capacitance versus voltage (C-V) measurements. Y1 - 2008 UR - http://www.dpg-verhandlungen.de/year/2008/conference/berlin/part/df/session/12/contribution/6 SN - 0420-0195 SP - S. 196 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Seifarth, Olaf A1 - Walczyk, Christian A1 - Lupina, Grzegorz A1 - Zaumseil, Peter A1 - Schmeißer, Dieter A1 - Müssig, Hans-Joachim A1 - Schroeder, Thomas T1 - The electronic band diagram of thin PrO2(111) / Pr-silicate buffers on Si(111) and its relevance to dielectric properties T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 44 N2 - Thin dielectric buffers of cubic PrO2(111) on Si(111) are ideally suited to integrate Ge onto Si by moderating the lattice mismatch between the materials. The leakage current across this dielectric buffer is strongly influenced by the electronic band diagram and defects inside the band gap. Therefore, we measured the band offsets, band gaps and defect positions by means of synchrotron radiation based photoemission spectroscopy techniques (XPS and XAS) with special emphasis on the Pr-silicate interface. In a next step we compare the spectroscopic data with information from dielectric studies, based on temperature dependent leakage current studies. We observe a close relation between dielectric properties and the electronic structure. Y1 - 2009 UR - http://www.dpg-verhandlungen.de/year/2009/conference/dresden/part/df/session/6/contribution/5 SN - 0420-0195 SP - S. 136 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Dudek, Peter A1 - Lupina, Grzegorz A1 - Kozłowski, Grzegorz A1 - Dabrowski, Jarek Marek A1 - Lippert, Gunther A1 - Müssig, Hans-Joachim A1 - Schmeißer, Dieter A1 - Schroeder, Thomas T1 - Band structure and electrical properties of MBE grown HfO2 - based alkaline earth perovskites T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 45 N2 - Ultra thin dielectric films (<20 nm) deposited on TiN electrodes are interesting for MIM capacitor application. High capacitance density and dielectric permittivity must be accompanied by extremely low leakage currents (10−8 A/cm2) at bias 0.5 V. To achieve such low leakage currents, high band gap and proper band alignment is required. Occupied electronic states can be probed with standard laboratory photoemission methods. Probing of unoccupied states is more challenging. Synchrotron based PES in combination with XAS forms a powerful method to study the band alignment. ASAM end station located at the U 49/2 PGM 2 beamline of BESSY II (Berlin) offers excellent conditions for performing such measurements. We investigated HfO2 - based alkaline earth perovskite - BaHfO3 with subsequent admixture of TiO2, resulting in formation of BaHf0.5Ti0.5O3 compound. The analysis of data indicates that band gap for HfO2 is similar to BaHfO3 and amounts 5.8 eV; for BaHf0.5Ti0.5O3 it decreases to 3.8 eV. We conclude that the addition of TiO2 to BaHfO3 increases significantly the dielectric permittivity but also impacts the band gap alignment. The conduction band offset shrinks, influencing the leakage current behavior. Y1 - 2010 UR - http://www.dpg-verhandlungen.de/year/2010/conference/regensburg/part/ds/session/24/contribution/4 SN - 0420-0195 SP - S. 232 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Olbrich, R. A1 - Wilkens, Henrik A1 - Oelke, R. A1 - Wollschläger, Joachim A1 - Zöllner, Marvin Hartwig A1 - Schroeder, Thomas A1 - Reichling, M. T1 - A well-structured metastable ceria surface T2 - Applied Physics Letters Y1 - 2014 U6 - https://doi.org/10.1063/1.4866667 VL - 104 IS - 8 SP - 081910-1 EP - 081910-4 ER - TY - GEN A1 - Schäfer, Anna A1 - Wendt, Fabian A1 - Mantl, Siegfried A1 - Hartdegen, Hilde A1 - Mikulics, Martin A1 - Schubert, Jürgen A1 - Luysberg, Martina A1 - Besmehn, Astrid A1 - Niu, Gang A1 - Schroeder, Thomas T1 - Hexagonal LaLuO3 as high-k dielectric T2 - Journal of Vacuum Science and Technology : B Y1 - 2015 U6 - https://doi.org/10.1116/1.4904401 VL - 33 SP - 01A104 ER - TY - GEN A1 - Di Gaspare, L. A1 - Sabbagh, D. A1 - De Seta, Monica A1 - Sodo, A. A1 - Wirths, S. A1 - Buca, Dan A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Capellini, Giovanni T1 - A very low temperature epi-cleaning process for Ge / GeSn heterostructures T2 - Journal of Applied Physics Y1 - 2015 U6 - https://doi.org/10.1063/1.4906616 SN - 1089-7550 VL - 117 SP - 045306 ER - TY - GEN A1 - Taoka, Noriyuki A1 - Asano, Takanori A1 - Yamaha, Takashi A1 - Terashima, Tatsuya A1 - Nakatsuka, Osamu A1 - Costina, Ioan A1 - Zaumseil, Peter A1 - Capellini, Giovanni A1 - Zaima, Shigeaki A1 - Schroeder, Thomas T1 - Non-uniform depth distributions of Sn concentration induced by Sn migration and desorption during GeSnSi layer formation T2 - Applied Physics Letters Y1 - 2015 U6 - https://doi.org/10.1063/1.4908121 SN - 1077-3118 VL - 106 SP - 061107-1 EP - 061107-5 ER - TY - GEN A1 - Chahine, Gilbert A. A1 - Zöllner, Marvin Hartwig A1 - Richard, Marie-Ingrid A1 - Subhajit, G. A1 - Zaumseil, Peter A1 - Capellini, Giovanni A1 - Schroeder, Thomas A1 - Schülli, Tobias U. T1 - Strain and Lattice Orientation Distribution in SiN/Ge CMOS Compatible Light Emitters Microstructures by Quick X-ray Nano-diffraction Microscopy T2 - Applied Physics Letters Y1 - 2015 U6 - https://doi.org/10.1063/1.4909529 SN - 1077-3118 VL - 106 SP - 071902-1 EP - 071902-4 ER - TY - GEN A1 - Wirths, S. A1 - Troitsch, R. A1 - Mussler, G. A1 - Stoica, T. A1 - Hartmann, J.-M. A1 - Zaumseil, Peter A1 - Schroeder, Thomas A1 - Mantl, Siegfried A1 - Buca, Dan T1 - Ternary and Quaternary Ni(Si)GeSn Contact Formation for highly strained Ge p- and n-MOSFETs T2 - Semiconductor Science and Technology Y1 - 2015 U6 - https://doi.org/10.1088/0268-1242/30/5/055003 SN - 0268-1242 VL - 30 IS - 5 SP - 055003 ER - TY - GEN A1 - Kaletta, Udo Christian A1 - Wipf, Christian A1 - Fraschke, Mirko A1 - Wolansky, Dirk A1 - Schubert, Markus Andreas A1 - Schroeder, Thomas A1 - Wenger, Christian T1 - AlN/SiO2/Si3N4/Si(100) based CMOS compatible surface acoustic wave filter with -12.8 dB minimum insertion loss T2 - IEEE Transactions on Electron Devices Y1 - 2015 U6 - https://doi.org/10.1109/TED.2015.2395443 SN - 0018-9383 VL - 62 IS - 3 SP - 764 EP - 768 ER - TY - GEN A1 - Wilkens, Henrik A1 - Spieß, Wanja A1 - Zöllner, Marvin Hartwig A1 - Niu, Gang A1 - Schroeder, Thomas A1 - Wollschläger, Joachim T1 - Post deposition annealing of epitaxial Ce1−xPrxO2−δ films grown on Si(111) T2 - Physical Chemistry Chemical Physics Y1 - 2015 U6 - https://doi.org/10.1039/C6CP01553K SN - 1463-9084 SN - 1463-9076 VL - 17 SP - 9991 EP - 9996 ER - TY - GEN A1 - Grossi, Alessandro A1 - Walczyk, Damian A1 - Zambelli, Cristian A1 - Miranda, Enrique A1 - Olivo, Piero A1 - Stikanov, V. A1 - Feriani, A. A1 - Sune, J. A1 - Schoof, Gunther A1 - Kraemer, Rolf A1 - Tillack, Bernd A1 - Fox, A. A1 - Schroeder, Thomas A1 - Walczyk, Christian T1 - Impact of Intercell and Intracell Variability on Forming and Switching Parameters in RRAM Arrays T2 - IEEE Transaction on Electronic Devices Y1 - 2015 U6 - https://doi.org/10.1109/TED.2015.2442412 SN - 0018-9383 VL - 62 IS - 8 SP - 2502 EP - 2509 ER - TY - GEN A1 - Zöllner, Marvin Hartwig A1 - Richard, Marie-Ingrid A1 - Chahine, Gilbert A. A1 - Zaumseil, Peter A1 - Reich, Christian A1 - Capellini, Giovanni A1 - Montalenti, Francesco A1 - Marzegalli, Anna A1 - Xie, Ya-Hong A1 - Schülli, Tobias U. A1 - Häberlen, Maik A1 - Storck, Peter A1 - Schroeder, Thomas T1 - Imaging structure and composition homogeneity of 300 mm SiGe virtual substrates for advanced CMOS applications by scanning X-ray diffraction microscopy T2 - ACS Applied Materials and Interfaces Y1 - 2015 U6 - https://doi.org/10.1021/am508968b SN - 1944-8252 VL - 7 IS - 17 SP - 9031 EP - 9037 ER - TY - GEN A1 - Zaumseil, Peter A1 - Yamamoto, Yuji A1 - Schubert, M. A1 - Capellini, Giovanni A1 - Skibitzki, Oliver A1 - Zöllner, Marvin Hartwig A1 - Schroeder, Thomas T1 - Tailoring the strain in Si nano-structures for defect-free epitaxial Ge overgrowth T2 - Nanotechnology Y1 - 2015 U6 - https://doi.org/10.1088/0957-4484/26/35/355707 SN - 1361-6528 VL - 26 IS - 35 SP - 355707 ER - TY - GEN A1 - Schäfer, Anna A1 - Rahmanizadeh, K. A1 - Bihlmayer, G. A1 - Luysberg, Martina A1 - Wendt, Fabian A1 - Besmehn, Astrid A1 - Fox, A. A1 - Schnee, M. A1 - Niu, Gang A1 - Schroeder, Thomas A1 - Mantl, Siegfried A1 - Hartdegen, Hilde A1 - Mikulics, Martin A1 - Schubert, Jürgen T1 - Polymorphous GdScO3 as high permittivity dielectric T2 - Journal of Alloy and Compunds Y1 - 2015 U6 - https://doi.org/10.1016/j.jallcom.2015.08.135 SN - 0925-8388 VL - 651 SP - 514 EP - 520 ER - TY - GEN A1 - Salvalaglio, Marco A1 - Bergamaschini, Roberto A1 - Isa, Fabio A1 - Scaccabarozi, Andrea A1 - Isella, Giovanni A1 - Backofen, Rainer A1 - Voigt, Axel A1 - Montalenti, Francesco A1 - Capellini, Giovanni A1 - Marzegalli, Anna A1 - Schroeder, Thomas A1 - Känel, Hans von A1 - Miglio, Leo T1 - Engineering coalescence by annealing of 3D Ge microstructures into high-qualtiy suspended layers on Si T2 - ACS Applied Materials and Interfaces Y1 - 2015 U6 - https://doi.org/10.1021/acsami.5b05054 SN - 1944-8244 VL - 7 IS - 34 SP - 19219 EP - 19225 ER - TY - CHAP A1 - Lupina, Grzegorz A1 - Schroeder, Thomas A1 - Dabrowski, Jarek Marek A1 - Schmeißer, Dieter A1 - Müssig, Hans-Joachim T1 - Ti-doping of Pr silicate layers for high-k dielectrics applications T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - Near-term downscaling of the metal-oxide-semiconductor field-effect transistors (MOSFETs) requires the replacement of the SiO2 gate oxide with a material having a higher dielectric constant. Recent studies indicate that silicate materials are the most promising candidates; among them are Pr silicates. Applying a combination of x-ray photoelectron spectroscopy (XPS), electrical measurements (C-V), and ab initio calculations, we investigated the effect of thin Ti doping on the structural and electrical properties of the gate stacks composed of a Pr silicate film and a SiO2-based interfacial buffer layer. Metallic Ti was deposited at room temperature after the formation of the Pr silicate dielectric. The resulting layered structures were annealed under ultra-high vacuum (UHV) at various temperatures between 70∘C and 880∘C. XPS indicates that the evaporated layer preserves its metallic character over the whole range of UHV annealing temperatures. Synchrotron radiation XPS at BESSY II shows that large amounts of Ti atoms incorporated into the Pr silicate remain metallic even after air exposure at room temperature. Annealing in nitrogen ambient at 300∘C leads to the oxidation of these atoms so that a mixed Pr:Ti silicate is formed. We show that the so formed dielectrics exhibit an improved equivalent oxide thickness and a reduced density of interface states. KW - high-k KW - X-ray photoelectron spectroscopy KW - ab inito calculations KW - Capacitance-voltage measurements KW - Pr silicate Y1 - 2005 UR - http://www.dpg-verhandlungen.de/year/2005/conference/berlin/part/df/session/6/contribution/5?lan=en PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Yang, Sang Mo A1 - Mazet, Lucie A1 - Okatan, M. Baris A1 - Jesse, Stephen A1 - Niu, Gang A1 - Schroeder, Thomas A1 - Schamm-Chardon, Sylvie A1 - Dubourdieu, Catherine A1 - Baddorf, Arthur P. A1 - Kalinin, Sergei V. T1 - Decoupling indirect topographic cross-talk in band excitation piezoresponse force microscopy imaging and spectroscopy T2 - Applied Physics Letters Y1 - 2016 U6 - https://doi.org/10.1063/1.4954276 SN - 1077-3118 VL - 108 IS - 25 SP - 252902 ER - TY - GEN A1 - Schlykow, Viktoria A1 - Klesse, Wolfgang Matthias A1 - Niu, Gang A1 - Taoka, Noriyuki A1 - Yamamoto, Yuji A1 - Skibitzki, Oliver A1 - Barget, M. R. A1 - Zaumseil, Peter A1 - Känel, Hans von A1 - Schubert, Markus Andreas A1 - Capellini, Giovanni A1 - Schroeder, Thomas T1 - Selective growth of fully relaxed GeSn nano-islands by nanoheteroepitaxy on patterned Si(001) T2 - Applied Physics Letters Y1 - 2016 U6 - https://doi.org/10.1063/1.4967500 SN - 1077-3118 VL - 109 IS - 20 SP - 202102 ER -