TY - CHAP A1 - Acker, Jörg A1 - Ducke, Jana A1 - Rietig, Anja A1 - Müller, Tim A1 - Eisert, Stefan A1 - Reichenbach, Birk A1 - Löser, Wolfgang ED - Oye, Harald A. ED - Brekken, Harald ED - Rong, Harry ED - Tangstad, Merete ED - Tveit, Halvard T1 - Segregation, grain boundary milling, and chemical leaching for the refinement of metallurgical-grade silicon for photovoltaic application T2 - Silicon for the Chemical and Solar Industry XII, Trondheim, 2014 N2 - The present work describes a completely new approach to the solidification refinement of metallurgical-grade silicon. The new process comprises the following steps: (i) The first step involves adding auxiliary metals to the molten silicon in order to segregate the metallic and non-metallic impurities in the secondary phase after cooling. (ii) The melt is rapidly cooled in the cellular solidification regime. This generates a Si microstructure with a defined cell size in which all cell boundaries are surrounded by the secondary phase. Furthermore, the secondary phase should form an interconnected three-dimensional network. (iii) The solids are crushed by shockwaves using electrohydraulic fragmentation techniques. The shockwaves lead to preferential crushing at the interface between the silicon and the secondary phase. (iv) The secondary phases are fast and effectively removed by microwave-assisted high-pressure leaching that was newly developed for this process. The potential of the new refinement procedure is demonstrated with auxiliary metals Ca, Al, and Ti. This new procedure yields a significant decrease in phosphorous and metal impurities. KW - silicon KW - leaching KW - hydrometallurgy KW - solar cell KW - segregation KW - etching Y1 - 2014 SN - 978-82-997357-8-0 SP - 177 EP - 188 PB - Department of Materials Science and Engineering, Norwegian University of Science and Technology CY - Trondheim ER - TY - CHAP A1 - Rietig, Anja A1 - Acker, Jörg ED - Nygaard, Lars ED - Pachaly, Bernd ED - Page, Ingrid Gamst ED - Rong, Harry ED - Tangstad, Merete ED - Tveit, Halvard T1 - A new and fast method for determination of boron, phosphorus and other trace elements in metallurgical grade silicon T2 - Silicon for the Chemical and Solar Industry XIII, Kristiansand, 2016 N2 - A new method for accurate and precise determination of non-metallic and metallic impurities in silicon was developed and statistically validated. The first step is the fast dissolution of silicon in a microwave-assisted high pressure system to minimize a loss of phosphorus. The essential innovation is the use of the concentrated digestion solution for ICP-OES measurements. This approach avoids the common removal of the silicon and acid matrix by volatilization, which can cause considerable losses of boron. Finally, for the ICP-OES measurements in such high-silicon matrices the optimum measuring conditions were determined and a careful selection of emission lines with respect to selectivity, spectral and non-spectral inferences and matrix effects was performed. The method of matrix matched calibration (MMC) is used for quantification of the impurities’ contents. For Al, Mg, Ca, Ti, Cr, Mn, Fe, Ni, Cu, Zr and P the validation was performed against certified reference materials (IPT134, IPT135, NIST57b). To validate the determination of boron 9 silicon samples of different boron contents from three interlaboratory comparisons were used. The new procedure allows the determination of impurities of 4N-silicon (12 elements) with high precision and accuracy. KW - silicon KW - ICP-OES KW - impurity KW - chemical analysis KW - boron KW - phosphorus Y1 - 2016 UR - https://www.ntnu.no/trykk/publikasjoner/Silicon%20for%20the%20chemical%20and%20solar%20industry%20XIII/ SP - 95 EP - 106 PB - Department of Materials Science and Engineering, Norwegian University of Science and Technology CY - Trondheim ER - TY - GEN A1 - Sieber, Tim A1 - Ducke, Jana A1 - Rietig, Anja A1 - Langner, Thomas A1 - Acker, Jörg T1 - Recovery of Li(Ni0.33Mn0.33Co0.33)O2 from Lithium-Ion Battery Cathodes: Aspects of Degradation T2 - Nanomaterials N2 - Nickel–manganese–cobalt oxides, with LiNi0.33Mn0.33Co0.33O2 (NMC) as the most prominent compound, are state-of-the-art cathode materials for lithium-ion batteries in electric vehicles. The growing market for electro mobility has led to a growing global demand for Li, Co, Ni, and Mn, making spent lithium-ion batteries a valuable secondary resource. Going forward, energy- and resource-inefficient pyrometallurgical and hydrometallurgical recycling strategies must be avoided. We presented an approach to recover NMC particles from spent lithium-ion battery cathodes while preserving their chemical and morphological properties, with a minimal use of chemicals. The key task was the separation of the cathode coating layer consisting of NMC, an organic binder, and carbon black, from the Al substrate foil. This can be performed in water under strong agitation to support the slow detachment process. However, the contact of the NMC cathode with water leads to a release of Li+ ions and a fast increase in the pH. Unwanted side reactions may occur as the Al substrate foil starts to dissolve and Al(OH)3 precipitates on the NMC. These side reactions are avoided using pH-adjusted solutions with sufficiently high buffer capacities to separate the coating layer from the Al substrate, without precipitations and without degradation of the NMC particles. KW - lithium KW - nickel–manganese–cobalt oxide KW - NMC KW - leaching KW - recycling KW - SEM-EDX KW - Raman spectroscopy KW - lithium ion battery Y1 - 2019 UR - https://www.mdpi.com/journal/nanomaterials/special_issues/charact_nano UR - https://www.mdpi.com/2079-4991/9/2/246 U6 - https://doi.org/10.3390/nano9020246 SN - 2079-4991 VL - 9 IS - 2 SP - 246 EP - 259 ER - TY - GEN A1 - Rietig, Anja A1 - Langner, Thomas A1 - Acker, Jörg T1 - A revised model of silicon oxidation during the dissolution of silicon in HF/HNO₃ mixtures T2 - Physical chemistry, chemical physics N2 - The stoichiometry of wet chemical etching of silicon in concentrated HF/HNO₃ mixtures was investigated. The formation of nitrogen species enriched in the etching mixture and their reactivity during the etching process was studied. The main focus of the investigations was the comprehensive quantification of the gaseous reaction products using mass spectrometry. Whereas previously it could only be speculated that nitrogen was a product, its formation was detected for the first time. The formation of hydrogen, N₂, N₂O and NH₄⁺ showed a dependence on the etching bath volume used, which indicates the formation of nitrogen compounds by side reactions. Simultaneously, the ratio of the nitrogen oxides, NO and NO₂, formed decreases with increasing etching bath volume, while nitric acid consumption increases, so that the formation of NO₂ could also be identified as a side reaction. Based on the stoichiometries obtained, a new reaction scheme for the reduction of nitric acid during etching in HF/HNO₃ mixtures and an electron balance for the oxidation of silicon is presented. KW - silicon KW - etching KW - mechanism KW - nitrogen oxide KW - hydrogen KW - mass spectrometry KW - Raman spectroscopy KW - kinetics Y1 - 2019 UR - https://pubs.rsc.org/en/content/articlelanding/2019/CP/C9CP04429A#!divAbstract U6 - https://doi.org/10.1039/c9cp04429a SN - 1463-9076 VL - 21 SP - 22002 EP - 22013 ER - TY - GEN A1 - Sieber, Tim A1 - Rietig, Anja A1 - Ducke, Jana A1 - Acker, Jörg ED - Vogt, Carla T1 - Direkte Feststoffanalyse von Hauptkomponenten in Kathodenmaterialien von Lithiumbatterien mittels HRCS-GF-AAS T2 - Colloquium Analytische Atomspektroskopie - CANAS 2019, Book of Abstracts N2 - Zur Bestimmung der metallischen Hauptkomponenten in Lithium-Batterie-Kathodenmaterialien ist der nasschemische Aufschluss mit anschließender ICP-OES-Analyse oft das Mittel der Wahl. Da dieses Verfahren jedoch recht zeitaufwendig ist und den Einsatz starker Säuren erfordert, wurde eine Methode zur direkten Feststoffanalyse mittels HRCS-GF-AAS (high resolution continuum source graphit furnace atom absorption spectrometry) nach dem STPF-Konzept (stabilized temperature platform furnace) entwickelt. Die hohen Analytkonzentrationen erfordern dabei die Messung auf den vergleichsweise wenig intensiven Linien Li = 323,2657 nm, Ni = 294,3912 nm, Mn = 321,6945 nm und Co= 243,5823 nm. Zusätzlich wird das Probenmaterial einer Feststoffverdünnung mit matrixverwandten Komponenten unterzogen. Die Verdünnung senkt zum einen die Konzentration und die Gefahr der Verschleppung der Analyten und begünstigt zum anderen die Freigabe des Analyten aus der Probenmatrix. Durch Aufnahme von Extinktions-Zeit-Verläufen im Temperaturbereich von 200 - 2600 °C konnten die Freisetzungstemperaturen für jeden Analyten bestimmt werden. Nach anschließenden Optimierungen der Pyrolyse- und Atomisierungstemperaturen wurde mithilfe der Einzeloxide für jeden Analyten die Linearität des Messsignals geprüft und der Arbeitsbereich festgelegt. Durch Vermessung von variierenden Oxidmischungen und Mischoxiden, sowie Zusatz möglicher weiterer Interferenten, wie dem Bindermaterial PVDF wurden Spezifität, Selektivität und Robustheit der Methode überprüft. Abschließend erfolgte anhand realer Proben (Recyclinggut aus Lithium-Batterie-Kathoden) ein Vergleich zwischen den Ergebnissen der direkten Feststoffanalyse mittels HRCS-GF-AAS und dem bereits etablierten Verfahren der ICP-OES Analyse nach nasschemischem Aufschluss. Nach umfangreicher Methodenentwicklung kann ein Verfahren der direkten Feststoffanalyse von Recylinggut aus Kathodenmaterialien von Lithium-Ionen-Batterien mittels HRCS-GF-AAS bereitgestellt werden, das eine schnelle und präzise Analyse der Hauptkomponenten Li, Ni, Mn und Co erlaubt. KW - continuum source KW - AAS KW - Feststoffanalytik KW - Feststoffstandard KW - Graphitrohr KW - Interferenz KW - NMC KW - Recycling KW - Lithium KW - Batterie Y1 - 2019 UR - https://tu-freiberg.de/en/canas/canas-2019-engl/final-program VL - 2019 SP - S1/4 PB - TU Bergakademie Freiberg CY - Freiberg ET - 1. Auflage ER - TY - GEN A1 - Langner, Thomas A1 - Rietig, Anja A1 - Acker, Jörg T1 - Raman spectroscopic determination of the degree of dissociation of nitric acid in binary and ternary mixtures with HF and H2SiF6 T2 - Journal of Raman Spectroscopy N2 - The oxidizing effect of nitric acid in aqueous solutions depends on the concentration of undissociated nitric acid. This makes the concentration of undissociated nitric acid an essential parameter to monitor and control the quality of silicon etching in the industrial manufacturing of solar cells. In the present study, a method known already is extended in such a way that the degree of dissociation of nitric acid can be determined by Raman spectroscopy in HF/HNO3/H2SiF6 acid mixtures over a broad concentration range for the first time and without using an internal or external standard to compensate the typical time‐dependent drift of a Raman spectrometer. The method developed requires the calculation of a peak area ratio from the areas of the unimpeded Raman signals assigned to nitrate (νN − O) at 1,048 cm−1 and to undissociated HNO3 (νN − OH) at 957 cm−1. The correlation between the peak ratio and the degree of dissociation of nitric acid revealed can be described by a simple empirical equation. Using this equation, the degree of dissociation of nitric acid can be determined over a broad concentration range in binary and ternary mixtures of HNO3 with HF and H2SiF6. The impact of the acids HF and H2SiF6 and the total water content in the degree of dissociation of nitric acid is discussed. KW - Raman spectroscopy KW - nitric acid KW - dissociation KW - hexafluosilicic acid KW - hydrofluoric acid KW - silicon KW - etching Y1 - 2020 U6 - https://doi.org/10.1002/jrs.5769 VL - 51 IS - 2 SP - 366 EP - 372 ER - TY - GEN A1 - Rietig, Anja A1 - Acker, Jörg T1 - Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO3 and H2SiF6 T2 - Physical Chemistry Chemical Physics Y1 - 2023 U6 - https://doi.org/10.1039/d3cp03188h SN - 1463-9084 SN - 1463-9076 VL - 25 IS - 38 SP - 26245 EP - 26257 ER - TY - CHAP A1 - Rietig, Anja A1 - Langner, Thomas A1 - Acker, Jörg ED - Scheschkewitz, David ED - Kickelbick, Guido T1 - Dissolution of silicon in HF/HNO3 mixtures: A revised model T2 - 9th European Silicon Days, 9-12 September 2018, Saarbrücken, Germany, Book of abstracts N2 - The dissolution of Si in HF/HNO3 consists of a set of complex reactions and thus a large number of reaction products. The most comprehensive picture of this reaction, the role of the involved reaction products and the reactivity of the HF/HNO3 mixtures depending on their composition is drawn by Steinert et al..[1]-[3] Based on the first systematic investigations on hydrogen formation by Hoffmann et al.[4], Acker et al. succeeded a first mass and electron balance for the reaction of silicon in HF/HNO3.[5] However, there is still a lack in interpretation of the mass end electron balances arising from several nitrous oxides. So far, the identified nitrogen oxides NO, NO2 and N2O were considered in sum[5] and neither separated nor individually studied or quantified. The aim of this work is to complete the mass and electron balance by the contribution of the individual nitrous oxides and to identify their individual formation pathways. Kinetic measurements of the NO and NO2 formation during the dissolution of Si, NO2 turns out as a result from the oxidation of the primary product NO by the HNO3 in the etching mixtures. Subsequently, NO and NO2 react to N2O3 dissolved in the acid mixture. The kinetics of both reactions were individually studied by bubbling NO in HF/HNO3 mixtures of different composition. The already identified intermediary species N4O62+ turns out to be formed by disproportionation of dissolved NO2 via N2O4 without dissolution of silicon. A detailed kinetic studied showed, that only dissolved N2O3 and not the intermediate N4O62+ contribute to the dissolution rate of silicon in HF/HNO3 acid mixtures. Finally, kinetic measurements revealed that the formed H2 reduces gaseous NO yielding to the final gaseous reaction products N2, N2O as well as to ammonium ions which all are formed with identical reaction rate. This reaction is assumed to proceed via NH2OH as intermediate. As result of the identification and quantification of intermediary and final reaction products a new reaction scheme needs to be established leading to a new approach to the mass and electron balance for the oxidation of silicon during the dissolution in HF/HNO3 mixtures. KW - silicon KW - etching KW - Raman spectroscopy KW - mass spectrometry KW - gas analysis KW - reaction mechanism Y1 - 2018 SP - S. 199 PB - Universität des Saarlandes CY - Saarbrücken ER - TY - CHAP A1 - Rietig, Anja A1 - Acker, Jörg T1 - Ressourcensicherung durch Recycling von Sekundärrohstoffen T2 - Systemwissen für die vernetzte Energie- und Mobilitätswende KW - Recycling KW - Lithium-Ionen-Batterien KW - Elektroschrott KW - Edelmetalle Y1 - 2022 UR - https://www.ibbf.berlin/assets/images/Dokumente/220627_IBBF_Kompendium_2022_WEB_final%20(1).pdf SN - 978-3-9816861-8-0 SP - 141 EP - 152 PB - Vereinigung für Betriebliche Bildungsforschung e.V. CY - Berlin ET - 2. Auflage ER - TY - GEN A1 - Rietig, Anja A1 - Grafe, Hans-Joachim A1 - Acker, Jörg T1 - Understanding the Reasons for Erroneous Determinations of Boron in Silicon following Wet Chemical Digestion in HF/HNO3 T2 - Proceedings of the Silicon for the Chemical & Solar Industry XVI KW - boron KW - silicon KW - species KW - trace element Y1 - 2022 UR - https://ssrn.com/abstract=4123058 SN - 978-82-692919-0-2 U6 - https://doi.org/10.2139/ssrn.4123058 ER -