TY - CHAP A1 - Heller, Thomas A1 - Lopez, Alberto A1 - Bitzer, Thomas A1 - Richardson, Neville V. A1 - Schmeißer, Dieter T1 - Isopropoxy induced stabilisation of the 2x1 reconstruction of Si(100) T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - Alcohols are successfully employed as an additive in the anisotropic etching of silicon. In this HREELS study, we modelled the silicon/etching interface by the adsorption of alcohols (ethanol, isopropanol, n-propanol, tert-butyl alcohol) on Si(100)-2x1 and post-exposure to H2O under ultra high vacuum conditions. The vibrational data show that the adsorption of the alcohol molecules involves the cleavage of the O-H bond and the formation of a Si-O-C linkage to the alkoxy species. The dissociated hydrogen saturates one of the neighbouring dangling Si bonds. The Si-Si dimer bonds are not involved in the adsorption process. We observe a considerable chemisorption of water on the ethoxy and tert-butoxy passivated Si(100)-2x1 surface. From the disappearance of the 2x1 LEED pattern it can be concluded that the chemisorption of water occurs through a cleavage of the Si-Si dimer bond. In contrast, isopropoxy species on Si(100)-2x1 reduces dramatically the reactivity of Si(100)-2x1 towards water. Even following extreme exposures to water (1012 Torr s), a 2x1 LEED pattern was observed indicating the presence of intact Si-Si dimer bonds at the isopropoxy/Si(100)-2x1 surface. KW - alcohol adsorption KW - anisotropic etching KW - high resolution electron energy loss spectroscopy (HREELS) KW - low-energy electron diffraction (LEED) Y1 - 2000 UR - http://www.dpg-verhandlungen.de/year/2000/conference/regensburg/part/o/session/11/contribution/55?lang=en PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -