TY - GEN A1 - Hayat, Ahsan A1 - Ratzke, Markus A1 - Alvarado Chavarin, Carlos A1 - Zöllner, Marvin Hartwig A1 - Corley-Wiciak, Agnieszka Anna A1 - Schubert, Markus Andreas A1 - Wenger, Christian A1 - Fischer, Inga Anita T1 - Structural and morphological properties of CeO2 films deposited by radio frequency magnetron sputtering for back-end-of-line integration T2 - Thin Solid Films Y1 - 2024 U6 - https://doi.org/10.1016/j.tsf.2024.140547 SN - 0040-6090 VL - 807 ER - TY - GEN A1 - Hayat, Ahsan A1 - Spirito, Davide A1 - Corley-Wiciak, Agnieszka Anna A1 - Schubert, Markus Andreas A1 - Masood, Maria A1 - Reichmann, Felix A1 - Ratzke, Markus A1 - Capellini, Giovanni A1 - Fischer, Inga Anita T1 - MBE-based growth of Sn-rich quantum wells and dots at low Sn deposition rates T2 - Materials Science in Semiconductor Processing Y1 - 2023 U6 - https://doi.org/10.1016/j.mssp.2023.107693 SN - 1873-4081 VL - 165 ER - TY - GEN A1 - Kalra, Amanpreet A1 - Alvarado Chavarin, Carlos A1 - Nitsch, Paul-Gregor A1 - Tschammer, Rudi A1 - Flege, Jan Ingo A1 - Ratzke, Markus A1 - Zoellner, Marvin Hartwig A1 - Schubert, Markus Andreas A1 - Wenger, Christian A1 - Fischer, Inga Anita T1 - Deposition of CeOₓ/SnOₓ-based thin films via RF magnetron sputtering for resistive gas sensing applications T2 - Physica B, Condensed matter N2 - Cerium oxide-tin oxide (CeOx/SnOx) thin films with varying Sn content were deposited using RF magnetron sputtering and investigated for hydrogen sensing applications. Structural, compositional, and morphological properties were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), transmission electron microscopy (TEM), and energy-dispersive X-ray spectroscopy (EDX). Gas sensing measurements showed effective hydrogen detection at room temperature, with the sensitivity strongly influenced by Sn content and oxygen vacancy concentration. Higher Sn concentration enhanced the sensing response, which was correlated with microstructural features obtained from AFM and EDX, as well as with the presence of Ce3+ and Ce4+ oxidation states identified by XPS. This study highlights the potential of CeOx/SnOx thin films for possible back-end-of-line integration and provides proof-of-principle for room-temperature hydrogen sensing. KW - RF magnetron sputtering KW - CeOx/SnOx thin film KW - Room temperature KW - Hydrogen sensing Y1 - 2026 U6 - https://doi.org/10.1016/j.physb.2025.418098 SN - 0921-4526 VL - 723 SP - 1 EP - 7 PB - Elsevier BV CY - Amsterdam ER - TY - GEN A1 - Ratzke, Markus A1 - Wolfframm, Dirk A1 - Kappa, Mathias A1 - Kouteva-Arguirova, Simona A1 - Reif, Jürgen T1 - Pulsed laser deposition of HfO2 and Pr(x)O(y) high-k films on Si(100) T2 - Applied Surface Science Y1 - 2005 SN - 0169-4332 VL - 247 IS - 1-4 SP - 128 EP - 133 ER - TY - GEN A1 - Kappa, Mathias A1 - Ratzke, Markus A1 - Reif, Jürgen T1 - Pulsed laser deposition of hafnium oxide on silicon Y1 - 2005 ER - TY - CHAP A1 - Lippert, Gunther A1 - Dabrowski, Jarek Marek A1 - Costina, Ioan A1 - Lupina, Grzegorz A1 - Ratzke, Markus A1 - Zaumseil, Peter A1 - Müssig, Hans-Joachim T1 - Morphology and Composition of Praseodymium Based High-k Materials and Their Relevance to Dielectric Properties of Thin-Films Y1 - 2007 ER - TY - GEN A1 - Reif, Jürgen A1 - Costache, Florenta Adriana A1 - Varlamova, Olga A1 - Jia, G. A1 - Ratzke, Markus T1 - Self-organized regular surface patterning by pulsed laser ablation T2 - Physica Status Solidi C Y1 - 2009 U6 - https://doi.org/10.1002/pssc.200880719 SN - 1610-1634 VL - 6 IS - 3 SP - 681 EP - 686 ER - TY - GEN A1 - Varlamova, Olga A1 - Ratzke, Markus A1 - Reif, Jürgen T1 - Feedback Effect on the Self-Organized Nanostructures Formation on Silicon upon Femtosecond Laser Ablation T2 - Solid State Phenomena Y1 - 2009 SN - 1012-0394 VL - 156/158 SP - 535 EP - 540 ER - TY - JOUR A1 - Reif, Jürgen A1 - Ratzke, Markus A1 - Varlamova, Olga A1 - Costache, Florenta Adriana T1 - Electrical Properties of Laser-Ablation-Initiated Self-Organized Nanostructures on Silicon Surface Y1 - 2006 U6 - https://doi.org/10.1016/j.mseb.2006.07.030 ER - TY - CHAP A1 - Ratzke, Markus A1 - Kappa, Mathias A1 - Wolfframm, Dirk A1 - Kouteva-Arguirova, Simona A1 - Reif, Jürgen T1 - PLD of high-k dielectric films on silicon T2 - Fifth International Symposium on Laser Precision Microfabrication, 11 - 14 May 2004, Nara, Japan Y1 - 2004 SN - 0-8194-5623-3 SP - 406 EP - 411 PB - SPIE CY - Bellingham, Wash. ER -