TY - GEN A1 - Petkov, Nikolay A1 - Kashkarov, Egor B. A1 - Obrosov, Aleksei A1 - Bakalova, Totka A1 - Kejzlar, Pavel A1 - Bahchedzhiev, Hristo T1 - Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method T2 - Journal of Materials Engineering and Performance N2 - This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N. KW - cathodic arc deposition KW - nanohardness KW - TiCN coatings KW - XRD analysis Y1 - 2018 UR - https://link.springer.com/article/10.1007/s11665-018-3754-3 U6 - https://doi.org/10.1007/s11665-018-3754-3 SN - 1544-1024 SN - 1059-9495 VL - 28 IS - 1 SP - 343 EP - 354 ER -