TY - GEN A1 - Buhl, Johannes A1 - Klöppel, Thomas A1 - Merten, Mathias A1 - Haufe, Andre A1 - Israr, Rameez A1 - Bambach, Markus T1 - Numerical prediction of process-dependent properties of high-performance Ti6Al4 in LS-DYNA T2 - ESAFORM 2021 : 24th International Conference on Material Forming Y1 - 2021 U6 - https://doi.org/doi: 10.25518/esaform21.1496 ER - TY - GEN A1 - Klöppel, Thomas A1 - Merten, Mathias A1 - Haufe, Andre A1 - Buhl, Johannes A1 - Bambach, Markus ED - Bambach, Markus T1 - On the Numerical Prediction of Process-Dependent Properties of Current High-Performance Materials with Material Model *MAT_254 in LS-DYNA T2 - Procedia Manufacturing : 23rd International Conference on Material Forming Y1 - 2020 U6 - https://doi.org/10.1016/j.promfg.2020.04.341 SN - 2351-9789 VL - 47 SP - 1520 EP - 1525 ER - TY - GEN A1 - Grahmann, Jan A1 - Merten, André A1 - Ostendorf, Ralf A1 - Fontenot, M. A1 - Bleh, Daniela A1 - Schenk, Harald A1 - Wagner, Hans-Joachim T1 - Tunable external cavity quantum cascade lasers (EC-QCL): an application field for MOEMS based scanning gratings T2 - SPIE Conference: MOEMS and Miniaturized Systems XIII, San Francisco, 2014 Y1 - 2014 SN - 978-0-8194-9890-8 SP - 897708-1 EP - 897708-11 PB - SPIE Press CY - Bellingham ER - TY - CHAP A1 - Schenk, Harald A1 - Wagner, Michael A1 - Grahmann, Jan A1 - Merten, André ED - Kye, Jongwook ED - Owa, Soichi T1 - Advances in MOEMS technologies for high quality imaging systems T2 - Optical Microlithography XXXI, 27 February-1 March 2018, San Jose, California, Unites States N2 - An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering. Y1 - 2018 SN - 978-1-5106-1666-0 SN - 978-1-5106-1667-7 U6 - https://doi.org/10.1117/12.2297399 PB - SPIE CY - Bellingham, Washington ER -