TY - CHAP A1 - Łobaza, Justyna A1 - Kot, Małgorzata A1 - Schmeißer, Dieter T1 - Analysis of surface oxidation of TiON ALD films T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - Titanium oxynitride (TiON) films are interesting due to their remarkable optical and electronic properties which strongly depend on the O/N ratio. However, it is known that films containing Ti are prone to oxidation in contact with the air [1]. In this work, we study the thickness of a surface oxidation layer which is inherently formed on the atomic layer deposition (ALD) grown TiON/TiN films on Si substrate. We use an Ar+ ion bombardment source and X-ray photoelectron spectroscopy (XPS) for this analysis. We calibrate the sputter rate by using substrate signal intensity decay (here Si 2p) in the XPS spectra of the 5 nm thick TiON sample accordingly. This rate is assumed to be constant when films with a larger thickness are analyzed. We find that the surface oxidation layer is about 1 nm thick, independent on the detailed ALD parameters of the films. The TiN films found underneath are close to the stoichiometric values and have a residual O content below 5%. Finally, we compare these data to our previous results collected with synchrotron-based radiation source [2,3]. References: [1] Sowinska et al., Applied Physics Letters 100, 233509 (2012). [2] M. Sowinska et al., Applied Surface Science 381, 42-47 (2016). [3] M. Sowińska et al., Journal of Vacuum Science and Tech- nology A, 01A12734 (2016). KW - titanium oxynitride KW - X-Rax photoelectron spectroscopy KW - depth profiling KW - sputtering Y1 - 2017 UR - http://www.dpg-verhandlungen.de/year/2017/conference/dresden/part/ds/session/21/contribution/7 SN - 0420-0195 SP - S. 202 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Kot, Małgorzata A1 - Naumann, Franziska A1 - Garain, Samiran A1 - Poźarowska, Emilia A1 - Gargouri, Hassan A1 - Henkel, Karsten A1 - Schmeißer, Dieter T1 - Aluminum nitride films prepared by plasma atomic layer deposition using different plasma sources T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3 N2 - Aluminum nitride (AlN) thin films are promising for versatile applications in optoelectronics, electronics, piezoelectrics, and acoustics due to their remarkable properties such as wide band gap, high dielectric constant, low electrical conductivity, good piezoelectric coefficient and high ultrasonic velocity. We present a comparative study of AlN films grown by plasma-enhanced atomic layer deposition at 350°C silicon wafers in the SENTECH SI ALD LL system using TMA and NH3 where either a capacitively coupled plasma (CCP) or a direct PTSA (planar triple spiral antenna) source was applied. The films were characterized by ellipsometry, XPS and electrical measurements. The layer properties are discussed concerning the varied ALD process parameters. In general, the process using the direct PTSA source delivered films with higher refractive index and better homogeneity over the wafer achieving also higher growth rates per cycle (GPC) in reduced total cycle durations. Films with refractive index in the range of 2.05 and permittivity around 8 could be realized with a GPC of 1.54 Å/cycle. KW - Aluminium nitride KW - plasma-enhanced atomic layer deposition (PEALD) KW - ellispsometry KW - field emission scanning electron microscopy KW - atomic force microscopy KW - X-ray photoelectron spectroscopy KW - electrical characterization Y1 - 2018 SN - 0420-0195 SP - S. 170 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Kot, Małgorzata A1 - Kegelmann, Lukas A1 - Kus, Peter A1 - Tsud, Nataliya A1 - Matolínová, Iva A1 - Albrecht, Steve A1 - Matolin, Vladimir A1 - Schmeißer, Dieter T1 - Room temperature atomic layer deposition for perovskite solar cells T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3 N2 - After few years of efficiency driven research on perovskite solar cells, the focus now is shifting to understand the underlying processes governing the high efficiency and also to obtain long-term stable devices. Among various deposition methods, atomic layer deposition (ALD) may represent one of the best options, being possible to coat substrates in a very efficient way and at very low temperatures. In our previous work [1] we reported that the efficiency of the solar cell containing aged perovskite film can be enhanced twice while covering the perovskite with a thin ALD alumina film at room temperature. In this work, the chemical, electronic and morphological properties of the fresh perovskite film treated by ALD pulses of the trimethylaluminium and water at room temperature investigated using X-ray Photoelectron Spectroscopy and Field Emission Scanning Electron Microscopy will be discused and correlated with the solar cells performance and stability. [1] M. Kot et al., ChemSusChem 2016, 9, 3401. KW - Perovskite solar cells KW - atomic layer deposition KW - X-Ray photoelectron spectroscopy (XPS) KW - atomic force microscopy KW - field emission scanning electron microscopy KW - photo-conversion efficiency Y1 - 2018 SN - 0420-0195 SP - S. 174 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Schmeißer, Dieter A1 - Kot, Małgorzata A1 - Corrêa, Silma Alberton A1 - Das, Chittaranjan A1 - Henkel, Karsten ED - Wandelt, Klaus T1 - Interface Potentials, Intrinsic Defects, and Passivation Mechanisms in Al₂O₃, HfO₂, and TiO₂ Ultrathin Films T2 - Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, vol. 3.1 N2 - We study the electronic structure of ultrathin Al₂O₃, HfO₂, and TiO₂ ALD films by resonant photoelectron spectroscopy. We identify intrinsic defects which are responsible for the active sites in interface reactions, for the incorporation of intrinsic charges, and for the formation of local dipole momenta. All of these features determine the surface potentials and the reactivity of the surface of the atomic layer deposition coated systems. We give examples of charges and dipoles in Al₂O₃, on a study of the surface potentials in HfO₂, and relate the intrinsic defects in TiO₂ to their electrochemical relevance. KW - Atomic layer deposition (ALD) KW - Resonant photoelectron spectroscopy (resPES) KW - Band scheme KW - Interface potential KW - Intrinsic charges KW - Intrinsic defects KW - Partial density of states (pDOS) KW - Exciton KW - Polaron KW - Ligand-to-metal charge transfer KW - Aluminium oxide (Al₂O₃) KW - Hafnium oxide (HfO₂) KW - Titanium Oxide (TiO₂) Y1 - 2018 SN - 978-0-12-809739-7 SN - 978-0-12-814984-3 U6 - https://doi.org/10.1016/B978-0-12-409547-2.14119-8 SP - 162 EP - 171 PB - Elsevier CY - Oxford ER - TY - GEN A1 - Das, Chittaranjan A1 - Kot, Małgorzata A1 - Hellmann, Tim A1 - Wittich, Carolin A1 - Mankel, Eric A1 - Zimmermann, Iwan A1 - Schmeißer, Dieter A1 - Nazeeruddin, Mohammad Khaja A1 - Jaegermann, Wolfram T1 - Atomic Layer-Deposited Aluminum Oxide Hinders Iodide Migration and Stabilizes Perovskite Solar Cells T2 - Cell Reports Physical Science N2 - Iodide migration causes degradation of the perovskite solar cells. Here,we observe the direct migration of iodide into the hole-transport layer in a device. We demonstrate that ultrathin room temperature atomic layer-deposited Al2O3 on the perovskite surface very effectively hinders the migration. The perovskite-Al2O3 interface enables charge transfer across the Al2O3 layer in the solar cells, without causing any drastic changes in the properties of the perovskite absorber. Furthermore, it helps to preserve the initial properties of the perovskite film during exposure to light and air under real operating conditions, and thus, improves the stability of the solar cells. The ultrathin Al2O3 layer deposited at room temperature significantly increases the lifetime of the perovskite solar cells, and we hope this may be a step toward the mass production of stable devices. KW - perovskite solar cells KW - iodine migration KW - stability KW - X-ray photoelectron spectroscopy (XPS) KW - atomic layer deposition (ALD) KW - aluminum oxide (Al2O3) Y1 - 2020 U6 - https://doi.org/10.1016/j.xcrp.2020.100112 SN - 2666-3864 VL - 1 IS - 7 ER - TY - GEN A1 - Kot, Małgorzata A1 - Kegelmann, Lukas A1 - Köbler, Hans A1 - Vorokhta, Mykhailo A1 - Escudero, Carlos A1 - Kúš, Peter A1 - Šmíd, Břetislav A1 - Tallarida, Massimo A1 - Albrecht, Steve A1 - Abate, Antonio A1 - Matolínová, Iva A1 - Schmeißer, Dieter A1 - Flege, Jan Ingo T1 - In situ Near-Ambient Pressure X-ray Photoelectron Spectroscopy Reveals the Influence of Photon Flux and Water on the Stability of Halide Perovskite T2 - ChemSusChem N2 - For several years, scientists have been trying to understand the mechanisms that reduce the long‐term stability of perovskite solar cells. In this work, we examined the effect of water and photon flux on the stability of CH3NH3PbI3 perovskite films and solar cells using in situ near‐ambient pressure X‐ray photoelectron spectroscopy (NAP‐XPS), field emission scanning electron microscopy (FESEM), and current density–voltage (J–V) characterization. The used amount of water vapor (up to 1 mbar) had a negligible impact on the perovskite film. The higher the photon flux, the more prominent were the changes in the NAP‐XPS and FESEM data; also, a faster decline in power conversion efficiency (PCE) and a more substantial hysteresis in the J‐V characteristics were observed. Based on our results, it can be concluded that the PCE decrease originates from the creation of Frenkel pair defects in the perovskite film under illumination. The stronger the illumination, the higher the number of Frenkel defects, leading to a faster PCE decline and more substantial hysteresis in the J‐V sweeps. KW - field emission scanning electron microscopy (FESEM) KW - Frenkel defects KW - near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) KW - perovskite KW - photon-induced degradation Y1 - 2020 U6 - https://doi.org/10.1002/cssc.202001527 SN - 1864-5631 SN - 1864-564X VL - 13 IS - 21 SP - 5722 EP - 5730 ER - TY - GEN A1 - Mahmoodinezhad, Ali A1 - Morales, Carlos A1 - Naumann, Franziska A1 - Plate, Paul A1 - Meyer, Robert A1 - Janowitz, Christoph A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Flege, Jan Ingo T1 - Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma T2 - Verhandlungen der DPG - SurfaceScience21 N2 - Indium oxide thin films were deposited on Si (100) by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium (TMIn) and oxygen plasma (O2) in a low-temperature range of 80 to 200 °C. The In2O3 layers were characterized by in-situ spectroscopic ellipsometry (SE), ex-situ X-ray photoelectron spectroscopy (XPS) and electrical measurements. The SE data show a growth rate of 0.56 Å/cycle within the ALD window (100 to 150 °C) with a thickness inhomogeneity of ≤1.2%. In addition, the highest refractive index is 2.07 (at 632.8 nm) for the layer grown at 150 °C, and the films exhibit indirect and direct band gaps of 2.8±0.1 eV and 3.3±0.2 eV, respectively. XPS characterization indicates no carbon incorporation and a temperature-dependent off-stoichiometry of the layers. The chemical analysis of the In 3d and O 1s core levels confirms the formation of In-O bonds and suggests the additional presence of hydroxyl groups and defects. With increasing temperature, the contribution of OH groups and defects decreases whereas that of In-O bonds increases. Notably, higher growth temperatures result in an indium rich phase within the layers. KW - Indium oxide KW - Plasma enhanced atomic layer deposition KW - Spectroscopic ellipsometry KW - X-ray photoelectron spectroscopy Y1 - 2021 UR - https://www.dpg-verhandlungen.de/year/2021/conference/surfacescience/part/o/session/74/contribution/8 VL - 2021 PB - Deutsche Physikalische Gesellschaft e.V. CY - Bad Honnef ER - TY - GEN A1 - Kruszyńska, Joanna A1 - Ostapko, Jakub A1 - Ozkaya, Veysel A1 - Surucu, Belkis A1 - Szawcow, Oliwia A1 - Nikiforow, Kostiantyn A1 - Hołdyński, Marcin A1 - Tavakoli, Mohammad Mahdi A1 - Yadav, Pankaj A1 - Kot, Małgorzata A1 - Kołodziej, Grzegorz Piotr A1 - Wlazło, Mateusz A1 - Satapathi, Soumitra A1 - Akin, Seckin A1 - Prochowicz, Daniel T1 - Atomic Layer Engineering of Aluminum-Doped Zinc Oxide films for Efficient and Stable Perovskite Solar Cells T2 - Advanced Materials Interfaces N2 - Atomic layer deposition (ALD) has been considered as an efficient method to deposit high quality and uniform thin films of various electron transport materials for perovskite solar cells (PSCs). Here, the effect of deposition sequence in the ALD process of aluminum-doped zinc oxide (AZO) films on the performance and stability of PSCs is investigated. Particularly, the surface of AZO film is terminated by diethylzinc (DEZ)/H2O (AZO-1) or trimethylaluminum (TMA)/H2O pulse (AZO-2), and investigated with surface-sensitive X-ray photoelectron spectroscopy technique. It is observed that AZO-2 significantly enhances the thermal stability of the upcoming methylammonium lead iodide (MAPbI3) layer and facilitates charge transport at the interface as evidenced by photoluminescence spectroscopes and favorable interfacial band alignment. Finally, planar-type PSC with AZO-2 layer exhibits a champion power conversion efficiency of 18.09% with negligible hysteresis and retains 82% of the initial efficiency after aging for 100 h under ambient conditions (relative humidity 40 ± 5%). These results highlight the importance of atomic layer engineering for developing efficient and stable PSCs. KW - atomic layer deposition KW - electron transporting layers KW - perovskites KW - solar cells KW - stability of perovskite solar cells Y1 - 2022 U6 - https://doi.org/10.1002/admi.202200575 SN - 2196-7350 VL - 9 IS - 17 ER - TY - GEN A1 - Das, Chittaranjan A1 - Kedia, Mayank A1 - Zuo, Weiwei A1 - Mortan, Claudiu A1 - Kot, Małgorzata A1 - Flege, Jan Ingo A1 - Saliba, Michael T1 - Band Bending at Hole Transporting Layer-Perovskite Interfaces in n-i-p and in p-i-n Architecture T2 - Solar RRL N2 - Interfaces between hybrid perovskite absorber and its adjacent charge-transporting layers are of high importance for solar cells performance. Understanding their chemical and electronic properties is a key step in designing efficient and stable perovskite solar cells. In this work, the tapered cross-section photoemission spectroscopy (TCS-PES) method is used to study the methylammonium lead iodide (CH3NH3PbI3) (MAPI)-based solar cells in two configurations, that is, in an inverted p–i–n and in a classical n–i–p architecture. It is revealed in the results that the MAPI film deposited once on the n-type TiO2 and once on the p-type NiOx substrates is neither an intrinsic semiconductor nor adapts to the dopant nature of the substrate underneath, but it is heavily n-type doped on both substrates. In addition to that, the TCS-PES results identify that the band bending between the MAPI film and the hole transporting layer (HTL) layer depends on the perovskite solar cells architecture. In particular, a band bending on the HTL side in the n–i–p and at the MAPI in the p–i–n architecture is found. The flat band of NiOx at the NiOx/MAPI interface can be explained by the Fermi level pinning of the NiOx at the interface. KW - band bending KW - hole transporting layer KW - perovskites KW - X-ray photoelectron spectroscopy (XPS) Y1 - 2022 U6 - https://doi.org/10.1002/solr.202200348 SN - 2367-198X VL - 6 IS - 9 ER - TY - GEN A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Kegelmann, Lukas A1 - Köbler, Hans A1 - Vorokhta, Mykhailo A1 - Escudero, Carlos A1 - Albrecht, Steve A1 - Abate, Antonio A1 - Flege, Jan Ingo T1 - Application of atomic layer deposition and x-ray photoelectron spectroscopy in perovskite solar cells T2 - Verhandlungen der DPG N2 - In this work we have utilized near-ambient pressure and ultra-high vacuum X-ray photoelectron spectroscopy as well as atomic layer deposition to investigate perovskite solar cells (PSCs). We have demonstrated that ultrathin room temperature atomic layer-deposited aluminium oxide on the perovskite surface very effectively suppresses iodine migration[1] and improves the long term stability and efficiency of PSCs [2,3]. Furthermore, exposure to light proves more detrimental to the perovskite film than exposure to water vapor.[2] Absorbed photons create Frenkel defects in the perovskite crystal and their number strongly depends on the used illumination. The higher the photon flux, the higher the concentration of Frenkel defects, and thus the stronger the degradation of power conversion efficiency and the stronger the hysteresis in the J-V characteristics. [1] C. Das, M. Kot et al., Cell Reports Physical Science 2020, 1, 100112. [2] M. Kot et al., ChemSusChem 2020, 13, 5722. [3] M. Kot et al., ChemSusChem 2018, 11, 3640. KW - atomic layer deposition KW - x-ray photoelectron spectroscopy KW - perovskite solar cells KW - aluminium oxide KW - iodine migration KW - long term stability KW - Frenkel defects Y1 - 2022 UR - https://www.dpg-verhandlungen.de/year/2022/conference/regensburg/part/hl/session/5/contribution/4 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Mahmoodinezhad, Ali A1 - Morales, Carlos A1 - Kot, Małgorzata A1 - Naumann, Franziska A1 - Plate, Paul A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - A super-cycle approach to atomic layer deposition of indium-gallium-zinc oxide at low temperature T2 - Verhandlungen der DPG N2 - The continuing development of multifunctional devices needs novel multicomponent oxide layers, demanding a high control of both composition and thickness during their preparation. To this end, single metal oxides exhibiting high structural quality and conformity have successfully been grown by atomic layer deposition (ALD). However, the deposition of more complex compounds with specific optical and electrical properties is still challenging. In this work, we follow a bottom-up approach to design an ALD super-cycle to grow mixed indium-gallium-zinc oxide (IGZO) films with a controllable composition. For the formation of the individual indium, gallium, and zinc oxides, we found the use of plasma-enhanced ALD (PEALD) at 150 °C to be favorable when using the organometallic precursors trimethylindium, trimethylgallium, and diethylzinc together with oxygen plasma. The PEALD approach of IGZO films can particularly overcome a nucleation delay within the ZnO sub-cycle known from thermal ALD, achieving a higher growth per cycle and improving the quality and composition homogeneity of the films as shown by in-situ spectroscopic ellipsometry and ex-situ X-ray photoelectron spectroscopy. KW - Indium gallium zinc oxide KW - Transparent conducting oxide KW - Plasma-enhanced atomic layer deposition KW - X-ray photoelectron spectroscopy KW - spectroscopic ellipsometry KW - nucleation delay Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/40/contribution/3 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Mańkowska, Ewa A1 - Mazur, Michał A1 - Domaradzki, Jarosław A1 - Mazur, Piotr A1 - Kot, Małgorzata A1 - Flege, Jan Ingo T1 - Hydrogen Gas Sensing Properties of Mixed Copper–Titanium Oxide Thin Films T2 - Sensors N2 - Hydrogen is an efficient source of clean and environmentally friendly energy. However, because it is explosive at concentrations higher than 4%, safety issues are a great concern. As its applications are extended, the need for the production of reliable monitoring systems is urgent. In this work, mixed copper–titanium oxide ((CuTi)Ox) thin films with various copper concentrations (0–100 at.%), deposited by magnetron sputtering and annealed at 473 K, were investigated as a prospective hydrogen gas sensing material. Scanning electron microscopy was applied to determine the morphology of the thin films. Their structure and chemical composition were investigated by X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The prepared films were nanocrystalline mixtures of metallic copper, cuprous oxide, and titanium anatase in the bulk, whereas at the surface only cupric oxide was found. In comparison to the literature, the (CuTi)Ox thin films already showed a sensor response to hydrogen at a relatively low operating temperature of 473 K without using any extra catalyst. The best sensor response and sensitivity to hydrogen gas were found in the mixed copper–titanium oxides containing similar atomic concentrations of both metals, i.e., 41/59 and 56/44 of Cu/Ti. Most probably, this effect is related to their similar morphology and to the simultaneous presence of Cu and Cu2O crystals in these mixed oxide films. In particular, the studies of surface oxidation state revealed that it was the same for all annealed films and consisted only of CuO. However, in view of their crystalline structure, they consisted of Cu and Cu2O nanocrystals in the thin film volume. KW - mixed copper–titanium oxides KW - Cu2O KW - TiO2 KW - (CuTi)Ox KW - hydrogen gas sensing KW - thin films KW - magnetron sputtering Y1 - 2023 U6 - https://doi.org/10.3390/s23083822 SN - 1424-8220 VL - 23 IS - 8 ER - TY - GEN A1 - Kedia, Mayank A1 - Rai, Monika A1 - Phirke, Himanshu A1 - Aranda, Clara A. A1 - Das, Chittaranjan A1 - Chirvony, Vladimir A1 - Boehringer, Stephan A1 - Kot, Małgorzata A1 - Malekshahi Byranvand, Mahdi A1 - Flege, Jan Ingo A1 - Redinger, Alex A1 - Saliba, Michael T1 - Light Makes Right: Laser Polishing for Surface Modification of Perovskite Solar Cells T2 - ACS Energy Letters N2 - Interface engineering is a common strategy for passivating surface defects to attain open circuit voltages (Voc) in perovskite solar cells (PSCs). In this work, we introduce the concept of polishing a perovskite thin-film surface using a nanosecond (ns) pulsed ultraviolet laser to reduce surface defects, such as dangling bonds, undesirable phases, and suboptimal stoichiometry. A careful control of laser energy and scanning speed improves the photophysical properties of the surface without compromising the thickness. Using laser polishing, a Voc of 1.21 V is achieved for planar PSCs with a triple cation composition, showing an improved perovskite/hole transport interface by mitigating surface recombination losses. We measure an efficiency boost from 18.0% to 19.3% with improved stability of up to 1000 h. The results open the door to a new class of surface modification using lasers for interface passivation in well-controllable, automated, scalable, and solvent-free surface treatments. KW - Perovskite solar cells KW - laser polishing KW - perovskite/hole transport interface KW - surface defects KW - recombination losses Y1 - 2023 U6 - https://doi.org/10.1021/acsenergylett.3c00469 SN - 2380-8195 VL - 8 SP - 2603 EP - 2610 ER - TY - GEN A1 - Das, Chittaranjan A1 - Roy, Rajarshi A1 - Kedia, Mayank A1 - Kot, Małgorzata A1 - Zuo, Weiwei A1 - Félix, Roberto A1 - Sobol, Tomasz A1 - Flege, Jan Ingo A1 - Saliba, Michael T1 - Unraveling the Role of Perovskite in Buried Interface Passivation T2 - ACS Applied Materials & Interfaces N2 - Interfaces in perovskite solar cells play a crucial role in their overall performance, and therefore, detailed fundamental studies are needed for a better understanding. In the case of the classical n–i–p architecture, TiO2 is one of the most used electron-selective layers and can induce chemical reactions that influence the performance of the overall device stack. The interfacial properties at the TiO2/perovskite interface are often neglected, owing to the difficulty in accessing this interface. Here, we use X-rays of variable energies to study the interface of (compact and mesoporous) TiO2/perovskite in such a n–i–p architecture. The X-ray photoelectron spectroscopy and X-ray absorption spectroscopy methods show that the defect states present in the TiO2 layer are passivated by a chemical interaction of the perovskite precursor solution during the formation of the perovskite layer and form an organic layer at the interface. Such passivation of intrinsic defects in TiO2 removes charge recombination centers and shifts the bands upward. Therefore, interface defect passivation by oxidation of Ti3+ states, the organic cation layer, and an upward band bending at the TiO2/perovskite interface explain the origin of an improved electron extraction and hole-blocking nature of TiO2 in the n–i–p perovskite solar cells. KW - perovskite solar cells KW - interface KW - defects KW - photoemission spectroscopy Y1 - 2023 U6 - https://doi.org/10.1021/acsami.3c13085 SN - 1944-8244 SN - 1944-8252 VL - 15 IS - 48 SP - 56500 EP - 56510 ER - TY - GEN A1 - Kot, Małgorzata A1 - Kedia, Mayank A1 - Plate, Paul A1 - Marth, Ludwig A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - Application of plasma enhanced atomic layer deposition process of alumina on perovskite film boosts efficiency of solar cells T2 - Verhandlungen der DPG N2 - It is assumed that plasma-enhanced atomic layer deposition (PEALD) cannot be used to prepare thin films on sensitive organic-inorganic perovskites because the plasma destroys the perovskite film and thus deteriorates its photophysical properties. Here, we prove that using an appropriate geometry of the ALD system (SENTECH SI PEALD system) and suitable process parameters it is possible to coat perovskites with alumina by PEALD. Spectromicroscopy followed by electrical characterisation reveal that as long as the PEALD process is not optimized (too long plasma pulses) one gets degradation of the perovskite as well as dissociation of the created iodine pentoxide (during PEALD) under light that causes a valence band maximum (VBM) shift to the Fermi level and thus significantly decreases the solar cell efficiency. However, once the PEALD process parameters are optimized, no VBM shift is observed. Moreover, the solar cell efficiency depends inversely on process temperature and layer thickness. KW - Plamsa-enhanced atomic layer deposition KW - Perovskite solar cells KW - Valence band maximum Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/hl/session/4/contribution/2 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Mazur, Michał A1 - Kapuścik, Paulina A1 - Weichbrodt, Wiktoria A1 - Domaradzki, Jarosław A1 - Mazur, Piotr A1 - Kot, Małgorzata A1 - Flege, Jan Ingo T1 - WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations T2 - Materials N2 - Hydrogen gas sensors have recently attracted increased interest due to the explosive nature of H2 and its strategic importance in the sustainable global energy system. In this paper, the tungsten oxide thin films deposited by innovative gas impulse magnetron sputtering have been investigated in terms of their response to H2. It was found that the most favourable annealing temperature in terms of sensor response value, as well as response and recovery times, was achieved at 673 K. This annealing process caused a change in the WO3 cross-section morphology from a featureless and homogenous form to a rather columnar one, but still maintaining the same surface homogeneity. In addition to that, the full-phase transition from an amorphous to nanocrystalline form occurred with a crystallite size of 23 nm. It was found that the sensor response to only 25 ppm of H2 was equal to 6.3, which is one of the best results presented in the literature so far of WO3 optical gas sensors based on a gasochromic effect. Moreover, the results of the gasochromic effect were correlated with the changes in the extinction coefficient and the concentration of the free charge carriers, which is also a novel approach to the understanding of the gasochromic phenomenon. KW - Tungsten oxide (WO3) KW - gas impulse magnetron sputtering KW - thin film KW - gasochromic properties KW - optical properties KW - annealing KW - optical hydrogen gas sensor Y1 - 2023 U6 - https://doi.org/10.3390/ma16103831 SN - 1996-1944 VL - 16 IS - 10 ER - TY - CHAP A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Schmeißer, Dieter T1 - Localized defect states and charge trapping in Al₂O₃ films prepared by atomic layer deposition T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - The evaluation of the electronic structure and intrinsic defect mechanisms in Al₂O₃ thin films is essential for their effective use in applications with desired functionality such as surface passivation schemes for solar cells [1]. We present a comparative study of different Al₂O₃ films grown by atomic layer deposition (ALD) [2]. The layers were deposited on different substrates using the same aluminum precursor (TMA, trimethylalumium) and employing different process parameters (thermal-ALD, plasma-enhanced-ALD, substrate temperature). These films were characterized by resonant photoelectron spectroscopy and by electrical measurements (capacitance-voltage). For all films investigated intrinsic defect states within the electronic band gap were observed including excitonic, polaronic, and charge-transfer defect states, where their relative abundance is subject of the choice of ALD parameters and of the used substrate. The spectroscopic assigned in-gap defect states are related with electronic charges as determined in the electrical measurements. [1] G. Dingemans and W.M.M. Kessels, J. Vac. Sci. Technol. A 30, 040802 (2012). [2] K. Henkel, M. Kot, D. Schmeißer, J. Vac. Sci. Technol. A 35, (2017), accepted. KW - defect states KW - Al₂O₃ KW - resonant photoelectron spectroscopy KW - X-Ray absorption spectroscopy KW - capacitance-voltage measurements Y1 - 2017 UR - http://www.dpg-verhandlungen.de/year/2017/conference/dresden/part/ds/session/32/contribution/4 SN - 0420-0195 SP - S. 205 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Kot, Małgorzata A1 - Wojciechowski, Konrad A1 - Snaith, Henry J. A1 - Schmeißer, Dieter T1 - Characterization of the perovskite solar cells containing atomic layer deposited Al2O3 buffer layer T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft e.V. N2 - Hybrid perovskites have potential to overcome performance limits of the current solar cell technologies and achieve low cost and high versatility. Nonetheless, they are prone to degradation in presence of moisture within a couple of hours or days. In this work, we use the atomic layer deposition (ALD) of Al2O3 on the CH3NH3PbI3 perovskite at room temperature in order to verify if this thin ALD layer may protect the perovskite film against moisture degradation and to check the impact of the Al2O3 on the solar to power conversion efficiency (PCE). Depth profiling X-ray photoelectron spectroscopy study shows that the ALD precursors are chemically active only at the perovskite surface and the film bulk is not affected. The perovskite film coated with Al2O3 layer has enhanced moisture stability. Solar cells with a fresh-made CH3NH3PbI3 perovskite film have shown PCE of 15.4%, while the one with 50 days aged perovskite only 6.1%. However, when the aged perovskite is covered with RT-ALD-Al2O3 the PCE value is clearly enhanced.[1] [1] M. Kot et al., Room temperature ALD impact on efficiency, stability and surface properties in perovskite solar cells, ChemSusChem,acctepted. KW - Perovskite solar cell KW - atomic layer deposition KW - Al2O3 KW - efficiency recovery Y1 - 2017 UR - http://www.dpg-verhandlungen.de/year/2017/conference/dresden/part/cpp/session/38/contribution/5 SN - 0420-0195 SP - S. 147 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Das, Chittaranjan A1 - Zia, Waqas A1 - Mortan, Claudiu A1 - Hussain, Navid A1 - Saliba, Michael A1 - Flege, Jan Ingo A1 - Kot, Małgorzata T1 - Top-Down Approach to Study Chemical and Electronic Properties of Perovskite Solar Cells: Sputtered Depth Profiling Versus Tapered Cross-Sectional Photoelectron Spectroscopies T2 - Solar RRL N2 - A study of the chemical and electronic properties of various layers across perovskite solar cell (PSC) stacks is challenging. Depth-profiling photoemission spectroscopy can be used to study the surface, interface, and bulk properties of different layers in PSCs, which influence the overall performance of these devices. Herein, sputter depth profiling (SDP) and tapered cross-sectional (TCS) photoelectron spectroscopies (PESs) are used to study highly efficient mixed halide PSCs. It is found that the most used SDP-PES technique degrades the organic and deforms the inorganic materials during sputtering of the PSCs while the TCS-PES method is less destructive and can determine the chemical and electronic properties of all layers precisely. The SDP-PES dissociates the chemical bonding in the spiro-MeOTAD and perovskite layer and reduces the TiO2, which causes the chemical analysis to be unreliable. The TCS-PES revealed a band bending only at the spiro-MeOTAD/perovskite interface of about 0.7 eV. Both the TCS and SDP-PES show that the perovskite layer is inhomogeneous and has a higher amount of bromine at the perovskite/TiO2 interface. KW - chemical distributions KW - depth profiles KW - interfaces KW - perovskite solar cells KW - X-ray photoelectron spectroscopy Y1 - 2021 U6 - https://doi.org/10.1002/solr.202100298 SN - 2367-198X VL - 5 IS - 10 ER - TY - GEN A1 - Laroussi, Arwa A1 - Kot, Małgorzata A1 - Flege, Jan Ingo A1 - Raouafi, Noureddine A1 - Mirsky, Vladimir M. T1 - Self-assembled monolayers from symmetrical di-thiols: Preparation, characterization and application for the assembly of electrochemically active films T2 - Applied Surface Science N2 - 1,3-dimercaptopropan-2-ol, a symmetrical di-thiol, has been synthesized and applied as a new type of anchor molecule to prepare a self-assembled monolayer (SAM) on the gold surface. The formed monolayers were studied by cyclic voltammetry, impedance spectroscopy, X-ray photoelectron spectroscopy, kinetic capacitance, and contact angle measurements. The SAM structure depends on the adsorption conditions. A short incubation time of the electrode at high concentration of this di-thiol leads to the predominating binding through one thiol group of the adsorbate to the gold surface, while a long incubation at low concentration leads to the predominating binding by both thiol groups. A comparative study of the desorption and replacement of SAMs indicates a strong stability increase when the SAM molecules bond gold surface by two bonds mainly. This monolayer was used to immobilize electrochemically active p-benzoquinone moiety. The surface concentration of p-benzoquinone obtained from cyclic voltammetry is 2.5 ± 0.2 × 10−10 mol·cm−2 which corresponds to the functionalization of 65 ± 5% of SAM molecules. The obtained highly stable SAM with redox-active terminal group can be applied for different tasks of chemical sensing and biosensing. As an example, an application of this system for electrocatalytical oxidation of dihydronicotinamide adenosine dinucleotide (NADH) was tested. KW - self-assembled monolayer (SAM) KW - cyclic voltammetry KW - impedance spectroscopy KW - X-ray photoelectron spectroscopy (XPS) KW - kinetic capacitance KW - contact angle Y1 - 2020 U6 - https://doi.org/10.1016/j.apsusc.2020.145827 SN - 0169-4332 SN - 1873-5584 VL - 513 ER - TY - GEN A1 - Kot, Małgorzata A1 - Vorokhta, Mykhailo A1 - Wang, Zhiping A1 - Snaith, Henry J. A1 - Schmeißer, Dieter A1 - Flege, Jan Ingo T1 - Thermal stability of CH3NH3PbIxCl3-x versus [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 perovskite films by X-ray photoelectron spectroscopy T2 - Applied Surface Science N2 - The thermal stability of CH3NH3PbIxCl3-x and [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 perovskite films was studied in-situ by X-ray photoelectron spectroscopy. It was found that below 85 °C both of them are relatively stable. After annealing above 85 °C, we observe a clear perovskite surface decomposition, i.e., a release of organic cations and creation of “metallic lead”. The mixed cation lead mixed halide perovskite, however, decomposes at a much lower rate. For both perovskite films, the metallic to the total lead ratio changes with the same rate for the same annealing temperatures. The release of A-site cations from the ABX3 crystal structure of perovskite and/or creation of “metallic lead” causes also a small shift of the valence band maximum towards the Fermi level. The release of [HC(NH2)2]± or Cs± is not as significant as the release of CH3NH3±; therefore, it may explain why [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 solar cells are thermally more stable. Therefore, as the stability of CH3NH3PbIxCl3-x is same as the stability of [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 below 85 °C, there must be more severe degradation pathways that are currently underappreciated on the solar cell level. KW - Hybrid organic inorganic perovskite solar cells KW - X-ray photoelectron spectroscopy KW - Film degradation KW - Thermal stability Y1 - 2020 U6 - https://doi.org/10.1016/j.apsusc.2020.145596 SN - 0169-4332 SN - 1873-5584 VL - 513 ER - TY - GEN A1 - Kot, Małgorzata A1 - Henkel, Karsten A1 - Naumann, Franziska A1 - Gargouri, Hassan A1 - Tarnawska, Lidia Lupina A1 - Wilker, Viola A1 - Kus, Peter A1 - Pożarowska, Emilia A1 - Garain, Samiran A1 - Rouissi, Zied A1 - Schmeißer, Dieter T1 - Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources T2 - Journal of Vacuum Science and Technology A N2 - A comparative study of thin aluminum nitride (AlN) films deposited by plasma-enhanced atomic layer deposition in the SENTECH SI ALD LL system applying either a direct inductively coupled plasma (ICP) or an indirect capacitively coupled plasma (CCP) source is presented. The films prepared with the ICP source (based on a planar triple spiral antenna) exhibit improved properties concerning the growth rate per cycle, total cycle duration, homogeneity, refractive index, fixed and mobile electrical charges, and residual oxygen content compared to the CCP source, where the comparison is based on the applied plasma power of 200 W. The increase of the plasma power to 600 W in the ICP process significantly reduces the residual oxygen content and enhances the electrical breakdown field. The AlN layers grown under these conditions, with a growth rate per cycle of 1.54 Å/cycle, contain residual oxygen and carbon concentrations of about 10% and 4%, respectively, and possess a refractive index of 2.07 (at 632.8 nm). KW - Plamsa-enhanced atomic layer deposition (PEALD) KW - inductively coupled KW - capacitively coupled KW - plamsa source KW - ellipsometry KW - X-ray photoelectron spectroscopy (XPS) KW - X-ray diffraction (XRD) KW - Field emission scanning electron microscopy (FESEM) KW - capacitance-voltage (CV) KW - atomic force microscopy Y1 - 2019 U6 - https://doi.org/10.1116/1.5079628 SN - 0734-2101 SN - 1520-8559 VL - 37 IS - 2 ER - TY - GEN A1 - Kotwica, Tomasz A1 - Domaradzki, Jarosław A1 - Wojcieszak, Damian A1 - Sikora, Andrzej A1 - Kot, Małgorzata A1 - Schmeißer, Dieter T1 - Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations T2 - Materials Science-Poland N2 - The paper presents results of investigations on surface properties of transparent semiconducting thin films based on (Ti-Cu)oxide system prepared using multi-magnetron sputtering system. The thin films were prepared using two programmed profiles of pulse widt hmodulation coefficient, so called V- and U-shape profiles. The applied powering profiles allowed fabrication of thin films with gradient distribution of Ti and Cu elements over the thickness of deposited layers. Optical investigations allowed determination of transparency of prepared films that reached up to 60 % in the visible part of optical radiation, which makes them attractive for the transparent electronics domain. Surface properties investigations showed that the surface of mixed (Ti-Cu)oxides was sensitive to adsorption, in particular to carbon dioxide and water vapor. Soft etching with argon ions resulted in surface cleaning from residuals, however, deoxidation of Cu-oxide components was also observed. KW - surface KW - gradient distribution KW - thin film oxide Y1 - 2019 U6 - https://doi.org/10.2478/msp-2018-0100 SN - 0137-1339 SN - 2083-1331 SN - 2083-134X VL - 36 IS - 4 SP - 761 EP - 768 ER - TY - GEN A1 - Obstarczyk, Agata A1 - Kaczmarek, Danuta A1 - Wojcieszak, Damian A1 - Mazur, Michał A1 - Domaradzki, Jarosław A1 - Kotwica, Tomasz A1 - Pastuszek, Roman A1 - Schmeißer, Dieter A1 - Mazur, Piotr A1 - Kot, Małgorzata T1 - Tailoring optical and electrical properties of thin-film coatings based on mixed Hf and Ti oxides for optoelectronic application T2 - Materials and Design N2 - In this work multi-magnetron sputtering stand was used for the deposition of the mixed oxides thin films based on HfO2 and TiO2. In order to obtain various material composition the power released to each magnetron (containing metallic hafnium and titanium targets) was precisely selected. Structural, surface, optical, electrical and mechanical properties of as-deposited coatings were analyzed. Depending on the hafnium content in the deposited thin films various types of the microstructure was obtained, i.e. HfO2-monoclinic, amorphous and TiO2-rutile. Increase of Ti content above 28 at. % in the as-prepared mixed oxides coatings caused their amorphization. It was found that with an increase of Ti content in prepared coatings their surface roughness and simultaneously water contact angle decreased. Performed measurements of electrical properties revealed that the lowest leakage current density in the range of 10−7 – 10−8 A/cm2 was obtained for amorphous coatings. Moreover, the tailoring of the dielectric constant was possible by a proper selection of material composition and microstructure of the deposited thin films. Average transparency in the visible wavelength region was in the range of ca. 79–86%. The influence of material composition and structure on shifting of the fundamental absorption edge and optical bandgap energy was also observed. The refractive index increased with an increase of Ti content, while extinction coefficient was the lowest for amorphous coatings. Additionally, hardness values were dependent on the material composition and optical packing density and were in the range from 7.6 GPa to 10.1 GPa. KW - Magnetron sputtering KW - Optical coatings KW - Electrical properties KW - Mixed oxides KW - HfO2 KW - TiO2 KW - High-k oxides KW - Amorphous thin films Y1 - 2019 U6 - https://doi.org/10.1016/j.matdes.2019.107822 SN - 0264-1275 VL - 175 ER - TY - GEN A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Baran, Derya A1 - Saliba, Michael T1 - Themed issue on electronic properties and characterisation of perovskites T2 - Journal of Materials Chemistry C KW - perovskite solar cells KW - electronic properties of perovskites Y1 - 2019 U6 - https://doi.org/10.1039/c9tc90085c SN - 2050-7526 SN - 2050-7534 VL - 7 SP - 5224 EP - 5225 ER - TY - GEN A1 - Kot, Małgorzata A1 - Henkel, Karsten A1 - Müller, Klaus A1 - Kegelmann, Lukas A1 - Albrecht, Steve A1 - Tsud, Nataliya A1 - Kús, Peter A1 - Matolinová, Iva A1 - Schmeißer, Dieter T1 - Al2O3-Atomic Layer Deposited Films on CH3NH3PbI3 : Intrinsic Defects and Passivation Mechanisms T2 - Energy Technology , The Journal of Physical Chemistry C N2 - The initial interaction of atomic layer deposited films of Al2O3 at room temperature on CH3NH3PbI3 (MAPI) films is studied. Synchrotron radiation–based photoelectron spectroscopy is applied to analyze the initial changes in the Al-derived features by comparing samples with different Al2O3 film thicknesses. It is found that polarons and excitons, both intrinsic defects of Al2O3, play a key role in the interface formation. The polaronic states uptake a charge from the MAPI substrate. This charge is transferred to and stabilized in the excitonic state of Al2O3 which is assigned to predominately tetrahedral coordinated Al sites. This charge transfer is initiated by vacancies present in the MAPI substrate and stabilizes a covalent bonding at the Al2O3–MAPI interface but also causes a roughening of the interface which may lead to the formation of grain boundaries. On top of the rough interface, 2D Al2O3 clusters with an increasing number of octahedrally coordinated Al—O bonds grow, and with increasing Al2O3 coverage, they introduce self-healing of the structural defects. KW - charge donation and transfer cycles KW - covalent interfaces KW - defect monitoring KW - model of Al2O3–CH3NH3PbI3 interactions KW - resonant photoelectron spectroscopy Y1 - 2019 U6 - https://doi.org/10.1002/ente.201900975 SN - 2194-4288 SN - 2194-4296 VL - 7 IS - 11 ER - TY - GEN A1 - Schmeißer, Dieter A1 - Henkel, Karsten A1 - Pożarowska, Emilia A1 - Kegelmann, Lukas A1 - Tsud, Nataliya A1 - Kot, Małgorzata T1 - Point Defect-Mediated Interface Formation and Appearance of a Cooper Minimum for AlOₓ Atomic-Layer-Deposited Films on CH₃NH₃PbI₃ T2 - The Journal of Physical Chemistry. C N2 - We report on the interaction of CH₃NH₃PbI₃ substrates with AlOx films prepared by atomic layer deposition at room temperature. We use synchrotron radiation-based photoemission spectroscopy and study the Pb 4f, I 3d, and Al 2p core levels as well as the corresponding valence band states (Pb 5d and O 2p). A Cooper minimum is observed for both the Pb 5d and O 2p states, and it indicates that the bonding at the interface must be covalent. We focus on the electronic properties of the substrate and its interface and identify a delicate charge balance between polaronic and excitonic states in MAPI and AlOₓ. The perovskite vacancy sites, identified by changes in the core-level intensities, mediate the charge balance and covalent interaction. KW - Resonant photoelectron spectroscopy KW - Al₂O₃-CH₃NH₃PbI₃ interaction KW - Cooper minimum KW - point defects in CH₃NH₃PbI₃ KW - electronic structure of CH₃NH₃PbI₃ Y1 - 2019 U6 - https://doi.org/10.1021/acs.jpcc.9b05282 SN - 1932-7447 SN - 1932-7455 VL - 123 IS - 38 SP - 23352 EP - 23360 ER - TY - GEN A1 - Kot, Małgorzata A1 - Łobaza, Justyna A1 - Naumann, Franziska A1 - Gargouri, Hassan A1 - Henkel, Karsten A1 - Schmeißer, Dieter T1 - Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study T2 - Journal of Vacuum Science and Technology A N2 - The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using etrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation. KW - atomic layer deposition (ALD) KW - surface oxidation KW - X-Ray photoelectron spectroscopy (XPS) KW - titanium oxynitride Y1 - 2018 U6 - https://doi.org/10.1116/1.5003356 SN - 0734-2101 SN - 1520-8559 VL - 36 IS - 1 ER - TY - GEN A1 - Kot, Małgorzata A1 - Wojciechowski, Konrad A1 - Snaith, Henry J. A1 - Schmeißer, Dieter T1 - Evidence of Nitrogen Contribution to the Electronic Structure of the CH₃NH₃PbI₃ Perovskite T2 - Chemistry - A European Journal N2 - Despite fast development of hybrid perovskite solar cells, there are many fundamental questions related to the perovskite film which remain open. For example, there are contradicting theoretical reports on the role of the or-ganic methylammonium cation (CH₃NH₃+)in the methylam-monium lead triiodide (CH₃NH₃PbI₃)perovskite film. From one side it is reported that the organic cation does not contribute to electronic structure of the CH₃NH₃PbI₃ film. From the other side, valence band maximum fluctuations, dependent on the CH₃NH₃+ rotation, have been theoretically predicted. The resonant X-ray photoelectron spectroscopy results reported here show experimental evidence of nitrogen contribution to the CH₃NH₃PbI₃ electronic structure. Moreover,the observed strong resonances of nitrogen with the I 5s and the Pb 5d-6s levels indicate that the CH₃NH₃PbI₃ valence band is extended up to ~18 eV below the Fermi energy, and therefore one should also consider these shallow core levels while modeling its electronic structure. KW - methylammonium lead triiodide (CH₃NH₃PbI₃) KW - electronic structure KW - perovskite solar cells KW - resonant X-ray photoelectron spectroscopy (resPES) Y1 - 2018 U6 - https://doi.org/10.1002/chem.201705144 SN - 0947-6539 SN - 1521-3765 VL - 24 IS - 14 SP - 3539 EP - 3544 ER - TY - CHAP A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Richter, Matthias A1 - Tallarida, Massimo A1 - Schmeißer, Dieter ED - Wandelt, Klaus T1 - An (In Situ)² Approach: ALD and resPES Applied to Al₂O₃, HfO₂, and TiO₂ Ultrathin Films T2 - Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, Vol. 3.1 N2 - Oxide surface coatings are of importance in tailoring interface properties with respect to surface passivation, adjustment of surface potentials, or providing active centers for surface reactions. In this contribution, we report about surface coatings prepared by the atomic layer deposition (ALD) method. ALD is known for its conformal growth of ultrathin, dense films which exhibit a low concentration of pinholes. KW - Atomic layer deposition (ALD) KW - Resonant photoelectron spectroscopy (resPES) KW - Band scheme KW - Partial density of states (pDOS) KW - Intrinsic charges KW - Intrinsic defects KW - Aluminum oxide (Al₂O₃) KW - Hafnium oxide (HfO₂) KW - Titanium oxide(TiO₂) Y1 - 2018 SN - 978-0-12-809739-7 SN - 978-0-12-809894-3 U6 - https://doi.org/10.1016/B978-0-12-409547-2.13852-1 SP - 18 EP - 26 PB - Elsevier CY - Oxford ER - TY - GEN A1 - Kot, Małgorzata A1 - Kegelmann, Lukas A1 - Das, Chittaranjan A1 - Kus, Peter A1 - Tsud, Nataliya A1 - Matolínová, Iva A1 - Albrecht, Steve A1 - Matolin, Vladimir A1 - Schmeißer, Dieter T1 - Room temperature atomic layer deposited Al₂O₃ improves perovskite solar cells efficiency over time T2 - ChemSusChem N2 - Electrical characterisation of perovskite solar cells consisting of room-temperature atomic-layer-deposited aluminium oxide (RT-ALD-Al₂O₃) film on top of a methyl ammonium lead triiodide (CH₃NH₃PbI₃) absorber showed excellent stability of the power conversion efficiency (PCE) over along time. Under the same environmental conditions (for 355 d), the average PCE of solar cells without the ALD layer decreased from 13.6 to 9.6 %, whereas that of solar cells containing 9 ALD cycles of depositing RT-ALD-Al₂O₃on top of CH₃NH₃PbI₃ increased from 9.4 to 10.8 %. Spectromicroscopic investigations of the ALD/perovskite interface revealed that the maximum PCE with the ALD layer is obtained when the so-called perovskite cleaning process induced by ALD precursors is complete. The PCE enhancement over time is probably related to a self-healing process induced by the RT-ALD-Al₂O₃ film. This work may provide a new direction for further improving the long-term stability and performance of perovskite solar cells. KW - Perovskite Solar Cells (PSCs) KW - Atomic layer deposition (ALD) KW - long time stabilty KW - X-Ray photoelectron spectroscopy (XPS) KW - Field-emission scanning electron microscopy (FESEM) Y1 - 2018 U6 - https://doi.org/10.1002/cssc.201801434 SN - 1864-5631 SN - 1864-564X VL - 11 IS - 20 SP - 3640 EP - 3648 ER - TY - GEN A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Schmeißer, Dieter T1 - Localized defect states and charge trapping in atomic layer deposited-Al₂O₃ films T2 - Journal of Vacuum Science and Technology, A : Vacuum, Surfaces, and Films N2 - In this study, the authors compared different Al₂O₃ films grown by atomic layer deposition (ALD) with the same aluminum precursor but on different substrates. The authors employed different process parameters such as thermal-ALD and plasma-enhanced-ALD using different substrate temperatures ranging from 280 °C down to room temperature. They characterized these films by resonant photoelectron spectroscopy and by electrical measurements. They established that generally the ALD-Al₂O₃ films show characteristic features of bulk Al₂O₃. For all films investigated, the authors found intrinsic defect states within the electronic band gap and identified excitonic, polaronic, and charge-transfer defect states. The authors gave an atomistic model to explain these intrinsic defects and found that their relative abundance is subject of the choice of ALD parameters and of the substrate used. They were able to relate the spectroscopic assigned in-gap defect states with the electronic charges as determined in our electrical measurements. KW - defect states KW - resonant photoelectron spectroscopy (resPES) KW - Al₂O₃ KW - atomic layer deposition (ALD) KW - excitons KW - polarons Y1 - 2017 U6 - https://doi.org/10.1116/1.4971991 SN - 0734-2101 SN - 1520-8559 VL - 35 IS - 1 SP - 01B125-1 EP - 01B125-18 ER - TY - GEN A1 - Henkel, Karsten A1 - Das, Chittaranjan A1 - Kot, Małgorzata A1 - Schmeißer, Dieter A1 - Naumann, Franziska A1 - Kärkkänen, Irina A1 - Gargouri, Hassan T1 - In-gap states in titanium dioxide and oxynitride atomic layer deposited films T2 - Journal of Vacuum Science and Technology: A N2 - Valence band (VB) spectra of titanium dioxide (TiO2) and oxynitride (TiOxNy) films prepared by different atomic layer deposition (ALD) processes are compared and related to electrical characterization [current–voltage (JV) and capacitance–voltage (CV)] results. By increasing the nitrogen amount in the TiO2 film, band-gap narrowing is observed. The band-gap decrease is related to the contribution of the nitrogen density of states, which induces defects within the band-gap and thus reduces its optical band-gap. In-gap states are found in the VB spectra at 1 eV below the Fermi energy in all investigated ALD samples, i.e., in TiO2 as well as in TiOxNy films. An exponential correlation between leakage current density and in-gap state intensity is derived by the combination of JV measurements and VB spectra, whereas the in-gap states seem to have no influence on hysteresis and fixed oxide charges found in the CV data. It is argued that the in-gap states in TiO2 and TiOxNy have an excitonic or polaronic origin. Both, band-gap narrowing and in-gap state intensity can be tuned by the ALD process selection and the variation of its parameters. KW - Titanium dioxide (TiO2) KW - Titanium oxynitrdie (TiON) KW - valence band spectra KW - in-gap states KW - band-gap narrowing KW - electrical characterization Y1 - 2017 U6 - https://doi.org/10.1116/1.4972247 SN - 0734-2101 SN - 1520-8559 VL - 35 IS - 1 SP - 01B135-1 EP - 01B135-8 ER - TY - GEN A1 - Kot, Małgorzata A1 - Henkel, Karsten A1 - Das, Chittaranjan A1 - Brizzi, Simone A1 - Kärkkänen, Irina A1 - Schneidewind, Jessica A1 - Naumann, Franziska A1 - Gargouri, Hassan A1 - Schmeißer, Dieter T1 - Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition T2 - Surface and Coatings Technology N2 - A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium (TDMAT) and N2 plasma as well as titanium(IV)isopropoxide and NH3 plasma is reported. The comparison is based on the combination of Ti2p core level and valence band spectroscopy and current-voltage measurements. The TDMAT/N2 process delivers generally higher fractions of TiN and TiON within the Ti2p spectra of the films and stronger photoemissions within the bandgap as resolved in detail by high energy resolution synchrotron-based spectroscopy. In particular, it is shown that higher TiN contributions and in-gap emission intensities correlate strongly with increased leakage currents within the films and might be modified by the process parameters and precursor selection. KW - Titanium oxynitride KW - Plasma enhanced atomic layer deposition (PEALD) KW - ALD process parameters KW - Ti-N contributions KW - In-gap defect states KW - Leakage current Y1 - 2017 U6 - https://doi.org/10.1016/j.surfcoat.2016.11.094 SN - 0257-8972 SN - 1879-3347 VL - 324 SP - 586 EP - 593 ER - TY - GEN A1 - Das, Chittaranjan A1 - Kot, Małgorzata A1 - Rouissi, Zied A1 - Kędzierski, Kamil A1 - Henkel, Karsten A1 - Schmeißer, Dieter T1 - Selective Deposition of an ultrathin Pt Layer on a Au-Nanoisland-Modified Si Photocathode for Hydrogen Generation T2 - ACS Omega N2 - Platinum, being the most efficient and stable catalyst, is used in photoelectrochemical (PEC) devices. However, a minimal amount of Pt with maximum catalytic activity is required to be used to minimize the cost of production. In this work, we use an environmentally friendly, ost-effective, and less Pt-consuming method to prepare PEC devices for the hydrogen evolution reaction (HER). The Pt monolayer catalyst is selectively deposited on a Au-nanoisland-supported boron-doped p-type Si (100) photocathode. The PEC device based on the Si photocathode with an ultralow loading of the Pt catalyst exhibits a comparable performance for the HER to that of devices with a thick Pt layer. In addition, we demonstrate that by using a thin TiO2 layer deposited by atomic layer deposition photo-oxidation of the Si photocathode can be blocked resulting in a stable PEC performance. KW - water splitting KW - hydrogen evolution reaction (HER) KW - Si photocathode KW - gold nanoislands KW - nanostructured platinum Y1 - 2017 U6 - https://doi.org/10.1021/acsomega.6b00374 SN - 2470-1343 VL - 2 IS - 4 SP - 1360 EP - 1366 ER - TY - GEN A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Henkel, Karsten A1 - Wojciechowski, Konrad A1 - Snaith, Henry J. A1 - Schmeißer, Dieter T1 - Room temperature atomic layer deposited Al₂O₃ on CH₃NH₃PbI₃ characterized by synchrotron-based X-ray photoelectron spectroscopy T2 - Nuclear Instruments and Methods in Physics Research B N2 - An ultrathin Al₂O₃ film deposited on methylammonium lead triiodide (CH₃NH₃PbI₃) perovskite has the capability to suppress the carrier recombination process and improve the perovskite solar cells efficiency and stability. However, annealing at temperatures higher than 85°C degrades the CH₃NH₃PbI₃ perovskite film. The X-ray photoelectron spectroscopy study performed in this work indicates that it is possible to grow Al₂O₃ by atomic layer deposition on the perovskite at room temperature, however, besides pure Al₂O₃ some OH groups are found and the creation of lead and iodine oxides at the Al₂O₃/CH₃NH₃PbI₃ interface takes place. KW - Synchrotron-based X-ray photoelectron spectroscopy KW - Perovskite solar cells KW - Atomic layer deposition KW - Al₂O₃ Y1 - 2017 U6 - https://doi.org/10.1016/j.nimb.2017.01.082 SN - 0168-583X SN - 1872-9584 VL - 411 SP - 49 EP - 52 ER - TY - GEN A1 - Das, Chittaranjan A1 - Kot, Małgorzata A1 - Henkel, Karsten A1 - Schmeißer, Dieter T1 - Engineering of Sub-Nanometer SiOₓ Thickness in Si Photocathodes for Optimized Open Circuit Potential T2 - ChemSusChem N2 - Silicon is one of the most promising materials to be used for tandem-cell water-splitting devices. However, the electrochemical instability of bare Si makes it difficult to be used for stable devices. Besides that, the photovoltage loss in Si, caused by several factors (e.g., metal oxide protection layer and/or SiO₂/Si or catalyst/Si interface), limits its use in these devices. In this work, we present that an optimized open circuit potential (OCP) of Si can be obtained by controlling the SiOₓ thickness in sub-nanometer range. It can be done by means of a simple and cost-effective way using the combination of a wet chemical etching and the low temperature atomic layer deposition (ALD) of TiO₂. We have found that a certain thickness of the native SiOₓ is necessary to prevent further oxidation of the Si photocathode during the ALD growth of TiO₂. Moreover, covering the Si photocathode with an ALD TiO₂ layer enhances its stability. KW - atomic layer deposition KW - open circuit potential KW - Si photocathodes KW - silica KW - stability Y1 - 2016 U6 - https://doi.org/10.1002/cssc.201600777 SN - 1864-5631 SN - 1864-564X VL - 9 IS - 17 SP - 2332 EP - 2336 ER - TY - GEN A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Wang, Zhiping A1 - Henkel, Karsten A1 - Rouissi, Zied A1 - Wojciechowski, Konrad A1 - Snaith, Henry J. A1 - Schmeißer, Dieter T1 - Room-Temperature Atomic Layer Deposition of Al₂O₃: Impact on Efficiency, Stability and Surface Properties in Perovskite Solar Cells T2 - ChemSusChem N2 - In this work, solar cells with a freshly made CH₃NH₃PbI₃ perovskite film showed a power conversion efficiency (PCE) of 15.4 % whereas the one with 50 days aged perovskite film only 6.1 %. However, when the aged perovskite was covered with a layer of Al₂O₃ deposited by atomic layer deposition (ALD) at room temperature (RT), the PCE value was clearly enhanced. X-ray photoelectron spectroscopy study showed that the ALD precursors are chemically active only at the perovskite surface and passivate it. Moreover, the RT-ALD-Al2O3-covered perovskite films showed enhanced ambient air stability. KW - Al₂O₃ KW - atomic layer deposition (ALD) KW - perovskite KW - solar cells KW - X-ray photoelectron spectroscopy (XPS) Y1 - 2016 U6 - https://doi.org/10.1002/cssc.201601186 SN - 1864-5631 SN - 1864-564X VL - 9 IS - 24 SP - 3401 EP - 3406 ER - TY - GEN A1 - Zuo, Weiwei A1 - Malekshahi Byranvand, Mahdi A1 - Kodalle, Tim A1 - Zohdi, Mohammadreza A1 - Lim, Jaekeun A1 - Carlsen, Brian A1 - Friedlmeier, Theresa Magorian A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Flege, Jan Ingo A1 - Zong, Wansheng A1 - Abate, Antonio A1 - Sutter-Fella, Carolin M. A1 - Li, Meng A1 - Saliba, Michael T1 - Coordination Chemistry as a Universal Strategy for a Controlled Perovskite Crystallization T2 - Advanced Materials N2 - The most efficient and stable perovskite solar cells (PSCs) are made from a complex mixture of precursors. Typically, to then form a thin film, an extreme oversaturation of the perovskite precursor is initiated to trigger nucleation sites, e.g., by vacuum, an airstream, or a so-called antisolvent. Unfortunately, most oversaturation triggers do not expel the lingering (and highly coordinating) dimethyl sulfoxide (DMSO), which is used as a precursor solvent, from the thin films; this detrimentally affects long-term stability. In this work, (the green) dimethyl sulfide (DMS) is introduced as a novel nucleation trigger for perovskite films combining, uniquely, high coordination and high vapor pressure. This gives DMS a universal scope: DMS replaces other solvents by coordinating more strongly and removes itself once the film formation is finished. To demonstrate this novel coordination chemistry approach, MAPbI3 PSCs are processed, typically dissolved in hard-to-remove (and green) DMSO achieving 21.6% efficiency, among the highest reported efficiencies for this system. To confirm the universality of the strategy, DMS is tested for FAPbI3 as another composition, which shows higher efficiency of 23.5% compared to 20.9% for a device fabricated with chlorobenzene. This work provides a universal strategy to control perovskite crystallization using coordination chemistry, heralding the revival of perovskite compositions with pure DMSO. KW - Perovskite solar cells KW - nucleation KW - dimethyl sulfide ()DMS) solvent KW - coordination chemistry Y1 - 2023 U6 - https://doi.org/10.1002/adma.202302889 SN - 0935-9648 SN - 1521-4095 VL - 35 IS - 39 ER - TY - GEN A1 - Zia, Waqas A1 - Malekshahi Byranvand, Mahdi A1 - Rudolph, Toby A1 - Rai, Monika A1 - Kot, Małgorzata A1 - Das, Chittaranjan A1 - Kedia, Mayank A1 - Zohdi, Mohammadreza A1 - Zuo, Weiwei A1 - Yeddu, Vishal A1 - Saidaminov, Makhsud I. A1 - Flege, Jan Ingo A1 - Kirchartz, Thomas A1 - Saliba, Michael T1 - MAPbCl3 Light Absorber for Highest Voltage Perovskite Solar Cells T2 - ACS Energy Letters N2 - Perovskite solar cells (PSCs) excel in achieving high open-circuit voltages (VOC) for narrow bandgaps (∼1.6 eV) but face challenges with wide-bandgap perovskites, like methylammonium lead trichloride (MAPbCl3) with a 3.03 eV bandgap. These materials are transparent in visible absorbing ultraviolet (UV) light. However, achieving uniform film crystallization remains a hurdle. Here, we enhance MAPbCl3 crystallization by manipulating annealing atmospheres (nitrogen, air, and MACl vapor). Excess MACl vapor improves surface coverage, which is crucial for film stability. We demonstrate that the microstructure of the perovskite film, including surface morphology, grain boundaries, and interfaces, can affect the photovoltaic properties. The subsequently obtained VOC of 1.78 V is the highest recorded for single-junction PSCs to the best of our knowledge. Surprisingly, the conventional hole-transport layer spiro-OMeTAD, optimized for narrow bandgaps, sustains such high voltages. Photoluminescence measurements reveal a trap-assisted recombination peak at 1.65 eV, indicating deep traps as significant to voltage loss in MAPbCl3. KW - Perovskite solar cells KW - methylammonium lead trichloride (MAPbCl3) KW - uniform film crystallization KW - manipulation of annealing atmospheres KW - trap-assisted recombination KW - microstructure Y1 - 2024 U6 - https://doi.org/10.1021/acsenergylett.3c02777 SN - 2380-8195 VL - 9 SP - 1017 EP - 1024 ER - TY - GEN A1 - Gawlińska-Nęcek, Katarzyna A1 - Kot, Małgorzata A1 - Starowicz, Zbigniew A1 - Jarzębska, Anna A1 - Panek, Piotr A1 - Flege, Jan Ingo T1 - Instability of Formamidinium Lead Iodide (FAPI) Deposited on a Copper Oxide Hole Transporting Layer (HTL) T2 - ACS Applied Materials & Interfaces N2 - Copper oxide appears to be a promising candidate for a hole transport layer (HTL) in emerging perovskite solar cells. Reasons for this are its good optical and electrical properties, cost-effectiveness, and high stability. However, is this really the case? In this study, we demonstrate that copper oxide, synthesized by a spray-coating method, is unstable in contact with formamidinium lead triiodide (FAPI) perovskite, leading to its decomposition. Using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and ultraviolet–visible (UV–vis) spectrophotometry, we find that the entire copper oxide diffuses into and reacts with the FAPI film completely. The reaction products are an inactive yellow δ-FAPI phase, copper iodide (CuI), and an additional new phase of copper formate hydroxide (CH2CuO3) that has not been reported previously in the literature. KW - formamidinium lead iodide KW - perovskites KW - instability KW - Cu2O KW - hole transporting layer KW - phase transition Y1 - 2024 U6 - https://doi.org/10.1021/acsami.4c03440 SN - 1944-8244 VL - 16 IS - 21 SP - 27936 EP - 27943 PB - American Chemical Society (ACS) ER - TY - GEN A1 - Mahmoodinezhad, Ali A1 - Morales, Carlos A1 - Naumann, Franziska A1 - Plate, Paul A1 - Meyer, Robert A1 - Janowitz, Christoph A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Zöllner, Marvin Hartwig A1 - Wenger, Christian A1 - Flege, Jan Ingo T1 - Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma T2 - Journal of Vacuum Science and Technology A N2 - Indium oxide (InxOy) thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium and oxygen plasma in a low-temperature range of 80–200 °C. The optical properties, chemical composition, crystallographic structure, and electrical characteristics of these layers were investigated by spectroscopic ellipsometry (SE), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), as well as current-voltage and capacitance-voltage measurements. The SE results yielded a nearly constant growth rate of 0.56 Å per cycle and a thickness inhomogeneity of ≤1.2% across 4-in. substrates in the temperature range of 100–150 °C. The refractive index (at 632.8 nm) was found to be 2.07 for the films deposited at 150 °C. The PEALD-InxOy layers exhibit a direct (3.3 ± 0.2 eV) and an indirect (2.8 ± 0.1 eV) bandgap with an uptrend for both with increasing substrate temperature. Based on XPS characterization, all InxOy samples are free of carbon impurities and show a temperature-dependent off-stoichiometry indicating oxygen vacancies. XRD diffraction patterns demonstrate an onset of crystallization at 150 °C. Consistent with the optical, XPS, and XRD data, the films deposited at ≥150 °C possess higher electrical conductivity. Our findings prove that a low-temperature PEALD process of InxOy is feasible and promising for a high-quality thin-film deposition without chemical impurities on thermally fragile substrates. KW - Indium oxide KW - Plasma-enhanced atomic layer deposition KW - X-ray photoelectron spectroscopy KW - Ellipsometry KW - X-ray diffraction KW - Electrical properties Y1 - 2021 U6 - https://doi.org/10.1116/6.0001375 SN - 0734-2101 SN - 1520-8559 VL - 39 IS - 6 ER - TY - GEN A1 - Janowitz, Christoph A1 - Mahmoodinezhad, Ali A1 - Kot, Małgorzata A1 - Morales, Carlos A1 - Naumann, Franziska A1 - Plate, Paul A1 - Zöllner, Marvin Hartwig A1 - Bärwolf, Florian A1 - Stolarek, David A1 - Wenger, Christian A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - Toward controlling the Al2O3/ZnO interface properties by in situ ALD preparation T2 - Dalton Transactions N2 - An Al2O3/ZnO heterojunction was grown on a Si single crystal substrate by subsequent thermal and plasma-assisted atomic layer deposition (ALD) in situ. The band offsets of the heterointerface were then studied by consecutive removal of the layers by argon sputtering, followed by in situ X-ray photoelectron spectroscopy. The valence band maximum and conduction band minimum of Al2O3 are found to be 1.1 eV below and 2.3 eV above those of ZnO, resulting in a type-I staggered heterojunction. An apparent reduction of ZnO to elemental Zn in the interface region was detected in the Zn 2p core level and Zn L3MM Auger spectra. This suggests an interface formation different from previous models. The reduction of ZnO to Zn in the interface region accompanied by the creation of oxygen vacancies in ZnO results in an upward band bending at the interface. Therefore, this study suggests that interfacial properties such as the band bending as well as the valence and conduction band offsets should be in situ controllable to a certain extent by careful selection of the process parameters. KW - ALD heterojunction KW - band alignement KW - ZnO KW - Al2O3 KW - interface properties Y1 - 2022 U6 - https://doi.org/10.1039/D1DT04008A SN - 1477-9234 SN - 1477-9226 VL - 51 SP - 9291 EP - 9301 ER - TY - GEN A1 - Laroussi, Arwa A1 - Kot, Małgorzata A1 - Flege, Jan Ingo A1 - Raouafi, Noureddine A1 - Mirsky, Vladimir M. T1 - Self-Assembled Monolayers from Symmetrical Di-Thiols: Preparation, Characterization and Application for the Assembly of Electrochemically Active Films T2 - Engineering Proceedings N2 - 1,3-dimercaptopropan-2-ol, a symmetrical di-thiol, has been synthesized and applied as a new type of anchor molecule to prepare a self-assembled monolayer (SAM) on a gold surface. The formed monolayers were studied by cyclic voltammetry, impedance spectroscopy, X-ray photoelectron spectroscopy, kinetic capacitance, and contact angle measurements. The SAM structure depends on the adsorption conditions. A short incubation time of the electrode at high concentration of this di-thiol leads to the predominating binding through one thiol group of the adsorbate to the gold surface, while a long incubation at low concentration leads to the predominating binding by both thiol groups. A comparative study of the desorption and replacement of SAMs indicates a strong stability increase when the SAM molecules bond gold surfaces by two bonds mainly. This monolayer was used to immobilize electrochemically active p-benzoquinone moiety. The surface concentration of p-benzoquinone obtained from cyclic voltammetry is 2.5 ± 0.2 × 10−10 mol cm−2, which corresponds to the functionalization of 65 ± 5% of SAM molecules. The obtained highly stable SAM with redox-active terminal group can be applied for different tasks of chemical sensing and biosensing. As an example, an application of this system for electrocatalytical oxidation of dihydronicotinamide adenosine dinucleotide (NADH) was tested. KW - self-assembled monolayer KW - immobilization fashion KW - X-ray photoelectron spectroscopy KW - p-benzoquinone KW - electron transfer KW - cyclic voltammetry KW - NADH sensor Y1 - 2021 U6 - https://doi.org/10.3390/I3S2021Dresden-10112 SN - 2673-4591 N1 - Presented at the 8th International Symposium on Sensor Science, 17–28 May 2021 VL - 6 IS - 1 ER -