TY - CHAP A1 - Tallarida, Massimo A1 - Karavaev, Konstantin A1 - Kolanek, Krzysztof A1 - Schmeißer, Dieter T1 - In-situ experimental approach to the study of atomic layer deposition with atomic force microscope, X-ray photoelectron and X-ray absorption spectroscopy T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft ; Reihe 6, Bd. 44 N2 - We describe our experimental approach to the investigation of atomic layer deposition (ALD). ALD is a powerful deposition technique for growing conformal thin films of composite materials with atomically accurate thickness on large area [1]. Despite the enormous industrial interest growing around ALD, its fundamental properties were not yet properly studied. We developed an ALD reactor for the in-situ investigations using XPS, XAS and AFM as experimental techniques. We studied the chemical-physical properties of the growing thin films after each deposition cycle. Here, we illustrate the recent results concerning the ALD of HfO2 obtained using different Hf-precursors on various substrates [2]. We show how the in-situ investigations could deliver an important insight into the fundamental characteristics of ALD and how these information could be used to modify and optimize the deposition parameters. [1] M. Leskelä, M. Ritala, Thin Solid Films, 409, 138, 2002; [2] M. Tallarida, K. Karavaev, and D. Schmeisser, J. Appl. Phys. 104, 064116 (2008). Y1 - 2009 UR - http://www.dpg-verhandlungen.de/year/2009/conference/dresden/part/ds/session/26/contribution/15 SN - 0420-0195 SP - S.176 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -