TY - GEN A1 - Kirchheim, Dennis A1 - Wilski, Stefan A1 - Jaritz, Montgomery A1 - Mitschker, Felix A1 - Oberberg, Moritz A1 - Trieschmann, Jan A1 - Banko, Lars A1 - Brochhagen, Markus A1 - Schreckenberg, Rabea A1 - Hopmann, Christian A1 - Böke, Marc A1 - Benedikt, Jan A1 - Arcos, Teresa de los A1 - Grundmeier, Guido A1 - Grochla, Dario A1 - Ludwig, Alfred A1 - Mussenbrock, Thomas A1 - Brinkmann, Ralf Peter A1 - Awakowicz, Peter A1 - Dahlmann, Rainer T1 - Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD T2 - Journal of Coatings Technology and Research Y1 - 2018 U6 - https://doi.org/10.1007/s11998-018-0138-4 SN - 1547-0091 SN - 1935-3804 VL - 16 IS - 2 SP - 573 EP - 583 ER - TY - GEN A1 - Trieschmann, Jan A1 - Schmidt, Frederik A1 - Mussenbrock, Thomas T1 - Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges T2 - Plasma Processes and Polymers Y1 - 2017 U6 - https://doi.org/10.1002/ppap.201600140 SN - 1612-8869 VL - 14 IS - 1-2 SP - 1600140 ER - TY - GEN A1 - Trieschmann, Jan A1 - Mussenbrock, Thomas T1 - Kinetic Analysis of Negative Power Deposition in Low Pressure Plasmas T2 - Plasma Sources Science and Technolgy Y1 - 2017 U6 - https://doi.org/10.1088/1361-6595/aa51f2 SN - 1361-6595 SN - 0963-0252 VL - 26 IS - 2 SP - 024004 ER - TY - GEN A1 - Eremin, Denis A1 - Bienholz, Stefan A1 - Szeremley, Daniel A1 - Trieschmann, Jan A1 - Ries, Stefan A1 - Awakowicz, Peter A1 - Mussenbrock, Thomas A1 - Brinkmann, Ralf Peter T1 - On the Physics of a Large CCP Discharge T2 - Plasma Sources Science and Technology Y1 - 2016 U6 - https://doi.org/10.1088/0963-0252/25/2/025020 SN - 1361-6595 SN - 0963-0252 VL - 25 IS - 2 SP - 025020 ER - TY - GEN A1 - Dirkmann, Sven A1 - Ziegler, Martin A1 - Hansen, Mirko A1 - Kohlstedt, Hermann A1 - Trieschmann, Jan A1 - Mussenbrock, Thomas T1 - Kinetic Simulation of Filament Growth Dynamics in Memristive Electrochemical Metallization Devices T2 - Journal of Applied Physics Y1 - 2015 U6 - https://doi.org/10.1063/1.4936107 SN - 1089-7550 SN - 0021-8979 VL - 118 IS - 21 SP - 214501 ER - TY - GEN A1 - Trieschmann, Jan A1 - Mussenbrock, Thomas T1 - Transport of Sputtered Particles in Capacitive Sputter Sources T2 - Journal of Applied Physics Y1 - 2015 U6 - https://doi.org/10.1063/1.4926878 SN - 1089-7550 SN - 0021-8979 VL - 118 IS - 3 SP - 033302 ER - TY - GEN A1 - Gallian, Sara A1 - Trieschmann, Jan A1 - Mussenbrock, Thomas A1 - Brinkmann, Ralf Peter A1 - Hitchon, William N. G. T1 - Analytic model of the Energy Distribution Function for Highly Energetic Electrons in Technological Plasmas T2 - Journal of Applied Physics Y1 - 2015 U6 - https://doi.org/10.1063/1.4905943 SN - 1089-7550 SN - 0021-8979 VL - 117 IS - 2 SP - 023305 ER - TY - CHAP A1 - Wilczek, Sebastian A1 - Trieschmann, Jan A1 - Schulze, Julian A1 - Schüngel, Edmund A1 - Brinkmann, Ralf Peter A1 - Derzsi, Aranka A1 - Korolov, Ihor A1 - Donkó, Zoltán A1 - Mussenbrock, Thomas T1 - Confinement of highly energetic electron beams in low pressure capacitive discharges T2 - Plasma Sciences (ICOPS), 2015 IEEE International Conference on, May 24-28, 2015, Antalya, Turkey Y1 - 2015 SN - 978-1-4799-6974-6 U6 - https://doi.org/10.1109/PLASMA.2015.7179545 PB - IEEE CY - Piscataway, NJ ER - TY - CHAP A1 - Wilczek, Sebastian A1 - Trieschmann, Jan A1 - Brinkmann, Ralf Peter A1 - Mussenbrock, Thomas A1 - Schulze, Julian A1 - Schüngel, Edmund A1 - Derzsi, Aranka A1 - Korolov, Ihor A1 - Hartmann, Paul A1 - Donkó, Zoltán T1 - Hysteresis effects and confinement of beam electrons in capacitive discharges T2 - 2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada, June 19-23, 2016 Y1 - 2016 SN - 978-1-4673-9601-1 U6 - https://doi.org/10.1109/PLASMA.2016.7534342 PB - IEEE CY - Piscataway, NJ ER - TY - GEN A1 - Daksha, Manaswi A1 - Derzsi, Aranka A1 - Wilczek, Sebastian A1 - Trieschmann, Jan A1 - Mussenbrock, Thomas A1 - Awakowicz, Peter A1 - Donkó, Zoltán A1 - Schulze, Julian T1 - The Effect of Realistic Heavy Particle Induced Secondary Electron Emission Coefficients on the Electron Power Absorption Dynamics in Single- and Dual-Frequency CCPs T2 - Plasma Sources Science and Technology Y1 - 2017 U6 - https://doi.org/10.1088/1361-6595/aa7c88 SN - 1361-6595 SN - 0963-0252 VL - 26 IS - 8 SP - 085006 ER -