TY - JOUR A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter A1 - Klein, A. A1 - Jaegermann, Wolfram A1 - Pettenkofer, Christian A1 - Follath, Rolf T1 - Spectro-Microscopy with PEEM / µESCA Y1 - 2000 ER - TY - GEN A1 - Batchelor, David R. A1 - Schmeißer, Dieter A1 - Follath, Rolf T1 - The BTU Cottbus Beamline at BESSY II Y1 - 1999 ER - TY - JOUR A1 - Batchelor, David R. A1 - Follath, Rolf A1 - Schmeißer, Dieter T1 - The optical design of a PGM for the Undulator U49/2 at BESSY II Y1 - 1998 ER - TY - JOUR A1 - Batchelor, David R. A1 - Follath, Rolf A1 - Mikalo, Ricardo Pablo A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter T1 - Commissioning Results of the BTUC-PGM beamline Y1 - 2001 ER - TY - CHAP A1 - Batchelor, David R. A1 - Follath, Rolf A1 - Schmeißer, Dieter T1 - Design of a PGM for the U49/2 Undulator at BESSY II T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - This poster describes the beamline proposed for the BESSY II U49/2 Undulator by the Collaborating Research Group of BTU Cottbus, HMI Berlin and the TU Darmstadt. The beamline is designed with both high resolution electron spectroscopy, valence band measurements and PEEM in mind and utilises the wide energy range of the U49 Undulator 40−1500eV. The design chosen is based on a Petersen PGM [1] but with the grating illuminated with parallel light [2]. This modification allows variation of the monochromator higher order content or resolution, spot size without changing the focus. The performance of the beamline was investigated using various programs available at BESSY. The Undulator character- istics were evaluated using both SMUT and WAVE, and the optical performance of the monochromator was checked using REFLEC and RAY. The calculations show a resolving power of 2×104 with a flux of the order 1013 photons s−1 over the energy range covered by the mono- chromator. The maximum nominal second order contributions are ≈ 2% at 300 eV for the first Undulator harmonic and ≈ 9% for the third harmonic at 500 eV, both of which can be reduced by increasing the grating incidence angle and, or decreasing the Undulator Pinhole size. KW - Bessy II KW - undulator beamline U49/2 KW - design Y1 - 1999 UR - http://www.dpg-verhandlungen.de/year/1999/conference/muenster/part/o/session/36/contribution/81?lang=en PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - CHAP A1 - Lips, Klaus A1 - Schulze, Tim F. A1 - Starr, David E. A1 - Bär, Marcus A1 - Wilks, Regan G. A1 - Fenske, F. A1 - Ruske, Florian A1 - Reiche, Martin A1 - Krol, Roel van de A1 - Reichardt, Gerd A1 - Schäfers, Franz A1 - Hendel, Stefan A1 - Follath, Rolf A1 - Bahrdt, Johannes A1 - Peredkov, Sergey A1 - DeBeer, Serena A1 - Hävecker, Michael A1 - Knop-Gericke, Axel A1 - Rau, Björn A1 - Kaufmann, Christian A1 - Schlatmann, Rutger A1 - Schlögl, Robert A1 - Rech, Bernd A1 - Raoux, Simone T1 - EMIL: The Energy Materials In-situ Laboratory Berlin – A novel characterization facility for photovoltaic and energy materials T2 - 31st European Photovoltaic Solar Energy Conference and Exhibition, proceedings of the international conference held in Hamburg, Germany, 14 -18 September 2015 Y1 - 2015 SN - 3-936338-39-6 U6 - https://doi.org/10.4229/EUPVSEC20152015-1AO.2.1 SP - 25 EP - 28 PB - WIP CY - München ER - TY - CHAP A1 - Lips, Klaus A1 - Starr, David E. A1 - Bär, Marcus A1 - Schulze, Tim F. A1 - Fenske, F. A1 - Christiansen, Silke A1 - Krol, Roel van de A1 - Raoux, Simone A1 - Reichardt, Gerd A1 - Schäfers, Franz A1 - Hendel, Stefan A1 - Follath, Rolf A1 - Bahrdt, Johannes A1 - Scheer, M. A1 - Wüstefeld, Godehard A1 - Kuske, P. A1 - Hävecker, Michael A1 - Knop-Gericke, Axel A1 - Schlögl, Robert A1 - Rech, Bernd T1 - EMIL: The Energy Materials In Situ Laboratory Berlin T2 - 40th Photovoltaic Specialists Conference (PVSC), 2014 : Colorado Convention Center, Denver, Colorado, 8-13 June 2014 Y1 - 2014 SN - 978-1-4799-4398-2 U6 - https://doi.org/10.1109/PVSC.2014.6925017 SP - 698 EP - 700 PB - IEEE CY - Piscataway, NJ ER -