TY - GEN A1 - Kot, Małgorzata A1 - Kedia, Mayank A1 - Plate, Paul A1 - Marth, Ludwig A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - Application of plasma enhanced atomic layer deposition process of alumina on perovskite film boosts efficiency of solar cells T2 - Verhandlungen der DPG N2 - It is assumed that plasma-enhanced atomic layer deposition (PEALD) cannot be used to prepare thin films on sensitive organic-inorganic perovskites because the plasma destroys the perovskite film and thus deteriorates its photophysical properties. Here, we prove that using an appropriate geometry of the ALD system (SENTECH SI PEALD system) and suitable process parameters it is possible to coat perovskites with alumina by PEALD. Spectromicroscopy followed by electrical characterisation reveal that as long as the PEALD process is not optimized (too long plasma pulses) one gets degradation of the perovskite as well as dissociation of the created iodine pentoxide (during PEALD) under light that causes a valence band maximum (VBM) shift to the Fermi level and thus significantly decreases the solar cell efficiency. However, once the PEALD process parameters are optimized, no VBM shift is observed. Moreover, the solar cell efficiency depends inversely on process temperature and layer thickness. KW - Plamsa-enhanced atomic layer deposition KW - Perovskite solar cells KW - Valence band maximum Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/hl/session/4/contribution/2 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Mahmoodinezhad, Ali A1 - Morales, Carlos A1 - Kot, Małgorzata A1 - Naumann, Franziska A1 - Plate, Paul A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - A super-cycle approach to atomic layer deposition of indium-gallium-zinc oxide at low temperature T2 - Verhandlungen der DPG N2 - The continuing development of multifunctional devices needs novel multicomponent oxide layers, demanding a high control of both composition and thickness during their preparation. To this end, single metal oxides exhibiting high structural quality and conformity have successfully been grown by atomic layer deposition (ALD). However, the deposition of more complex compounds with specific optical and electrical properties is still challenging. In this work, we follow a bottom-up approach to design an ALD super-cycle to grow mixed indium-gallium-zinc oxide (IGZO) films with a controllable composition. For the formation of the individual indium, gallium, and zinc oxides, we found the use of plasma-enhanced ALD (PEALD) at 150 °C to be favorable when using the organometallic precursors trimethylindium, trimethylgallium, and diethylzinc together with oxygen plasma. The PEALD approach of IGZO films can particularly overcome a nucleation delay within the ZnO sub-cycle known from thermal ALD, achieving a higher growth per cycle and improving the quality and composition homogeneity of the films as shown by in-situ spectroscopic ellipsometry and ex-situ X-ray photoelectron spectroscopy. KW - Indium gallium zinc oxide KW - Transparent conducting oxide KW - Plasma-enhanced atomic layer deposition KW - X-ray photoelectron spectroscopy KW - spectroscopic ellipsometry KW - nucleation delay Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/40/contribution/3 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Morales, Carlos A1 - Kosto, Yuliia A1 - Tschammer, Rudi A1 - Henkel, Karsten A1 - Flege, Jan Ingo T1 - Reduction by H2 exposure at room temperature of ceria ultrathin films grown by atomic layer deposition T2 - Verhandlungen der DPG N2 - Atomic layer deposition (ALD) exhibits a high potential for integration as a scalable process in microelectronics, allowing well-controlled layer-by-layer deposition and conformal growth on 3D structures. Yet, the ALD technique is also well known to lead to amorphous and defective, non-stoichiometric films, potentially resulting in modified materials properties that, in the case of ultra-thin deposits, can also be affected by film/substrate interaction. Interestingly, initial in situ X-ray photoemission spectroscopy (XPS) measurements of ceria ALD-deposits on Al2O3/Si, sapphire, and SiO2 substrates confirm a Ce3+/Ce4+ mixture dependent on the substrate interaction, deposit thickness, and morphology. Using near-ambient pressure XPS, we have significantly reduced ultrathin (< 10 nm) ceria films grown by ALD by exposing them to different O2/H2 partial pressures at moderate temperatures (< 525K). Notably, the total amount of reduction to Ce3+ is found to depend on the deposit thickness and initial ceria/substrate interaction. Furthermore, the intrinsic defects related to the ALD method seem to play a critical role in the reversible reduction at room temperature. KW - Cerium oxide KW - atomic layer deposition KW - near-ambient pressure X-ray photoemission spectroscopy (NAPXPS) KW - hydrogen detection Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/92/contribution/6 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Schewe, Lukas A1 - Sulaiman, Cathy A1 - Buß, Lars A1 - Ewert, Moritz A1 - Flege, Jan Ingo T1 - In-situ photoemission electron microscopy investigation of mono- and bilayer graphene growth on Ru(10-10) T2 - Verhandlungen der DPG N2 - Epitaxial graphene growth has often been studied on close-packed transition metal substrates, e. g., the Ru(0001) surface, which is a well-studied model system for strong graphene-support interaction. Here, we focus on a Ru surface with different symmetry, i. e., the Ru(10-10) surface, to investigate the influence of the presumably modified graphene-substrate interaction on the growth of epitaxial monolayer and bilayer graphene (MLG, BLG) islands. The structural and chemical differences of the graphene on the two different surfaces are investigated by photoemission electron microscopy (PEEM), delivering information on both morphology and electronic structure. In-situ PEEM observation of graphene growth on the Ru(10-10) substrate by ethylene decomposition reveals the growth characteristics of MLG and BLG, the latter showing second layer nucleation via surface segregation of carbon. Furthermore, depending on growth temperature and relative orientation of the growing islands and surface steps, different growth characteristics are observed, in contrast to previous studies of the graphene/Ru(0001) system whereas similar electronic properties seem to prevail. Yet, when the MLG is decoupled from the Ru(10-10) substrate via intercalation of oxygen a distinct shift in work function is identified, slightly different from the resulting shift on Ru(0001). KW - photoemission electron microscopy (PEEM) KW - graphene KW - ruthenium KW - growth characteristics Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/93/contribution/7 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Sulaiman, Cathy A1 - Schewe, Lukas A1 - Buß, Lars A1 - Ewert, Moritz A1 - Flege, Jan Ingo T1 - In-situ monolayer graphene growth on Ru(10-10): an electron microscopy study T2 - Verhandlungen der DPG N2 - During the last decade, the controlled growth of monolayer (MLG) and bilayer graphene has extensively been studied on the hexagonal Ru(0001) surface, which is a system that is known to form strong chemical bonds at the metal-graphene interface. Yet, little attention was paid to the influence of the substrate orientation that was demonstrated to have a significant impact for graphene growth on the Ir(001) and Ir(111) surfaces, the latter exhibiting a weak coupling between the graphene and the support. Therefore, in this study we have grown graphene on the rectangular Ru(10-10) surface by segregation and ethylene-supported chemical vapor deposition. A photoemission and low-energy electron microscope (PEEM & LEEM) has been utilized to directly characterize the MLG growth process with respect to variations in substrate temperature and step orientation. The expansion of the MLG islands is compared to the well-established carpet-growth mode on the Ru(0001) surface. These results have been complemented by probing of the occupied and unoccupied electronic structure of the islands using PEEM and intensity-voltage LEEM. Furthermore, the existence of two preferential surface reconstructions is identified via micro-illumination low-energy electron diffraction (LEED), whose spatial distribution is revealed by employing dark-field LEEM imaging. KW - photoemission electron microscopy (PEEM) KW - graphene KW - ruthenium KW - low-energy electron microscopy (LEEM) KW - low-energy electron diffraction (LEED) Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/64/contribution/8 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Tschammer, Rudi A1 - Buß, Lars A1 - Morales, Carlos A1 - Senanayake, Sanjaya D. A1 - Falta, Jens A1 - Flege, Jan Ingo T1 - In situ characterization of cerium oxide on Au(111) under reducing and oxidizing conditions by low-energy electron microscopy T2 - Verhandlungen der DPG N2 - The development of novel catalysts for a variety of applications is a key challenge for modern catalysis. Inverse metal oxide catalysts consisting of oxide nanoparticles dispersed on a metal support have recently attracted much attention, showing higher activity and selectivity compared to traditional catalytic systems, harnessing synergistic effects attributed to the so-called metal-support interaction. To gain further insights, we deposited cerium oxide nanoparticles on Au(111) and studied this system by low-energy electron microscopy (LEEM) and low-energy electron diffraction (LEED). The prepared samples demonstrate a distinct correlation between the deposition temperature and the structural order of the nanoparticles. This has been expanded upon by exploring the changes induced by reduction with H2 and reoxidation with O2 or CO2, again exhibiting a connection between structural order and activity, while also showing the influence of the oxide-metal interaction on the stability of cerium oxide under reducing conditions. KW - low-energy electron microscopy KW - cerium oxide KW - reduction KW - reoxidation KW - low-energy electron diffraction (LEED) Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/78/contribution/9 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Abdeldayem, Mohamed A1 - Baki, Aykut A1 - Morales, Carlos A1 - Flege, Jan Ingo A1 - Klimm, Detlef A1 - Fiedler, Andreas A1 - Bierwagen, Oliver A1 - Schwarzkopf, Jutta T1 - Potential of La-doped SrTiO3 thin films grown by metal-organic vapor phase epitaxy for thermoelectric applications T2 - Verhandlungen der DPG N2 - Conversion of waste heat energy into electrical energy by exploiting the thermoelectric effect in solids promises a great contribution to energy harvesting concepts. However, most thermoelectric materials use toxic Pb or Te. Recently, La-doped SrTiO3 has gained a lot of interest as a potential candidate for thermoelectric devices for its good thermoelectric properties, chemical and thermal stability. In this paper, we report the homoepitaxial growth of La-doped SrTiO3 thin films by metalorganic vapor phase epitaxy (MOVPE) technique, which works at high oxygen partial pressures and offers upscaling potential for industry. The adjustment of charge carrier concentration, necessary for thermoelectric power factor optimization, was performed by introducing a defined amount of the metal-organic precursor La(tmhd)3 and tetraglyme to the liquid precursor solution. X-ray diffraction and atomic force microscopy verified a pure perovskite phase with high structural quality. The electrical conductivity increases linearly with the La concentration in the gas phase, which is attributed to the substitution of La+3 ions on the Sr+2 sites inferred from photoemission spectroscopy. KW - thermoelectric KW - metalorganic vapor phase epitaxy (MOVPE) KW - X-ray diffraction (XRD) KW - atomic force microscopy (AFM) KW - X-ray photoemission spectroscopy (XPS) Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/ds/session/12/contribution/50 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Angrick, Christoph A1 - Thiede, Christian A1 - Reimann, Andre A1 - Henriksen, Annika A1 - Mutzke, Nicole A1 - Ewert, Moritz A1 - Buß, Lars A1 - Falta, Jens A1 - Flege, Jan Ingo A1 - Donath, Markus T1 - Spin-polarized very-low-energy electron diffraction from spin-orbit- and/or exchange-influenced targets T2 - Verhandlungen der DPG N2 - Exchange (XC) or spin-orbit (SOC) interaction cause electron scattering from surfaces to be spin dependent. The resulting spin filtering of the scattered electron beam can be used in spin-polarization analyzers. These analyzers are implemented in, for instance, photoemission setups to obtain spin resolution. Therefore, for promising targets, electron reflectivity and resulting spin asymmetry of very-low-energy electrons are measured for a wide range of incident electron energies and angles. By this, the investigated target is put to a test regarding the usability as a scattering target in a spin-polarization analyzer. Here, several results of SOC- as well as XC-influenced targets are presented. The results of the SOC-influenced targets Au(111), single-layer MoS2/Au(111) and W(110) [1] are compared with the results of the XC-influenced target Fe(001)-p(1x1)O [2]. Additionally, the influence of SOC interaction in the case of the XC-influenced target is investigated. The spin asymmetry caused by SOC is found to be one order of magnitude smaller than the spin asymmetry caused by XC. [1] Angrick et al., J. Phys.: Condens. Matter 33, 115001 (2020). [2] Thiede et al., Phys. Rev. Applied 1, 054003 (2014). KW - spin-polarization analysis KW - very-low-energy electron diffraction Y1 - 2023 UR - https://www.dpg-verhandlungen.de/year/2023/conference/skm/part/o/session/67/contribution/8 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Sulaiman, Cathy A1 - Buß, Lars A1 - Sánchez-Barquilla, Raquel A1 - Falta, Jens A1 - Flege, Jan Ingo T1 - In-situ growth and characterization of 2D TaSe2 on Au(111) T2 - Verhandlungen der DPG, Regensburg 2025 N2 - Group V dichalcogenides such as TaX2 (X = S, Se, T) have extensively been investigated in recent decades due to their diverse electron correlation effects, including the occurrence of charge density waves and Mott-Hubbard transitions. In 2D, two polytypes, 1T and 1H, exist, which exhibit distinct properties, making selective growth of each polytype crucial. Using low-energy electron microscopy (LEEM), we have successfully observed the growth of two TaSe2 phases on Au(111) in situ after the co-deposition of Ta and Se. At elevated temperature, micron-sized, triangle-shaped islands with bright contrast nucleate first and grow at a higher rate. However, this phase turns out to be meta-stable as it suddenly transitions into a more stable phase (with dark contrast) and continues to grow at a reduced rate. Low-energy electron diffraction shows the presence of TaSe2; bandstructure-sensitive I(V)-LEEM analysis reveals substantial differences in electron reflectivity between both phases. A comparison with TaS2 suggests that the metastable and stable phases are 1T- and 1H-TaSe2, respectively. KW - TMDC KW - LEEM KW - LEED Y1 - 2025 UR - https://www.dpg-verhandlungen.de/year/2025/conference/regensburg/part/o/session/14/contribution/11 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -