TY - GEN A1 - Weißhaupt, David A1 - Funk, Hannes S. A1 - Sürgers, Christoph A1 - Fischer, Gerda A1 - Oehme, Michael A1 - Schwarz, Daniel A1 - Fischer, Inga Anita A1 - Slageren, Joris van A1 - Schulze, Jörg T1 - Formation of Mn5Ge3 on a Recess-Etched Ge (111) Quantum-Well Structure for Semiconductor Spintronics T2 - 44th International Convention on Information, Communication and Electronic Technology, MIPRO 2021, Opatija, Croatia, September 27 - Oct. 1, 2021 Y1 - 2021 SN - 978-1-6654-4761-4 U6 - https://doi.org/10.23919/MIPRO52101.2021.9596924. SN - 978-953-233-101-1 SP - 45 EP - 49 PB - Piscataway CY - IEEE ER - TY - GEN A1 - Nitsch, Paul-G. A1 - Ratzke, Markus A1 - Pozarowska, Emilia A1 - Flege, Jan Ingo A1 - Alvarado Chavarin, Carlos A1 - Wenger, Christian A1 - Fischer, Inga Anita T1 - Deposition of reduced ceria thin films by reactive magnetron sputtering for the development of a resistive gas sensor T2 - Verhandlungen der DPG, Berlin 2024 N2 - The use of cerium oxide for hydrogen sensing is limited by the low electrical conductivity of layers deposited from a ceria target. To increase the electrical conductivity, partially reduced cerium oxide layers were obtained from a metallic cerium target by reactive magnetron sputtering. The proportions of the oxidation states Ce3+, present in reduced species, and Ce4+, present in fully oxidized species, were determined by ex-situ XPS. For electrical characterization, films were deposited on planarized tungsten finger electrodes. IV curves were measured over several days to investigate possible influences of oxygen and humidity on electrical conductivity. The morphological stability of the layers under ambient conditions was investigated by microscopical methods. The XPS results show a significant amount of Ce3+ in the layers. The electrical conductivity of as-grown samples is several orders of magnitude higher than that of samples grown from a ceria target. However, the conductivity decreases over time, indicating an oxidation of the layers. The surface morphology of the samples was found to be changing drastically within days, leading to partial delamination. KW - ceria KW - metalic cerium target KW - electrical conductivity KW - X-ray photoelectron spectroscopy (XPS) KW - oxidation states KW - morphology Y1 - 2024 UR - https://www.dpg-verhandlungen.de/year/2024/conference/berlin/part/ds/session/11/contribution/18 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Berkmann, Fritz A1 - Augel, Lion A1 - Hack, Michael A1 - Kawaguchi, Yuma A1 - Weißhaupt, David A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - Optimization of fully integrated Al nanohole array-based refractive index sensors for use with a LED light source Fritz Berkmann T2 - IEEE Photonics Journal KW - Sensors KW - Refractive index KW - Optical variables control KW - Optical refraction KW - Optical device fabrication KW - Germanium KW - Solid modeling Y1 - 2022 UR - https://ieeexplore.ieee.org/document/9781306 U6 - https://doi.org/10.1109/JPHOT.2022.3177354 SN - 1943-0655 VL - 14 IS - 3 SP - 1 EP - 8 ER - TY - GEN A1 - Steuer, Oliver A1 - Schwarz, Daniel A1 - Oehme, Michael A1 - Schulze, J. A1 - Maczko, H. A1 - Kudrawiec, Robert A1 - Fischer, Inga Anita A1 - Heller, R. A1 - Hübner, R. A1 - Khan, M. M. A1 - Georgiev, Yordan M. A1 - Zhou, Shengqiang A1 - Helm, M. A1 - Prucnal, Slawomir T1 - Band-gap and strain engineering in GeSn alloys using post-growth pulsed laser melting T2 - Journal of Physics: Condensed Matter Y1 - 2022 U6 - https://doi.org/10.1088/1361-648X/aca3ea SN - 1361-648X VL - 35 IS - 5 ER - TY - GEN A1 - Xie, Yufang A1 - Birowska, Magdalena A1 - Funk, Hannes S. A1 - Fischer, Inga Anita A1 - Schwarz, Daniel A1 - Schulze, Jörg A1 - Zeng, Yu-Jia A1 - Helm, Manfred A1 - Zhou, Shengqiang A1 - Prucnal, Slawomir T1 - Tuning of Curie temperature in Mn5Ge3 films T2 - Journal of Applied Physics Y1 - 2022 U6 - https://doi.org/10.1063/5.0066717 SN - 1089-7550 VL - 131 SP - 105102-1 EP - 105102-8 ER - TY - GEN A1 - Wendav, Torsten A1 - Fischer, Inga Anita A1 - Virgilio, Michele A1 - Capellini, Giovanni A1 - Oliveira, F. A1 - Cerqueira, M. F. A1 - Benedetti, A. A1 - Chiussi, Stefano A1 - Zaumseil, Peter A1 - Schwartz, Bernhard A1 - Busch, Kurt A1 - Schulze, J. T1 - Photoluminescence from ultrathin Ge-rich multiple quantum wells observed up to room temperature: Experiments and modeling T2 - Physical Review B 94 Y1 - 2016 U6 - https://doi.org/10.1103/PhysRevB.94.245304 VL - 94 IS - 24 SP - 245304 ER - TY - GEN A1 - Fischer, Inga Anita A1 - Augel, Lion A1 - Berkmann, Fritz A1 - Kawaguchi, Yuma A1 - Schlipf, Jon A1 - Schulze, Jörg T1 - Plasmonics-Integrated Ge PIN-Photodetectors T2 - ECS Transactions Y1 - 2019 U6 - https://doi.org/10.1149/09301.0041ecst SN - 1938-5862 SN - 1938-6737 VL - 93 IS - 1 SP - 41 EP - 44 ER - TY - GEN A1 - Augel, Lion A1 - Schlipf, Jon A1 - Bullert, Sergej A1 - Bürzele, Sebastian A1 - Schulze, Jörg A1 - Fischer, Inga Anita T1 - Photonic-plasmonic mode coupling in nanopillar Ge-on-Si PIN photodiodes T2 - Scientific Reports N2 - Incorporating group IV photonic nanostructures within active top-illuminated photonic devices often requires light-transmissive contact schemes. In this context, plasmonic nanoapertures in metallic films can not only be realized using CMOS compatible metals and processes, they can also serve to influence the wavelength-dependent device responsivities. Here, we investigate crescent-shaped nanoapertures in close proximity to Ge-on-Si PIN nanopillar photodetectors both in simulation and experiment. In our geometries, the absorption within the devices is mainly shaped by the absorption characteristics of the vertical semiconductor nanopillar structures (leaky waveguide modes). The plasmonic resonances can be used to influence how incident light couples into the leaky modes within the nanopillars. Our results can serve as a starting point to selectively tune our device geometries for applications in spectroscopy or refractive index sensing. Y1 - 2021 U6 - https://doi.org/10.1038/s41598-021-85012-z SN - 2045-2322 IS - 11 ER - TY - GEN A1 - Elogail, Yasmine A1 - Berkmann, Fritz A1 - Clausen, Caterina J. A1 - Fischer, Inga Anita A1 - Hänel, Linda A. A1 - Schwarz, Daniel A1 - Schulze, Jörg T1 - Investigation of Ge-Based P-Channel Planar-Doped Barrier FETs integrated on Si T2 - Microelectronics Journal Y1 - 2022 U6 - https://doi.org/10.1016/j.mejo.2022.105404 SN - 1879-2391 VL - 123 ER - TY - GEN A1 - Fischer, Inga Anita A1 - Brehm, Moritz A1 - De Seta, Monica A1 - Isella, Giovanni A1 - Paul, Douglas J. A1 - Virgilio, Michele A1 - Capellini, Giovanni T1 - On-chip infrared photonics with Si-Ge-heterostructures: What is next? T2 - APL Photonics N2 - The integration of Ge on Si for photonics applications has reached a high level of maturity: Ge photodetectors are available on the Si platform in foundry processes, and Si/Ge heterostructure multiple quantum-well photodiodes are rapidly progressing toward applications in light modulation. These successes result from decades of development of high-quality material growth and integration, which, more recently, has sparked an increasingly broad field of photonic device research based on Si/Ge heterostructures that extends from quantum cascade lasers to sensors. Here, we highlight selected recent structure and device developments as well as possible future trends that are enabled by the maturity of the SiGe material platform KW - Heterostructures KW - Photodetectors KW - Photonics KW - Nanowires KW - Plasmonics KW - Epitaxy KW - Quantum wells KW - Lasers KW - Sensors KW - Electronic band structure Y1 - 2022 UR - https://aip.scitation.org/doi/10.1063/5.0078608 U6 - https://doi.org/10.1063/5.0078608 SN - 2378-0967 VL - 7 IS - 5 SP - 050901-1 EP - 050901-20 ER - TY - GEN A1 - Funk, Hannes S. A1 - Kern, Michael A1 - Weißhaupt, David A1 - Sürgers, Christoph A1 - Fischer, Inga Anita A1 - Oehme, Michael A1 - Slageren, Joris van A1 - Schulze, Jörg T1 - Composition and magnetic properties of thin films grown by interdiffusion of Mn and Sn-Rich, Ge lattice matched SixGe1-x-ySny layers T2 - Journal of Magnetism and Magnetic Materials Y1 - 2022 U6 - https://doi.org/10.1016/j.jmmm.2021.168731. SN - 0304-8853 VL - 546 ER - TY - GEN A1 - Weißhaupt, David A1 - Funk, Hannes S. A1 - Oehme, Michael A1 - Bloos, Dominik A1 - Berkmann, Fritz A1 - Seidel, Lukas A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - High mobility Ge 2DHG based MODFETs for low-temperature applications T2 - Semiconductor Science and Technology Y1 - 2023 U6 - https://doi.org/10.1088/1361-6641/acb22f SN - 1361-6641 VL - 38 IS - 3 ER - TY - GEN A1 - Xie, Yufang A1 - Li, Zichao A1 - Begeza, Viktor A1 - Funk, Hannes S. A1 - Fischer, Inga Anita A1 - Zeng, Yu-Jia A1 - Helm, Manfred A1 - Zhou, Shengqiang A1 - Prucnal, Slawomir T1 - Influence of fabrication parameters on the magnetic and structural properties of Mn5Ge3 T2 - Semiconductor Science and Technology N2 - Mn5Ge3 is a ferromagnetic material with the high potential for spintronic applications. Usually, it is grown by conventional solid state reaction of manganese with germanium using molecular beam epitaxy. Here, we report the structural and magnetic properties of Mn5Ge3 layers grown on Ge substrates using ultrafast-solid phase epitaxy (SPE) method. We investigate the influence of the substrate orientation, Mn layer thickness and annealing parameters on the crystallographic orientation and magnetization of Mn5Ge3. It is shown that after millisecond range SPE, Mn5Ge3 films always have a preferred (100) orientation whether grown on Ge (001) or (111) substrates, which determines the orientation of the magnetization easy axis lying in the film plane along c axis independent of the layer thickness. The Curie temperature of Mn5Ge3 weakly depends on fabrication parameters. KW - solid phase epitaxy KW - flash lamp annealing KW - ferromagnetic film KW - spintronic KW - fabrication parameter KW - structural property Y1 - 2022 UR - https://iopscience.iop.org/article/10.1088/1361-6641/ac6689 U6 - https://doi.org/10.1088/1361-6641/ac6689 SN - 1361-6641 VL - 37 IS - 6 SP - 1 EP - 8 ER - TY - GEN A1 - Schlykow, Viktoria A1 - Manganelli, Constanza Lucia A1 - Römer, Friedhard A1 - Clausen, Caterina J. A1 - Augel, Lion A1 - Schulze, Jörg A1 - Katzer, Jens A1 - Schubert, Michael Andreas A1 - Witzigmann, Bernd A1 - Schroeder, Thomas A1 - Capellini, Giovanni A1 - Fischer, Inga Anita T1 - Ge(Sn) nano-island/Si heterostructure photodetectors with plasmonic antennas T2 - Nanotechnology Y1 - 2020 U6 - https://doi.org/10.1088/1361-6528/ab91ef SN - 1361-6528 VL - 31 IS - 34 ER - TY - GEN A1 - Schlipf, Jon A1 - Martin, Elena A1 - Stchakovsky, Michel A1 - Benedetti, Alessandro A1 - Fischer, Inga Anita A1 - Schulze, Jörg A1 - Chiussi, Stefano T1 - Ellipsometric analysis of concentration gradients induced in semiconductor crystals by pulsed laser induced epitaxy T2 - Journal of Vacuum Science & Technology B Y1 - 2019 U6 - https://doi.org/10.1116/1.5122777 SN - 2166-2754 VL - 37 IS - 6 ER - TY - GEN A1 - Fischer, Inga Anita A1 - Clausen, Caterina J. A1 - Schwarz, Daniel A1 - Zaumseil, Peter A1 - Capellini, Giovanni A1 - Virgilio, Michele A1 - da Silva Figueira, Maria Cecilia A1 - Birner, Stefan A1 - Koelling, Sebastian A1 - Koenraad, Paul M. A1 - Huang, Michael R. S. A1 - Koch, Christoph T. A1 - Wendav, Torsten A1 - Busch, Kurt A1 - Schulze, Jörg T1 - Composition analysis and transition energies of ultrathin Sn-rich GeSn quantum wells T2 - Physical Review Materials Y1 - 2020 U6 - https://doi.org/10.1103/PhysRevMaterials.4.024601 SN - 2475-9953 VL - 4 IS - 2 ER - TY - GEN A1 - Bergmann, Fritz A1 - Ayasse, Markus A1 - Schlipf, Jon A1 - Mörz, Florian A1 - Weißhaupt, David A1 - Oehme, Michael A1 - Prucnal, Slawomir A1 - Kawaguchi, Yuma A1 - Schwarz, Daniel A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - Plasmonic gratings from highly doped Ge1−ySny films on Si T2 - Journal of Physics D: Applied Physics Y1 - 2021 SN - 1361-6463 VL - 54 IS - 44 ER - TY - GEN A1 - Weißhaupt, David A1 - Funk, Hannes S. A1 - Kern, Michal A1 - Dettling, Marco M. A1 - Schwarz, Daniel A1 - Oehme, Michael A1 - Sürgers, Christoph A1 - Slageren, Joris van A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - Weak localization and weak antilocalization in doped Ge1-ySny layers with up to 8% Sn T2 - Journal of Physics: Condensed Matter Y1 - 2021 U6 - https://doi.org/10.1088/1361-648X/abcb68 SN - 1361-648X VL - 33 IS - 8 ER - TY - GEN A1 - Schwartz, Bernhard A1 - Oehme, Michael A1 - Kostecki, Konrad A1 - Widmann, Daniel A1 - Gollhofer, Martin A1 - Körner, Roman A1 - Bechler, Stefan A1 - Fischer, Inga Anita A1 - Wendav, Torsten A1 - Kasper, Erich A1 - Schulze, Jörg A1 - Kittler, Martin T1 - Electroluminescence of GeSn/Ge MQW LEDs on Si substrate T2 - Optics Letters Y1 - 2015 U6 - https://doi.org/10.1364/OL40.003209 VL - 40 IS - 13 SP - 3209 EP - 3212 ER - TY - GEN A1 - Schlipf, Jon A1 - Fischer, Inga Anita T1 - Rigorous coupled-wave analysis of a multi-layered plasmonic integrated refractive index sensor T2 - Optics Express Y1 - 2021 U6 - https://doi.org/10.1364/OE.438585 SN - 1094-4087 VL - Vol. 29 IS - 22 SP - 36201 EP - 36210 ER - TY - GEN A1 - Wen, Shuyu A1 - Shaikh, Mohd Saif A1 - Steuer, Oliver A1 - Prucnal, Slawomir A1 - Grenzer, Jörg A1 - Hübner, René A1 - Turek, Marcin A1 - Pyszniak, Krzysztof A1 - Reiter, Sebastian A1 - Fischer, Inga Anita A1 - Georgiev, Yordan M. A1 - Helm, Manfred A1 - Wu, Shaoteng A1 - Luo, Jun-Wei A1 - Zhou, Shengqiang A1 - Berencén, Yonder T1 - Room-temperature extended short-wave infrared GeSn photodetectors realized by ion beam techniques T2 - Applied Physics Letters N2 - GeSn alloys hold great promise as high-performance, low-cost, near- and short-wavelength infrared photodetectors with the potential to replace the relatively expensive and currently market-dominant InGaAs- and InSb-based photodetectors. In this Letter, we demonstrate room-temperature GeSn pn photodetectors fabricated by a complementary metal-oxide-semiconductor compatible process, involving Sn and P ion implantation and flash-lamp annealing prior to device fabrication. The fabrication process enables the alloying of Ge with Sn at concentrations up to 4.5% while maintaining the high-quality single-crystalline structure of the material. This allows us to create Ge0.955Sn0.045 pn photodetectors with a low dark current density of 12.8 mA/cm2 and a relatively high extended responsivity of 0.56 A/W at 1.71 μm. These results pave the way for the implementation of a cost-effective, scalable, and CMOS-compatible short-wavelength infrared detector technology. KW - Electric currents KW - Semiconductors KW - Photodetectors KW - C-MOS KW - Electromagnetic radiation detectors KW - Crystal structure KW - Alloys KW - Ion implantation KW - Ion beam analysis Y1 - 2023 UR - https://pubs.aip.org/aip/apl/article/123/8/081109/2907921 U6 - https://doi.org/10.1063/5.0166799 SN - 0003-6951 VL - 123 IS - 8 SP - 1 EP - 7 ER - TY - GEN A1 - Mai, Christian A1 - Marschmeyer, Steffen A1 - Peczek, Anna A1 - Kroh, Aleksandra A1 - Jose, Josmy A1 - Reiter, Sebastian A1 - Fischer, Inga Anita A1 - Wenger, Christian A1 - Mai, Andreas T1 - Integration Aspects of Plasmonic TiN-based Nano-Hole-Arrays on Ge Photodetectorsin a 200mm Wafer CMOS Compatible Silicon Technology T2 - ECS Transactions N2 - In this work we present the progress in regard to the integration of a surface plasmon resonance refractive index sensor into a CMOS compatible 200 mm wafer silicon-based technology. Our approach pursues the combination of germanium photodetectors with metallic nanohole arrays. The paper is focused on the technology development to fabricate large area photodetectors based on a modern design concept. In a first iteration we achieved a leakage current density of 82 mA/cm2 at reverse bias of 0.5 V and a maximum optical responsivity of 0.103 A/W measured with TE polarized light at λ = 1310 nm and a reversed bias of 1 V. For the realization of nanohole arrays we used thin Titanium nitride (TiN) layers deposited by a sputtering process. We were able to produce very homogenous TiN layers with a thickness deviation of around 10 % and RMS of 1.413 nm for 150 nm thick TiN layers. KW - plasmonics KW - nanohole array KW - germanium detector Y1 - 2022 U6 - https://doi.org/10.1149/10904.0035ecst SN - 1938-5862 VL - 109 IS - 4 SP - 35 EP - 46 ER - TY - GEN A1 - Körner, Roman A1 - Schwarz, Daniel A1 - Fischer, Inga Anita A1 - Augel, Lion A1 - Bechler, Stefan A1 - Hänel, Linda A. A1 - Kern, Michael A1 - Oehme, Michael A1 - Rolseth, Erlend Granbo A1 - Schwartz, Bernhard A1 - Weißhaupt, David A1 - Zhang, Wogong A1 - Schulze, Jörg T1 - The Zener-Emitter: A Novel Superluminescent Ge Optical Waveguide-Amplifier with 4.7 dB Gain at 92 mA Based on Free-Carrier Modulation by Drect Zener Tunneling Monolithically Integrated on Si T2 - 2016 IEEE International Electronic Devices Meeting (IEDM), 3-7 Dec. 2016 Y1 - 2016 SN - 978-1-5090-3901-2 SN - 978-1-5090-3902-9 SP - 22.5.1 EP - 22.5.4 PB - IEEE CY - Piscataway, NJ ER - TY - GEN A1 - Berkmann, Fritz A1 - Ayasse, Markus A1 - Mörz, Florian A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - Titanium and Nickel as alternative materials for mid Infrared Plasmonic T2 - 44th International Convention on Information, Communication and Electronic Technology, MIPRO 2021, Opatija, Croatia, September 27 - Oct. 1, 2021 Y1 - 2021 SN - 978-953-233-101-1 SN - 978-1-6654-4761-4 U6 - https://doi.org/10.23919/MIPRO52101.2021.9597155 SP - 36 EP - 39 PB - Piscataway CY - IEEE ER - TY - GEN A1 - Han, Weijia A1 - Reiter, Sebastian A1 - Schlipf, Jon A1 - Mai, Christian A1 - Spirito, Davide A1 - Jose, Josmy A1 - Wenger, Christian A1 - Fischer, Inga Anita T1 - Strongly enhanced sensitivities of CMOS compatible plasmonic titanium nitride nanohole arrays for refractive index sensing under oblique incidence T2 - Optics Express N2 - Titanium nitride (TiN) is a complementary metal-oxide-semiconductor (CMOS) compatible material with large potential for the fabrication of plasmonic structures suited for device integration. However, the comparatively large optical losses can be detrimental for application. This work reports a CMOS compatible TiN nanohole array (NHA) on top of a multilayer stack for potential use in integrated refractive index sensing with high sensitivities at wavelengths between 800 and 1500 nm. The stack, consisting of the TiN NHA on a silicon dioxide (SiO2) layer with Si as substrate (TiN NHA/SiO2/Si), is prepared using an industrial CMOS compatible process. The TiN NHA/SiO2/Si shows Fano resonances in reflectance spectra under oblique excitation, which are well reproduced by simulation using both finite difference time domain (FDTD) and rigorous coupled-wave analysis (RCWA) methods. The sensitivities derived from spectroscopic characterizations increase with the increasing incident angle and match well with the simulated sensitivities. Our systematic simulation-based investigation of the sensitivity of the TiN NHA/SiO2/Si stack under varied conditions reveals that very large sensitivities up to 2305 nm per refractive index unit (nm RIU−1) are predicted when the refractive index of superstrate is similar to that of the SiO2 layer. We analyze in detail how the interplay between plasmonic and photonic resonances such as surface plasmon polaritons (SPPs), localized surface plasmon resonances (LSPRs), Rayleigh Anomalies (RAs), and photonic microcavity modes (Fabry-Pérot resonances) contributes to this result. This work not only reveals the tunability of TiN nanostructures for plasmonic applications but also paves the way to explore efficient devices for sensing in broad conditions. KW - TiN KW - Plasmonics Y1 - 2023 U6 - https://doi.org/10.1364/OE.481993 SN - 1094-4087 VL - 31 IS - 11 SP - 17389 EP - 17407 ER - TY - GEN A1 - Funk, Hannes S. A1 - Kern, Michael A1 - Weisshaupt, David A1 - Sürgers, Christoph A1 - Fischer, Inga Anita A1 - Oehme, Michael A1 - Slageren, Joris van A1 - Schulze, Jörg T1 - Magnetic Characterization of a Mn Based Ferromagnet on SixGe(1-x-y)Sny with High Sn Content T2 - ECS Transactions Y1 - 2019 U6 - https://doi.org/10.1149/09301.0101ecst SN - 1938-5862 SN - 1938-6737 VL - 93 IS - 1 SP - 101 EP - 104 ER - TY - GEN A1 - Augel, Lion A1 - Fischer, Inga Anita A1 - Gollhofer, Martin A1 - Oehme, Michael A1 - Schulze, Jörg T1 - Comparing Fourier transform infrared spectroscopy results with photocurrent measurements for Ge-on-Si PIN photodetectors with and without Al nanoantennas T2 - Journal of Applied Physics Y1 - 2020 U6 - https://doi.org/10.1063/5.0012279 SN - 1089-7550 VL - 128 IS - 1 SP - 013105-1 EP - 013105-8 ER - TY - GEN A1 - Schlipf, Jon A1 - Tetzner, Henriette A1 - Spirito, Davide A1 - Manganelli, Constanza Lucia A1 - Capellini, Giovanni A1 - Huang, Michael R. S. A1 - Koch, Christoph T. A1 - Clausen, Caterina J. A1 - Elsayed, Ahmed A1 - Schulze, Jörg A1 - Fischer, Inga Anita T1 - Raman shifts in MBE‐grown SixGe1 − x − ySny alloys with large Si content T2 - Journal of Raman Spectroscopy Y1 - 2021 U6 - https://doi.org/10.1002/jrs.6098 SN - 1097-4555 ER - TY - GEN A1 - Tetzner, Henriette A1 - Seifert, W. A1 - Skibitzki, Oliver A1 - Yamamoto, Yuji A1 - Lisker, Marco A1 - Mirza, M. M. A1 - Fischer, Inga Anita A1 - Paul, Douglas J. A1 - De Seta, Monica A1 - Capellini, Giovanni T1 - Unintentional p-type conductivity in intrinsic Ge-rich SiGe/Ge heterostructures grown on Si(001) T2 - Applied Physics Letter Y1 - 2023 U6 - https://doi.org/10.1063/5.0152962 SN - 1077-3118 VL - 122 IS - 24 ER - TY - GEN A1 - Hayat, Ahsan A1 - Spirito, Davide A1 - Corley-Wiciak, Agnieszka Anna A1 - Schubert, Markus Andreas A1 - Masood, Maria A1 - Reichmann, Felix A1 - Ratzke, Markus A1 - Capellini, Giovanni A1 - Fischer, Inga Anita T1 - MBE-based growth of Sn-rich quantum wells and dots at low Sn deposition rates T2 - Materials Science in Semiconductor Processing Y1 - 2023 U6 - https://doi.org/10.1016/j.mssp.2023.107693 SN - 1873-4081 VL - 165 ER - TY - GEN A1 - Steuer, O. A1 - Liedke, Maciej O. A1 - Butterling, M. A1 - Schwarz, D. A1 - Schulze, J. A1 - Li, Z. A1 - Wagner, A. A1 - Fischer, Inga Anita A1 - Hübner, R. A1 - Zhou, S. T1 - Evolution of point defects in pulsed-laser-melted Ge1-xSnx probed by positron annihilation lifetime spectroscopy T2 - Journal of Physics: Condensed Matter N2 - Direct-band-gap Germanium-Tin alloys (Ge1-xSnx) with high carrier mobilities are promising materials for nano- and optoelectronics. The concentration of open volume defects in the alloy, such as Sn and Ge vacancies, influences the final device performance. In this article, we present an evaluation of the point defects in molecular-beam-epitaxy grown Ge1-xSnx films treated by post-growth nanosecond-range pulsed laser melting (PLM). Doppler broadening – variable energy positron annihilation spectroscopy and variable energy positron annihilation lifetime spectroscopy are used to investigate the defect nanostructure in the Ge1-xSnx films exposed to increasing laser energy density. The experimental results, supported with ATomic SUPerposition calculations, evidence that after PLM, the average size of the open volume defects increases, which represents a raise in concentration of vacancy agglomerations, but the overall defect density is reduced as a function of the PLM fluence. At the same time, the positron annihilation spectroscopy analysis provides information about dislocations and Ge vacancies decorated by Sn atoms. Moreover, it is shown that the PLM reduces the strain in the layer, while dislocations are responsible for trapping of Sn and formation of small Sn-rich-clusters. KW - GeSn KW - laser annealing KW - positron annihilation KW - PLM KW - point defects Y1 - 2023 UR - https://iopscience.iop.org/article/10.1088/1361-648X/ad0a10/meta U6 - https://doi.org/10.1088/1361-648X/ad0a10 SN - 0953-8984 VL - 36 IS - 8 SP - 1 EP - 11 ER - TY - GEN A1 - Efremenko, Yulia A1 - Laroussi, Arwa A1 - Sengül, Akant A1 - Corley-Wiciak, Agnieszka Anna A1 - Fischer, Inga Anita A1 - Mirsky, Vladimir M. T1 - Deposition of Polymers on Titanium Nitride Electrodes T2 - Coatings N2 - The application of titanium nitride (TiN) as an electrode for electrochemical deposition or characterization requires the removal of an insulating layer from its surface. This process was studied and optimized, and the conditions for the complete removal of this layer through treatment with oxalic acid were formulated. The obtained TiN surfaces were used for the deposition of various conducting and non-conducting polymers. Two different approaches were applied: (i) in situ electrochemical synthesis of the main classes of conducting polymers, including polyaniline, polypyrrole, polythiophene, and selected derivatives thereof, and (ii) electrostatically driven layer-by-layer (LbL) deposition of multilayers of oppositely charged polyelectrolytes. The deposited polymers were characterized by electrochemical methods. The electrochemical properties of the deposited conducting polymers and their deposition on the TiN surface were comparable to those of the metallic electrodes. The films produced via LbL deposition exhibited a pronounced influence of the charge of the last deposited polymer on the redox reaction of ferri/ferrocyanide, validating the charge alteration with each successive polymer layer deposition. The studied deposition technologies can be used for the modification of TiN surfaces required in applications of this material in chemical sensors and other devices. Y1 - 2024 U6 - https://doi.org/10.3390/coatings14020215 SN - 2079-6412 VL - 14 IS - 2 ER - TY - GEN A1 - Tetzner, Henriette A1 - Fischer, Inga Anita A1 - Skibitzki, Oliver A1 - Mirza, M. M. A1 - Manganelli, Constanza Lucia A1 - Luongo, G. A1 - Spirito, Davide A1 - Douglas, J. P. A1 - De Seta, Monica A1 - Capellini, Giovanni T1 - Current leakage mechanisms related to threading dislocations in Ge-rich SiGe heterostructures grown on Si(001) T2 - Applied Physics Letters Y1 - 2021 U6 - https://doi.org/10.1063/5.0064477 SN - 1077-3118 SN - 0003-6951 VL - 119 IS - 15 ER - TY - GEN A1 - Reiter, Sebastian A1 - Han, Weijia A1 - Mai, Christian A1 - Spirito, Davide A1 - Jose, Josmy A1 - Zöllner, Marvin Hartwig A1 - Fursenko, Oksana A1 - Schubert, Markus Andreas A1 - Stemmler, Ivo A1 - Wenger, Christian A1 - Fischer, Inga Anita T1 - Titanium Nitride Plasmonic Nanohole Arrays for CMOS-Compatible Integrated Refractive Index Sensing: Influence of Layer Thickness on Optical Properties T2 - Plasmonics Y1 - 2023 U6 - https://doi.org/10.1007/s11468-023-01810-3 SN - 1557-1963 SP - 1 EP - 13 ER - TY - GEN A1 - Berkmann, F. A1 - Steuer, Oliver A1 - Ganss, Fabian A1 - Prucnal, Slawomir A1 - Schwarz, Daniel A1 - Fischer, Inga Anita A1 - Schulze, Jörg T1 - Sharp MIR plasmonic modes in gratings made of heavily doped pulsed laser-melted Ge1-xSnx T2 - Optical Materials Express Y1 - 2023 U6 - https://doi.org/10.1364/OME.479637 SN - 2159-3930 VL - 13 IS - 3 SP - 752 EP - 763 ER - TY - GEN A1 - Oleynik, Paul A1 - Berkmann, Fritz A1 - Reiter, Sebastian A1 - Schlipf, Jon A1 - Ratzke, Markus A1 - Yamamoto, Yuji A1 - Fischer, Inga Anita T1 - Strong Optical Coupling of Lattice Resonances in a Top-down Fabricated Hybrid Metal–Dielectric Al/Si/Ge Metasurface T2 - Nano Letters N2 - Optical metasurfaces enable the manipulation of the light–matter interaction in ultrathin layers. Compared with their metal or dielectric counterparts, hybrid metasurfaces resulting from the combination of dielectric and metallic nanostructures can offer increased possibilities for interactions between modes present in the system. Here, we investigate the interaction between lattice resonances in a hybrid metal–dielectric metasurface obtained from a single-step nanofabrication process. Finite-difference time domain simulations show the avoided crossing of the modes appearing in the wavelength-dependent absorptance inside the Ge upon variations in a selected geometry parameter as evidence for strong optical coupling. We find good agreement between the measured and simulated absorptance and reflectance spectra. Our metasurface design can be easily incorporated into a top-down optoelectronic device fabrication process with possible applications ranging from on-chip spectroscopy to sensing. KW - metamaterials KW - semiconductors KW - hybridization KW - optoelectronics Y1 - 2024 U6 - https://doi.org/10.1021/acs.nanolett.3c05050 SN - 1530-6984 SN - 1530-6992 VL - 24 IS - 10 SP - 3142 EP - 3149 ER - TY - GEN A1 - Schlipf, Jon A1 - Berkmann, Fritz A1 - Yamamoto, Yuji A1 - Reichenbach, Marc A1 - Veleski, Mitko A1 - Kawaguchi, Y. A1 - Mörz, Florian A1 - Tomm, Jens W. A1 - Weißhaupt, David A1 - Fischer, Inga Anita T1 - Robust Si/Ge heterostructure metasurfaces as building blocks for wavelength-selective photodetectors T2 - Applied Physics Letters Y1 - 2023 U6 - https://doi.org/10.1063/5.0134458 SN - 1077-3118 VL - 122 IS - 12 ER -