TY - GEN A1 - Dorai Swamy Reddy, Keerthi A1 - Pérez, Eduardo A1 - Baroni, Andrea A1 - Mahadevaiah, Mamathamba Kalishettyhalli A1 - Marschmeyer, Steffen A1 - Fraschke, Mirko A1 - Lisker, Marco A1 - Wenger, Christian A1 - Mai, Andreas T1 - Optimization of technology processes for enhanced CMOS-integrated 1T-1R RRAM device performance T2 - The European Physical Journal B N2 - Implementing artificial synapses that emulate the synaptic behavior observed in the brain is one of the most critical requirements for neuromorphic computing. Resistive random-access memories (RRAM) have been proposed as a candidate for artificial synaptic devices. For this applicability, RRAM device performance depends on the technology used to fabricate the metal–insulator–metal (MIM) stack and the technology chosen for the selector device. To analyze these dependencies, the integrated RRAM devices in a 4k-bit array are studied on a 200 mm wafer scale in this work. The RRAM devices are integrated into two different CMOS transistor technologies of IHP, namely 250 nm and 130 nm and the devices are compared in terms of their pristine state current. The devices in 130 nm technology have shown lower number of high pristine state current devices per die in comparison to the 250 nm technology. For the 130 nm technology, the forming voltage is reduced due to the decrease of HfO2 dielectric thickness from 8 nm to 5 nm. Additionally, 5% Al-doped 4 nm HfO2 dielectric displayed a similar reduction in forming voltage and a lower variation in the values. Finally, the multi-level switching between the dielectric layers in 250 nm and 130 nm technologies are compared, where 130 nm showed a more significant number of conductance levels of seven compared to only four levels observed in 250 nm technology. KW - RRAM Y1 - 2024 U6 - https://doi.org/10.1140/epjb/s10051-024-00821-1 SN - 1434-6028 VL - 97 PB - Springer Science and Business Media LLC ER - TY - GEN A1 - Maldonado, David A1 - Cantudo, Antonio A1 - Swamy Reddy, Keerthi Dorai A1 - Pechmann, Stefan A1 - Uhlmann, Max A1 - Wenger, Christian A1 - Roldan, Juan Bautista A1 - Pérez, Eduardo T1 - Influence of stop and gate voltage on resistive switching of 1T1R HfO2-based memristors, a modeling and variability analysis T2 - Materials Science in Semiconductor Processing Y1 - 2024 U6 - https://doi.org/10.1016/j.mssp.2024.108726 SN - 1873-4081 SN - 1369-8001 VL - 182 ER - TY - GEN A1 - Vinuesa, Guillermo A1 - García, Héctor A1 - Pérez, Eduardo A1 - Wenger, Christian A1 - Íñiguez de la Torre, Ignacio A1 - González, Tomás A1 - Dueñas, Salvador A1 - Castán, Helena T1 - On the asymmetry of Resistive Switching Transitions T2 - Electronics N2 - In this study, the resistive switching phenomena in TiN/Ti/HfO2/Ti metal–insulator–metal stacks is investigated, mainly focusing on the analysis of set and reset transitions. The electrical measurements in a wide temperature range reveal that the switching transitions require less voltage (and thus, less energy) as temperature rises, with the reset process being much more temperature sensitive. The main conduction mechanism in both resistance states is Space-charge-limited Conduction, but the high conductivity state also shows Schottky emission, explaining its temperature dependence. Moreover, the temporal evolution of these transitions reveals clear differences between them, as their current transient response is completely different. While the set is sudden, the reset process development is clearly non-linear, closely resembling a sigmoid function. This asymmetry between switching processes is of extreme importance in the manipulation and control of the multi-level characteristics and has clear implications in the possible applications of resistive switching devices in neuromorphic computing. KW - resistive switching KW - RRAM KW - memristor KW - transient KW - temperature dependence KW - low power consumption Y1 - 2024 U6 - https://doi.org/10.3390/electronics13132639 SN - 2079-9292 VL - 13 IS - 13 PB - MDPI ER - TY - GEN A1 - Vinuesa, Guillermo A1 - Garcia, Hector A1 - Duenas, Salvador A1 - Castan, Helena A1 - Iñiguez de la Torre, Ignacio A1 - Gonzalez, Tomas A1 - Dorai Swamy Reddy, Keerthi A1 - Uhlmann, Max A1 - Wenger, Christian A1 - Perez, Eduardo T1 - Effect of the temperature on the performance and dynamic behavior of HfO2-Based Rram Devices T2 - ECS Meeting Abstracts N2 - Over the past decades, the demand for semiconductor memory devices has been steadily increasing, and is currently experiencing an unprecedented boost due to the development and expansion of artificial intelligence. Among emerging high-density non-volatile memories, resistive random-access memory (RRAM) is one of the best recourses for all kind of applications, such as neuromorphic computing or hardware security [1]. Although many materials have been evaluated for RRAM development, some of them with excellent results, HfO2 is one of the established materials in CMOS domain due to its compatibility with standard materials and processes [2]. The main goal of this work is to study the switching capability and stability of HfO2-based RRAMs, as well as to explore their ability in the field of analogue applications, by analyzing the evolution of the resistance states that allow multilevel control. Indeed, analogue operation is a key point for achieving electronic neural synapses in neuromorphic systems, with synaptic weight information encoded in the different resistance states. This research has been carried out over a wide temperature range, between 40 and 340 K, as we are interested in testing the extent to which performance is maintained or modified, with a view to designing neuromorphic circuits that are also suitable in the low-temperature realm. We aim to prove that these simple, fast, high integration density structures can also be used in circuits designed for specific applications, such as aerospace systems. The RRAM devices studied in this work are TiN/Ti/8 nm-HfO2/TiN metal-insulator-metal (MIM) capacitors. Dielectric layers were atomic layer deposited (ALD). It has been demonstrated that the Ti coat in the top electrode acts as a scavenger that absorbs oxygen atoms from the HfO2 layer, and facilitates the creation of conductive filaments of oxygen vacancies [3]. In fact, the oxygen reservoir capability of Ti is well known, as it is able to attract and release oxygen atoms from or to the HfO2 layer during the RRAM operation [4]. The clustering of vacancies extends through the entire thickness of the oxide and, after an electroformig step, it joins the upper and lower electrodes and the device reaches the low resistance state (LRS). By applying adequate electrical signals, the filaments can be partially dissolved, which brings the device into the high-resistance state (HRS), with lower current values. The set process brings the device to the LRS state, while the reset one brings it to the HRS. The dependence of electrical conductivity on external applied electrical excitation allows triggering the device between the both states in a non-volatile manner [5]. The experimental equipment used consisted of a Keithley 4200-SCS semiconductor parameter analyzer and a Lake Shore cryogenic probe station. Fig.1 shows current-voltage cycles measured at different temperatures; the averages values at each temperature, both in logarithmic and linear scale, are also shown. The functional window increases as temperature decreases. The evolutions of set and reset voltage values with temperature are depicted in Fig.2, whereas the current values (measured at 0.1 V) corresponding to the LRS and HRS can be seen in Fig.3. LRS resistance decreases as temperature increases, in agreement with semiconductor behaviour, probably due to a hopping conduction mechanism. Both set and reset voltages decrease as temperature increases; the reset process is smoother at high temperatures. The reduction in reset voltage variability as temperature increases is very notable. Finally, Fig. 4 shows a picture of the transient behaviour; in the right panel of the same figure, the amplitudes of the current transients in the reset state have been included in the external loop. To sum up, the resistive switching phenomena is studied in a wide temperature range. The LRS shows semiconducting behavior with temperature, most likely related to a hopping conduction mechanism. Switching voltages decrease as temperature increases, with a notable reduction in reset voltage variability. An excellent control of intermediate resistance state is shown through current transients at several voltages in the reset process. REFERENCES [1] M. Asif et al., Materials Today Electronics 1, 100004 (2022). [2] S. Slesazeck et al., Nanotechnology 30, 352003 (2019). [3] Z. Fang et al., IEEE Electron Device Letters 35, 9, 912-914 (2014). [4] H. Y. Lee et al., IEEE Electron Device Letters 31, 1, 44-46 (2010). [5] D. J. Wouters et al., Proceedings of the IEEE 103, 8, 1274-1288 (2015). Figure 1 KW - RRAM Y1 - 2024 U6 - https://doi.org/10.1149/MA2024-01211297mtgabs SN - 2151-2043 VL - MA2024-01 IS - 21 SP - 1297 EP - 1297 PB - The Electrochemical Society ER - TY - GEN A1 - Dersch, Nadine A1 - Roemer, Christian A1 - Perez, Eduardo A1 - Wenger, Christian A1 - Schwarz, Mike A1 - Iñíguez, Benjamín A1 - Kloes, Alexander T1 - Fast circuit simulation of memristive crossbar arrays with bimodal stochastic synaptic weights T2 - 2024 IEEE Latin American Electron Devices Conference (LAEDC) N2 - This paper presents an approach for highly efficient circuit simulation of hardware-based artificial neural networks by using memristive crossbar array architectures. There are already possibilities to test neural networks with stochastic weights via simulations like the macro model NeuroSim. However, the noise-based variability approach offers more realistic setting options including elements of a classical circuit simulation for more precise analysis of neural networks. With this approach, statistical parameter fluctuations can be simulated based on different distribution functions of devices. In Cadence Virtuoso, a simulation of a crossbar array with 10 synaptic weights following a bimodal distribution, the new approach shows a 1,000x speedup compared to a Monte Carlo simulation. Initial tests of a memristive crossbar array with over 15,000 stochastic weights to classify the MNIST dataset show that the new approach can be used to test the functionality of hardware-based neural networks. KW - RRAM Y1 - 2024 SN - 979-8-3503-6130-8 U6 - https://doi.org/10.1109/LAEDC61552.2024.10555829 SN - 979-8-3503-6129-2 SN - 2835-3471 SP - 1 EP - 4 PB - IEEE ER - TY - GEN A1 - Wen, Jianan A1 - Baroni, Andrea A1 - Perez, Eduardo A1 - Uhlmann, Max A1 - Fritscher, Markus A1 - KrishneGowda, Karthik A1 - Ulbricht, Markus A1 - Wenger, Christian A1 - Krstic, Milos T1 - Towards reliable and energy-efficient RRAM based discrete fourier transform accelerator T2 - 2024 Design, Automation & Test in Europe Conference & Exhibition (DATE) N2 - The Discrete Fourier Transform (DFT) holds a prominent place in the field of signal processing. The development of DFT accelerators in edge devices requires high energy efficiency due to the limited battery capacity. In this context, emerging devices such as resistive RAM (RRAM) provide a promising solution. They enable the design of high-density crossbar arrays and facilitate massively parallel and in situ computations within memory. However, the reliability and performance of the RRAM-based systems are compromised by the device non-idealities, especially when executing DFT computations that demand high precision. In this paper, we propose a novel adaptive variability-aware crossbar mapping scheme to address the computational errors caused by the device variability. To quantitatively assess the impact of variability in a communication scenario, we implemented an end-to-end simulation framework integrating the modulation and demodulation schemes. When combining the presented mapping scheme with an optimized architecture to compute DFT and inverse DFT(IDFT), compared to the state-of-the-art architecture, our simulation results demonstrate energy and area savings of up to 57 % and 18 %, respectively. Meanwhile, the DFT matrix mapping error is reduced by 83% compared to conventional mapping. In a case study involving 16-quadrature amplitude modulation (QAM), with the optimized architecture prioritizing energy efficiency, we observed a bit error rate (BER) reduction from 1.6e-2 to 7.3e-5. As for the conventional architecture, the BER is optimized from 2.9e-3 to zero. KW - RRAM Y1 - 2024 SN - 978-3-9819263-8-5 SN - 979-8-3503-4860-6 U6 - https://doi.org/10.23919/DATE58400.2024.10546709 SN - 1558-1101 SP - 1 EP - 6 PB - IEEE ER - TY - GEN A1 - Maldonado, David A1 - Baroni, Andrea A1 - Aldana, Samuel A1 - Dorai Swamy Reddy, Keerthi A1 - Pechmann, Stefan A1 - Wenger, Christian A1 - Roldán, Juan Bautista A1 - Pérez, Eduardo T1 - Kinetic Monte Carlo simulation analysis of the conductance drift in Multilevel HfO2-based RRAM devices T2 - Nanoscale N2 - The drift characteristics of valence change memory (VCM) devices have been analyzed through both experimental analysis and 3D kinetic Monte Carlo (kMC) simulations. KW - RRAM Y1 - 2024 U6 - https://doi.org/10.1039/d4nr02975e SN - 2040-3364 VL - 16 IS - 40 SP - 19021 EP - 19033 PB - Royal Society of Chemistry (RSC) ER - TY - GEN A1 - Petryk, Dmytro A1 - Dyka, Zoya A1 - Pérez, Eduardo A1 - Kabin, Ievgen A1 - Katzer, Jens A1 - Schäffner, Jan A1 - Langendörfer, Peter T1 - Sensitivity of HfO2-based RRAM Cells to Laser Irradiation T2 - Microprocessors and Microsystems Y1 - 2021 U6 - https://doi.org/10.1016/j.micpro.2021.104376 SN - 0141-9331 IS - 87 ER - TY - GEN A1 - Wen, Jianan A1 - Vargas, Fabian Luis A1 - Zhu, Fukun A1 - Reiser, Daniel A1 - Baroni, Andrea A1 - Fritscher, Markus A1 - Perez, Eduardo A1 - Reichenbach, Marc A1 - Wenger, Christian A1 - Krstic, Milos T1 - RRAMulator : an efficient FPGA-based emulator for RRAM crossbar with device variability and energy consumption evaluation T2 - Microelectronics Reliability N2 - The in-memory computing (IMC) systems based on emerging technologies have gained significant attention due to their potential to enhance performance and energy efficiency by minimizing data movement between memory and processing unit, which is especially beneficial for data-intensive applications. Designing and evaluating systems utilizing emerging memory technologies, such as resistive RAM (RRAM), poses considerable challenges due to the limited support from electronics design automation (EDA) tools for rapid development and design space exploration. Additionally, incorporating technology-dependent variability into system-level simulations is critical to accurately assess the impact on system reliability and performance. To bridge this gap, we propose RRAMulator, a field-programmable gate array (FPGA) based hardware emulator for RRAM crossbar array. To avoid the complex device models capturing the nonlinear current–voltage (IV) relationships that degrade emulation speed and increase hardware utilization, we propose a device and variability modeling approach based on device measurements. We deploy look-up tables (LUTs) for device modeling and use the multivariate kernel density estimation (KDE) method to augment existing data, extending data variety and avoiding repetitive data usage. The proposed emulator achieves cycle-accurate, real-time emulations and provides information such as latency and energy consumption for matrix mapping and vector–matrix multiplications (VMMs). Experimental results show a significant reduction in emulation time compared to conventional behavioral simulations. Additionally, an RRAM-based discrete Fourier transform (DFT) accelerator is analyzed as a case study featuring a range of in-depth system assessments. KW - RRAM Y1 - 2025 U6 - https://doi.org/10.1016/j.microrel.2025.115630 SN - 0026-2714 VL - 168 SP - 1 EP - 10 PB - Elsevier BV CY - Amsterdam ER - TY - GEN A1 - Uhlmann, Max A1 - Krysik, Milosz A1 - Wen, Jianan A1 - Frohberg, Max A1 - Baroni, Andrea A1 - Reddy, Keerthi Dorai Swamy A1 - Pérez, Eduardo A1 - Ostrovskyy, Philip A1 - Piotrowski, Krzysztof A1 - Carta, Corrado A1 - Wenger, Christian A1 - Kahmen, Gerhard T1 - A compact one-transistor-multiple-RRAM characterization platform T2 - IEEE transactions on circuits and systems I : regular papers N2 - Emerging non-volatile memories (eNVMs) such as resistive random-access memory (RRAM) offer an alternative solution compared to standard CMOS technologies for implementation of in-memory computing (IMC) units used in artificial neural network (ANN) applications. Existing measurement equipment for device characterisation and programming of such eNVMs are usually bulky and expensive. In this work, we present a compact size characterization platform for RRAM devices, including a custom programming unit IC that occupies less than 1 mm2 of silicon area. Our platform is capable of testing one-transistor-one-RRAM (1T1R) as well as one-transistor-multiple-RRAM (1TNR) cells. Thus, to the best knowledge of the authors, this is the first demonstration of an integrated programming interface for 1TNR cells. The 1T2R IMC cells were fabricated in the IHP’s 130 nm BiCMOS technology and, in combination with other parts of the platform, are able to provide more synaptic weight resolution for ANN model applications while simultaneously decreasing the energy consumption by 50 %. The platform can generate programming voltage pulses with a 3.3 mV accuracy. Using the incremental step pulse with verify algorithm (ISPVA) we achieve 5 non-overlapping resistive states per 1T1R device. Based on those 1T1R base states we measure 15 resulting state combinations in the 1T2R cells. KW - RRAM KW - Vector Matrix Multiplication Y1 - 2025 U6 - https://doi.org/10.1109/TCSI.2025.3555234 SN - 1549-8328 SP - 1 EP - 12 PB - Institute of Electrical and Electronics Engineers (IEEE) CY - New York ER - TY - GEN A1 - Baroni, Andrea A1 - Pérez, Eduardo A1 - Reddy, Keerthi Dorai Swamy A1 - Pechmann, Stefan A1 - Wenger, Christian A1 - Ielmini, Daniele A1 - Zambelli, Cristian T1 - Enhancing RRAM reliability : exploring the effects of Al doping on HfO2-based devices T2 - IEEE transactions on device and materials reliability N2 - This study provides a comprehensive evaluation of RRAM devices based on HfO2 and Al-doped HfO2 insulators, focusing on critical performance metrics, including Forming yield, Post-Programming Stability (PPS), Fast Drift, Endurance, and Retention at elevated temperatures (125 ∘C). Aluminum doping significantly enhances device reliability and stability, improving Forming yield, reducing current drift during programming and Retention tests, and minimizing variability during Endurance cycling. While Al5%:HfO2 achieves most of the observed benefits compared to pure HfO2, Al7%:HfO2 offers incremental advantages for scenarios requiring extreme reliability. These findings position Al-doped HfO2 devices as a promising solution for RRAM-based systems in memory and neuromorphic computing, highlighting the potential trade-off between performance gains and increased fabrication complexity. This work underlines the importance of material engineering for optimizing RRAM devices in application-specific contexts. KW - RRAM KW - Memristive device Y1 - 2025 U6 - https://doi.org/10.1109/TDMR.2025.3581061 SN - 1530-4388 SN - 1558-2574 SP - 1 EP - 9 PB - Institute of Electrical and Electronics Engineers (IEEE) CY - New York ER - TY - GEN A1 - Blumenstein, Alan A1 - Pérez, Eduardo A1 - Wenger, Christian A1 - Dersch, Nadine A1 - Kloes, Alexander A1 - Iñíguez, Benjamín A1 - Schwarz, Mike T1 - Evaluating device variability in RRAM-based single- and multi-layer perceptrons T2 - 2025 32nd International Conference on Mixed Design of Integrated Circuits and System (MIXDES) N2 - This work investigates the impact of stochastic weight variations in hardware implementations of artificial neural networks, focusing on a Single-Layer Perceptron and Multi-Layer Perceptrons. A variable neural network model is introduced, applying Gaussian variability to synaptic weights based on an adjustment rate, which controls the proportion of affected weights. By studying how stochastic variations affect accuracy, simulations under device-to-device and cycle-to-cycle variation conditions demonstrate that Single-Layer Perceptrons are more sensitive to weight variations, while Multi-Layer perceptrons show greater robustness. Additionally, stochastic quantization improves the performance of Multi-Layer Perceptrons but has minimal effect on Single-Layer Perceptrons. KW - RRAM Y1 - 2025 SN - 978-83-63578-27-5 U6 - https://doi.org/10.23919/MIXDES66264.2025.11092102 SP - 74 EP - 77 PB - IEEE CY - New York ER - TY - GEN A1 - Wen, Jianan A1 - Baroni, Andrea A1 - Uhlmann, Max A1 - Perez, Eduardo A1 - Wenger, Christian A1 - Krstic, Milos T1 - ReFFT : an energy-efficient RRAM-based FFT accelerator T2 - IEEE transactions on computer-aided design of integrated circuits and systems N2 - The fast Fourier transform (FFT) is a highly efficient algorithm for computing the discrete Fourier transform (DFT). It is widely employed in various applications, including digital communication, image processing, and signal analysis. Recently, in-memory computing architectures based on emerging technologies, such as resistive RAM (RRAM), have demonstrated promising performance with low hardware cost for data-intensive applications. However, directly mapping FFT onto RRAM crossbars is challenging because the algorithm relies on many small, sequential butterfly operations, while cross-bars are optimized for large-scale, highly parallel vector–matrix multiplications (VMMs). In this paper, we introduce ReFFT, a system architecture that reformulates FFT computations for efficient execution on RRAM crossbars. ReFFT combines the reduced computational complexity of FFT with the parallel VMM capability of RRAM. We incorporate measured device data into our framework to analyze the effect of variability and develop an adaptive mapping scheme that improves twiddle-factor programming accuracy, leading to a 9.9 dB peak signal-to-noise ratio (PSNR) improvement for a 256-point FFT. Compared with prior RRAM-based DFT designs, ReFFT achieves up to 4.6× and 19.5× higher energy efficiency for 256- and 2048-point FFTs, respectively. The system is further validated in digital communication and satellite image compression tasks. KW - RRAM KW - Accelerator Y1 - 2025 U6 - https://doi.org/10.1109/TCAD.2025.3627146 SN - 0278-0070 SP - 1 EP - 14 PB - IEEE CY - Piscataway, NJ ER - TY - GEN A1 - Dersch, Nadine A1 - Perez, Eduardo A1 - Wenger, Christian A1 - Lanza, Mario A1 - Zhu, Kaichen A1 - Schwarz, Mike A1 - Iñíguez, Benjamín A1 - Kloes, Alexander T1 - Statistical model for the calculation of conductance variations of memristive devices T2 - 2025 IEEE European Solid-State Electronics Research Conference (ESSERC) N2 - This paper presents a statistical model which calculates the expected conductance variations from device to device or from cycle to cycle of memristive devices. The mean readout current and its standard deviation can be calculated for binary and multi-level devices. These values are important for simulating hardware-based artificial neural networks at circuit level and testing their functionality. Research into hardwarebased artificial neural networks is important because they are energy-efficient. Furthermore to calculating the variations, the statistical model can be used to determine what influence the cumulative distribution function of switching has on the variations and which behavior provides the best results for the hardwarebased artificial neural network. Some memristive devices exhibit multi-level behavior due to defects in the switching layer. The number of these defects and the optimal amount can be estimated. KW - RRAM KW - Memristive devices KW - Statistical variations KW - Binary KW - Multi-level KW - Artificial neural networks KW - Cumulative distribution Y1 - 2025 U6 - https://doi.org/10.1109/ESSERC66193.2025.11213973 SP - 373 EP - 376 PB - IEEE CY - Piscataway, NJ ER - TY - GEN A1 - Dersch, Nadine A1 - Perez, Eduardo A1 - Wenger, Christian A1 - Schwarz, Mike A1 - Iniguez, Benjamin A1 - Kloes, Alexander T1 - A closed-form model for programming of oxide-based resistive random access memory cells derived from the Stanford model T2 - Solid-state electronics N2 - This paper presents a closed-form model for pulse-based programming of oxide-based resistive random access memory devices. The Stanford model is used as a basis and solved in a closed-form for the programming cycle. A constant temperature is set for this solution. With the closed-form model, the state of the device after programming or the required programming settings for achieving a specific device conductance can be calculated directly and quickly. The Stanford model requires time-consuming iterative calculations for high accuracy in transient analysis, which is not necessary for the closed-form model. The closed-form model is scalable across different programming pulse widths and voltages. KW - RRAM KW - Closed-form KW - Modeling KW - Oxide-based KW - Pulse-programming KW - Resistive random access memory KW - Stanford model KW - Variability Y1 - 2025 U6 - https://doi.org/10.1016/j.sse.2025.109238 SN - 0038-1101 VL - 230 SP - 1 EP - 5 PB - Elsevier BV CY - Amsterdam ER - TY - GEN A1 - Wen, Jianan A1 - Baroni, Andrea A1 - Mistroni, Alberto A1 - Perez, Eduardo A1 - Zambelli, Cristian A1 - Wenger, Christian A1 - Krstic, Milos A1 - Bolzani Pöhls, Leticia Maria T1 - ReDiM : an efficient strategy for read disturb mitigation in RRAM-based accelerators T2 - 2025 IEEE 31st International Symposium on On-Line Testing and Robust System Design (IOLTS) N2 - Resistive RAM (RRAM) has emerged as a promising non-volatile memory technology for implementing energy-efficient hardware accelerators within the in-memory computing (IMC) paradigm. However, due to the immature fabrication process and inherent material instabilities, frequent read operations during computations can induce read disturb effects, leading to unintended resistance drift and potential data corruption. Existing mitigation approaches primarily focus on detecting read disturb effects and triggering memory refresh operations. In this work, we propose an architecture-level solution that mitigates read disturb in RRAM-based accelerators. Our strategy employs crossbar duplication and decomposes the single high input pulse into two lower-amplitude pulses, effectively minimizing the risk of read disturb. To validate our approach, we develop a simulation framework that incorporates measurement data from characterized RRAM devices under read disturb stress conditions. Experimental results on VGG-8 with CIFAR-10 demonstrate that the proposed method significantly mitigates inference accuracy degradation caused by read disturb in RRAM-based accelerators, while incurring modest area and energy overheads of 12.32% and 2.15%, respectively. This work provides a practical and scalable solution for enhancing the robustness of RRAM-based accelerators in edge and high-performance computing applications. KW - RRAM KW - Resistive RAM KW - In-memory Computing KW - AI Accelerator KW - Read Disturb KW - Reliability Y1 - 2025 SN - 979-8-3315-3334-2 U6 - https://doi.org/10.1109/IOLTS65288.2025.11117065 SP - 1 EP - 7 PB - IEEE CY - Piscataway, NJ ER - TY - GEN A1 - Blumenstein, Alan A1 - Pérez, Eduardo A1 - Wenger, Christian A1 - Dersch, Nadine A1 - Kloes, Alexander A1 - Iñíguez, Benjamín A1 - Schwarz, Mike T1 - Exploring variability and quantization effects in artificial neural networks using the MNIST dataset T2 - Solid-state electronics N2 - This paper investigates the impact of introducing variability to trained neural networks and examines the effects of variability and quantization on network accuracy. The study utilizes the MNIST dataset to evaluate various Multi-Layer Perceptron configurations: a baseline model with a Single-Layer Perceptron and an extended model with multiple hidden nodes. The effects of Cycle-to-Cycle variability on network accuracy are explored by varying parameters such as the standard deviation to simulate dynamic changes in network weights. In particular, the performance differences between the Single-Layer Perceptron and the Multi-Layer Perceptron with hidden layers are analyzed, highlighting the network’s robustness to stochastic perturbations. These results provide insights into the effects of quantization and network architecture on accuracy under varying levels of variability. KW - Single-Layer Perceptron KW - Multi-Layer Perceptron KW - Cycle-to-Cycle variability KW - Quantization KW - Stochastic variability KW - Simulation Y1 - 2026 U6 - https://doi.org/10.1016/j.sse.2025.109296 SN - 0038-1101 VL - 232 SP - 1 EP - 4 PB - Elsevier BV CY - Amsterdam ER - TY - GEN A1 - Perez, Eduardo A1 - Maldonado, David A1 - Pechmann, Stefan A1 - Reddy, Keerthi Dorai Swamy A1 - Uhlmann, Max A1 - Hagelauer, Amelie A1 - Roldan, Juan Bautista A1 - Wenger, Christian T1 - Impact of the series resistance on switching characteristics of 1T1R HfO₂-based RRAM devices T2 - 2025 15th Spanish Conference on Electron Devices (CDE) N2 - This study investigates the influence of the series resistance (RS) on the switching characteristics of 1-transistor-1-resistor (1T1R) RRAM devices based on HfO2 and Al:HfO₂ dielectrics. Intrinsic RS values were extracted from I-V characteristics measured over 50 Reset-Set cycles at various gate voltages (VG) by using a numerical transformation method. Results reveal the contribution of the transistor’s resistance to the overall RS. A linear relationship between RS values and Set transition voltages (VTS) was found, with larger RS values amplifying the variability in switching parameters. Comparative analysis of cumulative distribution functions (CDFs) highlights differences between technologies, showing lower VTS values as well as lower sensitivity to RS for Al:HfO₂-based devices. These findings underscore the critical role of RS in modeling and optimizing the performance of RRAM devices for reliable operation. KW - RRAM KW - Memristive device Y1 - 2025 SN - 979-8-3315-9618-7 U6 - https://doi.org/10.1109/CDE66381.2025.11038868 SP - 1 EP - 4 PB - Institute of Electrical and Electronics Engineers (IEEE) CY - Piscataway, NJ ER - TY - GEN A1 - Maldonado, D. A1 - Acal, C. A1 - Ortiz, H. A1 - Navas-Gomez, F. A1 - Cantudo, A. A1 - Wenger, Christian A1 - Pérez, Eduardo A1 - Roldán, J.B. T1 - Variability in HfO₂-based memristors under pulse operation T2 - Microelectronic engineering N2 - We have studied device-to-device variability in TiN/Ti/HfO2/TiN devices under pulse operation. We measured extensively memristive devices that are CMOS integrated with different pulse trains, changing the pulse width and amplitude for groups of more than one hundred devices. The statistical parameters of the measured current were extracted to better understand the device physics under the pulse operation regime. An analytical model to describe synaptic depression and potentiation behavior in the device conductance is introduced, it fits accurately the means of the current data for all the pulse trains under study. In addition, an explanation of the measurements is enlightened with kinetic Monte Carlo simulations that allow the study of resistive switching at the atomic level. Finally, the probability distribution functions of the measured currents in some of the pulses within the pulse series employed are analyzed to extract the probability distribution that works better. A proposal for the implementation of device-to-device variability in the Stanford models is introduced. KW - RRAM KW - Resistive switching memory KW - Variability KW - Distribution function KW - Pulse operation KW - Memristive device Y1 - 2026 U6 - https://doi.org/10.1016/j.mee.2026.112445 SN - 0167-9317 VL - 304 SP - 1 EP - 8 PB - Elsevier BV CY - Amsterdam ER -