TY - GEN A1 - Ossorio, Óscar G. A1 - Vinuesa, Guillermo A1 - Garcia, Hector A1 - Sahelices, Benjamin A1 - Duenas, Salvador A1 - Castan, Helena A1 - Perez, Eduardo A1 - Mahadevaiah, Mamathamba Kalishettyhalli A1 - Wenger, Christian T1 - Performance Assessment of Amorphous HfO2-based RRAM Devices for Neuromorphic Applications T2 - ECS Transactions N2 - The use of thin layers of amorphous hafnium oxide has been shown to be suitable for the manufacture of Resistive Random-Access memories (RRAM). These memories are of great interest because of their simple structure and non-volatile character. They are particularly appealing as they are good candidates for substituting flash memories. In this work, the performance of the MIM structure that takes part of a 4 kbit memory array based on 1-transistor-1-resistance (1T1R) cells was studied in terms of control of intermediate states and cycle durability. DC and small signal experiments were carried out in order to fully characterize the devices, which presented excellent multilevel capabilities and resistive-switching behavior. KW - RRAM KW - resistive switching KW - HfO2 Y1 - 2021 U6 - https://doi.org/10.1149/10202.0029ecst SN - 1938-6737 SN - 1938-5862 VL - 102 IS - 2 SP - 29 EP - 35 ER - TY - GEN A1 - Perez, Eduardo A1 - Ossorio, Óscar G. A1 - Duenas, Salvador A1 - Castan, Helena A1 - García, Hector A1 - Wenger, Christian T1 - Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays T2 - Electronics (MDPI) N2 - A crucial step in order to achieve fast and low-energy switching operations in resistive random access memory (RRAM) memories is the reduction of the programming pulse width. In this study, the incremental step pulse with verify algorithm (ISPVA) was implemented by using different pulse widths between 10 μ s and 50 ns and assessed on Al-doped HfO 2 4 kbit RRAM memory arrays. The switching stability was assessed by means of an endurance test of 1k cycles. Both conductive levels and voltages needed for switching showed a remarkable good behavior along 1k reset/set cycles regardless the programming pulse width implemented. Nevertheless, the distributions of voltages as well as the amount of energy required to carry out the switching operations were definitely affected by the value of the pulse width. In addition, the data retention was evaluated after the endurance analysis by annealing the RRAM devices at 150 °C along 100 h. Just an almost negligible increase on the rate of degradation of about 1 μ A at the end of the 100 h of annealing was reported between those samples programmed by employing a pulse width of 10 μ s and those employing 50 ns. Finally, an endurance performance of 200k cycles without any degradation was achieved on 128 RRAM devices by using programming pulses of 100 ns width KW - RRAM KW - Reliability Y1 - 2020 U6 - https://doi.org/10.3390/electronics9050864 SN - 2079-9292 VL - 9 IS - 5 ER -