TY - CHAP A1 - Heim, S. A1 - Friedrich, Daniel A1 - Guttmann, P. A1 - Rehbein, S. A1 - Chumakov, Dmytro A1 - Ritz, Y. A1 - Schneider, G. A1 - Schmeißer, Dieter A1 - Zschech, Ehrenfried T1 - Dynamical X-ray Microscopy Study of Stress-Induced Voiding in Cu Interconnects KW - x-ray KW - Microscopy KW - Interconnects Y1 - 2009 UR - http://link.aip.org/link/?APCPCS/1143/20/1 ER - TY - CHAP A1 - Friedrich, Daniel A1 - Michling, Marcel A1 - Klocek, Jolanta A1 - Schmeißer, Dieter A1 - Avdoshenko, Stas A1 - Chumakov, Dmytro A1 - Zschech, Ehrenfried T1 - Study of C60 based films formation by NEXAFS T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 44 N2 - The C60 fullerenes and some of its -OH, -CF3 and -Cl derivates are candidates for application as ultra-low-k insulators in the semiconductor industry. Future preparation of thin films based on these materials requires the stability of the substituted fullerenes against chemical handling and processing steps. The latter issue was addressed by our NEXAFS studies that were done by synchrotron radiation at the beam line U49/2-PGM2 at BESSY II. Performed were the C K-edge NEXAFS studies in total fluorescence and total electron yield modes. The C60 based films were deposited on silicon by spraying from solutions. The influence of the different substitutional groups with C60 molecules was studied. The data were compared to the reference spectra of a pure C60 film. For C60(OH)24, C60-Cl2 and C60(CF3)12 a variance of the intensity of the π*-resonance as well as shift to higher energies of 0.5 eV (-OH), 0.6 eV (-F), 0.7 eV (-Cl) were observed. The results confirm the necessary stability of the used C60 derivatives and shall be used for optimization of the film deposition chemistry and conditions. Y1 - 2009 SN - 0420-0195 SP - S. 145 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Schmeißer, Dieter A1 - Tallarida, Massimo A1 - Henkel, Karsten A1 - Müller, Klaus A1 - Mandal, Dipankar A1 - Chumakov, Dmytro A1 - Zschech, Ehrenfried T1 - Characterization of oxidic and organic materials with synchrotron radiation based XPS and XAS KW - oxidic KW - organic KW - materials KW - synchrotron radiation KW - XPS KW - XAS Y1 - 2009 ER - TY - GEN A1 - Zagorodniy, Kostyantyn A1 - Chumakov, Dmytro A1 - Täschner, Christine A1 - Lukowiak, Anna A1 - Stegmann, Heiko A1 - Schmeißer, Dieter A1 - Geisler, Holm A1 - Engelmann, Hans-Jürgen A1 - Hermann, Helmut A1 - Zschech, Ehrenfried T1 - Novel Carbon-cage based ultralow-k materials: Modelling and first experiments KW - carbon-cage KW - ultralow-k Y1 - 2008 U6 - https://doi.org/10.1109/TSM.2008.2005396 ER - TY - GEN A1 - Kolanek, Krzysztof A1 - Hermann, Peter A1 - Dudek, Piotr T. A1 - Gotszalk, Teodor A1 - Chumakov, Dmytro A1 - Weisheit, Martin A1 - Hecker, Michael A1 - Zschech, Ehrenfried T1 - Local anodic oxidation by atomic force microscopy for nano-Raman strain measurements on silicon-germanium thin films T2 - Thin Solid Films KW - oxidation KW - microscope KW - measurements KW - thin films Y1 - 2010 SN - 0040-6090 VL - 518 IS - 12 SP - 3267 EP - 3272 ER -