TY - GEN A1 - Reif, Jürgen A1 - Schneider, Thomas A1 - Wolfframm, Dirk A1 - Schmid, Reiner P. T1 - Femtosecond nonlinear optical characterisation of silicon wafers: the role of symmetry T2 - Materials Science in Semiconductor Processing Y1 - 2001 UR - http://www.sciencedirect.com/science/article/pii/S1369800100001669 U6 - https://doi.org/10.1016/S1369-8001(00)00166-9 SN - 1369-8001 VL - 4 IS - 1-3 SP - 241 EP - 243 ER - TY - JOUR A1 - Reif, Jürgen A1 - Schmid, Reiner P. A1 - Schneider, Thomas A1 - Wolfframm, Dirk T1 - Nonlinear optical characterization of the surface of silicon wafers: In-situ detection of external stress Y1 - 2000 ER - TY - CHAP A1 - Reif, Jürgen A1 - Schneider, Thomas A1 - Schmid, Reiner P. A1 - Wolfframm, Dirk ED - Helvajian, Henry T1 - Nonlinear optical characterization of the surface of silicon wafers: In-situ detection of external stress T2 - Laser Applications in Microelectronics and Optoelectronic Manufacturing V, 24 - 26 January 2000, San Jose, USA Y1 - 2000 SN - 0-8194-3550-3 PB - SPIE CY - Bellingham, Wash. ER - TY - GEN A1 - Wolfframm, Dirk A1 - Kouteva-Arguirova, Simona A1 - Arguirov, Tzanimir V. A1 - Schmid, Reiner P. A1 - Dittmar, K. A1 - Zienert, I. A1 - Reif, Jürgen T1 - Hafnium oxide on silicon: A non-destructive characterization of the interfacial layer T2 - Solid State Phenomena Y1 - 2004 UR - http://www.scientific.net/SSP.95-96.653.pdf SN - 1662-9779 SN - 0377-6883 VL - 95-96 SP - 653 EP - 658 ER -