TY - BOOK A1 - Specht, Dieter A1 - Forkel, M. A1 - Weber, H. A1 - Specht, Dieter T1 - Fokus - Forschungskapazitäten und -seviceleistungen KW - Arbeitssystemgestaltung Y1 - 1993 PB - Berlin; Heidelberg u. a. : Springer ER - TY - CHAP A1 - Mai, Andreas A1 - Dauderstädt, Ulrike A1 - Pahner, D. A1 - Krellmann, M. A1 - Schmeißer, Dieter A1 - Wagner, M. T1 - In situ determination of laser induced degradation of micro-mirror arrays T2 - International Students and Young Scientists Workshop Photonics and Microsystems, Cottbus, Germany, 8 - 10 June 2011 N2 - The Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) develops spatial light modulators (SLMs) based on arrays of tiltable micro mirrors on a semiconductor chip. Typical applications are pattern generation for deepUV-laser mask writing or structured illumination in microscopy. Development and optimization of such SLMs requires detailed knowledge of the device behaviour under operating conditions. Here, the flatness of each single mirror effects the image resolution and contrast of the generated pattern and is amongst others a characteristic property of SLMs. In this context a surface topography measurement under laser exposure (in situ) was designed. The interferometric setup uses the phase-shift principle and allows a resolution in z-direction in the single-digit nanometer range. During irradiation with UV-laser light at 248 nm (KrF) and energy densities of up to 20 mJ/cm2 the change in single micro-mirrors topography was detected in situ. Measurementswith varying pulse energies were carried out to identify an impacton the device performance. In general, the setup is neither limited to a specific illumination wavelength nor to micro-mirrors as structures under test. KW - micro-mirror arrays KW - laser induced degradation Y1 - 2011 SN - 978-1-4577-1651-5 U6 - https://doi.org/10.1109/STYSW.2011.6155850 SP - 84 EP - 88 PB - IEEE CY - Piscataway, NJ ER - TY - RPRT A1 - Müller, Jörg A1 - Dieter, M. A1 - Bauhus, J. A1 - Spellmann, H. A1 - Möhring, B. A1 - Wagner, S. A1 - Wolf, Heino A1 - Niekisch, M. A1 - Weiger, H. A1 - Feindt, Peter H. A1 - Hamm, Ulrich A1 - Wätzold, Frank A1 - Wolters, Volkmar A1 - Engels, Eve-Marie A1 - Schraml, U. A1 - Lang, F. A1 - Pröbstl-Haider, U. A1 - Richter, K. T1 - Wege zu einem effizienten Waldnaturschutz in Deutschland. Stellungnahme Y1 - 2020 UR - http://www.fnr.de/fileadmin/allgemein/pdf/Effizienter_Waldnaturschutz_in_Deutschland.pdf PB - Wissenschaftlicher Beirat Waldpolitik und Wissenschaftlicher Beirat Biodiversität und Genetische Ressourcen beim BMEL ER - TY - JOUR A1 - Wieprecht, Wolfgang A1 - Stieler, M. A1 - Heinze, G. A1 - Möller, Detlev A1 - Riebel, Ulrich A1 - Hofmann, E. A1 - Sparmann, A. A1 - Kalaß, Dieter A1 - Acker, Karin A1 - Auel, Renate T1 - Droplet concentrations (LWC) and its chemical composition after gas cleaning in the lignite firwed power plant Jänschwalde (FRG) Y1 - 1998 ER - TY - BOOK A1 - Specht, Dieter A1 - Forkel, M. A1 - Weber, H. T1 - Semantic Modelling of Technical Objects KW - wissensbasierte Systeme KW - KI-Repräsentation KW - CAD Y1 - 1993 SN - 3540977546 PB - Berlin; Heidelberg u. a. : Springer ER - TY - JOUR A1 - Seyller, Th. A1 - Sieber, N. A1 - Graupner, R. A1 - James, D. A1 - Riley, J. A1 - Leckey, R. A1 - Polcik, M. A1 - Schmeißer, Dieter T1 - High Resolution Photoelectron Spectroscopy on SiC Surfaces Y1 - 2002 ER - TY - GEN A1 - Lewerenz, Hans-Joachim A1 - Aggour, Mohammed A1 - Murrell, Chris A1 - Kanis, M. A1 - Hoffmann, Patrick A1 - Jungblut, H. A1 - Schmeißer, Dieter T1 - Interface engineering of photoelectrochemically prepared Si surfaces N2 - The oxide of Si(111) formed by electropolishing in dilute ammonium fluoride solution is analysed by photoelectron spectroscopy using synchrotron radiation. The oxidiclayer is about 3.1 nm thick and contains Si-F-x species as well as oxyfluorides. The oxyfluorides are found preferentially at the electropolishing layer surface. SiOHspecies are concentrated at the oxidic film/substrate interface. The full width half maximum of the Si 2p line indicates that the Si/electropolishing oxide interface issmoother than the Si/natural oxide interface. KW - Mean Free Paths KW - Silicon KW - Range Y1 - 2002 ER - TY - CHAP A1 - Möller, Detlev A1 - Wieprecht, Wolfgang A1 - Hofmeister, J. A1 - Kalaß, Dieter A1 - Elbing, F. A1 - Ulbricht, M. T1 - Fog dissipation by dry ice blasting process mechanism T2 - Proceedings, 2nd International Conference on Fog and Fog Collection, St. John’s, Canada, July 15 - 20, 2001 Y1 - 2001 SN - 0-9683887-1-X SP - 485 EP - 491 CY - North York ER - TY - GEN A1 - Lewerenz, Hans-Joachim A1 - Aggour, Mohammed A1 - Murrell, Chris A1 - Kanis, M. A1 - Jungblut, H. A1 - Jakubowicz, J. A1 - Cox, P. A. A1 - Campbell, S. A. A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter T1 - Initial stages of structure formation on silicon electrodes investigated by photoelectron spectroscopy using synchrotron radiation and in-situ atomic force microscopy T2 - Journal of the Electrochemical Society N2 - The surface condition of electrochemically H-terminated Si is compared with the situation at the first photocurrent maximum in dilute acidic ammonium fluoride solution where the divalent dissolution converts into the four-valence process. The first high spectral-resolution photoelectron spectroscopy data using synchrotron radiation of electrochemically hydrogenated Si are presented. A combined electrochemistry/ultrahigh vacuum surface analysis system, attached to the U 49/2 beamline at the synchrotron Bessy II, is used for photoelectron spectroscopy (PES) of the electrochemically conditioned samples. We analyze the Si 2p, O 1s, and F 1s core levels. A comparison of a density functional theory calculation of the reaction sequence, proposed in the dissolution model of Gerischer and co-workers, with the PES results supports this model. The anodized sample is characterized by a residual H coverage of 0.35 monolayers evidenced by a surface core level shift, Si-OH and Si-Fx species, F-, and a higher oxidized Si species. SiO2 is not found. Even on very well H-terminated surfaces, we find residual Si-OH complexes, fluoride and water. In situ atomic force microscopy shows a roughening with a root mean square roughness parameter of 2.6 nm. %A92003 The Electrochemical Society. All rights reserved. Y1 - 2003 SN - 1945-7111 VL - 150 IS - 3 SP - E185 EP - E189 ER - TY - GEN A1 - Lewerenz, Hans-Joachim A1 - Murrell, Chris A1 - Jakubowicz, J. A1 - Aggour, Mohammed A1 - Kanis, M. A1 - Campbell, S. A. A1 - Cox, P. A. A1 - Hoffmann, Patrick A1 - Jungblut, H. A1 - Schmeißer, Dieter T1 - High Resolution Surface analysis of Si Roughenning in Dilute Ammonium Fluoride Solution T2 - Journal of Electroanalytical Chemistry N2 - The initial stages of porous Si formation on Si(111) in dilute ammonium fluoride solution are analysed by photoelectron spectroscopy using synchrotron radiation (SRPES). The PES results in the por-Si formation regime partly support a recent dissolution model. The contribution from the Si 2p surface core level shift shows that 0.35 ML of the surface is still H-terminated after interruption of the conditioning process at the first photocurrent maximum. Two signals shifted in binding energy by 0.8 and 1 eV, respectively, are attributed to reaction intermediates expected from the proposed reaction mechanism and from theoretical calculations using density functional theory (DFT). A distinct roughening is found in in-situ AFM measurements, with a calculated RMS roughness parameter of 2.6 nm. KW - Porous Si KW - transistors KW - Electropolishing KW - Photoelectron spectroscopy KW - AFM KW - Synchrotron radiation Y1 - 2003 SN - 1873-2569 VL - 540 SP - 3 EP - 6 ER - TY - JOUR A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter A1 - Soinski, M. S. T1 - Promieniowanie synchrotronowe jako uniwersalne narzedzie badawcze - Proby jego wykorzystania w badaniach struktury zeliwa Y1 - 2004 ER - TY - CHAP A1 - Henkel, Karsten A1 - Schwiertz, Carola A1 - Wagner, S. A1 - Valdeig, A. A1 - List, M. A1 - Schmeißer, Dieter T1 - Partikel- und Tropfendetektion im Mikrometerbereich mittels Schwingquarzen Y1 - 2003 SN - 3-935712-92-8 SP - 291 EP - 294 PB - w.e.b.-Univ.-Verl. CY - Dresden ER - TY - JOUR A1 - Specht, Dieter A1 - Gruß, Christian M. F. T1 - Revenue Management - sind Ertragssteigerungen auch für produzierende Unternehmen möglich? Y1 - 2005 ER - TY - JOUR A1 - Specht, Dieter A1 - Gruß, Christian M. F. T1 - Kontingentierungsansätze des Revenue Managements für produzierende Unternehmen Y1 - 2005 ER - TY - BOOK A1 - Specht, Dieter A1 - Gruß, Christian M. F. T1 - Modelüberblick zur optimalen Auftragsannahmeentscheidung für produzierende Unternehmen auf Basis des Revenue Management Ansatzes Y1 - 2007 SN - 978-3-937236-62-7 PB - München, TCW ER - TY - BOOK A1 - Specht, Dieter A1 - Gruß, Christian M. F. T1 - Revenue Management - eine Strategie für die Produktion in der Automobilindustrie? Y1 - 2007 SN - 978-3-8350-0932-5 PB - Deutscher Universitäts-Verlag CY - Wiesbaden ER - TY - JOUR A1 - Specht, Dieter A1 - Gruß, Christian M. F. A1 - Stefanska, Renata T1 - Erweiterte Zeiterfassungsmethodik zur Schwachstellenidentifikation im Prozessablauf Y1 - 2007 ER - TY - JOUR A1 - Specht, Dieter A1 - Stefanska, Renata A1 - Gruß, Christian M. F. T1 - Objektorientierter Ansatz zur Kostenbeeinflussung in den Frühphasen der Produktentstehung Y1 - 2008 ER - TY - JOUR A1 - Bieniek, Tomasz A1 - Beck, Romuald B. A1 - Jakubowski, Andrzej A1 - Konarski, Piotr A1 - Cwil, M. A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter T1 - Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation KW - ultrashallow KW - oxynitride Y1 - 2008 ER - TY - GEN A1 - Schwarzkopf, Jutta A1 - Dirsyte, R. A1 - Devi, A. A1 - Kwasniewski, A. A1 - Schmidbauer, M. A1 - Wagner, Gerd A1 - Michling, Marcel A1 - Schmeißer, Dieter A1 - Fornari, Robert T1 - Influence of Na on the structure of Bi4Ti3O12 films deposited by liquid-delivery spin MOCVD T2 - Thin solid films Y1 - 2011 SN - 0040-6090 VL - 519 IS - 17 SP - 5754 EP - 5759 ER -