TY - GEN A1 - Strobel, Carsten A1 - Alvarado Chavarin, Carlos A1 - Knaut, Martin A1 - Völkel, Sandra A1 - Albert, Matthias A1 - Hiess, Andre A1 - Max, Benjamin A1 - Wenger, Christian A1 - Kirchner, Robert A1 - Mikolajick, Thomas T1 - High Gain Graphene Based Hot Electron Transistor with Record High Saturated Output Current Density T2 - Advanced Electronic Materials N2 - Hot electron transistors (HETs) represent an exciting frontier in semiconductor technology, holding the promise of high-speed and high-frequency electronics. With the exploration of two-dimensional materials such as graphene and new device architectures, HETs are poised to revolutionize the landscape of modern electronics. This study highlights a novel HET structure with a record output current density of 800 A/cm² and a high current gain α, fabricated using a scalable fabrication approach. The HET structure comprises two-dimensional hexagonal boron nitride (hBN) and graphene layers wet transferred to a germanium substrate. The combination of these materials results in exceptional performance, particularly in terms of the highly saturated output current density. The scalable fabrication scheme used to produce the HET opens up opportunities for large-scale manufacturing. This breakthrough in HET technology holds promise for advanced electronic applications, offering high current capabilities in a practical and manufacturable device. KW - Graphene KW - Transistor Y1 - 2024 U6 - https://doi.org/10.1002/aelm.202300624 SN - 2199-160X VL - 10 IS - 2 ER - TY - GEN A1 - Strobel, Carsten A1 - Alvarado Chavarin, Carlos A1 - Leszczynski, Sebastian A1 - Richter, Karola A1 - Knaut, Martin A1 - Reif, Johanna A1 - Völkel, Sandra A1 - Albert, Matthias A1 - Wenger, Christian A1 - Bartha, Johann Wolfgang A1 - Mikolajick, Thomas T1 - Improved Graphene-base Heterojunction Transistor with Different Collector Semi-conductors for High-frequency Applications T2 - Advanced Materials Letters N2 - A new kind of transistor device with a graphene monolayer embedded between two n-type silicon layers is fabricated and characterized. The device is called graphene-base heterojunction transistor (GBHT). The base-voltage controls the current of the device flowing from the emitter via graphene to the collector. The transit time for electrons passing by the ultrathin graphene layer is extremely short which makes the device very promising for high frequency RF-electronics. The output current of the device is saturated and clearly modulated by the base voltage. Further, the silicon collector of the GBHT is replaced by germanium to improve the device performance. This enabled the collector current to be increased by almost three orders of magnitude. Also, the common-emitter current gain (Ic/Ib) increased from 10-3 to approximately 0.3 for the newly designed device. However, the ON-OFF ratio of the improved germanium based GBHT has so far been rather low. Further optimizations are necessary in order to fully exploit the potential of the graphene-base heterojunction transistor. KW - Graphene KW - transistor Y1 - 2022 U6 - https://doi.org/10.5185/amlett.2022.011688 SN - 0976-3961 VL - 13 IS - 1 ER - TY - GEN A1 - Strobel, Carsten A1 - Alvarado Chavarin, Carlos A1 - Wenger, Christian A1 - Albert, Matthias A1 - Mikolajick, Thomas T1 - Vertical Graphene-Based Transistors for Power Electronics, Optoelectronics and Radio-Frequency Applications T2 - IEEE Nanotechnology Materials and Devices Conference (NMDC), Paestum, Italy, 22-25 October 2023 N2 - The combination of two-dimensional materials, such as graphene, with established thin films offers great opportunities for enabling next-generation vertical transistors for various applications. This paper gives a brief overview about different vertical transistor concepts using twodimensional materials proposed so far, e.g. the hot electron transistor and the Barristor. With the arrival of twodimensional materials, the hot electron transistor also experienced a revival with predicted cut-off frequencies in the THz range. The Barristor overcomes the weak current saturation of lateral graphene field-effect transistors and high on-off ratios up to 107 were demonstrated, which are suitable parameters for logic applications. By combining a semiconductor-graphene-semiconductor design of the simplest hot electron transistor with the Barristor operating principle a new device, called graphene adjustable-barriers transistor, can be realized. This new device concept provides the potential for RF, power electronics, and optoelectronic applications. KW - Graphene Y1 - 2023 SN - 979-8-3503-3546-0 SN - 979-8-3503-3547-7 U6 - https://doi.org/10.1109/NMDC57951.2023.10344102 SN - 2473-0718 SP - 196 EP - 201 PB - Institute of Electrical and Electronics Engineers (IEEE) ER - TY - GEN A1 - Strobel, Carsten A1 - Alvarado Chavarin, Carlos A1 - Völkel, Sandra A1 - Jahn, Andreas A1 - Hiess, Andre A1 - Knaut, Martin A1 - Albert, Matthias A1 - Wenger, Christian A1 - Steinke, Olaff A1 - Stephan, Ulf A1 - Röhlecke, Sören A1 - Mikolajick, Thomas T1 - Enhanced Electrical Properties of Optimized Vertical Graphene-Base Hot Electron Transistors T2 - ACS Applied Electronic Materials N2 - The arrival of high-mobility two-dimensional materials like graphene leads to the renaissance of former vertical semiconductor–metal–semiconductor (SMS) hot electron transistors. Because of the monolayer thickness of graphene, improved SMS transistors with a semimetallic graphene-base electrode are now feasible for high-frequency applications. In this study we report about a device that consists of amorphous silicon, graphene, and crystalline silicon. For the first time, this device is fabricated by a four-mask lithography process which leads to significant improvements in the device performance. A strongly increased common-emitter current gain of 2% could be achieved while the on–off ratio improved to 1.6 × 105, which is already higher than predicted theoretically. This could be mainly attributed to better interface characteristics and decreased lateral dimensions of the devices. A cutoff frequency of approximately 26 MHz could be forecasted based on the DC measurements of the device. KW - Graphene KW - Transistor Y1 - 2023 U6 - https://doi.org/10.1021/acsaelm.2c01725 SN - 2637-6113 VL - 5 IS - 3 SP - 1670 EP - 1675 ER - TY - GEN A1 - Strobel, Carsten A1 - Alvarado Chavarin, Carlos A1 - Richter, Karola A1 - Knaut, Martin A1 - Reif, Johanna A1 - Völkel, Sandra A1 - Jahn, Andreas A1 - Albert, Matthias A1 - Wenger, Christian A1 - Kirchner, Robert A1 - Bartha, Johann Wolfgang A1 - Mikolajick, Thomas T1 - Novel Graphene Adjustable-Barrier Transistor with Ultra-High Current Gain T2 - ACS Applied Materials & Interfaces N2 - A graphene-based three terminal barristor device was proposed to overcome the low on/off ratios and insufficient current saturation of conventional graphene field effect transistors. In this study, we fabricated and analyzed a novel graphene-based transistor, which resembles the structure of the barristor but uses a different operating condition. This new device, termed graphene adjustable-barriers transistor (GABT), utilizes a semiconductor-based gate rather than a metal−insulator gate structure to modulate the device currents. The key feature of the device is the two graphene-semiconductor Schottky barriers with different heights that are controlled simultaneously by the gate voltage. Due to the asymmetry of the barriers, the drain current exceeds the gate current by several orders of magnitude. Thus, the GABT can be considered an amplifier with an alterable current gain. In this work, a silicon−graphene−germanium GABT with an ultra-high current gain (ID/IG up to 8 × 106) was fabricated, and the device functionality was demonstrated. Additionally, a capacitance model is applied to predict the theoretical device performance resulting in an on−off ratio above 106, a swing of 87 mV/dec, and a drivecurrent of about 1 × 106 A/cm2. KW - Graphene KW - Transistor Y1 - 2022 U6 - https://doi.org/10.1021/acsami.2c10634 SN - 1944-8244 SN - 1944-8252 VL - 14 IS - 34 SP - 39249 EP - 39254 ER -