TY - GEN A1 - Buß, Lars A1 - Falta, Jens A1 - Flege, Jan Ingo T1 - Intercalation dynamics of sulfur underneath graphene on Ru(0001) T2 - Verhandlungen der DPG N2 - It is known that the binding of epitaxially grown graphene to the substrate has a detrimental effect on its electronic properties. This is especially true for the strong binding to various transition metals and particularly ruthenium. However, via intercalation the interlayer coupling can be lifted and its unique electronic properties can be restored. Therefore, we have investigated the interaction of sulfur with single-layer graphene grown on Ru(0001) via surface segregation and CVD of ethylene under UHV conditions with in situ low-energy electron microscopy (LEEM) and micro-diffraction (µLEED). At elevated temperature and under dimethyl disulfide background pressure, we observe that sulfur intercalates through the open edges of the graphene islands. Prolonged exposure to sulfur induces wrinkling of the graphene islands, consistent with substantial relief of tensile strain after successful sulfur insertion underneath the graphene. It can be seen that the intercalation dynamics are both dependent on the temperature during intercalation and the preparation method of the graphene sheets. Furthermore, darkfield imaging and µLEED of the intercalated graphene reveal a graphene induced improved ordering of sulfur underneath. KW - low-energy electron microscopy (LEEM) KW - micro-diffraction (µLEED) Y1 - 2019 UR - https://www.dpg-verhandlungen.de/year/2019/conference/regensburg/part/o/session/7/contribution/9 SN - 0420-0195 SP - 315 EP - 315 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER - TY - GEN A1 - Mishra, Neeraj A1 - Forti, Stiven A1 - Fabbri, Filippo A1 - Martini, Leonardo A1 - McAleese, Clifford A1 - Conran, Ben R. A1 - Whelan, Patrick R. A1 - Shivayogimath, Abhay A1 - Jessen, Bjarke S. A1 - Buß, Lars A1 - Falta, Jens A1 - Aliaj, Ilirjan A1 - Roddaro, Stefano A1 - Flege, Jan Ingo A1 - Bøggild, Peter A1 - Teo, Kenneth B. K. A1 - Coletti, Camilla T1 - Wafer-Scale Synthesis of Graphene on Sapphire: Toward Fab-Compatible Graphene T2 - Small N2 - The adoption of graphene in electronics, optoelectronics, and photonics is hindered by the difficulty in obtaining high‐quality material on technologically relevant substrates, over wafer‐scale sizes, and with metal contamination levels compatible with industrial requirements. To date, the direct growth of graphene on insulating substrates has proved to be challenging, usually requiring metal‐catalysts or yielding defective graphene. In this work, a metal‐free approach implemented in commercially available reactors to obtain high‐quality monolayer graphene on c‐plane sapphire substrates via chemical vapor deposition is demonstrated. Low energy electron diffraction, low energy electron microscopy, and scanning tunneling microscopy measurements identify the Al‐rich reconstruction of sapphire to be crucial for obtaining epitaxial graphene. Raman spectroscopy and electrical transport measurements reveal high‐quality graphene with mobilities consistently above 2000 cm2 V−1 s−1. The process is scaled up to 4 and 6 in. wafers sizes and metal contamination levels are retrieved to be within the limits for back‐end‐of‐line integration. The growth process introduced here establishes a method for the synthesis of wafer‐scale graphene films on a technologically viable basis. KW - graphene on insulator KW - interface KW - metal free KW - sapphire KW - wafer scale Y1 - 2019 U6 - https://doi.org/10.1002/smll.201904906 SN - 1613-6810 SN - 1613-6829 VL - 15 IS - 50 ER - TY - GEN A1 - Sanchez-Barquilla, Raquel A1 - Tschammer, Rudi A1 - Buß, Lars A1 - Morales, Carlos A1 - Flege, Jan Ingo T1 - The relation between substrate, Sm alloy, and surface sensitivity of ceria (111)- and (100)-oriented nano-islands on Ru(0001) and Cu(111) T2 - Verhandlungen der DPG N2 - Inverse oxide/metal catalysis allows achieving better catalytic performance than its traditional counterpart. For example, in cerium-based inverse catalyst systems, the Ce3+ states have been shown to be the active sites for methanol synthesis. This suggests that the activity can be enhanced by promoting those through alloying with trivalent, catalytically active rare-earth metals, as, e.g. Sm. We present low-energy and X-ray photoemission electron microscopy (LEEM/XPEEM), investigations that show how epitaxially grown (100)- and (111)-oriented CeO2 islands may be modified and/or alloyed by post-deposited metallic Sm. For the Ce1−xSmxO2−δ/Ru(0001) system, the CeO2 (111)-oriented islands undergo a structural change, concomitant with a partial conversion from Ce4+ to Ce3+. Surprisingly, for Ce1−xSmxO2−δ/Cu(111) the result is found to be face-dependent since only (100)-oriented CeOx islands were reduced whereas the (111)-oriented islands remained unaltered. Both systems have been exposed to reducing (H2) and oxidizing (CO2) conditions, resulting in higher reduction and in a complete recovery of the Ce4+ states, respectively. These unexpected results indicate a complex interaction not only between cerium and the doping element, but also an intricate interplay with the metallic substrate. KW - ceria KW - low-energy electron microscopy (LEEM) KW - X-ray photoemission electron microscopy (XPEEM) KW - samarium KW - metal substrate influence on reduction KW - orientation Y1 - 2024 UR - https://www.dpg-verhandlungen.de/year/2024/conference/berlin/part/o/session/85/contribution/6 SN - 0420-0195 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -