TY - GEN A1 - Cuypers, Daniel A1 - Dorp, Dennis H. von A1 - Tallarida, Massimo A1 - Brizzi, Simone A1 - Conard, Thierry A1 - Rodriguez, Leonard A1 - Mees, M. A1 - Arnauts, Sophia A1 - Schmeißer, Dieter A1 - Adelmann, Christoph A1 - De Gendt, Stefan T1 - Study of InP Surfaces after Wet Chemical Treatments T2 - ECS Journal of Solid State Science and Technology N2 - The influence of different wet chemical treatments (HCl, H₂SO₄, NH₄OH) on the composition of InP surfaces is studied by using synchrotron radiation photoemission spectroscopy (SRPES). It is shown that a significant amount of oxide remains present after immersion in a NH₄OH solution which is ascribed to the insolubility of In³⁺ at higher pH values. Acidic treatments efficiently remove the native oxide, although components like Pᴼ, Inᴼ and P(2±Δ)+ suboxides are observed. Alternatively, the influence of a passivation step in (NH₄)₂S solution on the surface composition was investigated. The InP surface after immersion into (NH₄)₂S results in fewer surface components, without detection of Pᴼ and P(2±Δ)+ suboxides. Finally, slight etching of InP surfaces in HCl/H₂O₂ solution followed by a native oxide removal step, showed no significant effect on the surface composition. KW - Synchrotron Radiation Photoelectron Spectroscopy KW - Scanning Tunneling Microscopy KW - InP KW - Wet chemical treatment Y1 - 2014 U6 - https://doi.org/10.1149/2.005401jss SN - 2162-8777 SN - 2162-8769 VL - 3 IS - 1 SP - N3016 EP - N3022 ER - TY - GEN A1 - Cuypers, Daniel A1 - Dorp, Dennis H. von A1 - Tallarida, Massimo A1 - Brizzi, Simone A1 - Rodriguez, Leonard A1 - Conard, Thierry A1 - Arnauts, Sophia A1 - Schmeißer, Dieter A1 - Adelmann, Christoph A1 - De Gendt, Stefan T1 - Study of InP Surfaces after Wet Chemical Treatments T2 - ECS Transactions N2 - In this work synchrotron radiation photoemission spectroscopy (SRPES) is used to study InP surfaces after different wet chemical treatments. All results are compared to a typical fingerprint of surface components present on an as received InP sample. It is shown that acidified (HCl and H₂SO₄) treatments efficiently remove the native phosphate, although components like Pᴼ, Inᴼ and P(2±∆)+ remain present. In alkaline solution (NH₄OH) oxide remains present at the surface. As an alternative treatment, the immersion into (NH₄)₂S was studied. This passivation treatment results in fewer surface components which suggests that a higher quality surface is obtained. KW - Synchrotron Radiation Photoelectron Spectroscopy KW - InP KW - Wet chemical treatment Y1 - 2013 U6 - https://doi.org/10.1149/05806.0297ecst SN - 1938-6737 SN - 1938-5862 VL - 58 IS - 6 SP - 297 EP - 303 ER - TY - CHAP A1 - Cuypers, Daniel A1 - Dorp, Dennis H. von A1 - Tallarida, Massimo A1 - Brizzi, Simone A1 - Rodriguez, Leonard A1 - Conard, Thierry A1 - Arnauts, Sophia A1 - Schmeißer, Dieter A1 - Adelmann, Christoph A1 - De Gendt, Stefan T1 - Study of InP Surfaces After Wet Chemical Treatments T2 - Meeting Abstracts-Electrochemical Society, San Francisco, 2013 KW - Synchrotron Radiation Photoelectron Spectroscopy KW - InP KW - Wet chemical treatment Y1 - 2013 UR - http://ma.ecsdl.org/content/MA2013-02/30/2132.full.pdf+html N1 - MA2013-02(30) SP - S. 2132 PB - The Electrochemical Society ER -