TY - THES A1 - Goryachko, Andriy T1 - Investigations of perspective materials for aggressively scaled gate stacks and contact structures of MOS devices KW - silicon KW - praseodymium oxide KW - tungsten nitride KW - tungsten silicide KW - cobalt silicide KW - scanning tunneling microscopy KW - Angerelection spectroscopy Y1 - 2002 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:co1-000000342 UR - http://opus4.kobv.de/opus4-btu/frontdoor/index/index/docId/59 ER -