<?xml version="1.0" encoding="utf-8"?>
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  <doc>
    <id>5077</id>
    <completedYear/>
    <publishedYear>2000</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName>SPIE</publisherName>
    <publisherPlace>Bellingham, Wash.</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2011-02-14</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Nonlinear optical characterization of the surface of silicon wafers: In-situ detection of external stress</title>
    <parentTitle language="eng">Laser Applications in Microelectronics and Optoelectronic Manufacturing V, 24 - 26 January 2000, San Jose, USA</parentTitle>
    <identifier type="isbn">0-8194-3550-3</identifier>
    <enrichment key="UBICOIdent">005918</enrichment>
    <enrichment key="UBICOseries">SPIE proceedings series ; 3933</enrichment>
    <author>
      <firstName>Jürgen</firstName>
      <lastName>Reif</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <editor>
      <firstName>Henry</firstName>
      <lastName>Helvajian</lastName>
    </editor>
    <author>
      <firstName>Thomas</firstName>
      <lastName>Schneider</lastName>
    </author>
    <author>
      <firstName>Reiner P.</firstName>
      <lastName>Schmid</lastName>
    </author>
    <author>
      <firstName>Dirk</firstName>
      <lastName>Wolfframm</lastName>
    </author>
    <collection role="old_institute" number="01017">LS Leichtbau-Keramik</collection>
    <collection role="institutes" number="1504">FG Experimentalphysik und funktionale Materialien</collection>
    <collection role="institutes" number="2284">AG Physikalische Chemie II</collection>
  </doc>
</export-example>
