<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>24477</id>
    <completedYear/>
    <publishedYear>2019</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>395</pageFirst>
    <pageLast>402</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>193</volume>
    <type>articler</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation>ISC Konstanz e.V.</contributingCorporation>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2019-10-11</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">A two-step acidic texturization procedure for the manufacture of lowreflective multi-crystalline silicon solar wafer</title>
    <abstract language="eng">Texturization of multi-crystalline silicon wafers for photovoltaic application comprises the removal of the saw damage and shaping the topography of the bulk surface to create a surface with a low reflectivity, the so-called texture. Etching of multi-crystalline silicon wafers is usually carried out with acid mixtures consisting of hydrofluoric acid (HF), nitric acid (HNO₃) and hexafluorosilicic acid (H₂SiF₆). The present study reveals that such acid mixtures diluted by water or modified by the addition of ammonia solution, NH₃ (added as ammonium hydroxide solution, NH₄OH) can create textures with a significantly increased surface area exceeding that obtained by standard etching mixtures by a factor of 2.5–3. This yields a significantly reduced reflectivity of the etched wafer surface. However, the addition of water or NH₃ causes a very low etching rate, which makes such mixtures inapplicable for industrial application. To overcome this disadvantage, a two-step etching regime was developed to produce surface-enlarged solar wafers within a timespan typical for industrial production lines. This procedure comprises a first step of slow etching with a NH₃-modified etching mixture to pre-shape the ascut wafer surface. The second etching step is performed with a typical HF/HNO₃/H₂SiF₆ etching mixture that finalizes the texturization. Electrical measurements made on solar cells produced from such etched wafer confirm the improved surface quality of the two-step etched wafer compared to the reference wafer.</abstract>
    <parentTitle language="eng">Solar Energy</parentTitle>
    <identifier type="doi">10.1016/j.solener.2019.09.051</identifier>
    <identifier type="issn">0038-092X</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">false</enrichment>
    <author>
      <firstName>Birgit</firstName>
      <lastName>Meinel</lastName>
    </author>
    <submitter>
      <firstName>Jörg</firstName>
      <lastName>Acker</lastName>
    </submitter>
    <author>
      <firstName>Thomas</firstName>
      <lastName>Langner</lastName>
    </author>
    <author>
      <firstName>Pirmin</firstName>
      <lastName>Preis</lastName>
    </author>
    <author>
      <firstName>Eckard</firstName>
      <lastName>Wefringhaus</lastName>
    </author>
    <author>
      <firstName>Jörg</firstName>
      <lastName>Acker</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>acidic texturization</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>multi-crystalline silicon</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>reflectivity</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>solar cell parameter</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>topography</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>confocal microscopy</value>
    </subject>
    <collection role="institutes" number="2206">FG Physikalische Chemie</collection>
  </doc>
</export-example>
