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    <title language="eng">Silicate Formation at the Interface of Hf-Oxide and Pr-Oxide as a High-k Dielectric and Si(001) surfaces</title>
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    <completedDate>2008-06-18</completedDate>
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    <title language="eng">Ferromagnetic Semiconducting EuO Nanorods</title>
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    <author>
      <firstName>Matthew J.</firstName>
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      <firstName>Heinrich Theodor</firstName>
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    <completedDate>2008-06-19</completedDate>
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    <title language="eng">Composition and Electrical Properties of Ultra-Thin SiOxNy Layers Formed by rf Plasma Nitrogen Implantation/Plasma Oxidation Processes</title>
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    <enrichment key="UBICOquelle">Journal of Telecommunications and Information Technology 3(2007)S. 9 -15, 1509-4553</enrichment>
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    <enrichment key="UBICOquelle">Journal of Telecommunications and Information Technology 3(2007)S. 16-19, 1509-4553</enrichment>
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      <firstName>Romuald B.</firstName>
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    <title language="eng">Comparison of Composition of Ultra-Thin Silicon Oxynitride Layers´ fabricated by PECVD and Ultrashallow rf Plasma Ion Implantation</title>
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      <firstName>...</firstName>
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    <author>
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    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
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