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    <title language="eng">Transport of Sputtered Particles in Capacitive Sputter Sources</title>
    <parentTitle language="eng">Journal of Applied Physics</parentTitle>
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    <title language="eng">Nonlocal Behavior of the Excitation Rate in Highly Collisional RF Discharges</title>
    <parentTitle language="eng">Plasma Sources Science and Technology</parentTitle>
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    <title language="eng">Analytic model of the Energy Distribution Function for Highly Energetic Electrons in Technological Plasmas</title>
    <parentTitle language="eng">Journal of Applied Physics</parentTitle>
    <identifier type="doi">10.1063/1.4905943</identifier>
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    <identifier type="issn">0021-8979</identifier>
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    <author>
      <firstName>Sara</firstName>
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      <firstName>Madlen</firstName>
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      <firstName>Ralf Peter</firstName>
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    <author>
      <firstName>William N. G.</firstName>
      <lastName>Hitchon</lastName>
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    <id>18022</id>
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    <title language="eng">A Computational Analysis of the Vibrational Quanta of Molecular Oxygen in Low Pressure Stationary and Transient Radio-Frequency Oxygen Plasmas</title>
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    <author>
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      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
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    <author>
      <firstName>Jean-Paul</firstName>
      <lastName>Booth</lastName>
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    <author>
      <firstName>Pascal</firstName>
      <lastName>Chabert</lastName>
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    <author>
      <firstName>Jan van</firstName>
      <lastName>Dijk</lastName>
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    <author>
      <firstName>Thomas</firstName>
      <lastName>Mussenbrock</lastName>
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    <author>
      <firstName>Ralf Peter</firstName>
      <lastName>Brinkmann</lastName>
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  <doc>
    <id>18023</id>
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    <publishedYear>2016</publishedYear>
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    <language>eng</language>
    <pageFirst>020401</pageFirst>
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    <title language="eng">Electron Heating in Technological Plasmas</title>
    <parentTitle language="eng">Plasma Sources Science and Technology</parentTitle>
    <identifier type="doi">10.1088/0963-0252/25/2/020401</identifier>
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    <author>
      <firstName>Julian</firstName>
      <lastName>Schulze</lastName>
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      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
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      <firstName>Thomas</firstName>
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    <collection role="institutes" number="1102">FG Theoretische Elektrotechnik</collection>
  </doc>
  <doc>
    <id>18024</id>
    <completedYear/>
    <publishedYear>2016</publishedYear>
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    <language>eng</language>
    <pageFirst>015009</pageFirst>
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    <completedDate>2017-01-23</completedDate>
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    <title language="eng">A New Hybrid Scheme for Simulations of Highly Collisional RF-Driven Plasmas</title>
    <parentTitle language="eng">Plasma Sources Science and Technology</parentTitle>
    <identifier type="doi">10.1088/0963-0252/25/1/015009</identifier>
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    <author>
      <firstName>Denis</firstName>
      <lastName>Eremin</lastName>
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    <submitter>
      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
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      <firstName>Torben</firstName>
      <lastName>Hemke</lastName>
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      <firstName>Thomas</firstName>
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    <collection role="institutes" number="1102">FG Theoretische Elektrotechnik</collection>
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    <title language="eng">On the OES Line-Ratio Technique in Argon and Argon Containing Plasmas</title>
    <parentTitle language="eng">Journal of Physics D: Applied Physics</parentTitle>
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    <identifier type="issn">1361-6463</identifier>
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    <author>
      <firstName>Sarah</firstName>
      <lastName>Siepa</lastName>
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      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
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    <author>
      <firstName>Stephan</firstName>
      <lastName>Danko</lastName>
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    <author>
      <firstName>Tsanko V.</firstName>
      <lastName>Tsankov</lastName>
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    <author>
      <firstName>Thomas</firstName>
      <lastName>Mussenbrock</lastName>
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    <author>
      <firstName>Uwe</firstName>
      <lastName>Czarnetzki</lastName>
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    <collection role="institutes" number="1102">FG Theoretische Elektrotechnik</collection>
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    <id>21003</id>
    <completedYear/>
    <publishedYear>2017</publishedYear>
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    <language>eng</language>
    <pageFirst>085006</pageFirst>
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    <pageNumber>13</pageNumber>
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    <issue>8</issue>
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    <completedDate>2018-01-16</completedDate>
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    <title language="eng">The Effect of Realistic Heavy Particle Induced Secondary Electron Emission Coefficients on the Electron Power Absorption Dynamics in Single- and Dual-Frequency CCPs</title>
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    <identifier type="doi">10.1088/1361-6595/aa7c88</identifier>
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    <identifier type="issn">0963-0252</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <author>
      <firstName>Manaswi</firstName>
      <lastName>Daksha</lastName>
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    <submitter>
      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
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    <author>
      <firstName>Aranka</firstName>
      <lastName>Derzsi</lastName>
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    <author>
      <firstName>Sebastian</firstName>
      <lastName>Wilczek</lastName>
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    <author>
      <firstName>Jan</firstName>
      <lastName>Trieschmann</lastName>
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      <firstName>Thomas</firstName>
      <lastName>Mussenbrock</lastName>
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    <author>
      <firstName>Peter</firstName>
      <lastName>Awakowicz</lastName>
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    <author>
      <firstName>Zoltán</firstName>
      <lastName>Donkó</lastName>
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    <author>
      <firstName>Julian</firstName>
      <lastName>Schulze</lastName>
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    <completedDate>2018-01-16</completedDate>
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    <title language="eng">In Depth Nano Spectroscopic Analysis on Homogeneously Switching Double Barrier Memristive Devices</title>
    <parentTitle language="eng">Journal of Applied Physics</parentTitle>
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    <identifier type="issn">0021-8979</identifier>
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      <firstName>Sven</firstName>
      <lastName>Dirkmann</lastName>
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      <firstName>Krishna Kanth</firstName>
      <lastName>Neelisetty</lastName>
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      <firstName>Martin</firstName>
      <lastName>Ziegler</lastName>
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    <author>
      <firstName>Georg</firstName>
      <lastName>Haberfehlner</lastName>
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    <author>
      <firstName>Radian</firstName>
      <lastName>Popescu</lastName>
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    <author>
      <firstName>Gerald</firstName>
      <lastName>Kothleitner</lastName>
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    <author>
      <firstName>Venkata Sai Kiran</firstName>
      <lastName>Chakravadhanula</lastName>
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    <author>
      <firstName>Christian</firstName>
      <lastName>Kübel</lastName>
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    <author>
      <firstName>Hermann</firstName>
      <lastName>Kohlstedt</lastName>
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    <author>
      <firstName>Thomas</firstName>
      <lastName>Mussenbrock</lastName>
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    <author>
      <firstName>Lorenz</firstName>
      <lastName>Kienle</lastName>
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  </doc>
  <doc>
    <id>21006</id>
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    <publishedYear>2017</publishedYear>
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    <pageLast/>
    <pageNumber/>
    <edition/>
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    <volume>7</volume>
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    <creatingCorporation/>
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    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2018-01-16</completedDate>
    <publishedDate>--</publishedDate>
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    <title language="eng">Resistive switching in memristive electrochemical metallization devices</title>
    <parentTitle language="eng">AIP Advances</parentTitle>
    <identifier type="doi">10.1063/1.4985443</identifier>
    <identifier type="issn">2158-3226</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <enrichment key="Artikelnummer">065006</enrichment>
    <author>
      <firstName>Sven</firstName>
      <lastName>Dirkmann</lastName>
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    <submitter>
      <firstName>Madlen</firstName>
      <lastName>Herzig</lastName>
    </submitter>
    <author>
      <firstName>Thomas</firstName>
      <lastName>Mussenbrock</lastName>
    </author>
    <collection role="institutes" number="1102">FG Theoretische Elektrotechnik</collection>
  </doc>
</export-example>
