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    <completedDate>2016-04-21</completedDate>
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    <title language="eng">Imaging structure and composition homogeneity of 300 mm SiGe virtual substrates for advanced CMOS applications by scanning X-ray diffraction microscopy</title>
    <parentTitle language="eng">ACS Applied Materials and Interfaces</parentTitle>
    <identifier type="doi">10.1021/am508968b</identifier>
    <identifier type="issn">1944-8252</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <author>
      <firstName>Marvin Hartwig</firstName>
      <lastName>Zöllner</lastName>
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      <lastName>Tülling</lastName>
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    <author>
      <firstName>Marie-Ingrid</firstName>
      <lastName>Richard</lastName>
    </author>
    <author>
      <firstName>Gilbert A.</firstName>
      <lastName>Chahine</lastName>
    </author>
    <author>
      <firstName>Peter</firstName>
      <lastName>Zaumseil</lastName>
    </author>
    <author>
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      <lastName>Reich</lastName>
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    <author>
      <firstName>Giovanni</firstName>
      <lastName>Capellini</lastName>
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    <author>
      <firstName>Francesco</firstName>
      <lastName>Montalenti</lastName>
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    <author>
      <firstName>Anna</firstName>
      <lastName>Marzegalli</lastName>
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    <author>
      <firstName>Ya-Hong</firstName>
      <lastName>Xie</lastName>
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    <author>
      <firstName>Tobias U.</firstName>
      <lastName>Schülli</lastName>
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    <author>
      <firstName>Maik</firstName>
      <lastName>Häberlen</lastName>
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      <lastName>Storck</lastName>
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    <collection role="institutes" number="1521">FG Halbleitermaterialien</collection>
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    <title language="eng">Structural Mapping of Functional Ge Layers Grown on Graded SiGe Buffers for sub-10 nm CMOS Applications Using Advanced X-ray Nano-Diffraction</title>
    <parentTitle language="eng">ACS Applied Materials and Interfaces</parentTitle>
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    <identifier type="issn">1944-8252</identifier>
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      <firstName>Marion</firstName>
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    <author>
      <firstName>Marvin Hartwig</firstName>
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    <author>
      <firstName>Gilbert A.</firstName>
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      <lastName>Zaumseil</lastName>
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    <author>
      <firstName>Peter</firstName>
      <lastName>Storck</lastName>
    </author>
    <author>
      <firstName>Tobias U.</firstName>
      <lastName>Schülli</lastName>
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    <author>
      <firstName>Thomas</firstName>
      <lastName>Schröder</lastName>
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    <collection role="institutes" number="1521">FG Halbleitermaterialien</collection>
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