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    <publisherName>IEEE</publisherName>
    <publisherPlace>Piscataway, NJ</publisherPlace>
    <creatingCorporation/>
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    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2011-11-18</completedDate>
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    <title language="eng">Fullerene based materials for ultra-low-k application</title>
    <parentTitle language="eng">International Students and Young Scientists Workshop "Photonics and Microsystems", Szklarska, Poreba, Poland, 25 - 27 June 2010</parentTitle>
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      <firstName>K.</firstName>
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    <author>
      <firstName>A.</firstName>
      <lastName>Urbanowicz</lastName>
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    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
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    <author>
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    <author>
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  <doc>
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    <title language="eng">Studies of the chemical and electrical properties of fullerene and 3-aminopropyltrimethoxysilane based low-k materials</title>
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</export-example>
