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  <doc>
    <id>3591</id>
    <completedYear/>
    <publishedYear>2006</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2007-06-08</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Characterization of Nanocrystalline TiO2 - HfO2 Thin Films Prepared by Low Pressure Hot Target Reactive Magnetron Sputtering</title>
    <enrichment key="UBICOIdent">004289</enrichment>
    <enrichment key="UBICOquelle">Surface and Coatings Technology 200(2006)22/23, S. 6283-6287, 0257-8972</enrichment>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Guido</firstName>
      <lastName>Beuckert</lastName>
    </author>
    <author>
      <firstName>E. L.</firstName>
      <lastName>Prociow</lastName>
    </author>
    <author>
      <firstName>Angnieszka</firstName>
      <lastName>Borkowska</lastName>
    </author>
    <author>
      <firstName>Robert</firstName>
      <lastName>Kudrawiec</lastName>
    </author>
    <author>
      <firstName>J.</firstName>
      <lastName>Misiewicz</lastName>
    </author>
    <collection role="old_institute" number="01005">LS Angewandte Physik / Sensorik</collection>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>3592</id>
    <completedYear/>
    <publishedYear>2006</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
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    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2007-06-08</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Microstructure and Optical Properties of TiO2 Thin Films Prepared by Low Pressure Hot Target Reactive Magnetron Sputtering</title>
    <enrichment key="UBICOIdent">004290</enrichment>
    <enrichment key="UBICOquelle">Thin Solid Films 513(2006)1/2, S. 269-274, 0040-6090</enrichment>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <author>
      <firstName>Guido</firstName>
      <lastName>Beuckert</lastName>
    </author>
    <collection role="old_institute" number="01005">LS Angewandte Physik / Sensorik</collection>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>3807</id>
    <completedYear/>
    <publishedYear>2008</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2008-06-20</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Influence of Annealing on the Structure and Stoichiometry of Europium-Doped Titanium Dioxide Thin Films</title>
    <enrichment key="UBICOIdent">004537</enrichment>
    <enrichment key="UBICOquelle">Vacuum 82(2008)10, S. 1007-1012, 0042-207X</enrichment>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Angnieszka</firstName>
      <lastName>Borkowska</lastName>
    </author>
    <author>
      <firstName>Sebastian</firstName>
      <lastName>Müller</lastName>
    </author>
    <collection role="old_institute" number="01005">LS Angewandte Physik / Sensorik</collection>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>23504</id>
    <completedYear/>
    <publishedYear>2019</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>761</pageFirst>
    <pageLast>768</pageLast>
    <pageNumber/>
    <edition/>
    <issue>4</issue>
    <volume>36</volume>
    <type>articler</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2019-02-13</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations</title>
    <abstract language="eng">The paper presents results of investigations on surface properties of transparent semiconducting thin films based on (Ti-Cu)oxide system prepared using multi-magnetron sputtering system. The thin films were prepared using two programmed profiles of pulse widt hmodulation coefficient, so called V- and U-shape profiles. The applied powering profiles allowed fabrication of thin films with gradient distribution of Ti and Cu elements over the thickness of deposited layers. Optical investigations allowed determination of transparency of prepared films that reached up to 60 % in the visible part of optical radiation, which makes them attractive for the transparent electronics domain. Surface properties investigations showed that the surface of mixed (Ti-Cu)oxides was sensitive to adsorption, in particular to carbon dioxide and water vapor. Soft etching with argon ions resulted in surface cleaning from residuals, however, deoxidation of Cu-oxide components was also observed.</abstract>
    <parentTitle language="eng">Materials Science-Poland</parentTitle>
    <identifier type="doi">10.2478/msp-2018-0100</identifier>
    <identifier type="issn">0137-1339</identifier>
    <identifier type="issn">2083-1331</identifier>
    <identifier type="issn">2083-134X</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">false</enrichment>
    <author>
      <firstName>Tomasz</firstName>
      <lastName>Kotwica</lastName>
    </author>
    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Damian</firstName>
      <lastName>Wojcieszak</lastName>
    </author>
    <author>
      <firstName>Andrzej</firstName>
      <lastName>Sikora</lastName>
    </author>
    <author>
      <firstName>Małgorzata</firstName>
      <lastName>Kot</lastName>
    </author>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>surface</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>gradient distribution</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>thin film oxide</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>24053</id>
    <completedYear/>
    <publishedYear>2019</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber>15</pageNumber>
    <edition/>
    <issue/>
    <volume>175</volume>
    <type>articler</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2019-05-13</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Tailoring optical and electrical properties of thin-film coatings based on mixed Hf and Ti oxides for optoelectronic application</title>
    <abstract language="eng">In this work multi-magnetron sputtering stand was used for the deposition of the mixed oxides thin films based on HfO2 and TiO2. In order to obtain various material composition the power released to each magnetron (containing metallic hafnium and titanium targets) was precisely selected. Structural, surface, optical, electrical and mechanical properties of as-deposited coatings were analyzed. Depending on the hafnium content in the deposited thin films various types of the microstructure was obtained, i.e. HfO2-monoclinic, amorphous and TiO2-rutile. Increase of Ti content above 28 at. % in the as-prepared mixed oxides coatings caused their amorphization. It was found that with an increase of Ti content in prepared coatings their surface roughness and simultaneously water contact angle decreased. Performed measurements of electrical properties revealed that the lowest leakage current density in the range of 10−7 – 10−8 A/cm2 was obtained for amorphous coatings. Moreover, the tailoring of the dielectric constant was possible by a proper selection of material composition and microstructure of the deposited thin films. Average transparency in the visible wavelength region was in the range of ca. 79–86%. The influence of material composition and structure on shifting of the fundamental absorption edge and optical bandgap energy was also observed. The refractive index increased with an increase of Ti content, while extinction coefficient was the lowest for amorphous coatings. Additionally, hardness values were dependent on the material composition and optical packing density and were in the range from 7.6 GPa to 10.1 GPa.</abstract>
    <parentTitle language="eng">Materials and Design</parentTitle>
    <identifier type="doi">10.1016/j.matdes.2019.107822</identifier>
    <identifier type="issn">0264-1275</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <enrichment key="Artikelnummer">107822</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">false</enrichment>
    <author>
      <firstName>Agata</firstName>
      <lastName>Obstarczyk</lastName>
    </author>
    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Damian</firstName>
      <lastName>Wojcieszak</lastName>
    </author>
    <author>
      <firstName>Michał</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Tomasz</firstName>
      <lastName>Kotwica</lastName>
    </author>
    <author>
      <firstName>Roman</firstName>
      <lastName>Pastuszek</lastName>
    </author>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <author>
      <firstName>Piotr</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Małgorzata</firstName>
      <lastName>Kot</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Magnetron sputtering</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical coatings</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrical properties</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mixed oxides</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>HfO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>TiO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>High-k oxides</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Amorphous thin films</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>33133</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject_noref</type>
    <publisherName>Deutsche Physikalische Gesellschaft</publisherName>
    <publisherPlace>Bad Honnef</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2024-04-02</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Bare and Pd-doped ceria thin films prepared by ALD and EBE for hydrogen detection</title>
    <abstract language="eng">The need to store and use hydrogen safely as part of green economy based on renewable energy evokes a necessity to reliably detect it at ambient conditions. The majority of currently used sensors are working at elevated temperatures (200-500 °C). In this work, we demonstrate that ceria films deposited on a commercial electrode by atomic layer deposition (ALD) and electron beam evaporation (EBE) electrically respond to hydrogen (from 20 to 500 ppm) at much lower temperatures (50-200 °C). The results reveal that &lt;1.5 nm thin Pd adlayer increases the electrical response by several orders of magnitude for both ceria films. The NAP-XPS study under changing oxidative/reductive atmospheres sheds light on the mechanism of Pd-CeOx thermal activation and the role of the deposition technique in the reactivity of the oxide.</abstract>
    <parentTitle language="eng">Verhandlungen der DPG</parentTitle>
    <identifier type="issn">0420-0195</identifier>
    <identifier type="url">https://www.dpg-verhandlungen.de/year/2024/conference/berlin/part/o/session/59/contribution/5</identifier>
    <enrichment key="UBICOseries">Verhandlungen der DPG</enrichment>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">false</enrichment>
    <enrichment key="Fprofil">1 Energiewende und Dekarbonisierung / Energy Transition and Decarbonisation</enrichment>
    <enrichment key="Fprofil">4 Künstliche Intelligenz und Sensorik / Artificial Intelligence and Sensor Technology</enrichment>
    <author>
      <firstName>Yuliia</firstName>
      <lastName>Kosto</lastName>
    </author>
    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Paulina</firstName>
      <lastName>Kapuscik</lastName>
    </author>
    <author>
      <firstName>Rudi</firstName>
      <lastName>Tschammer</lastName>
    </author>
    <author>
      <firstName>Dominic</firstName>
      <lastName>Guttmann</lastName>
    </author>
    <author>
      <firstName>Ewa</firstName>
      <lastName>Mankowska</lastName>
    </author>
    <author>
      <firstName>Peter</firstName>
      <lastName>Matvija</lastName>
    </author>
    <author>
      <firstName>Carlos</firstName>
      <lastName>Morales</lastName>
    </author>
    <author>
      <firstName>Michał</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </author>
    <author>
      <firstName>Iva</firstName>
      <lastName>Matolinova</lastName>
    </author>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Jan Ingo</firstName>
      <lastName>Flege</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hydrogen sensor</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Atomic layer deposition (ALD)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ceria</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS)</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>33798</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber>12</pageNumber>
    <edition/>
    <issue/>
    <volume>417</volume>
    <type>articler</type>
    <publisherName>Elsevier BV</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2024-07-03</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Low temperature hydrogen sensor with high sensitivity based on CeOx thin film</title>
    <abstract language="eng">In this work, a 500 nm-thick cerium oxide thin film was prepared by electron beam evaporation. It was found that the deposition of 7 nm thick Pd catalyst was required for obtaining a sensor response to hydrogen. The Pd/CeOx sensing structure has a high response of 5000 towards 25 ppm H2 at a working temperature of 200 °C and exhibits a sensor response of 1.3 at temperatures near ambient. Furthermore, the sensing structure exhibited excellent response/recovery kinetics. The results confirm that the CeOx-based materials are a promising material for the fabrication of room-temperature hydrogen sensors.</abstract>
    <parentTitle language="eng">Sensors and Actuators B: Chemical</parentTitle>
    <identifier type="doi">10.1016/j.snb.2024.136148</identifier>
    <identifier type="issn">0925-4005</identifier>
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    <author>
      <firstName>Paulina</firstName>
      <lastName>Kapuścik</lastName>
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    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Damian</firstName>
      <lastName>Wojcieszak</lastName>
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    <author>
      <firstName>Patrycja</firstName>
      <lastName>Pokora</lastName>
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    <author>
      <firstName>Ewa</firstName>
      <lastName>Mańkowska</lastName>
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    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
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    <author>
      <firstName>Michał</firstName>
      <lastName>Mazur</lastName>
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      <firstName>Piotr</firstName>
      <lastName>Mazur</lastName>
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    <author>
      <firstName>Yuliia</firstName>
      <lastName>Kosto</lastName>
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    <author>
      <firstName>Carlos</firstName>
      <lastName>Morales</lastName>
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    <author>
      <firstName>Małgorzata</firstName>
      <lastName>Kot</lastName>
    </author>
    <author>
      <firstName>Jan Ingo</firstName>
      <lastName>Flege</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Cerium oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin film</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hydrogen sensing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Low operating temperature</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
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    <id>30703</id>
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    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
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    <issue>8</issue>
    <volume>23</volume>
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    <completedDate>2023-04-12</completedDate>
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    <title language="eng">Hydrogen Gas Sensing Properties of Mixed Copper–Titanium Oxide Thin Films</title>
    <abstract language="eng">Hydrogen is an efficient source of clean and environmentally friendly energy. However, because it is explosive at concentrations higher than 4%, safety issues are a great concern. As its applications are extended, the need for the production of reliable monitoring systems is urgent. In this work, mixed copper–titanium oxide ((CuTi)Ox) thin films with various copper concentrations (0–100 at.%), deposited by magnetron sputtering and annealed at 473 K, were investigated as a prospective hydrogen gas sensing material. Scanning electron microscopy was applied to determine the morphology of the thin films. Their structure and chemical composition were investigated by X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The prepared films were nanocrystalline mixtures of metallic copper, cuprous oxide, and titanium anatase in the bulk, whereas at the surface only cupric oxide was found. In comparison to the literature, the (CuTi)Ox thin films already showed a sensor response to hydrogen at a relatively low operating temperature of 473 K without using any extra catalyst. The best sensor response and sensitivity to hydrogen gas were found in the mixed copper–titanium oxides containing similar atomic concentrations of both metals, i.e., 41/59 and 56/44 of Cu/Ti. Most probably, this effect is related to their similar morphology and to the simultaneous presence of Cu and Cu2O crystals in these mixed oxide films. In particular, the studies of surface oxidation state revealed that it was the same for all annealed films and consisted only of CuO. However, in view of their crystalline structure, they consisted of Cu and Cu2O nanocrystals in the thin film volume.</abstract>
    <parentTitle language="eng">Sensors</parentTitle>
    <identifier type="issn">1424-8220</identifier>
    <identifier type="doi">10.3390/s23083822</identifier>
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    <enrichment key="Fprofil">1 Energiewende und Dekarbonisierung / Energy Transition and Decarbonisation</enrichment>
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    <author>
      <firstName>Ewa</firstName>
      <lastName>Mańkowska</lastName>
    </author>
    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Michał</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Piotr</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Małgorzata</firstName>
      <lastName>Kot</lastName>
    </author>
    <author>
      <firstName>Jan Ingo</firstName>
      <lastName>Flege</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>mixed copper–titanium oxides</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Cu2O</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>TiO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>(CuTi)Ox</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>hydrogen gas sensing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>magnetron sputtering</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
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  <doc>
    <id>30949</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
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    <pageLast/>
    <pageNumber>17</pageNumber>
    <edition/>
    <issue>10</issue>
    <volume>16</volume>
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    <completedDate>2023-05-23</completedDate>
    <publishedDate>--</publishedDate>
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    <title language="eng">WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations</title>
    <abstract language="eng">Hydrogen gas sensors have recently attracted increased interest due to the explosive nature of H2 and its strategic importance in the sustainable global energy system. In this paper, the tungsten oxide thin films deposited by innovative gas impulse magnetron sputtering have been investigated in terms of their response to H2. It was found that the most favourable annealing temperature in terms of sensor response value, as well as response and recovery times, was achieved at 673 K. This annealing process caused a change in the WO3 cross-section morphology from a featureless and homogenous form to a rather columnar one, but still maintaining the same surface homogeneity. In addition to that, the full-phase transition from an amorphous to nanocrystalline form occurred with a crystallite size of 23 nm. It was found that the sensor response to only 25 ppm of H2 was equal to 6.3, which is one of the best results presented in the literature so far of WO3 optical gas sensors based on a gasochromic effect. Moreover, the results of the gasochromic effect were correlated with the changes in the extinction coefficient and the concentration of the free charge carriers, which is also a novel approach to the understanding of the gasochromic phenomenon.</abstract>
    <parentTitle language="eng">Materials</parentTitle>
    <identifier type="issn">1996-1944</identifier>
    <identifier type="doi">10.3390/ma16103831</identifier>
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    <enrichment key="Fprofil">1 Energiewende und Dekarbonisierung / Energy Transition and Decarbonisation</enrichment>
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    <author>
      <firstName>Michał</firstName>
      <lastName>Mazur</lastName>
    </author>
    <submitter>
      <firstName>Karsten</firstName>
      <lastName>Henkel</lastName>
    </submitter>
    <author>
      <firstName>Paulina</firstName>
      <lastName>Kapuścik</lastName>
    </author>
    <author>
      <firstName>Wiktoria</firstName>
      <lastName>Weichbrodt</lastName>
    </author>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Piotr</firstName>
      <lastName>Mazur</lastName>
    </author>
    <author>
      <firstName>Małgorzata</firstName>
      <lastName>Kot</lastName>
    </author>
    <author>
      <firstName>Jan Ingo</firstName>
      <lastName>Flege</lastName>
    </author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Tungsten oxide (WO3)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>gas impulse magnetron sputtering</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>thin film</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>gasochromic properties</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>optical properties</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>annealing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>optical hydrogen gas sensor</value>
    </subject>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
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    <id>36259</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
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    <pageFirst>1</pageFirst>
    <pageLast>13</pageLast>
    <pageNumber>13</pageNumber>
    <edition/>
    <issue>13</issue>
    <volume>18</volume>
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    <publisherName>Wiley-VCH</publisherName>
    <publisherPlace>Weinheim</publisherPlace>
    <creatingCorporation/>
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    <completedDate>2025-07-08</completedDate>
    <publishedDate>--</publishedDate>
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    <title language="eng">Hydrogen sensing via heterolytic H₂ activation at room temperature by atomic layer deposited ceria</title>
    <abstract language="eng">Ultrathin atomic layer deposited ceria films (&amp;lt;20 nm) are capable of H2 heterolytic activation at room temperature, undergoing a significant reduction regardless of the absolute pressure, as measured under in‐situ conditions by near ambient pressure X‐ray photoelectron spectroscopy. ALD‐ceria can gradually reduce as a function of H2 concentration under H2/O2 environments, especially for diluted mixtures below 10 %. At room temperature, this reduction is limited to the surface region, where the hydroxylation of the ceria surface induces a charge transfer towards the ceria matrix, reducing Ce4+ cations to Ce3+. Thus, ALD‐ceria replicates the expected sensing mechanism of metal oxides at low temperatures without using any noble metal decorating the oxide surface to enhance H2 dissociation. The intrinsic defects of the ALD deposit seem to play a crucial role since the post‐annealing process capable of healing these defects leads to decreased film reactivity. The sensing behavior was successfully demonstrated in sensor test structures by resistance changes towards low concentrations of H2 at low operating temperatures without using noble metals. These promising results call for combining ALD‐ceria with more conductive metal oxides, taking advantage of the charge transfer at the interface and thus modifying the depletion layer formed at the heterojunction.</abstract>
    <parentTitle language="eng">ChemSusChem : chemistry, sustainability, energy, materials</parentTitle>
    <identifier type="doi">10.1002/cssc.202402342</identifier>
    <identifier type="issn">1864-5631</identifier>
    <enrichment key="Fprofil">4 Künstliche Intelligenz und Sensorik / Artificial Intelligence and Sensor Technology</enrichment>
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    <title language="eng">Influence of thermal modification on the gasochromic properties of WO₃ thin films fabricated by electron beam evaporation</title>
    <abstract language="eng">This paper describes the effect of post-deposition annealing on the structural and gasochromic properties of WO3 thin films deposited by electron beam evaporation and additionally decorated with a Pd catalyst layer of varying thickness. The WO3 layers were annealed at 800°C, which led to a phase transition from an amorphous to a monoclinic crystal structure, accompanied by an increase in surface roughness from 1.3 to 66 nm and the formation of a discontinuous island-like morphology with grain sizes up to 3 µm. The structural changes had a significant effect on the optical response of the layers to hydrogen. For the annealed samples, the absolute change in light transmission reached 20.2–20.9% for the 1.5 nm thick Pd catalyst and 7.7–9.2% for the 5 nm thick Pd catalyst at a wavelength of 850 nm. The corresponding optical response was 184–186% for the thin Pd layer and 353–396% for the thick Pd layer, depending on the hydrogen concentration (25–1000 ppm). The response time was reduced from 10 min at 25 ppm to &lt; 4 min at 1000 ppm, while the recovery time to the original state in air remained below 66 s under all conditions. XPS studies confirmed the reduction of W6+ to W5+ under the influence of hydrogen and reversible transition PdO - Pd, which correlates with the observed optical changes. The results show that annealing increases crystallinity and modifies porosity, which, in combination with the Pd catalyst directly affects the kinetics and magnitude of the gasochromic response.</abstract>
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For the annealed samples, the absolute change in light transmission (\u0394\n                    &lt;jats:italic&gt;T&lt;\/jats:italic&gt;\n                    ) reached 20.2\u201320.9% for the 1.5\u00a0nm thick Pd catalyst and 7.7\u20139.2% for the 5\u00a0nm thick Pd catalyst at a wavelength of\u00a0850\u00a0nm. The corresponding optical response was 184\u2013186% for the thin Pd layer and 353\u2013396% for the thick Pd layer, depending on the hydrogen concentration (25\u20131000\u00a0ppm). The response time was reduced from \u223c10min at 25\u00a0ppm to &amp;lt;4min at 1000\u00a0ppm, while the recovery time to the original state in air remained below 66\u00a0s under all conditions. XPS studies confirmed the reduction of W\n                    &lt;jats:sup&gt;6+&lt;\/jats:sup&gt;\n                    to W\n                    &lt;jats:sup&gt;5+&lt;\/jats:sup&gt;\n                    under the influence of hydrogen and reversible transition PdO\u2192Pd, which correlates with the observed optical changes. 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    <title language="eng">Correlation between electron beam evaporation conditions and sensor response of cerium oxide coatings</title>
    <abstract language="eng">Cerium oxide thin films were prepared by electron beam evaporation (EBE) under three deposition conditions: standard process, substrate heating at 200 °C, and ion beam assisted deposition (IBAD). The high optical transparency of the PVD-prepared coatings enables integration with transparent microelectronic devices, an aspect seldom explored in ceria-based gas sensors. Raman and optical analyses revealed various levels of oxygen vacancy-related defects in all films. Gas sensing measurements of the Pd/CeOx structures were correlated with their structural and electronic characteristics, including changes in Ce4+/Ce3+ ratios and band alignment during exposure to reducing gases, providing insight into the redox-driven sensing mechanism. All structures exhibit high ethanol sensitivity, while the highest response achieved for the films deposited with substrate heating and IBAD is consistent with their larger defect density and modified morphology. These findings demonstrate that tailoring EBE conditions provides an effective route to optimize CeOx thin films for improved gas sensing performance.</abstract>
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