<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>3591</id>
    <completedYear/>
    <publishedYear>2006</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2007-06-08</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Characterization of Nanocrystalline TiO2 - HfO2 Thin Films Prepared by Low Pressure Hot Target Reactive Magnetron Sputtering</title>
    <enrichment key="UBICOIdent">004289</enrichment>
    <enrichment key="UBICOquelle">Surface and Coatings Technology 200(2006)22/23, S. 6283-6287, 0257-8972</enrichment>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Guido</firstName>
      <lastName>Beuckert</lastName>
    </author>
    <author>
      <firstName>E. L.</firstName>
      <lastName>Prociow</lastName>
    </author>
    <author>
      <firstName>Angnieszka</firstName>
      <lastName>Borkowska</lastName>
    </author>
    <author>
      <firstName>Robert</firstName>
      <lastName>Kudrawiec</lastName>
    </author>
    <author>
      <firstName>J.</firstName>
      <lastName>Misiewicz</lastName>
    </author>
    <collection role="old_institute" number="01005">LS Angewandte Physik / Sensorik</collection>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
  <doc>
    <id>3807</id>
    <completedYear/>
    <publishedYear>2008</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2008-06-20</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Influence of Annealing on the Structure and Stoichiometry of Europium-Doped Titanium Dioxide Thin Films</title>
    <enrichment key="UBICOIdent">004537</enrichment>
    <enrichment key="UBICOquelle">Vacuum 82(2008)10, S. 1007-1012, 0042-207X</enrichment>
    <author>
      <firstName>Dieter</firstName>
      <lastName>Schmeißer</lastName>
    </author>
    <submitter>
      <firstName>...</firstName>
      <lastName>Administrator</lastName>
    </submitter>
    <author>
      <firstName>Jarosław</firstName>
      <lastName>Domaradzki</lastName>
    </author>
    <author>
      <firstName>Danuta</firstName>
      <lastName>Kaczmarek</lastName>
    </author>
    <author>
      <firstName>Angnieszka</firstName>
      <lastName>Borkowska</lastName>
    </author>
    <author>
      <firstName>Sebastian</firstName>
      <lastName>Müller</lastName>
    </author>
    <collection role="old_institute" number="01005">LS Angewandte Physik / Sensorik</collection>
    <collection role="institutes" number="1503">FG Angewandte Physik und Halbleiterspektroskopie</collection>
  </doc>
</export-example>
