<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>11544</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>163</pageFirst>
    <pageLast>170</pageLast>
    <pageNumber/>
    <edition/>
    <issue>10</issue>
    <volume>58</volume>
    <type>articler</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>2014-07-04</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Atomic layer deposition of thin oxide films for resistive switching</title>
    <parentTitle language="eng">Electrochemical Society (ECS) Transactions</parentTitle>
    <identifier type="doi">10.1149/05810.0163ecst</identifier>
    <identifier type="issn">1938-6737</identifier>
    <enrichment key="BTU">an der BTU erstellt / created at BTU</enrichment>
    <author>
      <firstName>K.</firstName>
      <lastName>Froehlich</lastName>
    </author>
    <submitter>
      <firstName>Marion</firstName>
      <lastName>Borrmann</lastName>
    </submitter>
    <author>
      <firstName>P.</firstName>
      <lastName>Jančovič</lastName>
    </author>
    <author>
      <firstName>B.</firstName>
      <lastName>Hudek</lastName>
    </author>
    <author>
      <firstName>J.</firstName>
      <lastName>Dérer</lastName>
    </author>
    <author>
      <firstName>A.</firstName>
      <lastName>Paskaleva</lastName>
    </author>
    <author>
      <firstName>Thomas</firstName>
      <lastName>Bertaud</lastName>
    </author>
    <author>
      <firstName>Thomas</firstName>
      <lastName>Schroeder</lastName>
    </author>
    <collection role="old_institute" number="01050">LS Halbleitermaterialien</collection>
    <collection role="institutes" number="1521">FG Halbleitermaterialien</collection>
  </doc>
</export-example>
