@misc{KotVorokhtaWangetal., author = {Kot, Małgorzata and Vorokhta, Mykhailo and Wang, Zhiping and Snaith, Henry J. and Schmeißer, Dieter and Flege, Jan Ingo}, title = {Thermal stability of CH3NH3PbIxCl3-x versus [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 perovskite films by X-ray photoelectron spectroscopy}, series = {Applied Surface Science}, volume = {513}, journal = {Applied Surface Science}, issn = {0169-4332}, doi = {10.1016/j.apsusc.2020.145596}, pages = {7}, abstract = {The thermal stability of CH3NH3PbIxCl3-x and [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 perovskite films was studied in-situ by X-ray photoelectron spectroscopy. It was found that below 85 °C both of them are relatively stable. After annealing above 85 °C, we observe a clear perovskite surface decomposition, i.e., a release of organic cations and creation of "metallic lead". The mixed cation lead mixed halide perovskite, however, decomposes at a much lower rate. For both perovskite films, the metallic to the total lead ratio changes with the same rate for the same annealing temperatures. The release of A-site cations from the ABX3 crystal structure of perovskite and/or creation of "metallic lead" causes also a small shift of the valence band maximum towards the Fermi level. The release of [HC(NH2)2]± or Cs± is not as significant as the release of CH3NH3±; therefore, it may explain why [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 solar cells are thermally more stable. Therefore, as the stability of CH3NH3PbIxCl3-x is same as the stability of [HC(NH2)2]0.83Cs0.17PbI2.7Br0.3 below 85 °C, there must be more severe degradation pathways that are currently underappreciated on the solar cell level.}, language = {en} } @misc{LaroussiKotFlegeetal., author = {Laroussi, Arwa and Kot, Małgorzata and Flege, Jan Ingo and Raouafi, Noureddine and Mirsky, Vladimir M.}, title = {Self-assembled monolayers from symmetrical di-thiols: Preparation, characterization and application for the assembly of electrochemically active films}, series = {Applied Surface Science}, volume = {513}, journal = {Applied Surface Science}, issn = {0169-4332}, doi = {10.1016/j.apsusc.2020.145827}, abstract = {1,3-dimercaptopropan-2-ol, a symmetrical di-thiol, has been synthesized and applied as a new type of anchor molecule to prepare a self-assembled monolayer (SAM) on the gold surface. The formed monolayers were studied by cyclic voltammetry, impedance spectroscopy, X-ray photoelectron spectroscopy, kinetic capacitance, and contact angle measurements. The SAM structure depends on the adsorption conditions. A short incubation time of the electrode at high concentration of this di-thiol leads to the predominating binding through one thiol group of the adsorbate to the gold surface, while a long incubation at low concentration leads to the predominating binding by both thiol groups. A comparative study of the desorption and replacement of SAMs indicates a strong stability increase when the SAM molecules bond gold surface by two bonds mainly. This monolayer was used to immobilize electrochemically active p-benzoquinone moiety. The surface concentration of p-benzoquinone obtained from cyclic voltammetry is 2.5 ± 0.2 × 10-10 mol·cm-2 which corresponds to the functionalization of 65 ± 5\% of SAM molecules. The obtained highly stable SAM with redox-active terminal group can be applied for different tasks of chemical sensing and biosensing. As an example, an application of this system for electrocatalytical oxidation of dihydronicotinamide adenosine dinucleotide (NADH) was tested.}, language = {en} } @misc{BoehnPenschkeLietal., author = {Boehn, Bernhard von and Penschke, Christopher and Li, Xiaoke and Paier, Joachim and Sauer, Joachim and Krisponeit, Jon-Olaf and Flege, Jan Ingo and Falta, Jens and Marchetto, Helder and Franz, Torsten and Lilienkamp, Gerhard and Imbihl, Ronald}, title = {Reaction dynamics of metal/oxide catalysts: Methanol oxidation at vanadium oxide films on Rh(111) from UHV to 10-2 mbar}, series = {Journal of Catalysis}, volume = {385}, journal = {Journal of Catalysis}, issn = {0021-9517}, doi = {10.1016/j.jcat.2020.03.016}, pages = {255 -- 264}, abstract = {Recent advances in in situ microscopy allow to follow the reaction dynamics during a catalytic surface reaction from ultra-high vacuum to 0.1 mbar, thus bridging a large part of the pressure gap. Submonolayer vanadium oxide films on Rh(111) have been studied during catalytic methanol oxidation in situ with spatially resolving imaging techniques. At 10-6 to 10-4 mbar VOx condenses into macroscopic circular islands that exhibit a substructure, consisting of a reduced island core and an oxidized outer ring. This substructure arises due to an oxygen gradient inside the VOx islands, which results in different coexisting 2D-phases of VOx on Rh(111). This substructure is also responsible for a "breathing-like" oscillatory expansion and contraction that the islands undergo under stationary conditions. Using density functional theory, the 2D-phase diagram of VOx on Rh(111) has been computed. The oscillatory behavior can be understood as a periodic phase transition between two 2D phases of VOx. With a newly developed near ambient pressure - low-energy electron microscope, it was shown that VOx islands disintegrate at 10-2 mbar, resulting in turbulent dynamics.}, language = {en} } @misc{FischerKrisponeitFoersteretal., author = {Fischer, Simon and Krisponeit, Jon-Olaf and Foerster, Michael and Aballe, Lucia and Falta, Jens and Flege, Jan Ingo}, title = {Massively Strained VO2 Thin Film Growth on RuO2}, series = {Crystal Growth \& Design}, volume = {20}, journal = {Crystal Growth \& Design}, number = {4}, issn = {1528-7483}, doi = {10.1021/acs.cgd.0c00120}, pages = {2734 -- 2741}, abstract = {Strain engineering vanadium dioxide thin films is one way to alter this material's characteristic first order transition from semiconductor to metal. In this study, we extend the exploitable strain regime by utilizing the very large lattice mismatch of 8.78\% occurring in the VO2/RuO2 system along the c axis of the rutile structure. We have grown VO2 thin films on single-domain RuO2 islands of two distinct surface orientations by atomic oxygen-supported reactive molecular beam epitaxy (MBE). These films were examined by spatially resolved photoelectron and X-ray absorption spectroscopy, confirming the correct stoichiometry. Low energy electron diffraction then reveals the VO2 films grow indeed fully strained on RuO2(110), exhibiting a previously unreported (2 × 2) reconstruction. On TiO2(110) substrates, we reproduce this reconstruction and attribute it to an oxygen-rich termination caused by the high oxygen chemical potential. On RuO2(100), on the contrary, the films grow fully relaxed. Hence, the presented growth method allows for simultaneous access to a remarkable strain window ranging from bulk-like structures to massively strained regions.}, language = {en} } @phdthesis{Yang, author = {Yang, Penghui}, title = {Impact of Alkali Treatments on the Surface and Interface Properties of Chalcopyrite Thin-Film Solar Cell Absorbers}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus4-51772}, pages = {159}, abstract = {This thesis focuses on the investigation and characterization of the surfaces and interfaces of chalcopyrite-based Cu(In,Ga)Se2 (CIGSe) thin film solar cells using various x-ray and electron spectroscopies. In particular, the impact of alkali post deposition treatments (PDT) on the chemical and electronic surface and interface structure of CdS/CIGSe absorbers is studied. The structure of "real world" CdS/CIGSe interfaces and how they are impacted by different alkali PDTs was investigated by a combination of different x-ray spectroscopies. The interface formation is characterized by studying sample sets with different CdS thicknesses. The chemical environment for indium and cadmium is revealed by deriving the modified Auger parameter α'(In) and α'(Cd) using the kinetic energy of most prominent Auger line together with the binding energy of the chosen core level. A more complex situation is found for CdS/CIGSe samples that underwent NaF+KF PDT, where a K-In-Se compound is initially present on top of the chalcopyrite absorber. The conversion of the K-In-Se type species into a Cd-In-(O,OH,S,Se) interface compound is recorded at short CBD-CdS deposition times. It appears the majority of K that is present at the surface of the NaF+KF PDT CIGSe absorber is dissolved in the CBD and partially re-deposited as K-O type species. The Cd/S ratio clearly deviates from the stoichiometry expected for CdS, and a Cd(O,OH,S)-like compound is likely formed. The electronic structure of CdS/CIGSe interface is similarly more complex for the NaF+KF PDT compared to the NaF PDT case, where only Cd(O,OH,S) buffer was formed. In an attempt to shed more light into this complex situation, the impact of evaporated alkali metals (K, Rb, Cs) on the surface structure of CIGSe was studied in-system by synchrotron-based hard x- ray photoelectron spectroscopy (HAXPES), aiming at understanding the underlying mechanism of the interfacial effect of alkalis on the performance of CIGSe devices. In the case of K deposition, two K species are observed by x-ray absorption near-edge structure (XANES) and HAXPES, one of which species disappears at high annealing temperature. Furthermore, three new In contributions (In-O and K-In-Se, metallic In species) can be observed after K evaporation. The evolution of chemical contribution supports the formation of a K-In-Se and Cu-poor CIGSe (1:3:5) bilayer structure that is similar to what was reported for "real world" NaF+KF PDTs. Deposition of heavy alkali metals (Rb, Cs) induced the formation of alkali selenide phases after alkali evaporation and during low temperature annealing. Similar chemical changes as seen for the K composition (i.e. presence of metallic In, In-O, and alkali-O) are observed. However, detailed analysis of the Alk/Se ratio and composition provide direct evidence for the formation of a Alk-(In)-Se and (Cu,Alk)(In, Ga)Se2 bilayer. The insights from these studies promise to provide crucial aid to fully exploit alkali pre-treatments in scientific and industrial CIGSe production, and will deliberate use of this means of surface/interface tailoring to push efficiencies even further.}, language = {en} } @misc{GomezAlvarezMoralesMendezetal., author = {Gomez-Alvarez, Miguel Angel and Morales, Carlos and M{\´e}ndez, Javier and Campo, Adolfo del and Urbanos, Fernando J. and D{\´i}az, Aar{\´o}n and Res{\´e}ndiz, Luis and Flege, Jan Ingo and Granados, Daniel and Soriano, Leonardo}, title = {A Comparative Study of the ZnO Growth on Graphene and Graphene Oxide: The Role of the Initial Oxidation State of Carbon}, series = {C - Journal of Carbon Research}, volume = {6}, journal = {C - Journal of Carbon Research}, number = {2}, issn = {2311-5629}, doi = {10.3390/c6020041}, pages = {18}, abstract = {The role of the oxidation state of carbon on the early stages of growth of metal oxides was studied for the particular case of ZnO deposition on graphene and graphene oxide on SiO2 (G/SiO2 and GO/SiO2, respectively) substrates. The growth was carried out by thermal evaporation of metallic Zn under an oxygen atmosphere at room temperature. This technique permits quasi-equilibrium conditions during the oxide growth, allowing the characterization of the fundamental interaction between ZnO and the graphene-based substrates. Although in both cases ZnO follows a Volmer-Weber growth mode controlled by nucleation at defects, the details are different. In the case of the GO/SiO2 substrate, the nucleation process acts as a bottleneck, limiting the coverage of the complete surface and allowing the growth of very large ZnO structures in comparison to G/SiO2. Moreover, by studying the Zn-LMM Auger spectra, it is shown how the initial nature of the substrate influences the composition of the ZnO deposit during the very early stages of growth in terms of Zn/O atomic ratio. These results are compared to those previously reported regarding ZnO growth on graphite and graphene on Cu (G/Cu). This comparison allows us to understand the role of different characteristics of graphene-based substrates in terms of number of defects, oxidation state, graphene support substrate and number of graphene layers.}, language = {en} } @misc{DasKotHellmannetal., author = {Das, Chittaranjan and Kot, Małgorzata and Hellmann, Tim and Wittich, Carolin and Mankel, Eric and Zimmermann, Iwan and Schmeißer, Dieter and Nazeeruddin, Mohammad Khaja and Jaegermann, Wolfram}, title = {Atomic Layer-Deposited Aluminum Oxide Hinders Iodide Migration and Stabilizes Perovskite Solar Cells}, series = {Cell Reports Physical Science}, volume = {1}, journal = {Cell Reports Physical Science}, number = {7}, issn = {2666-3864}, doi = {10.1016/j.xcrp.2020.100112}, pages = {18}, abstract = {Iodide migration causes degradation of the perovskite solar cells. Here,we observe the direct migration of iodide into the hole-transport layer in a device. We demonstrate that ultrathin room temperature atomic layer-deposited Al2O3 on the perovskite surface very effectively hinders the migration. The perovskite-Al2O3 interface enables charge transfer across the Al2O3 layer in the solar cells, without causing any drastic changes in the properties of the perovskite absorber. Furthermore, it helps to preserve the initial properties of the perovskite film during exposure to light and air under real operating conditions, and thus, improves the stability of the solar cells. The ultrathin Al2O3 layer deposited at room temperature significantly increases the lifetime of the perovskite solar cells, and we hope this may be a step toward the mass production of stable devices.}, language = {en} } @misc{FoersterSchenkZollneretal., author = {F{\"o}rster, Stefan and Schenk, Sebastian and Zollner, Eva Maria and Krahn, Oliver and Chiang, Cheng-Tien and Schumann, Florian O. and Bayat, Alireza and Schindler, Karl-Michael and Trautmann, Martin and Hammer, Ren{\´e} and Meinel, Klaus and Adeagbo, Waheed A. and Hergert, Wolfram and Flege, Jan Ingo and Falta, Jens and Ellguth, Martin and Tusche, Christian and DeBoissieu, Marc and Muntwiler, Matthias and Gerber, Thomas and Widdra, Wolf}, title = {Quasicrystals and their Approximants in 2D Ternary Oxides}, series = {Physia Status Solidi B}, volume = {257}, journal = {Physia Status Solidi B}, number = {7}, issn = {0370-1972}, doi = {10.1002/pssb.201900624}, pages = {11}, abstract = {2D oxide quasicrystals (OQCs) are recently discovered aperiodic, but well-ordered oxide interfaces. In this topical review, an introduction to these new thin-film systems is given. The concept of quasicrystals and their approximants is explained for BaTiO3 and SrTiO3 derived OQCs and related periodic structures in these 2D oxides. In situ microscopy unravels the high-temperature formation process of OQCs on Pt(111). The dodecagonal structure is discussed regarding tiling statistics and tiling decoration based on the results of atomically resolved scanning tunneling microscopy and various diffraction techniques. In addition, angle-resolved ultraviolet photoemission spectroscopy and X-ray photoelectron spectroscopy results prove a metallic character of the 2D oxide.}, language = {en} } @misc{KotKegelmannKoebleretal., author = {Kot, Małgorzata and Kegelmann, Lukas and K{\"o}bler, Hans and Vorokhta, Mykhailo and Escudero, Carlos and K{\´u}š, Peter and Šm{\´i}d, Břetislav and Tallarida, Massimo and Albrecht, Steve and Abate, Antonio and Matol{\´i}nov{\´a}, Iva and Schmeißer, Dieter and Flege, Jan Ingo}, title = {In situ Near-Ambient Pressure X-ray Photoelectron Spectroscopy Reveals the Influence of Photon Flux and Water on the Stability of Halide Perovskite}, series = {ChemSusChem}, volume = {13}, journal = {ChemSusChem}, number = {21}, issn = {1864-5631}, doi = {10.1002/cssc.202001527}, pages = {5722 -- 5730}, abstract = {For several years, scientists have been trying to understand the mechanisms that reduce the long-term stability of perovskite solar cells. In this work, we examined the effect of water and photon flux on the stability of CH3NH3PbI3 perovskite films and solar cells using in situ near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS), field emission scanning electron microscopy (FESEM), and current density-voltage (J-V) characterization. The used amount of water vapor (up to 1 mbar) had a negligible impact on the perovskite film. The higher the photon flux, the more prominent were the changes in the NAP-XPS and FESEM data; also, a faster decline in power conversion efficiency (PCE) and a more substantial hysteresis in the J-V characteristics were observed. Based on our results, it can be concluded that the PCE decrease originates from the creation of Frenkel pair defects in the perovskite film under illumination. The stronger the illumination, the higher the number of Frenkel defects, leading to a faster PCE decline and more substantial hysteresis in the J-V sweeps.}, language = {en} } @misc{KrisponeitFischerEsseretal., author = {Krisponeit, Jon-Olaf and Fischer, Simon and Esser, Sven and Moshnyaga, Vasily and Schmidt, Thomas and Piper, Louis F. J. and Flege, Jan Ingo and Falta, Jens}, title = {The morphology of VO2/TiO2(001): terraces, facets, and cracks}, series = {Scientific Reports}, volume = {10}, journal = {Scientific Reports}, issn = {2045-2322}, doi = {10.1038/s41598-020-78584-9}, pages = {8}, abstract = {Vanadium dioxide (VO2) features a pronounced, thermally-driven metal-to-insulator transition at 340 K. Employing epitaxial stress on rutile TiO2(001) substrates, the transition can be tuned to occur close to room temperature. Striving for applications in oxide-electronic devices, the lateral homogeneity of such samples must be considered as an important prerequisite for efforts towards miniaturization. Moreover, the preparation of smooth surfaces is crucial for vertically stacked devices and, hence, the design of functional interfaces. Here, the surface morphology of VO2/TiO2(001) films was analyzed by low-energy electron microscopy and diffraction as well as scanning probe microscopy. The formation of large terraces could be achieved under temperature-induced annealing, but also the occurrence of facets was observed and characterized. Further, we report on quasi-periodic arrangements of crack defects which evolve due to thermal stress under cooling. While these might impair some applicational endeavours, they may also present crystallographically well-oriented nano-templates of bulk-like properties for advanced approaches.}, language = {en} } @misc{MoralesLeinenFloresetal., author = {Morales, Carlos and Leinen, Dietmar and Flores, Eduardo and Mu{\~n}oz-Cortes, Esmeralda and Leardini, Fabrice and Ares, Jos{\´e} Ram{\´o}n and Flege, Jan Ingo and Soriano, Leonardo and Ferrer, Isabel J. and Sanchez, Carlos}, title = {Imaging the Kirkendall effect in pyrite (FeS2) thin films: Cross-sectional microstructure and chemical features}, series = {Acta Materialia}, volume = {205}, journal = {Acta Materialia}, issn = {1359-6454}, doi = {10.1016/j.actamat.2020.116582}, pages = {12}, abstract = {This investigation provides novel data on the structure and chemical composition of pyrite thin films and new hints concerning their formation mechanism. From TEM-HAADF data, it has been found that the films are composed of two different layers: one is very compact and the other one is quite porous with many voids separating a few groups of grains. This porous layer is always in direct contact with the substrate, and its thickness is quite similar to that of the original Fe film. The average size of pyrite grains is equal in both layers, what suggests that the same process is responsible for their formation. Concentration profiles of sulfur, iron and some impurities (mainly sodium and oxygen from the glass substrate) through both layers are given in this work, and thus chemical inhomogeneities of the films are proved by the obtained stoichiometric ratios (S/Fe). Moreover, Na from sodalime glass substrates mainly accumulates at the pyrite grain boundaries and barely dopes them. The obtained results support the hypothesis that the iron sulfuration process essentially induces the diffusion of iron atoms, what leads to the porous layer formation as a manifestation of the Kirkendall Effect. Therefore, it seems that the same mechanisms that operate in the synthesis of surface hollow structures at the nanoscale are also active in the formation of pyrite thin films ranging from several tens to hundreds of nanometers.}, language = {en} } @misc{GhoshSinhaXieetal., author = {Ghosh, Sujoy Kumar and Sinha, Tridib Kumar and Xie, Mengying and Bowen, Christopher Rhys and Garain, Samiran and Mahanty, Biswajit and Roy, Krittish and Henkel, Karsten and Schmeißer, Dieter and Kim, Jin Kuk and Mandal, Dipankar}, title = {Temperature-Pressure Hybrid Sensing All-Organic Stretchable Energy Harvester}, series = {ACS Applied Electronic Materials}, volume = {3}, journal = {ACS Applied Electronic Materials}, number = {1}, issn = {2637-6113}, doi = {10.1021/acsaelm.0c00816}, pages = {248 -- 259}, abstract = {The design and development of intrinsically stretchable all-organic self-powered sensors concurrently perceiving temperature and pressure remain a challenge but deliver an exciting platform to realize environmentally friendly wearable electronics. In this approach, a biomimetic all-organic stretchable energy harvester is designed by a xylitol-added poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) (PEDOT:PSS/Xyl) film as a compatible overlay electrode with polyaniline-reinforced one-dimensional aligned poly(vinylidene fluoride) hybrid electroactive soft nanowires. The gradient of elastic modulus between the electrode and the active nanowire component enables the all-organic device to manifest excellent power-generating performance under external temperature fluctuation (∼3 μW/m2 under ΔT ∼ 92 K) and mechanical force (∼31 μW/cm2 at 30 N). Importantly, the device renders simultaneous energy scavenging of temperature and pressure changes under pressing and stretching conditions (∼20\%). The excellent mechanosensitivity (∼100 mV/N), fast response time (∼1 ms), outstanding mechanical and thermal stability, and good temperature resolution <10 K enable the harvester to act as an epidermal sensor, which simultaneously detects and discriminates both subtle pressure and thermal deviations exposed to an epidermis surface. The real-time recording and wireless transferring of physiological signals to a smartphone indicate an effective way to realize remote healthcare monitoring for early intervention.}, language = {en} } @misc{EwertBussGenuzioetal., author = {Ewert, Moritz and Buß, Lars and Genuzio, Francesca and Mente{\c{s}}, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {Transitions from single-layer MoS2 to bilayer growth: A LEEM study}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, address = {Bad Honnef}, abstract = {Molybdenum disulfide (MoS2) is well-known to change from an indirect to a direct semiconductor as a single layer. We present insights from in-situ low-energy electron microscopy (LEEM) on the extended growth of MoS2 on the Au(111) surface at elevated temperatures of 720°C. Our continuous growth method leads to the formation of micron-sized single-layer MoS2 islands. The single-domain character of these islands is confirmed by employing dark-field imaging and micro-diffraction (LEED). This also reveals the distribution of 90:10 of the two expected MoS2 mirror domains on Au(111). Selected-area angle-resolved photoelectron spectroscopy (ARPES) measurements of these mirror domains underline the threefold symmetry of the two mirror domains and indicate the presence of MoS2 bilayer. Using X-ray photoemission electron microscopy (XPEEM) and intensity-voltage LEEM (I(V))-LEEM we identify the bilayer nucleation areas at nearly full surface coverage and propose a model pathway for their formation.}, language = {en} } @misc{JanowitzMahmoodinezhadNaumannetal., author = {Janowitz, Christoph and Mahmoodinezhad, Ali and Naumann, Franziska and Plate, Paul and Henkel, Karsten and Flege, Jan Ingo}, title = {XPS and UPS investigation of an ALD prepared Al2O3/ZnO heterojunction}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {The band alignment of two large band gap oxides was studied by a combination of XPS and UPS using consecutive sputter steps to unravel the electronic structure and elemental composition of each layer and the interface region. An Al2O3/ZnO heterointerface (10 nm Al2O3 on 59 nm ZnO) was grown on top of a Si single crystal substrate by consecutive thermal and plasma-assisted atomic layer deposition (ALD) respectively. The valence band maximum of Al2O3 was found to be 1.1 eV below that of ZnO, the conduction band minimum 2.3 eV above, resulting in a type-I staggered heterojunction. A reduction of ZnO to elemental Zn in the interface region was detected by the apparent shoulder of the Zn 2p and 2s core levels and by the Zn LMM Auger. This suggests an ALD interface formation mechanism different from previous models identified for other heterointerfaces.}, language = {en} } @misc{MahmoodinezhadMoralesNaumannetal., author = {Mahmoodinezhad, Ali and Morales, Carlos and Naumann, Franziska and Plate, Paul and Meyer, Robert and Janowitz, Christoph and Henkel, Karsten and Kot, Małgorzata and Flege, Jan Ingo}, title = {Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {Indium oxide thin films were deposited on Si (100) by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium (TMIn) and oxygen plasma (O2) in a low-temperature range of 80 to 200 °C. The In2O3 layers were characterized by in-situ spectroscopic ellipsometry (SE), ex-situ X-ray photoelectron spectroscopy (XPS) and electrical measurements. The SE data show a growth rate of 0.56 {\AA}/cycle within the ALD window (100 to 150 °C) with a thickness inhomogeneity of ≤1.2\%. In addition, the highest refractive index is 2.07 (at 632.8 nm) for the layer grown at 150 °C, and the films exhibit indirect and direct band gaps of 2.8±0.1 eV and 3.3±0.2 eV, respectively. XPS characterization indicates no carbon incorporation and a temperature-dependent off-stoichiometry of the layers. The chemical analysis of the In 3d and O 1s core levels confirms the formation of In-O bonds and suggests the additional presence of hydroxyl groups and defects. With increasing temperature, the contribution of OH groups and defects decreases whereas that of In-O bonds increases. Notably, higher growth temperatures result in an indium rich phase within the layers.}, language = {en} } @misc{MoralesMahmoodinezhadSchubertetal., author = {Morales, Carlos and Mahmoodinezhad, Ali and Schubert, Andreas Markus and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {Functional ultra-thin oxide films deposited by atomic layer deposition on structured substrates}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {In the last decades, atomic layer deposition (ALD) has gained prominence in the materials and surface science communities owing to its high potential for integration as a scalable process in microelectronics. ALD's largest strengths are its well-controlled layer-by-layer deposition and growth conformity on 3D structures. Yet, the ALD technique is also well known to lead to amorphous and defective, non-stoichiometric thin films, resulting in modified materials properties that may even preferentially be used in certain applications. To study these issues, we have developed an in-situ ALD reactor attached to an X-ray photoelectron spectroscopy (XPS) system, capable of switching between both pump and flow-type operation. This novel tool allows to cover the entire range of compounds and recipes used in ALD, thus clarifying the role of such defects at different deposition stages, growth conditions and film/substrate interfaces. To exemplify these sorts of studies, we show the deposition of Al2O3 5-10 nm films on nanostructured Si, and their use as substrates for functional CeOx ALD deposits.}, language = {en} } @misc{PozarowskaMoralesFlege, author = {Pozarowska, Emilia and Morales, Carlos and Flege, Jan Ingo}, title = {Growth of samarium thin films and subsequent oxidation on polycrystalline copper}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {The growth of samaria thin films on copper sheets has been chemically studied by in situ X-ray photoelectron spectroscopy (XPS). The early stages of growth (0.1-14 ML) were studied by consecutive evaporations of Sm by chemical vapor deposition followed by XPS measurements. Subsequently, samaria films of different thicknesses, namely 0.1, 1, and 14 ML, were oxidized at room temperature (RT). The evolution of the sample morphology was determined through inelastic peak shape analysis (IPSA) using the QUASES software as an indirect method to study the relationship between Sm oxidation state and its surface arrangement. Our results show that samarium grows as 2D islands up to 2ML, which is followed by 3D growth. Chemical analysis indicates that at low coverages (<0.5ML) Sm is already oxidized, leading to the appearance of Sm3+ as the only oxidation state. The increase in the intensity of the O1s peak with time and the absence of spectral changes in the Cu2p and LMM Auger (substrate) indicate that the transformation is mainly due to adventitious oxidation of the layer. With further deposition at RT the metallic state Sm0 appears at higher coverages, which is readily postoxidized by subsequent exposure to molecular oxygen, leading to complete oxidation. No intermediate oxidation states (Sm2+) were observed, in contrast to the reported prevalence of Sm2+ on single crystal surfaces during the early stages of growth.}, language = {en} } @misc{AngrickHenriksenMutzkeetal., author = {Angrick, Christoph and Henriksen, Annika and Mutzke, Nicole and Reimann, Andre and Ewert, Moritz and Buß, Lars and Falta, Jens and Flege, Jan Ingo and Donath, Markus}, title = {Spin-polarized VLEED from single-layer MoS2/Au(111): Investigation of spin-orbit-induced effects}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {The influence of spin-orbit interaction on low-energy electron reflection from single-layer MoS2 on Au(111) was studied by VLEED (very-low-energy electron diffraction) [1,2]. The spin-dependent electron reflection was investigated for a wide range of electron incidence angles and kinetic energies. Since the adlayer coverage is about 30\%, we studied the Au(111) substrate and a MoS2 bulk sample for comparison. This approach enabled us to distinguish between adlayer and substrate signals. For MoS2/Au(111), we detected a spin asymmetry of the reflected intensities, which shows a characteristic feature with alternating sign in the energy region of a VLEED fine structure [1]. The Au(111) substrate, in contrast, shows qualitatively different spin-asymmetry features, partially with reversed sign compared with MoS2/Au(111). The results of bulk MoS2 confirm that the characteristic feature in the single-layer data originates from MoS2. The influence of the adlayer-substrate interaction on the results will be discussed. [1] Burgbacher et al., Phys. Rev. B 87, 195411 (2013) [2] Angrick et al., J. Phys.: Condens. Matter 33, 115001 (2020)}, language = {en} } @misc{FischerFlegeFoersteretal., author = {Fischer, Simon and Flege, Jan Ingo and Foerster, Michael and Aballe, Lucia and Falta, Jens and Krisponeit, Jon-Olaf}, title = {Strongly Strained VO2 Thin Film Growth}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {The semiconductor-metal transition temperature of VO2 strongly shifts as a result of strain applied along the rutile c axis, making it interesting for various switching applications, as smart coatings and as sensors. In the past, this has been demonstrated, for instance, through the application of epitaxial strain on TiO2 substrates. We extend this tailoring approach by utilizing the much larger lattice mismatch of 8.78 \% occurring in the VO2/RuO2 system for orientations where the c axis lies in-plane. Depositing vanadium oxide by atomic oxygen-supported reactive MBE on an oxidized Ru(0001) template, we have grown VO2 thin films on single domain RuO2 islands with distinct orientations. Locally resolved electron spectroscopy was used to ascertain the correct stoichiometry of the grown VO2 films on all template island types. Low energy electron diffraction reveals the VO2 films to grow indeed fully strained on RuO2(110) but fully relaxed on RuO2(100). Hence, the presented template allows for simultaneous access to a remarkable strain window ranging from bulk-like structures to regions of massive tensile strain.}, language = {en} } @misc{PleinesBussMenteşetal., author = {Pleines, Linus and Buß, Lars and Mente{\c{s}}, Tevfik Onur and Genuzio, Francesca and Locatelli, Andrea and Flege, Jan Ingo and Falta, Jens}, title = {High temperature reduction and reoxidation of cerium oxide on Cu(111)}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {Cerium oxide is of great interest due to its technological importance in various electronic, optical and catalytic applications. The inverse model catalyst cerium oxide on Cu(111) shows a high activity for the production of methanol. Oxygen vacancies, e.g. in form of reduced ceria, are necessary for the production of methanol from CO2 and H2. The reduction of ceria may be achieved by exposure to H2 at elevated temperatures. We studied the interaction of H2 and CO2 with cerium oxide islands on a Cu(111) substrate with low-energy electron microscopy (LEEM) and x-ray absorption spectroscopy (XAS). From earlier studies, the orientation of the cerium oxide is known to be decisive for the catalytic activity. In our experiments, the impact of both orientations are directly compared via growth of (100) and (111) cerium oxide islands side by side. At temperatures around 550 °C, exposure to H2 leads to partial reduction and exposure to CO2 leads to complete reoxidation of the cerium oxide. The (100) and (111) orientations show different reduction and reoxidation behaviors.}, language = {en} } @misc{BussFaltaEwertetal., author = {Buß, Lars and Falta, Jens and Ewert, Moritz and Shao, Bin and Wehling, Tim Oliver and Flege, Jan Ingo}, title = {The role of two-dimensional pressure in sulfur intercalation underneath graphene on ruthenium}, series = {Verhandlungen der DPG - SurfaceScience21}, volume = {2021}, journal = {Verhandlungen der DPG - SurfaceScience21}, publisher = {Deutsche Physikalische Gesellschaft e.V.}, address = {Bad Honnef}, abstract = {Micrometer-sized single-layer graphene can epitaxially be grown on transition-metal substrates with excellent crystalline quality. However, due to strong binding these substrates have a detrimental influence on the intrinsic properties of the graphene. By lifting the interlayer coupling, e. g., via intercalating foreign atoms, its unique electronic properties can be restored. We have investigated the intercalation of sulfur underneath graphene on Ru(0001) with low-energy electron microscopy (LEEM) and micro-diffraction (µLEED). We find that sulfur deposited at elevated temperatures enters through the edge of the island, leading to wrinkle formation in the decoupled graphene. Interestingly, the presence of the graphene limits the possible S/Ru(0001) reconstructions that may form underneath, preventing less dense reconstructions like the p(2× 2) and (√3× √3) reconstructions. Based on density functional theory calculations, these findings are explained by a 2D pressure exerted by the overlying graphene, which results from the strong graphene-substrate interaction, only rendering the denser reconstructions of the S/Ru phase diagram energetically favorable.}, language = {en} } @misc{RichterChengCrumlinetal., author = {Richter, Matthias R. and Cheng, Wen-Hui and Crumlin, Ethan J. and Drisdell, Walter S. and Atwater, Harry A. and Schmeißer, Dieter and Lewis, Nathan S. and Brunschwig, Bruce S.}, title = {X‑ray Photoelectron Spectroscopy and Resonant X‑ray Spectroscopy Investigations of Interactions between Thin Metal Catalyst Films and Amorphous Titanium Dioxide Photoelectrode Protection Layers}, series = {Chemistry of Materials}, volume = {33}, journal = {Chemistry of Materials}, number = {4}, issn = {0897-4756}, doi = {10.1021/acs.chemmater.0c04043}, pages = {1265 -- 1275}, abstract = {The use of electrochemistry, X-ray photoelectron spectroscopy, and resonant X-ray spectroscopy has unlocked the paradox of interfacial hole conduction through amorphous TiO2 (a-TiO2) to deposited Ni, Ir, and Au metal catalysts. Although electrocatalysts for the oxygen-evolution reaction derived from metallic Ir and Ni have mutually similar overpotentials in alkaline media, Si/a-TiO2/Ir interfaces exhibit higher overpotentials than Si/a-TiO2/Ni interfaces. The data allow formulation of full band energy diagrams for n-Si/a-TiO2/metal interfaces for M = Ni, Ir, or Au. Although both Ni and Ir produce band bending in a-TiO2 favoring hole conduction, only Ni creates multiple states within the a-TiO2 band gap at the a-TiO2/Ni interface, which produces a quasi-metallic interface at the a-TiO2/Ni junction. Au, however, produces a flat-band interface that limits hole conduction without any new band gap states.}, language = {en} } @incollection{MuellerIsraelRachowetal., author = {M{\"u}ller, Klaus and Israel, Johannes and Rachow, Fabian and Schmeißer, Dieter}, title = {Sabatier-Based Direct Synthesis of Methane and Methanol Using CO2 from Industrial Gas Mixtures}, series = {Engineering Solutions for CO2 Conversion}, booktitle = {Engineering Solutions for CO2 Conversion}, editor = {Ramirez Reina, Tomas and Odriozola, Jos{\´e} Antonio and Arellano-Garc{\´i}a, Harvey}, edition = {1}, publisher = {Wiley-VCH}, address = {Weinheim}, isbn = {978-3-527-34639-4}, pages = {253 -- 280}, language = {en} } @misc{EwertBussBraudetal., author = {Ewert, Moritz and Buß, Lars and Braud, Nicolas and Kundu, Asish K. and Sheverdyaeva, Polina M. and Moras, Paolo and Genuzio, Francesca and Mente{\c{s}}, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {The Transition From MoS2 Single-Layer to Bilayer Growth on the Au(111) Surface}, series = {Frontiers in Physics}, volume = {9}, journal = {Frontiers in Physics}, issn = {2296-424X}, doi = {10.3389/fphy.2021.654845}, abstract = {The transition from single-layer to bilayer growth of molybdenum disulfide on the Au(111) surface is investigated by in situ low-energy electron and photoemission microscopy. By mapping the film morphology with nanometer resolution, we show that a MoS2 bilayer forms at the boundaries of single-layer single-domain MoS2 islands and next to merging islands whereas bilayer nucleation at the island centers is found to be suppressed, which may be related to the usage of dimethyl disulfide as sulfur precursor in the growth process. This approach, which may open up the possibility of growing continuous films over large areas while delaying bilayer formation, is likely transferable to other transition metal dichalcogenide model systems.}, language = {en} } @misc{MoralesLeinenCampoetal., author = {Morales, Carlos and Leinen, Dietmar and Campo, Adolfo del and Ares, Jos{\´e} Ram{\´o}n and S{\´a}nchez, Carlos and Flege, Jan Ingo and Guti{\´e}rrez, Alejandro and Prieto, Pilar and Soriano, Leonardo}, title = {Growth and characterization of ZnO thin films at low temperatures: from room temperature to -120 °C}, series = {Journal of Alloys and Compounds}, volume = {884}, journal = {Journal of Alloys and Compounds}, issn = {0925-8388}, doi = {10.1016/j.jallcom.2021.161056}, abstract = {ZnO thin films have been grown by e-beam evaporation in the range from room temperature to - 120 °C on two types of substrates, Al2O3 (0001) and Si (100). Although the ZnO/Al2O3 system has been thoroughly characterized, including optical and electrical techniques, the morphological, structural and chemical properties show no significant differences between both substrates. Thus, the general features of the ZnO growth mode at low temperature can be generalized. The relatively low growth temperatures reduce the diffusion of atoms at the surface, which leads to morphological and chemical changes. As the temperature decreases, the growth mode changes from a van der Drift model to a gradual bilayer system composed of an interfacial layer in contact with the substrate and a second columnar-based layer. This second well-ordered film disappears for the lowest temperatures while a Zn-rich interface in contact with the substrate emerges. Precisely from this interface, Zn-rich whiskers develop under the ZnO film and cause the loss of adhesion at temperatures below - 100 °C. These extreme temperatures also affect the crystal size, lattice strain, and total amount of oxygen vacancies. The behavior of the optical and electrical properties in terms of band gap, transparency, electrical resistivity, and Seebeck coefficient is discussed in the light of structural and chemical characterization. Samples grown at 0 °C exhibit an enhanced transmittance compared to those grown at room temperature while preserving similar electrical resistivity values and natural n-type doping. These results open a promising route to enhance ZnO films properties below the typical high temperature window.}, language = {en} } @misc{JugovacMenteşGenuzioetal., author = {Jugovac, Matteo and Mente{\c{s}}, Tevfik Onur and Genuzio, Francesca and Lachnitt, Jan and Feyer, Vitaliy and Flege, Jan Ingo and Locatelli, Andrea}, title = {Sensitivity to crystal stacking in low-energy electron microscopy}, series = {Applied Surface Science}, volume = {566}, journal = {Applied Surface Science}, issn = {0169-4332}, doi = {10.1016/j.apsusc.2021.150656}, abstract = {In this work we demonstrate the general characteristics of hcp and fcc stacking in low-energy electron reflectivity for transition metal surfaces, by following the restacking during homoepitaxial growth in real-time. For this purpose, the stacking of a model system, single-crystalline Ag islands during layer-by-layer growth at high temperature on O/W(110), is chosen. Multiple scattering calculations are used to model the relation between electron reflectivity and the crystal geometry. The changes in the electron reflectivity are shown to derive from the changes in the stacking sequence of the topmost surface layers. The results allow to distinguish between the hcp and fcc crystalline arrangements at a surface based on typical differences in the reflectivity curves, making the Ag results relevant for a variety of materials with hexagonal surface geometry. In particular, the multiplet structure within the first Bragg peak in the very low electron energy regime is identified with the fcc structure and thus it can be utilized as a fingerprint to determine the stacking sequence.}, language = {en} } @misc{LaroussiKotFlegeetal., author = {Laroussi, Arwa and Kot, Małgorzata and Flege, Jan Ingo and Raouafi, Noureddine and Mirsky, Vladimir M.}, title = {Self-Assembled Monolayers from Symmetrical Di-Thiols: Preparation, Characterization and Application for the Assembly of Electrochemically Active Films}, series = {Engineering Proceedings}, volume = {6}, journal = {Engineering Proceedings}, number = {1}, issn = {2673-4591}, doi = {10.3390/I3S2021Dresden-10112}, abstract = {1,3-dimercaptopropan-2-ol, a symmetrical di-thiol, has been synthesized and applied as a new type of anchor molecule to prepare a self-assembled monolayer (SAM) on a gold surface. The formed monolayers were studied by cyclic voltammetry, impedance spectroscopy, X-ray photoelectron spectroscopy, kinetic capacitance, and contact angle measurements. The SAM structure depends on the adsorption conditions. A short incubation time of the electrode at high concentration of this di-thiol leads to the predominating binding through one thiol group of the adsorbate to the gold surface, while a long incubation at low concentration leads to the predominating binding by both thiol groups. A comparative study of the desorption and replacement of SAMs indicates a strong stability increase when the SAM molecules bond gold surfaces by two bonds mainly. This monolayer was used to immobilize electrochemically active p-benzoquinone moiety. The surface concentration of p-benzoquinone obtained from cyclic voltammetry is 2.5 ± 0.2 × 10-10 mol cm-2, which corresponds to the functionalization of 65 ± 5\% of SAM molecules. The obtained highly stable SAM with redox-active terminal group can be applied for different tasks of chemical sensing and biosensing. As an example, an application of this system for electrocatalytical oxidation of dihydronicotinamide adenosine dinucleotide (NADH) was tested.}, language = {en} } @misc{MahmoodinezhadMoralesNaumannetal., author = {Mahmoodinezhad, Ali and Morales, Carlos and Naumann, Franziska and Plate, Paul and Meyer, Robert and Janowitz, Christoph and Henkel, Karsten and Kot, Małgorzata and Z{\"o}llner, Marvin Hartwig and Wenger, Christian and Flege, Jan Ingo}, title = {Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma}, series = {Journal of Vacuum Science and Technology A}, volume = {39}, journal = {Journal of Vacuum Science and Technology A}, number = {6}, issn = {0734-2101}, doi = {10.1116/6.0001375}, abstract = {Indium oxide (InxOy) thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium and oxygen plasma in a low-temperature range of 80-200 °C. The optical properties, chemical composition, crystallographic structure, and electrical characteristics of these layers were investigated by spectroscopic ellipsometry (SE), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), as well as current-voltage and capacitance-voltage measurements. The SE results yielded a nearly constant growth rate of 0.56 {\AA} per cycle and a thickness inhomogeneity of ≤1.2\% across 4-in. substrates in the temperature range of 100-150 °C. The refractive index (at 632.8 nm) was found to be 2.07 for the films deposited at 150 °C. The PEALD-InxOy layers exhibit a direct (3.3 ± 0.2 eV) and an indirect (2.8 ± 0.1 eV) bandgap with an uptrend for both with increasing substrate temperature. Based on XPS characterization, all InxOy samples are free of carbon impurities and show a temperature-dependent off-stoichiometry indicating oxygen vacancies. XRD diffraction patterns demonstrate an onset of crystallization at 150 °C. Consistent with the optical, XPS, and XRD data, the films deposited at ≥150 °C possess higher electrical conductivity. Our findings prove that a low-temperature PEALD process of InxOy is feasible and promising for a high-quality thin-film deposition without chemical impurities on thermally fragile substrates.}, language = {en} } @misc{DasZiaMortanetal., author = {Das, Chittaranjan and Zia, Waqas and Mortan, Claudiu and Hussain, Navid and Saliba, Michael and Flege, Jan Ingo and Kot, Małgorzata}, title = {Top-Down Approach to Study Chemical and Electronic Properties of Perovskite Solar Cells: Sputtered Depth Profiling Versus Tapered Cross-Sectional Photoelectron Spectroscopies}, series = {Solar RRL}, volume = {5}, journal = {Solar RRL}, number = {10}, issn = {2367-198X}, doi = {10.1002/solr.202100298}, abstract = {A study of the chemical and electronic properties of various layers across perovskite solar cell (PSC) stacks is challenging. Depth-profiling photoemission spectroscopy can be used to study the surface, interface, and bulk properties of different layers in PSCs, which influence the overall performance of these devices. Herein, sputter depth profiling (SDP) and tapered cross-sectional (TCS) photoelectron spectroscopies (PESs) are used to study highly efficient mixed halide PSCs. It is found that the most used SDP-PES technique degrades the organic and deforms the inorganic materials during sputtering of the PSCs while the TCS-PES method is less destructive and can determine the chemical and electronic properties of all layers precisely. The SDP-PES dissociates the chemical bonding in the spiro-MeOTAD and perovskite layer and reduces the TiO2, which causes the chemical analysis to be unreliable. The TCS-PES revealed a band bending only at the spiro-MeOTAD/perovskite interface of about 0.7 eV. Both the TCS and SDP-PES show that the perovskite layer is inhomogeneous and has a higher amount of bromine at the perovskite/TiO2 interface.}, language = {en} } @misc{GonzalezJuarezMoralesFlegeetal., author = {Gonzalez-Juarez, Maria de Lourdes and Morales, Carlos and Flege, Jan Ingo and Flores, Eduardo and Martin-Gonzalez, Marisol and Nandhakumar, Iris and Bradshaw, Darren}, title = {Tunable Carrier Type of a Semiconducting 2D Metal-Organic Framework Cu3(HHTP)2}, series = {ACS Applied Materials \& Interfaces}, volume = {14}, journal = {ACS Applied Materials \& Interfaces}, number = {10}, issn = {1944-8244}, doi = {10.1021/acsami.2c00089}, pages = {12404 -- 12411}, abstract = {In this work, a switch from n-type to p-type conductivity in electrodeposited Cu3(2,3,6,7,10,11-hexahydroxytriphenylene)2 [Cu3(HHTP2)] has been observed, which is most likely due to oxygen molecular doping. The synthesis of electrically conductive 2D metal-organic frameworks (MOFs) has been achieved through the introduction of highly conjugated organic linkers coordinated to their constituent metal-ion centers. However, the porous structure and unsaturated metal sites in MOFs make them susceptible to ambient adsorbates, which can affect their charge transport properties. This phenomenon has been experimentally investigated by GIXRD, Hall effect and Seebeck measurements, and X-ray photoelectron spectroscopy.}, language = {en} } @misc{JanowitzMahmoodinezhadKotetal., author = {Janowitz, Christoph and Mahmoodinezhad, Ali and Kot, Małgorzata and Morales, Carlos and Naumann, Franziska and Plate, Paul and Z{\"o}llner, Marvin Hartwig and B{\"a}rwolf, Florian and Stolarek, David and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {Toward controlling the Al2O3/ZnO interface properties by in situ ALD preparation}, series = {Dalton Transactions}, volume = {51}, journal = {Dalton Transactions}, issn = {1477-9234}, doi = {10.1039/D1DT04008A}, pages = {9291 -- 9301}, abstract = {An Al2O3/ZnO heterojunction was grown on a Si single crystal substrate by subsequent thermal and plasma-assisted atomic layer deposition (ALD) in situ. The band offsets of the heterointerface were then studied by consecutive removal of the layers by argon sputtering, followed by in situ X-ray photoelectron spectroscopy. The valence band maximum and conduction band minimum of Al2O3 are found to be 1.1 eV below and 2.3 eV above those of ZnO, resulting in a type-I staggered heterojunction. An apparent reduction of ZnO to elemental Zn in the interface region was detected in the Zn 2p core level and Zn L3MM Auger spectra. This suggests an interface formation different from previous models. The reduction of ZnO to Zn in the interface region accompanied by the creation of oxygen vacancies in ZnO results in an upward band bending at the interface. Therefore, this study suggests that interfacial properties such as the band bending as well as the valence and conduction band offsets should be in situ controllable to a certain extent by careful selection of the process parameters.}, language = {en} } @misc{KruszyńskaOstapkoOzkayaetal., author = {Kruszyńska, Joanna and Ostapko, Jakub and Ozkaya, Veysel and Surucu, Belkis and Szawcow, Oliwia and Nikiforow, Kostiantyn and Hołdyński, Marcin and Tavakoli, Mohammad Mahdi and Yadav, Pankaj and Kot, Małgorzata and Kołodziej, Grzegorz Piotr and Wlazło, Mateusz and Satapathi, Soumitra and Akin, Seckin and Prochowicz, Daniel}, title = {Atomic Layer Engineering of Aluminum-Doped Zinc Oxide films for Efficient and Stable Perovskite Solar Cells}, series = {Advanced Materials Interfaces}, volume = {9}, journal = {Advanced Materials Interfaces}, number = {17}, issn = {2196-7350}, doi = {10.1002/admi.202200575}, pages = {8}, abstract = {Atomic layer deposition (ALD) has been considered as an efficient method to deposit high quality and uniform thin films of various electron transport materials for perovskite solar cells (PSCs). Here, the effect of deposition sequence in the ALD process of aluminum-doped zinc oxide (AZO) films on the performance and stability of PSCs is investigated. Particularly, the surface of AZO film is terminated by diethylzinc (DEZ)/H2O (AZO-1) or trimethylaluminum (TMA)/H2O pulse (AZO-2), and investigated with surface-sensitive X-ray photoelectron spectroscopy technique. It is observed that AZO-2 significantly enhances the thermal stability of the upcoming methylammonium lead iodide (MAPbI3) layer and facilitates charge transport at the interface as evidenced by photoluminescence spectroscopes and favorable interfacial band alignment. Finally, planar-type PSC with AZO-2 layer exhibits a champion power conversion efficiency of 18.09\% with negligible hysteresis and retains 82\% of the initial efficiency after aging for 100 h under ambient conditions (relative humidity 40 ± 5\%). These results highlight the importance of atomic layer engineering for developing efficient and stable PSCs.}, language = {en} } @misc{MoralesPascualLeinenetal., author = {Morales, Carlos and Pascual, Antonio and Leinen, Dietmar and Flores, Eduardo and Mu{\~n}oz-Cortes, Esmeralda and Leardini, Fabrice and Ares, Jos{\´e} Ram{\´o}n and Flege, Jan Ingo and Soriano, Leonardo and Ferrer, Isabel J. and Sanchez, Carlos}, title = {Reaction Mechanism and Kinetic Model of Fe Thin Film Transformation into Monosulfides (FeS): First Step of the Fe Films Sulfuration Process into Pyrite}, series = {The Journal of Physical Chemistry C}, volume = {126}, journal = {The Journal of Physical Chemistry C}, number = {32}, issn = {1932-7455}, doi = {10.1021/acs.jpcc.2c02060}, pages = {13870 -- 13883}, abstract = {The sulfuration of metallic iron layers into pyrite (FeS2) is preceded by an initial stage characterized by the iron transformation into monosulfide, which acts as a precursor of the disulfide. This work presents a comprehensive reaction and kinetic model of the sulfuration reaction of metallic iron thin films into monosulfides when a molecular sulfur (S2) atmosphere is used. By slowing down the sulfuration reaction, we have been able to follow in situ the evolution of the transport properties (electrical resistivity and Seebeck coefficient) of the Fe films during their sulfuration reaction to monosulfides. We show that two different stages characterize this initial sulfuration: (1) the transformation of Fe into hexagonal pyrrhotite (Fe → Fe1-xSH) and (2) a partial crystallographic transformation of this hexagonal pyrrhotite into orthorhombic pyrrhotite (Fe1-xSH → Fe1-xSO). A two-step process can explain the pyrrhotite hexagonal phase formation, being first controlled by the surface adsorption of S2 on the external sample interface (S2/pyrrhotite) and second by the diffusion of Fe atoms through the formed pyrrhotite layer. By deducing the corresponding kinetic equations in terms of the experimental parameters (S2 partial pressure and thicknesses of the layers of present species), we can explain the evolution of the electrical resistance and Seebeck coefficient of the original Fe film during its transformation into monosulfide. At the same time, the appearance of the Kirkendall effect during the monosulfide phase formation is experimental and formally justified. The comprehensive description of this first stage of the complete sulfuration process of the Fe film into pyrite provides a layout to deeply discuss the influence of these intermedium phases on the final iron disulfide film characteristics and the appearance of potential film defects related to the experimental growth conditions.}, language = {en} } @misc{DasKediaZuoetal., author = {Das, Chittaranjan and Kedia, Mayank and Zuo, Weiwei and Mortan, Claudiu and Kot, Małgorzata and Flege, Jan Ingo and Saliba, Michael}, title = {Band Bending at Hole Transporting Layer-Perovskite Interfaces in n-i-p and in p-i-n Architecture}, series = {Solar RRL}, volume = {6}, journal = {Solar RRL}, number = {9}, issn = {2367-198X}, doi = {10.1002/solr.202200348}, abstract = {Interfaces between hybrid perovskite absorber and its adjacent charge-transporting layers are of high importance for solar cells performance. Understanding their chemical and electronic properties is a key step in designing efficient and stable perovskite solar cells. In this work, the tapered cross-section photoemission spectroscopy (TCS-PES) method is used to study the methylammonium lead iodide (CH3NH3PbI3) (MAPI)-based solar cells in two configurations, that is, in an inverted p-i-n and in a classical n-i-p architecture. It is revealed in the results that the MAPI film deposited once on the n-type TiO2 and once on the p-type NiOx substrates is neither an intrinsic semiconductor nor adapts to the dopant nature of the substrate underneath, but it is heavily n-type doped on both substrates. In addition to that, the TCS-PES results identify that the band bending between the MAPI film and the hole transporting layer (HTL) layer depends on the perovskite solar cells architecture. In particular, a band bending on the HTL side in the n-i-p and at the MAPI in the p-i-n architecture is found. The flat band of NiOx at the NiOx/MAPI interface can be explained by the Fermi level pinning of the NiOx at the interface.}, language = {en} } @misc{EwertBussGenuzioetal., author = {Ewert, Moritz and Buß, Lars and Genuzio, Francesca and Mente{\c{s}}, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {On the transition from MoS2 single-layer to bilayer growth on the Au(111) surface}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {MoS2 is well known for changing from an indirect to a direct band-gap semiconductor as a single layer. Here, for the model system MoS2/Au(111), we present in-situ studies of the continued growth of micron-size single-layer MoS2 islands including the first formation of bilayer patches. We have used angle-resolved photoemission spectroscopy from micrometer sized regions to investigate the local band structure of the islands' rims and centers, showing a prevalence for bilayer and single-layer formation at the rims and centers, respectively. The bilayer patches can clearly be identified locally on the few nanometer scale employing intensity-voltage low-energy electron microscopy as a fingerprinting method. Astonishingly, micro-spot low-energy electron diffraction hints toward the nucleation of the second layer of the MoS2 between the single layer MoS2 and the Au(111) substrate when the step bunches formed by the single-terrace growth mechanism become sufficiently high.}, language = {en} } @misc{PleinesBussMenteşetal., author = {Pleines, Linus and Buß, Lars and Mente{\c{s}}, Tevfik Onur and Genuzio, Francesca and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {In-situ characterization of cyclic reduction and reoxidation of CeOx(111) and CeOx(100) islands on Cu(111)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Cerium oxide (CeOx) is of special interest due to its catalytic activity and various other electronic and optical applications. The inverse model catalyst CeOx on Cu(111) has a high activity for methanol synthesis from H2 and CO2. For the activation of CO2, Ce3+ sites have to be present at the surface, which means that the CeOx has to be reduced to some extent. This may be achieved by exposure to H2 at elevated temperatures. We studied the interaction of H2 and CO2 with CeOx islands on Cu(111) with low-energy electron microscopy (LEEM) and X-ray absorption spectroscopy (XAS). From earlier studies, the orientation of the CeOx is known to be decisive for its catalytic activity. In our experiments (100) and (111) CeOx islands are grown side by side on the metal substrate, so that identical reaction conditions prevail during the experiment. At a high temperature of 550 ∘C, exposure to H2 leads to partial reduction, and exposure to CO2 leads to reoxidation of the CeOx. The differences observed for the two island orientations regarding structure and composition will be discussed.}, language = {en} } @misc{KotDasKegelmannetal., author = {Kot, Małgorzata and Das, Chittaranjan and Kegelmann, Lukas and K{\"o}bler, Hans and Vorokhta, Mykhailo and Escudero, Carlos and Albrecht, Steve and Abate, Antonio and Flege, Jan Ingo}, title = {Application of atomic layer deposition and x-ray photoelectron spectroscopy in perovskite solar cells}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {In this work we have utilized near-ambient pressure and ultra-high vacuum X-ray photoelectron spectroscopy as well as atomic layer deposition to investigate perovskite solar cells (PSCs). We have demonstrated that ultrathin room temperature atomic layer-deposited aluminium oxide on the perovskite surface very effectively suppresses iodine migration[1] and improves the long term stability and efficiency of PSCs [2,3]. Furthermore, exposure to light proves more detrimental to the perovskite film than exposure to water vapor.[2] Absorbed photons create Frenkel defects in the perovskite crystal and their number strongly depends on the used illumination. The higher the photon flux, the higher the concentration of Frenkel defects, and thus the stronger the degradation of power conversion efficiency and the stronger the hysteresis in the J-V characteristics. [1] C. Das, M. Kot et al., Cell Reports Physical Science 2020, 1, 100112. [2] M. Kot et al., ChemSusChem 2020, 13, 5722. [3] M. Kot et al., ChemSusChem 2018, 11, 3640.}, language = {en} } @misc{PozarowskaPleinesPrietoetal., author = {Pozarowska, Emilia and Pleines, Linus and Prieto, Mauricio J. and Tănase, Liviu Christian and Souza Caldas, Lucas de and Tiwari, Aarti and Schmidt, Thomas and Falta, Jens and Morales, Carlos and Flege, Jan Ingo}, title = {The relation between structure sensitivity and doping of ceria(111) vs. ceria(100)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {CeOx-Cu inverse catalysts have been shown to convert CO2 into valuable chemicals through catalytic hydrogenation. The catalytic activity may further be enhanced by alloying ceria with trivalent, catalytically active metals, such as Sm, promoting the formation of Ce3+ active sites. In this work, the structural and chemical properties of (111)- and (100)- oriented CeOx islands alloyed with samarium were explored by low-energy electron microscopy and X-ray photoemission electron microscopy. After Sm deposition on the as-grown CeOx islands, the near-surface region of (100)-oriented CeOx is reduced after exposure to H2 at 470 ∘C, whereas the deeper layers as well as the whole (111)-oriented islands retain the Ce4+ state. Subsequent reoxidation with O2 leads to the complete Ce4+ state recovery, suggesting the healing of oxygen vacancies. Additional annealing at 470 ∘C induces samarium diffusion into the ceria matrix. Yet, subsequent exposure to H2 reduces neither the (111)- nor the (100)-oriented CeSmOx islands, suggesting a quite unexpected stability of this system.}, language = {en} } @misc{BoehnWeissbachKrisponeitetal., author = {Boehn, Bernhard von and Weißbach, Anton and Krisponeit, Jon-Olaf and Flege, Jan Ingo and Falta, Jens and Gregoratti, Luca and Amati, Matteo and Zeller, Patrick and Imbihl, Ronald}, title = {Phase Separation within Vanadium Oxide Islands under Reaction Conditions: Methanol Oxidation at Vanadium Oxide Films on Rh(111)}, series = {The Journal of Physical Chemistry C}, volume = {126}, journal = {The Journal of Physical Chemistry C}, number = {45}, issn = {1932-7455}, doi = {10.1021/acs.jpcc.2c04174}, pages = {19101 -- 19112}, abstract = {Submonolayer coverages of V-oxide on Rh(111) condense during catalytic methanol oxidation into a pattern of macroscopic stripes or islands. Under reaction conditions, a phase separation occurs within the VOx islands that has been studied in a pressure range of 10-6-10-4 mbar with photoemission electron microscopy (PEEM), low-energy electron microscopy (LEEM), microspot-low-energy electron diffraction (μLEED), and microspot-X-ray photoelectron spectroscopy (μXPS). An oxidized outer ring with a (√7 × √7)R19.1° structure coexists with an inner (12 × 12) Moir{\´e}-type boundary layer and a reduced core exhibiting a (√3 × √3)R30° Moir{\´e} type pattern. The dependence of the substructure on the reaction conditions, on V coverage, and on island size was investigated. With μXPS, the V coverages of the different phases in the VOx islands were determined.}, language = {en} } @phdthesis{Mahmoodinezhad, author = {Mahmoodinezhad, Ali}, title = {Atomic layer deposition and characterization of metal oxide thin films}, address = {Cottbus}, doi = {10.26127/BTUOpen-6134}, pages = {187}, abstract = {This thesis describes low temperature growth of wide band gap metal oxide thin films deposited by thermal (T-) and plasma-enhanced (PE-) atomic layer deposition (ALD) techniques in which high quality materials are grown with atomic level precision. Metal oxides are extensively investigated due to their exceptional physical and chemical properties, including relatively wide band gap, high dielectric constant and high thermal stability. This variety of properties results in a wide range of different applications. Thin films of indium oxide (InOx), gallium oxide (GaOx), zinc oxide (ZnOx), and quaternary InOx/GaOx/ZnOx (IGZO), in addition to the well-known aluminum oxide (AlOx), and the catalyst cerium oxide (CeOx), have proven to be superior candidates for many applications; from microelectronics and optoelectronics to gas sensor devices. The demanding requirements of low-temperature deposition processes for thermal sensitive substrates, which include high layer homogeneity and conformality over large areas, makes ALD a pioneer deposition technique. Although many oxides have been grown by TALD and PEALD, the deposition of wide band gap oxides at low temperatures are rarely reported and/or being investigated. In this work, the deposition method of the individual binary oxide films and combining the respective binary processes into the developed super-cycle growth of quaternary compound have been investigated at relatively low-temperatures by TALD and PEALD. Besides, the growth characteristics and chemical properties of the deposited films were evaluated by in-situ and ex-situ characterization techniques such as spectroscopic ellipsometry (SE) and X-ray photoelectron spectroscopy (XPS), where the influence of ALD process parameters on the growth mechanism and films composition are discussed in detail for any potential applications.}, language = {en} } @misc{EwertBussLauritsenetal., author = {Ewert, Moritz and Buß, Lars and Lauritsen, Jeppe V. and Falta, Jens and Flege, Jan Ingo}, title = {Growth Mechanism of Single-Domain Monolayer MoS2 Nanosheets on Au(111) Revealed by In Situ Microscopy: Implications for Optoelectronics Applications}, series = {ACS Applied Nano Materials}, volume = {5}, journal = {ACS Applied Nano Materials}, number = {12}, issn = {2574-0970}, doi = {10.1021/acsanm.2c03584}, pages = {17702 -- 17710}, abstract = {The nucleation and growth of single-layer molybdenum disulfide single-domain nanosheets is investigated by in situ low-energy electron microscopy. We study the growth of micrometer-sized flakes and the correlated flattening process of the gold surface for three different elevated temperatures. Furthermore, the influence of surface step edges on the molybdenum disulfide growth process is revealed. We show that both nanosheet and underlying terrace grow simultaneously by pushing the surface step in the expansion process. Our findings point to an optimized growth procedure allowing for step-free, single-domain, single-layer islands of several micrometers in size, which is likely transferable to other transition-metal dichalcogenides (TMDs), offering a very fine degree of control over the TMD nanosheet structure and thickness.}, language = {en} } @misc{ZiaMalekshahiByranvandRudolphetal., author = {Zia, Waqas and Malekshahi Byranvand, Mahdi and Rudolph, Toby and Rai, Monika and Kot, Małgorzata and Das, Chittaranjan and Kedia, Mayank and Zohdi, Mohammadreza and Zuo, Weiwei and Yeddu, Vishal and Saidaminov, Makhsud I. and Flege, Jan Ingo and Kirchartz, Thomas and Saliba, Michael}, title = {MAPbCl3 Light Absorber for Highest Voltage Perovskite Solar Cells}, series = {ACS Energy Letters}, volume = {9}, journal = {ACS Energy Letters}, issn = {2380-8195}, doi = {10.1021/acsenergylett.3c02777}, pages = {1017 -- 1024}, abstract = {Perovskite solar cells (PSCs) excel in achieving high open-circuit voltages (VOC) for narrow bandgaps (∼1.6 eV) but face challenges with wide-bandgap perovskites, like methylammonium lead trichloride (MAPbCl3) with a 3.03 eV bandgap. These materials are transparent in visible absorbing ultraviolet (UV) light. However, achieving uniform film crystallization remains a hurdle. Here, we enhance MAPbCl3 crystallization by manipulating annealing atmospheres (nitrogen, air, and MACl vapor). Excess MACl vapor improves surface coverage, which is crucial for film stability. We demonstrate that the microstructure of the perovskite film, including surface morphology, grain boundaries, and interfaces, can affect the photovoltaic properties. The subsequently obtained VOC of 1.78 V is the highest recorded for single-junction PSCs to the best of our knowledge. Surprisingly, the conventional hole-transport layer spiro-OMeTAD, optimized for narrow bandgaps, sustains such high voltages. Photoluminescence measurements reveal a trap-assisted recombination peak at 1.65 eV, indicating deep traps as significant to voltage loss in MAPbCl3.}, language = {en} } @misc{SanchezBarquillaTschammerBussetal., author = {Sanchez-Barquilla, Raquel and Tschammer, Rudi and Buß, Lars and Morales, Carlos and Flege, Jan Ingo}, title = {The relation between substrate, Sm alloy, and surface sensitivity of ceria (111)- and (100)-oriented nano-islands on Ru(0001) and Cu(111)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Inverse oxide/metal catalysis allows achieving better catalytic performance than its traditional counterpart. For example, in cerium-based inverse catalyst systems, the Ce3+ states have been shown to be the active sites for methanol synthesis. This suggests that the activity can be enhanced by promoting those through alloying with trivalent, catalytically active rare-earth metals, as, e.g. Sm. We present low-energy and X-ray photoemission electron microscopy (LEEM/XPEEM), investigations that show how epitaxially grown (100)- and (111)-oriented CeO2 islands may be modified and/or alloyed by post-deposited metallic Sm. For the Ce1-xSmxO2-δ/Ru(0001) system, the CeO2 (111)-oriented islands undergo a structural change, concomitant with a partial conversion from Ce4+ to Ce3+. Surprisingly, for Ce1-xSmxO2-δ/Cu(111) the result is found to be face-dependent since only (100)-oriented CeOx islands were reduced whereas the (111)-oriented islands remained unaltered. Both systems have been exposed to reducing (H2) and oxidizing (CO2) conditions, resulting in higher reduction and in a complete recovery of the Ce4+ states, respectively. These unexpected results indicate a complex interaction not only between cerium and the doping element, but also an intricate interplay with the metallic substrate.}, language = {en} } @misc{TschammerKostoMoralesetal., author = {Tschammer, Rudi and Kosto, Yuliia and Morales, Carlos and Schmickler, Marcel and Henkel, Karsten and Devi, Anjana and Flege, Jan Ingo}, title = {Atomic layer deposition of cerium oxide monitored by operando ellipsometry and in-situ X-ray photoelectron spectroscopy}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Atomic layer deposition (ALD) has been used extensively to grow homogeneous films with excellent coverage and atomic-scale thickness control for a variety of applications. However, remaining challenges include the investigation of novel precursor-oxidant combinations for low-temperature deposition as well as unraveling the complex interplay between substrate and coating for ultrathin films. In this work, we present a detailed investigation of ultrathin cerium oxide films grown using the novel Ce(dpdmg)3 precursor with H2O and O2. Following a surface science-based approach, we have combined operando spectroscopic ellipsometry and in-situ X-ray photoelectron spectroscopy to allow rapid process optimization and determination of the complex relation between oxide stoichiometry, film thickness and ALD growth parameters, revealing a distinct dependence of inital Ce3+ content on the film thickness and choice of oxidant. This offers the possibility of adjusting the oxide properties to application requirements e.g. in gas sensing by choosing a suitable precursor-oxidant combination.}, language = {en} } @misc{KaoScheweAkhtaretal., author = {Kao, Ming-Chao and Schewe, Lukas Paul and Akhtar, Arub and Rehm, Jana and Bin Anooz, Saud Bin and Galazka, Zbigniew and Popp, Andreas and Flege, Jan Ingo and Vonk, Vedran and Stierle, Andreas}, title = {Structure and Stability of Al-alloyed β-Ga2O3(100) surfaces}, series = {Verhandlungen der DPG, Berlin 2024}, journal = {Verhandlungen der DPG, Berlin 2024}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {β-Ga2O3 (GaO) holds great promise in high-power applications. GaO is predicted to outperform the leading technologies based on SiC and GaN due to a three times higher calculated critical field strength. It has been identified that alloying with Al results in an almost linear increase in the bandgap between Ga2O3 (4.85eV) and Al2O3 (7eV). A critical issue in the bandgap engineering of GaO is maintaining reasonable electron mobility, which is low for the pure material (150cm2/V/S). This project aims to explore GaO by Al alloying, which allows tunable wide bandgaps for engineering material properties and at the same time maintains excellent crystal quality. PXRD and their Rietveld refinement on several AlGaO crystals indicate a preferential ordering of Al and Ga over octahedral and tetrahedral sites. The results of an SXRD study using synchrotron radiation addressing the surface structure of β-AlxGa2-xO3(100) substrates with x=0-0.25. Our results indicate that the GaO(100) surface is nearly bulk terminated and remains smooth up to 800°C and 10-5mbar of molecular oxygen.}, language = {en} } @misc{NitschRatzkePozarowskaetal., author = {Nitsch, Paul-G. and Ratzke, Markus and Pozarowska, Emilia and Flege, Jan Ingo and Alvarado Chavarin, Carlos and Wenger, Christian and Fischer, Inga Anita}, title = {Deposition of reduced ceria thin films by reactive magnetron sputtering for the development of a resistive gas sensor}, series = {Verhandlungen der DPG, Berlin 2024}, journal = {Verhandlungen der DPG, Berlin 2024}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {The use of cerium oxide for hydrogen sensing is limited by the low electrical conductivity of layers deposited from a ceria target. To increase the electrical conductivity, partially reduced cerium oxide layers were obtained from a metallic cerium target by reactive magnetron sputtering. The proportions of the oxidation states Ce3+, present in reduced species, and Ce4+, present in fully oxidized species, were determined by ex-situ XPS. For electrical characterization, films were deposited on planarized tungsten finger electrodes. IV curves were measured over several days to investigate possible influences of oxygen and humidity on electrical conductivity. The morphological stability of the layers under ambient conditions was investigated by microscopical methods. The XPS results show a significant amount of Ce3+ in the layers. The electrical conductivity of as-grown samples is several orders of magnitude higher than that of samples grown from a ceria target. However, the conductivity decreases over time, indicating an oxidation of the layers. The surface morphology of the samples was found to be changing drastically within days, leading to partial delamination.}, language = {en} } @misc{GertigMoralesHenkeletal., author = {Gertig, Max and Morales, Carlos and Henkel, Karsten and Flege, Jan Ingo}, title = {In situ X-ray photoelectron spectroscopy study of atomic layer deposited ceria on SiO2: substrate influence on the reaction mechanism during the early stages of growth}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Atomic layer deposition (ALD) is known to produce amorphous and defect-rich films in a layer-by-layer fashion, which can potentially give rise to unexpected material properties. In particular, ultrathin films (few monolayers) will show the highest complexity, as the substrate-material interaction will play a major role during deposition. Therefore, it is crucial to understand the early stages of growth of the ALD process to control and potentially tailor this interfacial interaction. Applying a surface science approach combined with complementary ex-situ characterization, we have studied by in-situ X-ray photoelectron spectroscopy (XPS) the early stages of ceria (CeOx) growth on SiO2 substrates deposited by thermal-ALD using Ce(thd)4/O3. Interestingly, an initial mixture of Ce3+ and Ce4+ was observed, although only Ce4+ may be expected considering the used precursor and oxidant. This fact, together with a deviation from the ideal layer-by-layer growth and a higher growth rate during the first cycles, indicates a significant influence of the substrate of the ALD reaction mechanism as well as a correlation between morphology and ceria oxidation state.}, language = {en} } @misc{GuttmannRiedelSanchezBarquillaetal., author = {Guttmann, Dominic and Riedel, Bj{\"o}rn and S{\´a}nchez-Barquilla, Raquel and Morales, Carlos and Flege, Jan Ingo}, title = {Oxide formation and oxide/metal interaction in CeOx/Ni(111)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Ni/ceria catalysts exhibit a high activity for methane to methanol conversion, making them very promising for applications within a sustainable economy. Possibly, their activity may be strongly enhanced due to the facile exchange between Ce4+ and Ce3+ states, with the latter likely responsible for activating O-H and C-H bonds. Here, we aim to unravel the complex metal-oxide interactions in the inverse CeOx/Ni(111) system under oxidizing and reducing environments. Using low-energy electron diffraction (LEED) we find that the CeOx(111) grown by reactive molecular beam epitaxy preferentially aligns with the main directions of the Ni(111) substrate or is azimuthally rotated by ±10°. By using X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS), we find that less NiO is formed during deposition of CeOx than when it is held without ceria at the same conditions (O2 partial pressure and temperature). Finally, we observe a complex behavior of the cerium and nickel oxidation states when exposing the system to O2 or H2 atmospheres.}, language = {en} } @misc{KostoKapuscikTschammeretal., author = {Kosto, Yuliia and Kapuscik, Paulina and Tschammer, Rudi and Guttmann, Dominic and Mankowska, Ewa and Matvija, Peter and Morales, Carlos and Mazur, Michał and Henkel, Karsten and Matolinova, Iva and Domaradzki, Jarosław and Flege, Jan Ingo}, title = {Bare and Pd-doped ceria thin films prepared by ALD and EBE for hydrogen detection}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {The need to store and use hydrogen safely as part of green economy based on renewable energy evokes a necessity to reliably detect it at ambient conditions. The majority of currently used sensors are working at elevated temperatures (200-500 °C). In this work, we demonstrate that ceria films deposited on a commercial electrode by atomic layer deposition (ALD) and electron beam evaporation (EBE) electrically respond to hydrogen (from 20 to 500 ppm) at much lower temperatures (50-200 °C). The results reveal that <1.5 nm thin Pd adlayer increases the electrical response by several orders of magnitude for both ceria films. The NAP-XPS study under changing oxidative/reductive atmospheres sheds light on the mechanism of Pd-CeOx thermal activation and the role of the deposition technique in the reactivity of the oxide.}, language = {en} } @misc{MoralesKostoTschammeretal., author = {Morales, Carlos and Kosto, Yuliia and Tschammer, Rudi and Henkel, Karsten and Flege, Jan Ingo}, title = {Unraveling the effects of substrate interaction on the chemical properties of atomic layer deposited ultra-thin ceria layers}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Atomic layer deposition (ALD) is well known to lead to amorphous and defective, non-stoichiometric films, potentially resulting in modified material properties that can also be affected by film/substrate interaction in the case of ultra-thin growths. For example, the formation, diffusion, and recovery of oxygen vacancies can be favored in disordered, reducible metal oxides compared to more ordered deposits, whereas interdiffusion processes can critically affect the film/substrate interface region. These effects have extensively been studied for thin thermal-ALD ceria films (below 15 nm) by combining in-situ and ex-situ characterization techniques in our lab and at synchrotron radiation facilities. While using alumina or silica substrates modifies the initial growth rate, Ce3+/Ce4+ ratio, and ceria morphology, the formation of different species at the interface affects its reactivity. Interestingly, the experiments have shown high reducibility of ALD-ceria ultrathin films on silica for very low hydrogen concentrations, even at room temperature, whereas for alumina substrates the formation of aluminates at the interface prevents further oxidation. Moreover, the comparison with more ordered films indicates a key role of the defective structure of ALD films in Ce3+/Ce4+ conversion.}, language = {en} } @misc{GawlińskaNęcekKotStarowiczetal., author = {Gawlińska-Nęcek, Katarzyna and Kot, Małgorzata and Starowicz, Zbigniew and Jarzębska, Anna and Panek, Piotr and Flege, Jan Ingo}, title = {Instability of Formamidinium Lead Iodide (FAPI) Deposited on a Copper Oxide Hole Transporting Layer (HTL)}, series = {ACS Applied Materials \& Interfaces}, volume = {16}, journal = {ACS Applied Materials \& Interfaces}, number = {21}, publisher = {American Chemical Society (ACS)}, issn = {1944-8244}, doi = {10.1021/acsami.4c03440}, pages = {27936 -- 27943}, abstract = {Copper oxide appears to be a promising candidate for a hole transport layer (HTL) in emerging perovskite solar cells. Reasons for this are its good optical and electrical properties, cost-effectiveness, and high stability. However, is this really the case? In this study, we demonstrate that copper oxide, synthesized by a spray-coating method, is unstable in contact with formamidinium lead triiodide (FAPI) perovskite, leading to its decomposition. Using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and ultraviolet-visible (UV-vis) spectrophotometry, we find that the entire copper oxide diffuses into and reacts with the FAPI film completely. The reaction products are an inactive yellow δ-FAPI phase, copper iodide (CuI), and an additional new phase of copper formate hydroxide (CH2CuO3) that has not been reported previously in the literature.}, language = {en} } @misc{KotHenkelSchmeisser, author = {Kot, Małgorzata and Henkel, Karsten and Schmeißer, Dieter}, title = {Internal chemical potential in mixed covalent-ionic photosensitive systems}, series = {Journal of Vacuum Science \& Technology A}, volume = {43 (2025)}, journal = {Journal of Vacuum Science \& Technology A}, number = {1}, publisher = {American Vacuum Society}, issn = {0734-2101}, doi = {10.1116/6.0004179}, pages = {1 -- 9}, abstract = {The internal chemical potential Γ of mixed covalent-ionic systems represents the potential differences between the covalent and the ionic intrinsic defect states located within the ionic gap. It is the key parameter to control the carrier densities, the stability regimes, and the photosensitive properties of materials. In this work, we describe first the quantitative analysis of the carrier densities in dependence on the internal potential Nπ(Γ) based on the common features of the electronic structure of mixed covalent-ionic materials. Subsequently, this method is applied on two mixed covalent-ionic materials, i.e., formamidinium lead triiodide and gallium oxide, as representatives of the respective families of perovskites (halides) and transparent conducting oxide thin films. Based on this analysis, the carrier densities as well as the photosensitivity mechanisms and the related specific properties of these materials in dependence on their internal chemical potential are discussed.}, language = {en} } @misc{KodalleMalekshahiByranvandGoudreauetal., author = {Kodalle, Tim and Malekshahi Byranvand, Mahdi and Goudreau, Meredith and Das, Chittaranjan and Roy, Rajarshi and Kot, Małgorzata and Briesenick, Simon and Zohdi, Mohammadreza and Rai, Monika and Tamura, Nobumichi and Flege, Jan Ingo and Hempel, Wolfram and Sutter-Fella, Carolin M. and Saliba, Michael}, title = {An integrated deposition and passivation strategy for controlled crystallization of 2D/3D Halide Perovskite films}, series = {Advanced Materials}, volume = {36}, journal = {Advanced Materials}, number = {24}, publisher = {Wiley}, address = {Weinheim}, issn = {0935-9648}, doi = {10.1002/adma.202309154}, pages = {12}, abstract = {This work introduces a simplified deposition procedure for multidimensional (2D/3D) perovskite thin films, integrating a phenethylammonium chloride (PEACl)-treatment into the antisolvent step when forming the 3D perovskite. This simultaneous deposition and passivation strategy reduces the number of synthesis steps while simultaneously stabilizing the halide perovskite film and improving the photovoltaic performance of resulting solar cell devices to 20.8\%. Using a combination of multimodal in situ and additional ex situ characterizations, it is demonstrated that the introduction of PEACl during the perovskite film formation slows down the crystal growth process, which leads to a larger average grain size and narrower grain size distribution, thus reducing carrier recombination at grain boundaries and improving the device's performance and stability. The data suggests that during annealing of the wet film, the PEACl diffuses to the surface of the film, forming hydrophobic (quasi-)2D structures that protect the bulk of the perovskite film from humidity-induced degradation.}, language = {en} } @misc{KapuścikWojcieszakPokoraetal., author = {Kapuścik, Paulina and Wojcieszak, Damian and Pokora, Patrycja and Mańkowska, Ewa and Domaradzki, Jarosław and Mazur, Michał and Mazur, Piotr and Kosto, Yuliia and Morales, Carlos and Kot, Małgorzata and Flege, Jan Ingo}, title = {Low temperature hydrogen sensor with high sensitivity based on CeOx thin film}, series = {Sensors and Actuators B: Chemical}, volume = {417}, journal = {Sensors and Actuators B: Chemical}, publisher = {Elsevier BV}, issn = {0925-4005}, doi = {10.1016/j.snb.2024.136148}, pages = {12}, abstract = {In this work, a 500 nm-thick cerium oxide thin film was prepared by electron beam evaporation. It was found that the deposition of 7 nm thick Pd catalyst was required for obtaining a sensor response to hydrogen. The Pd/CeOx sensing structure has a high response of 5000 towards 25 ppm H2 at a working temperature of 200 °C and exhibits a sensor response of 1.3 at temperatures near ambient. Furthermore, the sensing structure exhibited excellent response/recovery kinetics. The results confirm that the CeOx-based materials are a promising material for the fabrication of room-temperature hydrogen sensors.}, language = {en} } @misc{HernandezGomezPrietoMoralesetal., author = {Hern{\´a}ndez-G{\´o}mez, Cayetano and Prieto, Pilar and Morales, Carlos and Serrano, Aida and Flege, Jan Ingo and M{\´e}ndez, Javier and Garc{\´i}a-P{\´e}rez, Julia and Granados, Daniel and Soriano, Leonardo}, title = {Structural defects on graphene generated by deposition of CoO: effect of electronic coupling of graphene}, series = {Materials}, volume = {17}, journal = {Materials}, number = {13}, publisher = {MDPI AG}, address = {Basel}, issn = {1996-1944}, doi = {10.3390/ma17133293}, abstract = {Understanding the interactions in hybrid systems based on graphene and functional oxides is crucial to the applicability of graphene in real devices. Here, we present a study of the structural defects occurring on graphene during the early stages of the growth of CoO, tailored by the electronic coupling between graphene and the substrate in which it is supported: as received pristine graphene on polycrystalline copper (coupled), cleaned in ultra-high vacuum conditions to remove oxygen contamination, and graphene transferred to SiO2/Si substrates (decoupled). The CoO growth was performed at room temperature by thermal evaporation of metallic Co under a molecular oxygen atmosphere, and the early stages of the growth were investigated. On the decoupled G/SiO2/Si samples, with an initial low crystalline quality of graphene, the formation of a CoO wetting layer is observed, identifying the Stranski-Krastanov growth mode. In contrast, on coupled G/Cu samples, the Volmer-Weber growth mechanism is observed. In both sets of samples, the oxidation of graphene is low during the early stages of growth, increasing for the larger coverages. Furthermore, structural defects are developed in the graphene lattice on both substrates during the growth of CoO, which is significantly higher on decoupled G/SiO2/Si samples mainly for higher CoO coverages. When approaching the full coverage on both substrates, the CoO islands coalesce to form a continuous CoO layer with strip-like structures with diameters ranging between 70 and 150 nm.}, language = {en} } @misc{KotDasAlonsoetal., author = {Kot, Małgorzata and Das, Chittaranjan and Alonso, Clara Patricia Aranda and Prochowicz, Daniel}, title = {Perovskites: from materials science to devices}, series = {Journal of Materials Chemistry C}, volume = {12}, journal = {Journal of Materials Chemistry C}, number = {28}, publisher = {Royal Society of Chemistry (RSC)}, address = {Cambridge}, issn = {2050-7526}, doi = {10.1039/d4tc90109f}, pages = {10244 -- 10245}, abstract = {An introduction to the Journal of Materials Chemistry C themed collection on perovskite materials.}, language = {en} } @misc{KostoTschammerMoralesetal., author = {Kosto, Yuliia and Tschammer, Rudi and Morales, Carlos and Henkel, Karsten and Flege, Jan Ingo and Ratzke, Markus and Fischer, Inga Anita and Costina, Ioan and Alvarado Chavarin, Carlos and Wenger, Christian}, title = {Rational design and development of room temperature hydrogen sensors compatible with CMOS technology: a necessary step for the coming renewable hydrogen economy}, series = {Proceedings of iCampus Conference Cottbus 2024}, journal = {Proceedings of iCampus Conference Cottbus 2024}, publisher = {AMA Service GmbH}, address = {Wunstorf}, isbn = {978-3-910600-00-3}, doi = {10.5162/iCCC2024/P21}, pages = {182 -- 185}, abstract = {The transition towards a new, renewable energy system based on green energy vectors, such as hydrogen, requires not only direct energy conversion and storage systems, but also the development of auxiliary components, such as highly sensitive hydrogen gas sensors integrated into mass devices that operate at ambient conditions. Despite the recent advances in nanostructured metal oxide thin films in terms of simple fabrication processes and compatibility with integrated circuits, high sensitivity, and short response/recovery times usually require the use of expensive noble metals or elevated tem-peratures (>250 ºC), which results in high power consumption and poor long-term stability. This article presents the first steps of the work on developing a novel resistive hydrogen gas sensor based on ultrathin cerium oxide films, compatible with complementary metal oxide semiconductor technology and capable of operating at room temperature. Here, we show a multidisciplinary bottom-up approach combining different work areas for the sensor development, such as sensor architecture, sensing mechanism and deposition strategy of the active layer, electrical contact design depending on the desired electrical output, and fast testing under controlled environments.}, language = {en} } @misc{ImamHarfoucheAbdelghanyetal., author = {Imam, Neama Gomaa and Harfouche, Messaoud and Abdelghany, Amr Mohamed and Flege, Jan Ingo}, title = {Effect of Cu incorporation in silicate and modified borate bioglass materials for health applications: insights from synchrotron-based x-ray absorption spectroscopy}, series = {Discover Materials}, volume = {4}, journal = {Discover Materials}, number = {1}, publisher = {Springer Science and Business Media LLC}, issn = {2730-7727}, doi = {10.1007/s43939-024-00103-8}, abstract = {This contribution investigates the effect of variable copper incorporation (x = 0.2, 1.0, 2.0, and 4.0) in silicate (45 SiO2, 24.5 CaO, 24.5 Na2O, 6P2O5wt\%) and modified borate (45 B2O3, 24.5 CaO, 24.5 Na2O, 6P2O5wt\%) bioglass materials to be used for bone bonding applications. X-ray absorption fine structure spectroscopy (XAFS) has been used to determine the oxidation states and local coordination structure of Cu atoms in silicate-based and borate-based glasses at the Cu K-edge (~ 8979 eV). The oxidation states of Cu atoms have been determined by near-edge XAFS (XANES) fingerprinting employing reference standard compounds of Cu. Cu (I) and Cu (II) XANES spectra of the standard reference compounds were linearly combined to fit the normalized μ(E) data of the collected XANES spectra using linear combination fitting (LCF approach). The obtained results prove that most of the silicate glass samples contain Cu2O almost exclusively, while modified borate glass samples contain a significant mixture of Cu2O and CuO phases. According to the literature, the remarkable coexistence of Cu2O and CuO phases within the borate sample, particularly when x = 4, promotes the conversion process to allow the more facile formation of hydroxy carbonate apatite (HCA). The best fit structural parameters derived from extended-XAFS (EXAFS) fitting show that the ratio between Cu (I) and Cu (II) in borate glass agreed well with that extracted from XANES analysis. XANES and EXAFS conclude that borate glass with x = 4 is the most suitable composition for bone bonding applications.}, language = {en} } @misc{MoralesPlateMarthetal., author = {Morales, Carlos and Plate, Paul and Marth, Ludwig and Naumann, Franziska and Kot, Małgorzata and Janowitz, Christoph and Kus, Peter and Z{\"o}llner, Marvin Hartwig and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {Bottom-up design of a supercycle recipe for atomic layer deposition of tunable Indium Gallium Zinc Oxide thin films}, series = {ACS Applied Electronic Materials}, volume = {6}, journal = {ACS Applied Electronic Materials}, number = {8}, publisher = {American Chemical Society (ACS)}, issn = {2637-6113}, doi = {10.1021/acsaelm.4c00730}, pages = {5694 -- 5704}, abstract = {We present a successful bottom-up approach to design a generic plasma-enhanced atomic layer deposition (PEALD) supercycle recipe to grow high-quality indium gallium zinc oxide (IGZO) thin films with tunable composition at a relatively low temperature of 150 °C. In situ real-time ellipsometric characterization in combination with ex situ complementary techniques has been used to optimize the deposition process and quality of the films by identifying and solving growth challenges such as degree of oxidation, nucleation delays, or elemental composition. The developed supercycle approach enables facile control of the target composition by adapting the subcycle ratios within the supercycle process. Compared to other low-temperature deposition techniques resulting in amorphous films, our PEALD-IGZO process at 150 °C results in nearly amorphous, nanocrystalline films. The preparation of IGZO films at low temperature by a supercycle PEALD approach allows controlling the thickness, composition, and electrical properties while preventing thermally induced segregation.}, language = {en} } @misc{BussZamborliniSulaimanetal., author = {Buß, Lars and Zamborlini, Giovanni and Sulaiman, Cathy and Ewert, Moritz and Cinchetti, Mirko and Falta, Jens and Flege, Jan Ingo}, title = {Hexagons on rectangles: Epitaxial graphene on Ru(10-10)}, series = {Carbon}, volume = {231}, journal = {Carbon}, publisher = {Elsevier BV}, issn = {0008-6223}, doi = {10.1016/j.carbon.2024.119600}, pages = {10}, abstract = {Ruthenium is emerging as a promising candidate to replace copper in highly integrated electronics by enabling barrierless metallization in ultrathin interconnects. From this perspective, the study of graphene growth on such surface templates is of paramount importance as a platform for graphene integration in electronic devices. In particular, graphene growth on the Ru (10-10) surface allows selective growth of different graphene orientations, one-dimensional structures, and reduced substrate interaction compared to the well-established hexagonal Ru(0001) substrate. Real-time growth observations using low-energy electron microscopy and micro-diffraction highlight the influence of substrate symmetry on graphene growth, leading to the formation of rectangular islands with distinct zigzag- or armchair-terminated edges. Bilayer formation on Ru(10-10) occurs by nucleation of graphene nanoribbons under the monolayer. Micro-spot angle-resolved photoemission spectroscopy shows significantly less charge-transfer doping in these freestanding, zigzag-terminated bilayer graphene nanoribbons, indicating reduced graphene-substrate interaction and hence more effective decoupling as compared to graphene/Ru(0001). Our results show that the growth of graphene on non-hexagonal substrates opens new pathways for tailoring the graphene-substrate interaction at the interface, and thus the properties of graphene beyond the limits imposed by hexagonal substrates.}, language = {en} } @misc{GawlińskaNęcekKotStarowiczetal., author = {Gawlińska-Nęcek, Katarzyna and Kot, Małgorzata and Starowicz, Zbigniew and Janusz-Skuza, Marta and Panek, Piotr and Marth, Ludwig and Plate, Paul and Flege, Jan Ingo}, title = {Reaction dynamics between formamidinium lead iodide and Copper Oxide}, series = {ACS Applied Materials \& Interfaces}, volume = {16}, journal = {ACS Applied Materials \& Interfaces}, number = {42}, publisher = {American Chemical Society (ACS)}, issn = {1944-8244}, doi = {10.1021/acsami.4c12990}, pages = {57878 -- 57887}, abstract = {Copper oxide (CuOx) has been announced as a very promising hole-transporting layer for perovskite solar cells. However, in our previous work, we have shown that once a formamidinium lead triiodide (FAPI) perovskite is spin-coated on a spray-coated cuprous oxide (Cu2O) substrate, the Cu2O diffuses into and reacts with the FAPI film. In order to verify if the degradation products are related to the oxidation state of CuOx and/or its preparation method, in this work, we first prepared CuOx films by thermal oxidation at temperatures ranging from 120 to 300 °C. While increasing the process temperature, a transformation from copper I (Cu2O) to copper II (CuO) oxidation states was observed. For both oxidation states of copper, FAPI perovskite degradation was found; however, some alterations in the reaction products were noticed. In contrast to our expectations, the introduction of an ultrathin plasma-enhanced atomic layer deposited Al2O3 layer in between both films only partially blocked the CuOx migration into the FAPI film. It can be concluded that regardless of the chemical composition and/or preparation method of CuOx, the overlayered FAPI film gets decomposed. In order to use CuOx as a hole-transporting layer in solar cells, new strategies must be developed to limit these unwanted chemical reactions.}, language = {en} } @misc{MerteBraudBussetal., author = {Merte, Lindsay R. and Braud, Nicolas and Buß, Lars and Bisbo, Malthe Kj{\ae}r and Wallander, Harald J. and Krisponeit, Jon-Olaf and Flege, Jan Ingo and Hammer, Bj{\o}rk and Falta, Jens and Lundgren, Edvin}, title = {Oxygen Storage by Tin Oxide Monolayers on Pt3Sn(111)}, series = {The Journal of Physical Chemistry. C}, volume = {127}, journal = {The Journal of Physical Chemistry. C}, number = {6}, issn = {1932-7447}, doi = {10.1021/acs.jpcc.2c09041}, pages = {2988 -- 2994}, abstract = {The high performance of platinum-tin catalysts for oxidation reactions has been linked to the formation of tin oxides at the metal surface, but little is known about the structure of these oxides or the chemical behavior that determines their catalytic properties. We show here how surface oxides on Pt3Sn(111) incorporate oxygen at the metal interface, which may be subsequently removed by reaction with CO. The storage mechanism, where oxygen uptake occurs without loss of interfacial Pt-Sn bonds, is enabled by the peculiar asymmetrical coordination state of Sn2+. O atoms are bound at pocket sites in the 2D oxide sheet between these outward-buckled Sn atoms and metallic Sn in the alloy surface below.}, language = {en} } @misc{ZuoMalekshahiByranvandKodalleetal., author = {Zuo, Weiwei and Malekshahi Byranvand, Mahdi and Kodalle, Tim and Zohdi, Mohammadreza and Lim, Jaekeun and Carlsen, Brian and Friedlmeier, Theresa Magorian and Kot, Małgorzata and Das, Chittaranjan and Flege, Jan Ingo and Zong, Wansheng and Abate, Antonio and Sutter-Fella, Carolin M. and Li, Meng and Saliba, Michael}, title = {Coordination Chemistry as a Universal Strategy for a Controlled Perovskite Crystallization}, series = {Advanced Materials}, volume = {35}, journal = {Advanced Materials}, number = {39}, issn = {0935-9648}, doi = {10.1002/adma.202302889}, abstract = {The most efficient and stable perovskite solar cells (PSCs) are made from a complex mixture of precursors. Typically, to then form a thin film, an extreme oversaturation of the perovskite precursor is initiated to trigger nucleation sites, e.g., by vacuum, an airstream, or a so-called antisolvent. Unfortunately, most oversaturation triggers do not expel the lingering (and highly coordinating) dimethyl sulfoxide (DMSO), which is used as a precursor solvent, from the thin films; this detrimentally affects long-term stability. In this work, (the green) dimethyl sulfide (DMS) is introduced as a novel nucleation trigger for perovskite films combining, uniquely, high coordination and high vapor pressure. This gives DMS a universal scope: DMS replaces other solvents by coordinating more strongly and removes itself once the film formation is finished. To demonstrate this novel coordination chemistry approach, MAPbI3 PSCs are processed, typically dissolved in hard-to-remove (and green) DMSO achieving 21.6\% efficiency, among the highest reported efficiencies for this system. To confirm the universality of the strategy, DMS is tested for FAPbI3 as another composition, which shows higher efficiency of 23.5\% compared to 20.9\% for a device fabricated with chlorobenzene. This work provides a universal strategy to control perovskite crystallization using coordination chemistry, heralding the revival of perovskite compositions with pure DMSO.}, language = {en} } @misc{BussBraudEwertetal., author = {Buß, Lars and Braud, Nicolas and Ewert, Moritz and Jugovac, Matteo and Mentes, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {In-situ growth characterization of 2D heterostructures: MoSe2 on intercalated graphene/Ru(0001)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Despite the great fundamental interest in 2D heterostructures, most of the investigated 2D heterostructures were realized by mechanical exfoliation or chemical vapor deposition in the millibar range, preventing true in-situ characterization of the growth process. Here, we have investigated the growth of MoSe2 on single-layer graphene on Ru(0001) via real-time in-situ low-energy electron microscopy and micro-diffraction. After preparation of the graphene by standard procedures from an ethylene precursor, MoSe2 has been prepared via co-deposition of Mo and Se. Prior Se intercalation of the graphene appears to enhance the subsequent growth of MoSe2 on the graphene. At elevated temperatures, rotational ordering of the MoSe2 is facilitated by the strongly enhanced mobility of single-domain MoSe2 islands that align with the high symmetry orientations of the underlying graphene, indicating a non-negligible interaction between the two van-der-Waals materials. Micro-spot angle-resolved photoemission proves the monolayer nature of the as-grown MoSe2 as well as the free-standing character of the Se-intercalated graphene underneath.}, language = {en} } @misc{KostoMoralesDevietal., author = {Kosto, Yuliia and Morales, Carlos and Devi, Anjana and Henkel, Karsten and Flege, Jan Ingo}, title = {Activity of cerium oxide thin films prepared by atomic layer deposition using custom and commercial precursors}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Atomic layer deposition (ALD) allows preparation of conformal coatings with possibility to control their thickness at the submonolayer level, making it a good tool for depositing active layers on 3D structures. Our group is working on cerium oxide-based materials for hydrogen detection, which is difficult at ambient conditions due to the low sensitivity and long response time of the sensors. The cerium oxide layers prepared by ALD contain a lot of defects and provide an opportunity to overcome these complications. Thickness and morphology of the oxide films play an important role in defining the Ce3+/Ce4+ ratio, as well as the interface with the used substrate. Here, we compare cerium oxide thin films deposited by ALD techniques on SiO2 and Al2O3 substrates. The results reveal that the interface to the substrate can considerably influence the reactivity of the cerium oxide toward hydrogen and oxygen. Preparation of the oxides using two different precursors (commercial Ce(thd)4 and custom Ce(dpdmg)3) has been demonstrated to affect the redox properties of the films, their reactivity, and the reversibility.}, language = {en} } @misc{KotKediaPlateetal., author = {Kot, Małgorzata and Kedia, Mayank and Plate, Paul and Marth, Ludwig and Henkel, Karsten and Flege, Jan Ingo}, title = {Application of plasma enhanced atomic layer deposition process of alumina on perovskite film boosts efficiency of solar cells}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {It is assumed that plasma-enhanced atomic layer deposition (PEALD) cannot be used to prepare thin films on sensitive organic-inorganic perovskites because the plasma destroys the perovskite film and thus deteriorates its photophysical properties. Here, we prove that using an appropriate geometry of the ALD system (SENTECH SI PEALD system) and suitable process parameters it is possible to coat perovskites with alumina by PEALD. Spectromicroscopy followed by electrical characterisation reveal that as long as the PEALD process is not optimized (too long plasma pulses) one gets degradation of the perovskite as well as dissociation of the created iodine pentoxide (during PEALD) under light that causes a valence band maximum (VBM) shift to the Fermi level and thus significantly decreases the solar cell efficiency. However, once the PEALD process parameters are optimized, no VBM shift is observed. Moreover, the solar cell efficiency depends inversely on process temperature and layer thickness.}, language = {en} } @misc{LachnittDasMenonetal., author = {Lachnitt, Jan and Das, Shuvankar and Menon, Krishnakumar S. R. and Mandal, Suman and Flege, Jan Ingo}, title = {The dependence of structure on thickness of NiO(100) films on Ag(100) studied by IV-LEED}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Ultrathin NiO films have prospective applications especially in heterogeneous catalysis, microelectronics, and spintronics and are thus an object of active research. The Ag(100) surface is the usual support for these films, as its cubic lattice parameter is only 2.2 \% smaller than that of NiO, which enables pseudomorphic growth at very low thicknesses. We have studied the NiO(100) surface for three thicknesses of the oxide: 2 ML on Ag(100), 20 ML on the same substrate, and a bulk single crystal. We have used intensity-voltage low-energy electron diffraction (IV-LEED) in combination with X-ray photoelectron spectroscopy (XPS) and density-functional theory (DFT) calculations. We focus on differences among the three thicknesses, mainly in terms of lattice parameters and surface defects, and our study deepens existing knowledge of the growth of ultrathin NiO films. The IV-LEED calculations have been carried out using the AQuaLEED package, which will also be briefly presented.}, language = {en} } @misc{MahmoodinezhadMoralesKotetal., author = {Mahmoodinezhad, Ali and Morales, Carlos and Kot, Małgorzata and Naumann, Franziska and Plate, Paul and Henkel, Karsten and Flege, Jan Ingo}, title = {A super-cycle approach to atomic layer deposition of indium-gallium-zinc oxide at low temperature}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {The continuing development of multifunctional devices needs novel multicomponent oxide layers, demanding a high control of both composition and thickness during their preparation. To this end, single metal oxides exhibiting high structural quality and conformity have successfully been grown by atomic layer deposition (ALD). However, the deposition of more complex compounds with specific optical and electrical properties is still challenging. In this work, we follow a bottom-up approach to design an ALD super-cycle to grow mixed indium-gallium-zinc oxide (IGZO) films with a controllable composition. For the formation of the individual indium, gallium, and zinc oxides, we found the use of plasma-enhanced ALD (PEALD) at 150 °C to be favorable when using the organometallic precursors trimethylindium, trimethylgallium, and diethylzinc together with oxygen plasma. The PEALD approach of IGZO films can particularly overcome a nucleation delay within the ZnO sub-cycle known from thermal ALD, achieving a higher growth per cycle and improving the quality and composition homogeneity of the films as shown by in-situ spectroscopic ellipsometry and ex-situ X-ray photoelectron spectroscopy.}, language = {en} } @misc{BraudBussLundgrenetal., author = {Braud, Nicolas and Buß, Lars and Lundgren, Edvin and Merte, Lindsay R. and Wallander, Harald J. and Krisponeit, Jon-Olaf and Locatelli, Andrea and Mentes, Tevfik Onur and Jugovac, Matteo and Flege, Jan Ingo and Falta, Jens}, title = {Cleaning and tailoring the Pt3Sn(111) surface for surface experiments}, series = {Surface Science}, volume = {732}, journal = {Surface Science}, issn = {0039-6028}, doi = {10.1016/j.susc.2023.122281}, abstract = {The cleaning process of the bimetallic Pt3Sn(111) surface has been studied by means of low-energy electron microscopy (LEEM), microspot low-energy electron diffraction (-LEED), and X-ray photoemission electron microscopy (XPEEM). Different cleaning procedures, performed under ultra-high vacuum conditions (UHV), including sputtering with argon ions and repeated cycles of annealing up to 1500 K were investigated. In this work, we show that a clean Pt3Sn(111) surface of high structural quality with a sharp and brilliant (2 × 2) bulk reconstruction in LEED as well as a perfectly smooth surface with terraces of micron size can be achieved by sputtering, annealing at very high temperatures, followed by a subsequent slow (0.09 K/s) and careful cooling procedure. Additionally, we show the possibility of tailoring the Sn concentration in the topmost layers of Pt3Sn(111) as a function of annealing temperature and subsequent cooling rate. Structural changes of the surface are induced by Sn segregation combined with a surface order-disorder transition at 1340 K. Moreover, two new surface reconstructions depending on the cooling rate are reported.}, language = {en} } @misc{MańkowskaMazurDomaradzkietal., author = {Mańkowska, Ewa and Mazur, Michał and Domaradzki, Jarosław and Mazur, Piotr and Kot, Małgorzata and Flege, Jan Ingo}, title = {Hydrogen Gas Sensing Properties of Mixed Copper-Titanium Oxide Thin Films}, series = {Sensors}, volume = {23}, journal = {Sensors}, number = {8}, issn = {1424-8220}, doi = {10.3390/s23083822}, abstract = {Hydrogen is an efficient source of clean and environmentally friendly energy. However, because it is explosive at concentrations higher than 4\%, safety issues are a great concern. As its applications are extended, the need for the production of reliable monitoring systems is urgent. In this work, mixed copper-titanium oxide ((CuTi)Ox) thin films with various copper concentrations (0-100 at.\%), deposited by magnetron sputtering and annealed at 473 K, were investigated as a prospective hydrogen gas sensing material. Scanning electron microscopy was applied to determine the morphology of the thin films. Their structure and chemical composition were investigated by X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The prepared films were nanocrystalline mixtures of metallic copper, cuprous oxide, and titanium anatase in the bulk, whereas at the surface only cupric oxide was found. In comparison to the literature, the (CuTi)Ox thin films already showed a sensor response to hydrogen at a relatively low operating temperature of 473 K without using any extra catalyst. The best sensor response and sensitivity to hydrogen gas were found in the mixed copper-titanium oxides containing similar atomic concentrations of both metals, i.e., 41/59 and 56/44 of Cu/Ti. Most probably, this effect is related to their similar morphology and to the simultaneous presence of Cu and Cu2O crystals in these mixed oxide films. In particular, the studies of surface oxidation state revealed that it was the same for all annealed films and consisted only of CuO. However, in view of their crystalline structure, they consisted of Cu and Cu2O nanocrystals in the thin film volume.}, language = {en} } @misc{BakiAbdeldayemMoralesetal., author = {Baki, Aykut and Abdeldayem, Mohamed and Morales, Carlos and Flege, Jan Ingo and Klimm, Detlef and Bierwagen, Oliver and Schwarzkopf, Jutta}, title = {Potential of La-Doped SrTiO3 Thin Films Grown by Metal-Organic Vapor Phase Epitaxy for Thermoelectric Applications}, series = {Crystal Growth \& Design}, volume = {23}, journal = {Crystal Growth \& Design}, number = {4}, issn = {1528-7483}, doi = {10.1021/acs.cgd.2c01438}, pages = {2522 -- 2530}, abstract = {La-doped SrTiO3 thin films with high structural quality were homoepitaxially grown by the metal-organic vapor phase epitaxy (MOVPE) technique. Thermogravimetric characterization of the metal-organic precursors determines suitable flash evaporator temperatures for transferring the liquid source materials in the gas phase of the reactor chamber. An adjustment of the charge carrier concentration in the films, which is necessary for optimizing the thermoelectric power factor, was performed by introducing a defined amount of the metal-organic compound La(tmhd)3 and tetraglyme to the liquid precursor solution. X-ray diffraction and atomic force microscopy verified the occurrence of the pure perovskite phase exhibiting a high structural quality for all La concentrations. The electrical conductivity of the films obtained from Hall-effect measurements increases linearly with the La concentration in the gas phase, which is attributed to the incorporation of La3+ ions on the Sr2+ perovskite sites by substitution inferred from photoemission spectroscopy. The resulting structural defects were discussed concerning the formation of occasional Ruddlesden-Popper-like defects. The thermoelectric properties determined by Seebeck measurements demonstrate the high potential of SrTiO3 thin films grown by MOVPE for thermoelectric applications.}, language = {en} } @misc{MoralesKostoTschammeretal., author = {Morales, Carlos and Kosto, Yuliia and Tschammer, Rudi and Henkel, Karsten and Flege, Jan Ingo}, title = {Reduction by H2 exposure at room temperature of ceria ultrathin films grown by atomic layer deposition}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Atomic layer deposition (ALD) exhibits a high potential for integration as a scalable process in microelectronics, allowing well-controlled layer-by-layer deposition and conformal growth on 3D structures. Yet, the ALD technique is also well known to lead to amorphous and defective, non-stoichiometric films, potentially resulting in modified materials properties that, in the case of ultra-thin deposits, can also be affected by film/substrate interaction. Interestingly, initial in situ X-ray photoemission spectroscopy (XPS) measurements of ceria ALD-deposits on Al2O3/Si, sapphire, and SiO2 substrates confirm a Ce3+/Ce4+ mixture dependent on the substrate interaction, deposit thickness, and morphology. Using near-ambient pressure XPS, we have significantly reduced ultrathin (< 10 nm) ceria films grown by ALD by exposing them to different O2/H2 partial pressures at moderate temperatures (< 525K). Notably, the total amount of reduction to Ce3+ is found to depend on the deposit thickness and initial ceria/substrate interaction. Furthermore, the intrinsic defects related to the ALD method seem to play a critical role in the reversible reduction at room temperature.}, language = {en} } @misc{ScheweSulaimanBussetal., author = {Schewe, Lukas and Sulaiman, Cathy and Buß, Lars and Ewert, Moritz and Flege, Jan Ingo}, title = {In-situ photoemission electron microscopy investigation of mono- and bilayer graphene growth on Ru(10-10)}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Epitaxial graphene growth has often been studied on close-packed transition metal substrates, e. g., the Ru(0001) surface, which is a well-studied model system for strong graphene-support interaction. Here, we focus on a Ru surface with different symmetry, i. e., the Ru(10-10) surface, to investigate the influence of the presumably modified graphene-substrate interaction on the growth of epitaxial monolayer and bilayer graphene (MLG, BLG) islands. The structural and chemical differences of the graphene on the two different surfaces are investigated by photoemission electron microscopy (PEEM), delivering information on both morphology and electronic structure. In-situ PEEM observation of graphene growth on the Ru(10-10) substrate by ethylene decomposition reveals the growth characteristics of MLG and BLG, the latter showing second layer nucleation via surface segregation of carbon. Furthermore, depending on growth temperature and relative orientation of the growing islands and surface steps, different growth characteristics are observed, in contrast to previous studies of the graphene/Ru(0001) system whereas similar electronic properties seem to prevail. Yet, when the MLG is decoupled from the Ru(10-10) substrate via intercalation of oxygen a distinct shift in work function is identified, slightly different from the resulting shift on Ru(0001).}, language = {en} } @misc{SulaimanScheweBussetal., author = {Sulaiman, Cathy and Schewe, Lukas and Buß, Lars and Ewert, Moritz and Flege, Jan Ingo}, title = {In-situ monolayer graphene growth on Ru(10-10): an electron microscopy study}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {During the last decade, the controlled growth of monolayer (MLG) and bilayer graphene has extensively been studied on the hexagonal Ru(0001) surface, which is a system that is known to form strong chemical bonds at the metal-graphene interface. Yet, little attention was paid to the influence of the substrate orientation that was demonstrated to have a significant impact for graphene growth on the Ir(001) and Ir(111) surfaces, the latter exhibiting a weak coupling between the graphene and the support. Therefore, in this study we have grown graphene on the rectangular Ru(10-10) surface by segregation and ethylene-supported chemical vapor deposition. A photoemission and low-energy electron microscope (PEEM \& LEEM) has been utilized to directly characterize the MLG growth process with respect to variations in substrate temperature and step orientation. The expansion of the MLG islands is compared to the well-established carpet-growth mode on the Ru(0001) surface. These results have been complemented by probing of the occupied and unoccupied electronic structure of the islands using PEEM and intensity-voltage LEEM. Furthermore, the existence of two preferential surface reconstructions is identified via micro-illumination low-energy electron diffraction (LEED), whose spatial distribution is revealed by employing dark-field LEEM imaging.}, language = {en} } @misc{TschammerBussMoralesetal., author = {Tschammer, Rudi and Buß, Lars and Morales, Carlos and Senanayake, Sanjaya D. and Falta, Jens and Flege, Jan Ingo}, title = {In situ characterization of cerium oxide on Au(111) under reducing and oxidizing conditions by low-energy electron microscopy}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {The development of novel catalysts for a variety of applications is a key challenge for modern catalysis. Inverse metal oxide catalysts consisting of oxide nanoparticles dispersed on a metal support have recently attracted much attention, showing higher activity and selectivity compared to traditional catalytic systems, harnessing synergistic effects attributed to the so-called metal-support interaction. To gain further insights, we deposited cerium oxide nanoparticles on Au(111) and studied this system by low-energy electron microscopy (LEEM) and low-energy electron diffraction (LEED). The prepared samples demonstrate a distinct correlation between the deposition temperature and the structural order of the nanoparticles. This has been expanded upon by exploring the changes induced by reduction with H2 and reoxidation with O2 or CO2, again exhibiting a connection between structural order and activity, while also showing the influence of the oxide-metal interaction on the stability of cerium oxide under reducing conditions.}, language = {en} } @misc{AbdeldayemBakiMoralesetal., author = {Abdeldayem, Mohamed and Baki, Aykut and Morales, Carlos and Flege, Jan Ingo and Klimm, Detlef and Fiedler, Andreas and Bierwagen, Oliver and Schwarzkopf, Jutta}, title = {Potential of La-doped SrTiO3 thin films grown by metal-organic vapor phase epitaxy for thermoelectric applications}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Conversion of waste heat energy into electrical energy by exploiting the thermoelectric effect in solids promises a great contribution to energy harvesting concepts. However, most thermoelectric materials use toxic Pb or Te. Recently, La-doped SrTiO3 has gained a lot of interest as a potential candidate for thermoelectric devices for its good thermoelectric properties, chemical and thermal stability. In this paper, we report the homoepitaxial growth of La-doped SrTiO3 thin films by metalorganic vapor phase epitaxy (MOVPE) technique, which works at high oxygen partial pressures and offers upscaling potential for industry. The adjustment of charge carrier concentration, necessary for thermoelectric power factor optimization, was performed by introducing a defined amount of the metal-organic precursor La(tmhd)3 and tetraglyme to the liquid precursor solution. X-ray diffraction and atomic force microscopy verified a pure perovskite phase with high structural quality. The electrical conductivity increases linearly with the La concentration in the gas phase, which is attributed to the substitution of La+3 ions on the Sr+2 sites inferred from photoemission spectroscopy.}, language = {en} } @misc{AngrickThiedeReimannetal., author = {Angrick, Christoph and Thiede, Christian and Reimann, Andre and Henriksen, Annika and Mutzke, Nicole and Ewert, Moritz and Buß, Lars and Falta, Jens and Flege, Jan Ingo and Donath, Markus}, title = {Spin-polarized very-low-energy electron diffraction from spin-orbit- and/or exchange-influenced targets}, series = {Verhandlungen der DPG}, journal = {Verhandlungen der DPG}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Exchange (XC) or spin-orbit (SOC) interaction cause electron scattering from surfaces to be spin dependent. The resulting spin filtering of the scattered electron beam can be used in spin-polarization analyzers. These analyzers are implemented in, for instance, photoemission setups to obtain spin resolution. Therefore, for promising targets, electron reflectivity and resulting spin asymmetry of very-low-energy electrons are measured for a wide range of incident electron energies and angles. By this, the investigated target is put to a test regarding the usability as a scattering target in a spin-polarization analyzer. Here, several results of SOC- as well as XC-influenced targets are presented. The results of the SOC-influenced targets Au(111), single-layer MoS2/Au(111) and W(110) [1] are compared with the results of the XC-influenced target Fe(001)-p(1x1)O [2]. Additionally, the influence of SOC interaction in the case of the XC-influenced target is investigated. The spin asymmetry caused by SOC is found to be one order of magnitude smaller than the spin asymmetry caused by XC. [1] Angrick et al., J. Phys.: Condens. Matter 33, 115001 (2020). [2] Thiede et al., Phys. Rev. Applied 1, 054003 (2014).}, language = {en} } @misc{BussBraudEwertetal., author = {Buß, Lars and Braud, Nicolas and Ewert, Moritz and Jugovac, Matteo and Mente{\c{s}}, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {Unraveling van der Waals epitaxy: A real-time in-situ study of MoSe2 growth on graphene/Ru(0001)}, series = {Ultramicroscopy}, volume = {250}, journal = {Ultramicroscopy}, issn = {0304-3991}, doi = {10.1016/j.ultramic.2023.113749}, pages = {7}, abstract = {In the present work we investigate the growth of monolayer MoSe2 on selenium-intercalated graphene on Ru(0001), a model layered heterostructure combining a transition metal dichalcogenide with graphene, using low energy electron microscopy and micro-diffraction. Real-time observation of MoSe2 on graphene growth reveals the island nucleation dynamics at the nanoscale. Upon annealing, larger islands are formed by sliding and attachment of multiple nanometer-sized MoSe2 flakes. Local micro-spot angle-resolved photoemission spectroscopy reveals the electronic structure of the heterostructure, indicating that no charge transfer occurs within adjacent layers. The observed behavior is attributed to intercalation of Se at the graphene/Ru(0001) interface. The unperturbed nature of the proposed heterostructure therefore renders it as a model system for investigations of graphene supported TMD nanostructures.}, language = {en} } @misc{KediaRaiPhirkeetal., author = {Kedia, Mayank and Rai, Monika and Phirke, Himanshu and Aranda, Clara A. and Das, Chittaranjan and Chirvony, Vladimir and Boehringer, Stephan and Kot, Małgorzata and Malekshahi Byranvand, Mahdi and Flege, Jan Ingo and Redinger, Alex and Saliba, Michael}, title = {Light Makes Right: Laser Polishing for Surface Modification of Perovskite Solar Cells}, series = {ACS Energy Letters}, volume = {8}, journal = {ACS Energy Letters}, issn = {2380-8195}, doi = {10.1021/acsenergylett.3c00469}, pages = {2603 -- 2610}, abstract = {Interface engineering is a common strategy for passivating surface defects to attain open circuit voltages (Voc) in perovskite solar cells (PSCs). In this work, we introduce the concept of polishing a perovskite thin-film surface using a nanosecond (ns) pulsed ultraviolet laser to reduce surface defects, such as dangling bonds, undesirable phases, and suboptimal stoichiometry. A careful control of laser energy and scanning speed improves the photophysical properties of the surface without compromising the thickness. Using laser polishing, a Voc of 1.21 V is achieved for planar PSCs with a triple cation composition, showing an improved perovskite/hole transport interface by mitigating surface recombination losses. We measure an efficiency boost from 18.0\% to 19.3\% with improved stability of up to 1000 h. The results open the door to a new class of surface modification using lasers for interface passivation in well-controllable, automated, scalable, and solvent-free surface treatments.}, language = {en} } @misc{MazurKapuścikWeichbrodtetal., author = {Mazur, Michał and Kapuścik, Paulina and Weichbrodt, Wiktoria and Domaradzki, Jarosław and Mazur, Piotr and Kot, Małgorzata and Flege, Jan Ingo}, title = {WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations}, series = {Materials}, volume = {16}, journal = {Materials}, number = {10}, issn = {1996-1944}, doi = {10.3390/ma16103831}, pages = {17}, abstract = {Hydrogen gas sensors have recently attracted increased interest due to the explosive nature of H2 and its strategic importance in the sustainable global energy system. In this paper, the tungsten oxide thin films deposited by innovative gas impulse magnetron sputtering have been investigated in terms of their response to H2. It was found that the most favourable annealing temperature in terms of sensor response value, as well as response and recovery times, was achieved at 673 K. This annealing process caused a change in the WO3 cross-section morphology from a featureless and homogenous form to a rather columnar one, but still maintaining the same surface homogeneity. In addition to that, the full-phase transition from an amorphous to nanocrystalline form occurred with a crystallite size of 23 nm. It was found that the sensor response to only 25 ppm of H2 was equal to 6.3, which is one of the best results presented in the literature so far of WO3 optical gas sensors based on a gasochromic effect. Moreover, the results of the gasochromic effect were correlated with the changes in the extinction coefficient and the concentration of the free charge carriers, which is also a novel approach to the understanding of the gasochromic phenomenon.}, language = {en} } @misc{PożarowskaPleinesEwertetal., author = {Pożarowska, Emilia and Pleines, Linus and Ewert, Moritz and Prieto, Mauricio J. and Tănase, Liviu Christian and Souza Caldas, Lucas de and Tiwari, Aarti and Schmidt, Thomas and Falta, Jens and Krasovskii, Eugene and Morales, Carlos and Flege, Jan Ingo}, title = {Preparation and stability of the hexagonal phase of samarium oxide on Ru(0001)}, series = {Ultramicroscopy}, volume = {250}, journal = {Ultramicroscopy}, issn = {0304-3991}, doi = {10.1016/j.ultramic.2023.113755}, abstract = {We have used low-energy electron microscopy (LEEM), micro-illumination low-energy electron diffraction (µLEED) supported by ab initio calculations, and X-ray absorption spectroscopy (XAS) to investigate in-situ and in real-time the structural properties of Sm2O3 deposits grown on Ru(0001), a rare-earth metal oxide model catalyst. Our results show that samarium oxide grows in a hexagonal A-Sm2O3 phase on Ru(0001), exhibiting a (0001) oriented-top facet and (113) side facets. Upon annealing, a structural transition from the hexagonal to cubic phase occurs, in which the Sm cations exhibit the +3 oxidation state. The unexpected initial growth in the A-Sm2O3 hexagonal phase and its gradual transition to a mixture with cubic C-Sm2O3 showcases the complexity of the system and the critical role of the substrate in the stabilization of the hexagonal phase, which was previously reported only at high pressures and temperatures for bulk samaria. Besides, these results highlight the potential interactions that Sm could have with other catalytic compounds with respect to the here gathered insights on the preparation conditions and the specific compounds with which it interacts.}, language = {en} } @misc{SchmeisserMuellerHenkel, author = {Schmeißer, Dieter and M{\"u}ller, Klaus and Henkel, Karsten}, title = {Photosensitive and Rectifying Properties of Ga2O3 Described by Polaronic Screened Electrons and Internal Potentials}, series = {Journal of Physical Chemistry C}, volume = {127}, journal = {Journal of Physical Chemistry C}, number = {47}, issn = {1932-7447}, doi = {10.1021/acs.jpcc.3c05785}, pages = {23077 -- 23089}, abstract = {The photosensitive and rectifying properties of Ga2O3 are described by (n-type) intrinsic (π-) electrons. These polaronic screened multiatomic carriers populate the intrinsic defect states within the ionic gap; their spectroscopic evidence is based on resonant photoemission spectroscopy data that also provide the ionicity factor of Ga2O3 and the size of the ionic gap. The π-electron density depends on the internal potential and its photo- and field-induced dipole contributions, and it describes the observed combined ohmic-exponential carrier densities and current-voltage dependences. The π-electron dynamics is caused by pairing and dissociation dipoles in the bulk of Ga2O3. The material properties of the electrode contribute via external chemical potentials and define the criteria for ohmic and rectifying contacts. This quantitative and predictive concept not only convinces by perfect agreement with published experimental data but also points toward the achievable performance limits of UV absorbers and rectifying devices.}, language = {en} } @misc{WallanderGajdekAlbertinetal., author = {Wallander, Harald J. and Gajdek, Dorotea and Albertin, Stefano and Harlow, Gary and Braud, Nicolas and Buß, Lars and Krisponeit, Jon-Olaf and Flege, Jan Ingo and Falta, Jens and Lundgren, Edvin and Merte, Lindsay R.}, title = {Dynamic Behavior of Tin at Platinum Surfaces during Catalytic CO Oxidation}, series = {ACS Catalysis}, volume = {13}, journal = {ACS Catalysis}, number = {24}, issn = {2155-5435}, doi = {10.1021/acscatal.3c04657}, pages = {16158 -- 16167}, abstract = {Platinum-tin surfaces are active for CO oxidation, but their activity and the effects of tin oxide phases that form under reaction conditions are poorly understood. We have studied surface alloys of tin prepared on platinum single crystals during catalytic CO oxidation using near-ambient-pressure X-ray photoemission spectroscopy. On the flat terraces of Sn/Pt(111), a wetting layer of Sn(II) surface oxide forms, while on the stepped Sn/Pt(223) surface, 3D clusters of Sn(IV) oxide are formed. Oxidation of tin by O2 competes with the reduction of the oxides by CO under reaction conditions. Oxides that do not completely cover the surface can be reduced to metallic tin, while a fully covering layer of Sn(II) oxide cannot, showing the importance of oxide edge sites for the reduction process. The samples where 2D oxide layers are formed show a higher CO oxidation activity than for pure platinum at low temperatures, while the Sn(IV) oxide clusters on the stepped surfaces do not affect the measured CO oxidation rate. We therefore identify 2D Sn(II) oxide as an active phase for CO oxidation. While oxide island edges appear to make only minor contributions to conversion under these conditions, reactions at these sites play a major role in determining the phases present and their transformations.}, language = {en} } @misc{DasRoyKediaetal., author = {Das, Chittaranjan and Roy, Rajarshi and Kedia, Mayank and Kot, Małgorzata and Zuo, Weiwei and F{\´e}lix, Roberto and Sobol, Tomasz and Flege, Jan Ingo and Saliba, Michael}, title = {Unraveling the Role of Perovskite in Buried Interface Passivation}, series = {ACS Applied Materials \& Interfaces}, volume = {15}, journal = {ACS Applied Materials \& Interfaces}, number = {48}, issn = {1944-8244}, doi = {10.1021/acsami.3c13085}, pages = {56500 -- 56510}, abstract = {Interfaces in perovskite solar cells play a crucial role in their overall performance, and therefore, detailed fundamental studies are needed for a better understanding. In the case of the classical n-i-p architecture, TiO2 is one of the most used electron-selective layers and can induce chemical reactions that influence the performance of the overall device stack. The interfacial properties at the TiO2/perovskite interface are often neglected, owing to the difficulty in accessing this interface. Here, we use X-rays of variable energies to study the interface of (compact and mesoporous) TiO2/perovskite in such a n-i-p architecture. The X-ray photoelectron spectroscopy and X-ray absorption spectroscopy methods show that the defect states present in the TiO2 layer are passivated by a chemical interaction of the perovskite precursor solution during the formation of the perovskite layer and form an organic layer at the interface. Such passivation of intrinsic defects in TiO2 removes charge recombination centers and shifts the bands upward. Therefore, interface defect passivation by oxidation of Ti3+ states, the organic cation layer, and an upward band bending at the TiO2/perovskite interface explain the origin of an improved electron extraction and hole-blocking nature of TiO2 in the n-i-p perovskite solar cells.}, language = {en} } @misc{MoralesMahmoodinezhadTschammeretal., author = {Morales, Carlos and Mahmoodinezhad, Ali and Tschammer, Rudi and Kosto, Yuliia and Alvarado Chavarin, Carlos and Schubert, Markus Andreas and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates}, series = {Inorganics}, volume = {11}, journal = {Inorganics}, number = {12}, issn = {2304-6740}, doi = {10.3390/inorganics11120477}, abstract = {This work presents a new ultra-high vacuum cluster tool to perform systematic studies of the early growth stages of atomic layer deposited (ALD) ultrathin films following a surface science approach. By combining operando (spectroscopic ellipsometry and quadrupole mass spectrometry) and in situ (X-ray photoelectron spectroscopy) characterization techniques, the cluster allows us to follow the evolution of substrate, film, and reaction intermediates as a function of the total number of ALD cycles, as well as perform a constant diagnosis and evaluation of the ALD process, detecting possible malfunctions that could affect the growth, reproducibility, and conclusions derived from data analysis. The homemade ALD reactor allows the use of multiple precursors and oxidants and its operation under pump and flow-type modes. To illustrate our experimental approach, we revisit the well-known thermal ALD growth of Al2O3 using trimethylaluminum and water. We deeply discuss the role of the metallic Ti thin film substrate at room temperature and 200 °C, highlighting the differences between the heterodeposition (<10 cycles) and the homodeposition (>10 cycles) growth regimes at both conditions. This surface science approach will benefit our understanding of the ALD process, paving the way toward more efficient and controllable manufacturing processes.}, language = {en} } @misc{GonzalezCastanoMoralesNavarrodeMigueletal., author = {Gonzalez-Cast{\~a}no, Miriam and Morales, Carlos and Navarro de Miguel, Juan Carlos and Boelte, Jens-H. and Klepel, Olaf and Flege, Jan Ingo and Arellano-Garc{\´i}a, Harvey}, title = {Are Ni/ and Ni5Fe1/biochar catalysts suitable for synthetic natural gas production? A comparison with γ-Al2O3 supported catalysts}, series = {Green Energy \& Environment}, volume = {8}, journal = {Green Energy \& Environment}, number = {3}, issn = {2468-0257}, doi = {10.1016/j.gee.2021.05.007}, pages = {744 -- 756}, abstract = {Among challenges implicit in the transition to the post-fossil fuel energetic model, the finite amount of resources available for the technological implementation of CO2 revalorizing processes arises as a central issue. The development of fully renewable catalytic systems with easier metal recovery strategies would promote the viability and sustainability of synthetic natural gas production circular routes. Taking Ni and NiFe catalysts supported over γ-Al2O3 oxide as reference materials, this work evaluates the potentiality of Ni and NiFe supported biochar catalysts for CO2 methanation. The development of competitive biochar catalysts was found dependent on the creation of basic sites on the catalyst surface. Displaying lower Turn Over Frequencies than Ni/Al catalyst, the absence of basic sites achieved over Ni/C catalyst was related to the depleted catalyst performances. For NiFe catalysts, analogous Ni5Fe1 alloys were constituted over both alumina and biochar supports. The highest specific activity of the catalyst series, exhibited by the NiFe/C catalyst, was related to the development of surface basic sites along with weaker NiFe-C interactions, which resulted in increased Ni0:NiO surface populations under reaction conditions. In summary, the present work establishes biochar supports as a competitive material to consider within the future low-carbon energetic panorama.}, language = {en} } @misc{MoralesPascualLeinenetal., author = {Morales, Carlos and Pascual, Antonio and Leinen, Dietmar and Luna-L{\´o}pez, Gabriel and Ares, Jose R. and Flege, Jan Ingo and Soriano, Leonardo and Ferrer, Isabel J. and Sanchez, Carlos}, title = {Reaction Mechanism and Kinetic Model of the Transformation of Iron Monosulfide Thin Films into Pyrite Films}, series = {The Journal of Physical Chemistry C}, volume = {129}, journal = {The Journal of Physical Chemistry C}, number = {9}, publisher = {American Chemical Society (ACS)}, issn = {1932-7447}, doi = {10.1021/acs.jpcc.4c08227}, pages = {4724 -- 4737}, abstract = {This work presents a comprehensive reaction and kinetic model of the pyrite thin films formation by sulfuration of Fe monosulfides when a molecular sulfur (S2) atmosphere is used. This investigation completes the results already published on the explanation and interpretation of the sulfuration process that transforms metallic iron into pyrite. It was previously shown that the monosulfide species (i.e., orthorhombic and hexagonal pyrrhotite phases) are intermediate phases in the sulfuration reaction. Based on experimental data we now show that the sulfuration of pyrrhotite to pyrite takes place in two distinct stages: (i) conversion of orthorhombic pyrrhotite to pyrite (Fe1-xSO → FeS2) while the hexagonal pyrrhotite (Fe1-xSH) phase remains unaltered, and (ii) final transformation of hexagonal pyrrhotite to pyrite (Fe1-xSH → FeS2). Both processes occur via interstitial sulfur diffusion through the previously formed pyrrhotite layer. Consequently, the monosulfide is sulfurated at the internal Fe1-xS/FeS2 interface. The reaction mechanism at each stage has been validated using the corresponding kinetic model to fit the experimental data on time evolution of Fe1-xS and FeS2 layers thicknesses and some of the film transport properties. The concluding global reaction mechanism proposed in some of our former papers and completed here (Fe → Fe1-xS → FeS2) can explain the resulting microstructure of the pyrite films (i.e., Kirkendall effect and formation of a porous layer in the film). Simultaneously, it also justifies the presence of intrinsic defects, such as iron and sulfur vacancies, and the accumulation of interstitial sulfur at the film grain boundaries. The conductivity of pyrite films is tentatively explained using a two-band model where the changes in the Seebeck coefficient and the S/Fe ratio during the pyrite recrystallization stage can be successfully explained.}, language = {en} } @misc{MoralesTschammerGouderetal., author = {Morales, Carlos and Tschammer, Rudi and Gouder, Thomas and Choi, YongMan and Anjum, Dalaver and Baunthiyal, Aman and Krisponeit, Jon-Olaf and Falta, Jens and Flege, Jan Ingo and Idriss, Hicham}, title = {Stabilization of Ce3+ cations via U-Ce charge transfer in mixed oxides: consequences on the thermochemical water splitting to hydrogen}, series = {Journal of Physics: Energy}, volume = {7}, journal = {Journal of Physics: Energy}, publisher = {IOP Publishing}, issn = {2515-7655}, doi = {10.1088/2515-7655/adbad9}, pages = {1 -- 14}, abstract = {The work's objective is to enhance the generation of H2 via the thermochemical water splitting (TCWS) reaction over nanocrystalline mixed oxide Ce1-xUxO2. While CeO2 is the most active and stable known reducible oxide for the TCWS reaction, it is below par to make it practical. This has motivated many works to enhance its reduction capacity and therefore increase its activity. In this work the presence of both metal cations (Ce4+ and U4+) has allowed for the charge transfer reaction to occur (Ce4+ + U4+ → Ce3+ + U5+) and therefore increased its capacity to generate oxygen vacancies, VO (2 Ce3+ + VO), needed for the TCWS reaction. Test reactions on the polycrystalline mixed oxides indicated that small atomic percentages of U (\<10 \%) were found to be optimal for H2 production due to a considerable increase of Ce3+ states. Further studies of the Ce-U interaction were performed on thin epitaxial Ce1-xUxO2 (111) films of about 6 nm deep. In situ X-ray photoelectron spectroscopy showed clear evidences of charge transfer at low U content. Moreover, it was found that while increasing the content of U decreased the charge transfer efficiency it protected reduced Ce3+ from being oxidized. Our computational results using the DFT + U method gave evidence of charge transfer at 3.5 and 6.2 at.\% of U. In agreement with experiments, theoretical calculations also showed that the charge transfer is sensitive to the distribution of U4+ around the Ce4+ cations, which in turn affected the creation of VO needed for water splitting. Our results point out to the important yet often neglected effect of statistical entropy (cations distribution in the lattice), in addition to composition, in increasing the density of reduced states and consequently enhancing H2 production from water.}, language = {en} } @misc{KotGawlińska‐NęcekHenkeletal., author = {Kot, Małgorzata and Gawlińska-Nęcek, Katarzyna and Henkel, Karsten and Flege, Jan Ingo}, title = {Prospects of improving efficiency and stability of hybrid perovskite solar cells by alumina ultrathin films}, series = {Small}, volume = {21}, journal = {Small}, number = {12}, publisher = {Wiley}, issn = {1613-6810}, doi = {10.1002/smll.202408435}, pages = {19}, abstract = {Over the last few years, the influence of low temperature (≤80 °C) and, in particular, of room temperature, atomic layer deposited alumina (ALD-Al2O3) on the properties of the underlying hybrid perovskites of different compositions and on the efficiency and stability of the corresponding perovskite solar cells (PSCs) is extensively investigated. The main conclusion is that most probably thanks to the presence of intrinsic defect states in the ALD-Al2O3 and in the perovskite layers, charge transfer and neutralization are possible and the entire lifetime of the PSCs is thus improved. Moreover, the migration of mobile ions between the layers is blocked by the ALD-Al2O3 layer and thus the occurrence of hysteresis in the current density-voltage characteristics of the PSCs is suppressed. Considering the uniform and nondestructive surface coverage, low thermal budget, small amount of material required, and short duration of the established ALD-Al2O3 deposition on top of hybrid perovskites, this additional, but fully solar cell technology-compatible, process step is most likely the most effective, cheapest, and fastest way to improve the efficiency and long-term stability of PSCs and thus increase their marketability.}, language = {en} } @misc{SulaimanBussSanchezBarquillaetal., author = {Sulaiman, Cathy and Buß, Lars and S{\´a}nchez-Barquilla, Raquel and Falta, Jens and Flege, Jan Ingo}, title = {In-situ growth and characterization of 2D TaSe2 on Au(111)}, series = {Verhandlungen der DPG, Regensburg 2025}, journal = {Verhandlungen der DPG, Regensburg 2025}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {Group V dichalcogenides such as TaX2 (X = S, Se, T) have extensively been investigated in recent decades due to their diverse electron correlation effects, including the occurrence of charge density waves and Mott-Hubbard transitions. In 2D, two polytypes, 1T and 1H, exist, which exhibit distinct properties, making selective growth of each polytype crucial. Using low-energy electron microscopy (LEEM), we have successfully observed the growth of two TaSe2 phases on Au(111) in situ after the co-deposition of Ta and Se. At elevated temperature, micron-sized, triangle-shaped islands with bright contrast nucleate first and grow at a higher rate. However, this phase turns out to be meta-stable as it suddenly transitions into a more stable phase (with dark contrast) and continues to grow at a reduced rate. Low-energy electron diffraction shows the presence of TaSe2; bandstructure-sensitive I(V)-LEEM analysis reveals substantial differences in electron reflectivity between both phases. A comparison with TaS2 suggests that the metastable and stable phases are 1T- and 1H-TaSe2, respectively.}, language = {en} } @misc{KotGawlińska‐NęcekPożarowskaetal., author = {Kot, Małgorzata and Gawlińska-Nęcek, Katarzyna and Pożarowska, Emilia and Henkel, Karsten and Schmeißer, Dieter}, title = {Photosensitivity and carrier densities of perovskite solar absorbers}, series = {Advanced science}, volume = {12}, journal = {Advanced science}, number = {16}, publisher = {Wiley}, address = {Hobken, New Jersey}, issn = {2198-3844}, doi = {10.1002/advs.202412711}, pages = {1 -- 8}, abstract = {Dark and light current-voltage characteristics of perovskite solar absorbers are analyzed in terms of their carrier densities. The analysis reveals p-type large polarons as a dominant carrier type in the investigated perovskite solar cells. The mechanism causing photosensitivity is attributed to the dissociation (and pairing) of bipolarons to large polarons (and vice versa) that are controlled by the internal potential Γ. As an example, the polaron concept is tested for a formamidinium lead triiodide perovskite solar cell. The individual steps of the data analysis are demonstrated and determine the ionicity factor of this perovskite film, quantify the density of the large polarons, and predict the gain and loss of photo-induced carriers. It is deduced that a reversible light-on/off operation can only occur when the bias voltage never exceeds a critical value of the internal potential. The results gained in this study suggest that the novel analysis can be successively applied on different hybrid perovskite materials, too.}, language = {en} } @misc{MoralesGertigKotetal., author = {Morales, Carlos and Gertig, Max and Kot, Małgorzata and Alvarado, Carlos and Schubert, Markus Andreas and Zoellner, Marvin Hartwig and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {In situ X-ray photoelectron spectroscopy study of atomic layer deposited cerium oxide on SiO₂ : substrate influence on the reaction mechanism during the early stages of growth}, series = {Advanced materials interfaces}, volume = {12}, journal = {Advanced materials interfaces}, number = {5}, publisher = {Wiley}, address = {Weinheim}, issn = {2196-7350}, doi = {10.1002/admi.202400537}, pages = {1 -- 13}, abstract = {Thermal atomic layer deposition (ALD) of cerium oxide using commercial Ce(thd)4 precursor and O3 on SiO2 substrates is studied employing in-situ X-ray photoelectron spectroscopy (XPS). The system presents a complex growth behavior determined by the change in the reaction mechanism when the precursor interacts with the substrate or the cerium oxide surface. During the first growth stage, non-ALD side reactions promoted by the substrate affect the growth per cycle, the amount of carbon residue on the surface, and the oxidation degree of cerium oxide. On the contrary, the second growth stage is characterized by a constant growth per cycle in good agreement with the literature, low carbon residues, and almost fully oxidized cerium oxide films. This distinction between two growth regimes is not unique to the CeOx/SiO2 system but can be generalized to other metal oxide substrates. Furthermore, the film growth deviates from the ideal layer-by-layer mode, forming micrometric inhomogeneous and defective flakes that eventually coalesce for deposit thicknesses above 10 nm. The ALD-cerium oxide films present less order and a higher density of defects than films grown by physical vapor deposition techniques, likely affecting their reactivity in oxidizing and reducing conditions.}, language = {en} } @misc{FerbelVeronesiMentesetal., author = {Ferbel, Letizia and Veronesi, Stefano and Mentes, Tevfik Onur and Buß, Lars and Rossi, Antonio and Mishra, Neeraj and Coletti, Camilla and Flege, Jan Ingo and Locatelli, Andrea and Heun, Stefan}, title = {Rubidium intercalation in epitaxial monolayer graphene}, series = {Nanoscale}, volume = {17}, journal = {Nanoscale}, number = {19}, publisher = {Royal Society of Chemistry (RSC)}, address = {London}, issn = {2040-3364}, doi = {10.1039/D5NR00417A}, pages = {12465 -- 12472}, abstract = {Alkali metal intercalation of graphene layers has been of particular interest due to potential applications in electronics, energy storage, and catalysis. Rubidium (Rb) is one of the largest alkali metals and among the least investigated as an intercalant. Here, we report a systematic investigation, with a multi-technique approach, of the phase formation of Rb under epitaxial monolayer graphene on SiC(0001). We explore a wide phase space with two control parameters: the Rb density (i.e., deposition time) and sample temperature (i.e., room and low temperature). We reveal the emergence of (2 × 2) and [sqrt(3) x (sqrt3)] R30° structures formed by a single alkali metal layer intercalated between monolayer graphene and the interfacial C-rich reconstructed surface, also known as the buffer layer. Rb intercalation also results in strong n-type doping of the graphene layer. Upon progressively annealing to higher temperatures, we first reveal the diffusion of Rb atoms, which results in the enlargement of intercalated areas. As desorption sets in, intercalated regions progressively shrink and fragment. Eventually, at approximately 600 °C, the initial surface is retrieved, indicating the reversibility of the intercalation process.}, language = {en} } @misc{TschammerBussPożarowskaetal., author = {Tschammer, Rudi and Buß, Lars and Pożarowska, Emilia and Morales, Carlos and Senanayake, Sanjaya D. and Prieto, Mauricio J. and Tănase, Liviu C. and de Souza Caldas, Lucas and Tiwari, Aarti and Schmidt, Thomas and Ni{\~n}o, Miguel A. and Foerster, Michael and Falta, Jens and Flege, Jan Ingo}, title = {High-temperature growth of CeOx on Au(111) and behavior under reducing and oxidizing conditions}, series = {The journal of physical chemistry C}, volume = {129}, journal = {The journal of physical chemistry C}, number = {7}, publisher = {American Chemical Society (ACS)}, address = {Washington, DC}, issn = {1932-7447}, doi = {10.1021/acs.jpcc.4c08072}, pages = {3583 -- 3594}, abstract = {Inverse oxide-metal model catalysts can show superior activity and selectivity compared with the traditional supported metal-oxide architecture, commonly attributed to the synergistic overlayer-support interaction. We have investigated the growth and redox properties of ceria nanoislands grown on Au(111) between 700 and 890 °C, which yields the CeO2-Au(111) model catalyst system. We have observed a distinct correlation between deposition temperature, structural order, and oxide composition through low-energy electron microscopy, low-energy electron diffraction, intensity-voltage curves, and X-ray absorption spectroscopy. Improved structural order and thermal stability of the oxide have been achieved by increasing the oxygen chemical potential at the substrate surface using reactive oxygen (O/O2) instead of molecular O2 during growth. In situ characterization under reducing (H2) and oxidizing atmospheres (O2, CO2) indicates an irreversible loss of structural order and redox activity at high reduction temperatures, while moderate temperatures result in partial decomposition of the ceria nanoislands (Ce3+/Ce4+) to metallic cerium (Ce0). The weak interaction between Au(111) and CeOx would facilitate its reduction to the Ce0 metallic state, especially considering the comparatively strong interaction between Ce0 and Au0. Besides, the higher reactivity of atomic oxygen promotes a stronger interaction between the gold and oxide islands during the nucleation process, explaining the improved stability. Thus, we propose that by driving the nucleation and growth of the ceria/Au system in a highly oxidizing regime, novel chemical properties can be obtained.}, language = {en} } @misc{RichterRachowIsraeletal., author = {Richter, Jana and Rachow, Fabian and Israel, Johannes and Roth, Norbert and Charlafti, Evgenia and G{\"u}nther, Vivien and Flege, Jan Ingo and Mauß, Fabian}, title = {Reaction Mechanism Development for Methane Steam Reforming on a Ni/Al2O3 Catalyst}, series = {Catalysts}, volume = {13}, journal = {Catalysts}, number = {5}, issn = {2073-4344}, doi = {10.3390/catal13050884}, pages = {23}, abstract = {In this work, a reliable kinetic reaction mechanism was revised to accurately reproduce the detailed reaction paths of steam reforming of methane over a Ni/Al2O3 catalyst. A steady-state fixed-bed reactor experiment and a 1D reactor catalyst model were utilized for this task. The distinctive feature of this experiment is the possibility to measure the axially resolved temperature profile of the catalyst bed, which makes the reaction kinetics inside the reactor visible. This allows for understanding the actual influence of the reaction kinetics on the system; while pure gas concentration measurements at the catalytic reactor outlet show near-equilibrium conditions, the inhere presented temperature profile shows that it is insufficient to base a reaction mechanism development on close equilibrium data. The new experimental data allow for achieving much higher quality in the modeling efforts. Additionally, by carefully controlling the available active surface via dilution in the experiment, it was possible to slow down the catalyst conversion rate, which helped during the adjustment of the reaction kinetics. To assess the accuracy of the revised mechanism, a monolith experiment from the literature was simulated. The results show that the fitted reaction mechanism was able to accurately predict the experimental outcomes for various inlet mass flows, temperatures, and steam-to-carbon ratios.}, language = {en} } @misc{KediaDasKotetal., author = {Kedia, Mayank and Das, Chittaranjan and Kot, Malgorzata and Yalcinkaya, Yenal and Zuo, Weiwei and Tabah Tanko, Kenedy and Matvija, Peter and Ezquer, Mikel and Cornago, I{\~n}aki and Hempel, Wolfram and Kauffmann, Florian and Plate, Paul and Lira-Cantu, Monica and Weber, Stefan A.L. and Saliba, Michael}, title = {Mitigating the amorphization of perovskite layers by using atomic layer deposition of alumina}, series = {Energy \& environmental science}, volume = {18}, journal = {Energy \& environmental science}, number = {11}, publisher = {Royal Society of Chemistry (RSC)}, address = {London}, issn = {1754-5692}, doi = {10.1039/D4EE05703A}, pages = {5250 -- 5263}, abstract = {Atomic layer deposition of aluminum oxide (ALD-Al2O3) layers has recently been studied for stabilizing perovskite solar cells (PSCs) against environmental stressors, such as humidity and oxygen. In addition, the ALD-Al2O3 layer acts as a protective barrier, mitigating pernicious halide ion migration from the perovskite towards the hole transport interface. However, its effectiveness in preventing the infiltration of ions and additives from the hole-transport layer into perovskites remains insufficiently understood. Herein, we demonstrate the deposition of a compact ultrathin (∼0.75 nm) ALD-Al2O3 layer that conformally coats the morphology of a triple-cation perovskite layer. This promotes an effective contact of the hole transporter layer on top of the perovskite, thereby improving the charge carrier collection between these two layers. Upon systematically investigating the layer-by-layer structure of the PSC, we discovered that ALD-Al2O3 also acts as a diffusion barrier for the degraded species from the adjacent transport layer into the perovskite. In addition to these protective considerations, ALD-Al2O3 impedes the transition of crystalline perovskites to an undesired amorphous phase. Consequently, the dual functionality (i.e., enhanced contact and diffusion barrier) of the ALD-Al2O3 protection enhanced the device performance from 19.1\% to 20.5\%, while retaining 98\% of its initial performance compared to <10\% for pristine devices after 1500 h of outdoor testing under ambient conditions. Finally, this study deepens our understanding of the mechanism of ALD-Al2O3 as a two-way diffusion barrier, highlighting the multifaceted role of buffer layers in interfacial engineering for the long-term stability of PSCs.}, language = {en} } @misc{XieRachowRakhietal., author = {Xie, T. and Rachow, F. and Rakhi, undefined and Berg, H. P. and H{\"o}schler, K.}, title = {Heat transfer analysis of a tube-in-tube steam reformer for the application of MGT-SOFC hybrid process}, series = {Numerical Heat Transfer, Part A: Applications}, journal = {Numerical Heat Transfer, Part A: Applications}, publisher = {Taylor\&Francis}, issn = {1040-7782}, doi = {10.1080/10407782.2024.2323169}, pages = {1 -- 19}, abstract = {This work deals with the evaluation of a tube-in-tube reformer concept for the realization of the Micro Gas Turbine Solid Oxide Fuel Cell (MGT-SOFC) hybrid process using a semi-validated numerical model. Rigorous heat transfer analysis considering chemical reactions were performed for this concept. To validate the reforming kinetics and heat transfer mechanisms in a catalyst bed, experiments were conducted using a single reactor tube located in a temperature-controlled furnace. Different experimental conditions, such as furnace temperature and space velocity, were considered. A numerical model was replicated according to the single-tube reactor investigated and validated with the experimental results. The catalyst bed is considered as porous material with chemical reactions as internal source terms of species transport equations and energy transport equation. Since the heat transfer into the reformer tubes in the real operating environment is subject to different mechanisms (predominantly convection) than that in a furnace (predominantly thermal radiation), only the parameters on the side of the catalyst bed tuned by the single-tube experiment could be retained for the numerical model of the tube-in-tube concept, which leads to a semi-validated model. Based on this semi-validated model, the performance (such as temperature distribution, conversion rate of the products, etc.) and the applicability of a tube-in-tube reformer concept, considering the variation of boundary conditions, were investigated and evaluated.}, language = {en} } @misc{BussSulaimanSanchezBarquillaetal., author = {Buß, Lars and Sulaiman, Cathy and S{\´a}nchez-Barquilla, Raquel and Cojocariu, Iulia and Szpytma, Marcin and Mente{\c{s}}, Tevfik Onur and Locatelli, Andrea and Falta, Jens and Flege, Jan Ingo}, title = {Rise and fall of 1T-TaS₂ : epitaxial growth of monolayer TaS₂ on Au(111)}, series = {Physical review materials}, volume = {9}, journal = {Physical review materials}, number = {7}, publisher = {American Physical Society (APS)}, address = {College Park, MD}, issn = {2475-9953}, doi = {10.1103/1bxg-yvw2}, pages = {1 -- 9}, abstract = {Monolayer tantalum disulfide epitaxially grown on Au(111) is studied in real time during molecular beam epitaxy using low-energy electron microscopy and microdiffraction. Complementary x-ray photoelectron emission microscopy provides insight into the chemical and electronic structure of the grown layers. Our study reveals a previously unreported growth mechanism where the formation of 2⁢H-TaS2 proceeds via a transient 1⁢T-TaS2 phase. The 1⁢T-TaS2 phase exhibits a significantly higher growth rate than the 2⁢H-TaS2 phase, with growth proceeding mainly in the 1T phase. By comparison with TaSe2 on Au(111), we find that this growth mechanism is common to other Ta-based transition-metal dichalcogenides on Au(111). Furthermore, we find spectroscopic evidence for the presence of charge-density-wave order in 1⁢T-TaS2 on Au(111). These findings provide perspectives on the growth dynamics and phase control of TaS2, opening up avenues for tailoring its electronic properties through substrate interaction and phase engineering.}, language = {en} } @misc{MoralesTschammerPożarowskaetal., author = {Morales, Carlos and Tschammer, Rudi and Pożarowska, Emilia and Kosto, Julia and Villar-Garcia, Ignacio J. and P{\´e}rez-Dieste, Virginia and Favaro, Marco and Starr, David E. and Kapuścik, Paulina and Mazur, Michał and Wojcieszak, Damian and Domaradzki, Jarosław and Alvarado, Carlos and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {Hydrogen sensing via heterolytic H₂ activation at room temperature by atomic layer deposited ceria}, series = {ChemSusChem : chemistry, sustainability, energy, materials}, volume = {18}, journal = {ChemSusChem : chemistry, sustainability, energy, materials}, number = {13}, publisher = {Wiley-VCH}, address = {Weinheim}, issn = {1864-5631}, doi = {10.1002/cssc.202402342}, pages = {1 -- 13}, abstract = {Ultrathin atomic layer deposited ceria films (\<20 nm) are capable of H2 heterolytic activation at room temperature, undergoing a significant reduction regardless of the absolute pressure, as measured under in-situ conditions by near ambient pressure X-ray photoelectron spectroscopy. ALD-ceria can gradually reduce as a function of H2 concentration under H2/O2 environments, especially for diluted mixtures below 10 \%. At room temperature, this reduction is limited to the surface region, where the hydroxylation of the ceria surface induces a charge transfer towards the ceria matrix, reducing Ce4+ cations to Ce3+. Thus, ALD-ceria replicates the expected sensing mechanism of metal oxides at low temperatures without using any noble metal decorating the oxide surface to enhance H2 dissociation. The intrinsic defects of the ALD deposit seem to play a crucial role since the post-annealing process capable of healing these defects leads to decreased film reactivity. The sensing behavior was successfully demonstrated in sensor test structures by resistance changes towards low concentrations of H2 at low operating temperatures without using noble metals. These promising results call for combining ALD-ceria with more conductive metal oxides, taking advantage of the charge transfer at the interface and thus modifying the depletion layer formed at the heterojunction.}, language = {en} } @misc{TschammerGuttmannMoralesetal., author = {Tschammer, R. and Guttmann, D. and Morales, C. and Henkel, K. and Flege, J. I. and Tiebe, C.}, title = {P31 - In-situ and operando measurements for the characterization of next-generation sensor materials}, series = {SMSI 2025 Conference - Sensor and Measurement Science International : proceedings}, journal = {SMSI 2025 Conference - Sensor and Measurement Science International : proceedings}, publisher = {AMA Service GmbH}, address = {Wunstorf}, isbn = {978-3-910600-06-5}, doi = {10.5162/SMSI2025/P31}, pages = {292 -- 293}, abstract = {In this contribution, we highlight the use of in-situ X-ray photoelectron spectroscopy and operando spectroscopic ellipsometry for the characterization of ultra-thin (<20nm) atomic layer deposited layers for the use in next-generation miniaturized sensor devices. By targeting tin oxide layers, we show how we can use these techniques to gain insights into material composition, thickness, and optical properties, thus paving the way for unraveling the correlations between material properties and sensing performance.}, language = {en} }