@misc{TarnawskaZaumseilSchubertetal., author = {Tarnawska, Lidia Lupina and Zaumseil, Peter and Schubert, Markus Andreas and Okur, S. and Morkoc, H. and Paszkiewicz, R. and Storck, Peter and Schroeder, Thomas}, title = {Structural and optical quality of GaN on Sc2O3 / Y2O3 / Si(111)}, series = {Journal of Applied Physics}, volume = {111}, journal = {Journal of Applied Physics}, number = {7}, issn = {0021-8979}, doi = {10.1063/1.3699201}, pages = {073509 -- 073509-4}, language = {en} } @misc{TarnawskaDabrowskiGrzelaetal., author = {Tarnawska, Lidia Lupina and Dabrowski, Jarek Marek and Grzela, Tomasz and Niermann, T. and Lehmann, M. and Storck, Peter and Schr{\"o}der, Thomas}, title = {Interface science of virtual GaN substrates on Si(111) via Sc2O3/Y2O3 buffers: Experiment and Theory}, series = {Journal of Applied Physics}, volume = {113}, journal = {Journal of Applied Physics}, number = {21}, issn = {0021-8979}, pages = {213507 -- 213507}, language = {en} } @misc{NiermannZenglerTarnawskaetal., author = {Niermann, T. and Zengler, D. and Tarnawska, Lidia Lupina and Storck, Peter and Schroeder, Thomas}, title = {Virtual GaN substrates via Sc2O3/Y2O3 buffers on Si(111): TEM Characterization of growth defects}, series = {Journal of Applied Physics}, volume = {113}, journal = {Journal of Applied Physics}, number = {22}, issn = {0021-8979}, pages = {223501 -- 223501-8}, language = {en} } @misc{TarnawskaZoellnerNiermannetal., author = {Tarnawska, Lidia Lupina and Z{\"o}llner, Marvin Hartwig and Niermann, T. and Dietrich, Burkhart and Capellini, Giovanni and Thapa, Sarad and H{\"a}berlen, Maik and Lehmann, M. and Storck, Peter and Schr{\"o}der, Thomas}, title = {Zero Lattice Mismatch and Truly Single Crystalline ScN Buffer Layers for GaN Growth on Silicon}, series = {Applied Physics Letters}, volume = {107}, journal = {Applied Physics Letters}, number = {20}, issn = {1077-3118}, doi = {10.1063/1.4935856}, pages = {201907}, language = {en} } @misc{SanaTetznerDabrowskietal., author = {Sana, Prabha and Tetzner, Henriette and Dabrowski, Jarek Marek and Tarnawska, Lidia Lupina and Costina, Ioan and Thapa, Sarad and Storck, Peter and Schr{\"o}der, Thomas and Z{\"o}llner, Marvin Hartwig}, title = {Growth of ScN(111) on Sc₂O₃ (111) for GaN integration on Si(111): Experiment and ab initio calculations}, series = {Journal of Applied Physics}, volume = {120}, journal = {Journal of Applied Physics}, issn = {1089-7550}, doi = {10.1063/1.4963826}, pages = {135103}, language = {en} } @misc{KotHenkelNaumannetal., author = {Kot, Małgorzata and Henkel, Karsten and Naumann, Franziska and Gargouri, Hassan and Tarnawska, Lidia Lupina and Wilker, Viola and Kus, Peter and Pożarowska, Emilia and Garain, Samiran and Rouissi, Zied and Schmeißer, Dieter}, title = {Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources}, series = {Journal of Vacuum Science and Technology A}, volume = {37}, journal = {Journal of Vacuum Science and Technology A}, number = {2}, issn = {0734-2101}, doi = {10.1116/1.5079628}, pages = {11}, abstract = {A comparative study of thin aluminum nitride (AlN) films deposited by plasma-enhanced atomic layer deposition in the SENTECH SI ALD LL system applying either a direct inductively coupled plasma (ICP) or an indirect capacitively coupled plasma (CCP) source is presented. The films prepared with the ICP source (based on a planar triple spiral antenna) exhibit improved properties concerning the growth rate per cycle, total cycle duration, homogeneity, refractive index, fixed and mobile electrical charges, and residual oxygen content compared to the CCP source, where the comparison is based on the applied plasma power of 200 W. The increase of the plasma power to 600 W in the ICP process significantly reduces the residual oxygen content and enhances the electrical breakdown field. The AlN layers grown under these conditions, with a growth rate per cycle of 1.54 {\AA}/cycle, contain residual oxygen and carbon concentrations of about 10\% and 4\%, respectively, and possess a refractive index of 2.07 (at 632.8 nm).}, language = {en} }